JP3104915B2 - Novolak resin manufacturing method - Google Patents

Novolak resin manufacturing method

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Publication number
JP3104915B2
JP3104915B2 JP03045400A JP4540091A JP3104915B2 JP 3104915 B2 JP3104915 B2 JP 3104915B2 JP 03045400 A JP03045400 A JP 03045400A JP 4540091 A JP4540091 A JP 4540091A JP 3104915 B2 JP3104915 B2 JP 3104915B2
Authority
JP
Japan
Prior art keywords
weight
product
naphthol
compound
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP03045400A
Other languages
Japanese (ja)
Other versions
JPH04264118A (en
Inventor
博美 森田
和幸 村田
一郎 木村
晋 長尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP03045400A priority Critical patent/JP3104915B2/en
Publication of JPH04264118A publication Critical patent/JPH04264118A/en
Application granted granted Critical
Publication of JP3104915B2 publication Critical patent/JP3104915B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Epoxy Resins (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、耐湿性、耐熱性に優れ
た硬化物を与えるエポキシ樹脂の原料として又、エポキ
シ樹脂の硬化剤として有用な、軟化点の低いノボラック
型樹脂の製法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a novolak resin having a low softening point, which is useful as a raw material of an epoxy resin which gives a cured product having excellent moisture resistance and heat resistance, and which is useful as a curing agent for an epoxy resin.

【0002】[0002]

【従来の技術】特開平3−717には、ジメチロール化
合物とナフトールとを酸触媒の存在下に反応させて得ら
れるノボラック型樹脂が記載されている。
2. Description of the Prior Art JP-A-3-717 discloses a novolak resin obtained by reacting a dimethylol compound with naphthol in the presence of an acid catalyst.

【0003】[0003]

【発明が解決しようとする課題】特開平3−717の実
施例では、ジメチロール化合物とナフトールの反応を9
0〜95℃で行なっており、又、反応混合物中の過剰の
ナフトールを水蒸気蒸留により除去している。
In the embodiment of JP-A-3-717, the reaction between a dimethylol compound and naphthol is 9
The reaction is carried out at 0 to 95 ° C., and excess naphthol in the reaction mixture is removed by steam distillation.

【0004】しかしながら、この方法では水蒸気蒸留下
での酸化反応等により、反応生成物が分解したり再縮合
したりするため、後述の三核体化合物のノボラック型樹
脂中に占める割合が低下し、更に三核体化合物より低分
子量の化合物の含量が増加し、得られるノボラック型樹
脂及びそのエポキシ化物は軟化点が高くなり、取り扱い
易い低粘度品を得ることはできない。
However, in this method, a reaction product is decomposed or recondensed by an oxidation reaction under steam distillation or the like, so that the ratio of the trinuclear compound described below in the novolak-type resin decreases, Further, the content of the compound having a lower molecular weight than that of the trinuclear compound increases, and the obtained novolak-type resin and its epoxidized product have a high softening point, and a low-viscosity product that is easy to handle cannot be obtained.

【0005】更に、このノボラック型樹脂をエポキシ化
して得られるエポキシ樹脂を用いた硬化物は、耐湿性、
耐熱性の点で優れているが、更に耐湿性、耐熱性の向上
が望まれている。
Further, a cured product using an epoxy resin obtained by epoxidizing this novolak type resin has moisture resistance,
Although excellent in heat resistance, further improvement in moisture resistance and heat resistance is desired.

【0006】[0006]

【課題を解決するための手段】そこで、本発明者らは、
上記課題を解決すべく鋭意検討した結果、本発明を完成
した。即ち、本発明は、(1)式(A)
Means for Solving the Problems Accordingly, the present inventors have:
As a result of intensive studies to solve the above problems, the present invention has been completed. That is, the present invention relates to formula (A)

【0007】 [0007]

【0008】(式中、Rは炭素数1−4のアルキル基を
示す)で示されるジメチロール化合物(A)とナフトー
ルとを酸触媒の存在下で40〜85℃の温度で反応さ
せ、反応混合物中の過剰のナフトールを減圧下200℃
以下の温度で加熱蒸留して除去することを特徴とするノ
ボラック型樹脂の製法に関する。
(Wherein R represents an alkyl group having 1 to 4 carbon atoms) The dimethylol compound (A) is reacted with naphthol at a temperature of 40 to 85 ° C. in the presence of an acid catalyst. Remove excess naphthol in the solution at 200 ° C under reduced pressure
The present invention relates to a method for producing a novolak resin, which is removed by heating and distillation at the following temperature.

【0009】[0009]

【0010】[0010]

【0011】[0011]

【0012】[0012]

【0013】以下、本発明を詳細に説明する。ジメチロ
ール化合物(A)において、Rとしては、メチル基、エ
チル基、n−プロピル基、イソプロピル基、n−ブチル
基、イソブチル基、sec−ブチル基、t−ブチル基が
挙げられるが、特にメチル基が好ましい。
Hereinafter, the present invention will be described in detail. In the dimethylol compound (A), examples of R include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group. Is preferred.

【0014】ジメチロール化合物(A)の具体例として
は、例えば、2,6−ジメチロール−4−メチルフェノ
ール、2,6−ジメチロール−4−t−ブチルフェノー
ル、4,6−ジメチロール−2−メチルフェノール、
4,6−ジメチロール−2−t−ブチルフェノール等が
挙げられる。ナフトールとしては、α−ナフトール及び
β−ナフトールが挙げられる。
Specific examples of the dimethylol compound (A) include, for example, 2,6-dimethylol-4-methylphenol, 2,6-dimethylol-4-t-butylphenol, 4,6-dimethylol-2-methylphenol,
4,6-dimethylol-2-t-butylphenol and the like. Naphthol includes α-naphthol and β-naphthol.

【0015】上記(1)の製法で得られるノボラック型
樹脂(以下、本発明のノボラック型樹脂という)は、ジ
メチロール化合物(A)とナフトールとを、一般に酸触
媒の存在下に反応(脱水縮合)させるので式(C)
The novolak-type resin (hereinafter referred to as the novolak-type resin of the present invention) obtained by the production method (1) is obtained by reacting a dimethylol compound (A) with naphthol in the presence of an acid catalyst (dehydration condensation). Equation (C)

【0016】 [0016]

【0017】(式中、Rは前記と同じ意味を表し、nは
0−2の値をとる)で示される化合物を主成分として含
むが、三核体化合物(B)を30重量%以上、好ましく
は35重量%以上、特に好ましくは40重量%以上含
む。
(Wherein R has the same meaning as described above, and n takes a value of 0-2), but contains at least 30% by weight of a trinuclear compound (B). The content is preferably at least 35% by weight, particularly preferably at least 40% by weight.

【0018】本発明のノボラック型樹脂中には、その他
に、蒸留等の過程で発生する分解物や再縮合物等の副生
物が含有されるが、ノボラック型樹脂中の下記一般式
(B) (式中Rは前記と同じ意味を表す)で表される三核体化
合物(B)より低分子量の化合物(上記副生物等)の含
有量は10重量%以下、好ましくは7重量%以下、特に
好ましくは5重量%以下である。
In the novolak resin of the present invention, by-products such as decomposed products and recondensates generated in the course of distillation and the like are contained, and the following general formula (B) in the novolak resin is contained. (Wherein R represents the same meaning as described above), the content of the compound having a lower molecular weight than the trinuclear compound (B) (such as the above by-product) is 10% by weight or less, preferably 7% by weight or less, Particularly preferably, it is at most 5% by weight.

【0019】又、七核体以上の多核体化合物の合計含有
量は25重量%以下であることが好ましく、特に20重
量%以下であることが好ましい。なお、X核体化合物と
は、1分子中のベンゼン核とナフタレン核の数の和がX
である化合物をいう。
The total content of polynuclear compounds having seven or more nuclei is preferably 25% by weight or less, more preferably 20% by weight or less. The X-nuclear compound is defined as the sum of the numbers of benzene nuclei and naphthalene nuclei in one molecule is X
Is a compound.

【0020】本発明のノボラック型樹脂の製造法におい
ては、ジメチロール化合物(A)1モルに対してナフト
ールを2〜10モル用いるのが好ましく、特に3〜6モ
ル用いるのが好ましい。
In the process for producing a novolak resin according to the present invention, it is preferable to use 2 to 10 moles of naphthol with respect to 1 mole of the dimethylol compound (A), and it is particularly preferable to use 3 to 6 moles.

【0021】酸触媒としては、塩酸、硫酸、リン酸、p
−トルエンスルホン酸、しゅう酸等種々の化合物が使用
できるが、反応の円滑性及び三核体化合物(B)の生成
量を増加させることを考えると、p−トルエンスルホン
酸が好ましい。酸触媒の使用量は、ジメチロール化合物
(A)に対して0.01〜10重量%用いるのが好まし
いが、0.1〜1重量%用いれば十分である。
The acid catalyst includes hydrochloric acid, sulfuric acid, phosphoric acid, p
-Various compounds such as toluenesulfonic acid and oxalic acid can be used, but p-toluenesulfonic acid is preferred in view of increasing the smoothness of the reaction and increasing the yield of the trinuclear compound (B). The amount of the acid catalyst used is preferably 0.01 to 10% by weight based on the dimethylol compound (A), but it is sufficient to use 0.1 to 1% by weight.

【0022】反応温度は40〜85℃であるが、50〜
80℃が特に好ましい。反応は、無溶媒でも、メタノー
ル、エタノール、プロパノ−ル、ブタノール、ベンゼ
ン、トルエン、メチルイソブチルケトン等の溶媒中でも
行なうことができる。反応時間は、好ましくは2〜15
時間、特に好ましくは4〜10時間である。
The reaction temperature is from 40 to 85 ° C.,
80 ° C. is particularly preferred. The reaction can be carried out without solvent or in a solvent such as methanol, ethanol, propanol, butanol, benzene, toluene and methyl isobutyl ketone. The reaction time is preferably 2 to 15
Time, particularly preferably 4 to 10 hours.

【0023】ここで充分に反応を実施することは、次い
で行う過剰の未反応ナフトールを除却する際の高分子化
を防ぐのに有効である。かくして反応を実施した後、水
洗により酸触媒を除き中性にする。
It is effective to carry out the reaction sufficiently to prevent the polymerization at the time of removing excess unreacted naphthol to be performed subsequently. After carrying out the reaction in this way, the acid catalyst is removed by washing with water to make it neutral.

【0024】ついで、本発明の重要な点である過剰の未
反応ナフトールの除去を減圧下200℃以下で行う。こ
の際、200℃を超える温度で行うと、三核体化合物
(B)が高分化反応を起し、ノボラック型樹脂の粘度を
下げるという目的がそこなわれる。
Next, the removal of excess unreacted naphthol, which is an important point of the present invention, is carried out at 200 ° C. or less under reduced pressure. At this time, if the reaction is performed at a temperature exceeding 200 ° C., the trinuclear compound (B) causes a high differentiation reaction, and the purpose of lowering the viscosity of the novolak resin is lost.

【0025】又、一般的にフェノール類やナフトール類
を除去する方法である水蒸気蒸留では、酸化状態による
分解、再縮合等の副反応によりノボラック型樹脂の変質
を起こしてしまう。従って、本発明の方法においては、
減圧下、200℃以下で加熱蒸留することは極めて重要
である。
In the case of steam distillation, which is a method for generally removing phenols and naphthols, the novolak resin deteriorates due to side reactions such as decomposition and recondensation due to the oxidation state. Therefore, in the method of the present invention,
It is extremely important to heat distill at 200 ° C. or less under reduced pressure.

【0026】本発明の方法によれば、副反応は抑制さ
れ、得られるノボラック型樹脂は、上記のような変質を
起こしていない為、三核体化合物(B)を30重量%以
上含むことになる。
According to the method of the present invention, side reactions are suppressed and the resulting novolak-type resin does not undergo the above-mentioned alteration, so that it contains at least 30% by weight of the trinuclear compound (B). Become.

【0027】本発明のノボラック型樹脂は、軟化温度が
低く粘度が低いため取り扱い易く、作業性に優れ、しか
も、本発明のノボラック型樹脂をエポキシ化して得られ
るエポキシ樹脂も粘度が低く作業性に優れ、更にこのエ
ポキシ樹脂を用いた硬化物は、耐湿性、耐熱性に優れて
いる。
The novolak resin of the present invention is easy to handle and has excellent workability because of its low softening temperature and low viscosity, and the epoxy resin obtained by epoxidizing the novolak resin of the present invention also has low viscosity and low workability. The cured product using the epoxy resin is excellent in moisture resistance and heat resistance.

【0028】なお、本発明のノボラック型樹脂のエポキ
シ化は常法により行なうことができ、例えば、ノボラッ
ク型樹脂をエピクロロヒドリンと塩基性化合物の存在下
に反応させることにより得ることができ、得られるエポ
キシ樹脂は、本発明のノボラック型樹脂やフェノールノ
ボラック等の公知の硬化剤を用いて常法により硬化させ
ることができる。尚、本発明のノボラック型樹脂は通常
のエポキシ樹脂の硬化剤としても利用出来、耐湿性、耐
熱性にすぐれた硬化物を与える。
The epoxidation of the novolak type resin of the present invention can be carried out by a conventional method. For example, it can be obtained by reacting the novolak type resin with epichlorohydrin in the presence of a basic compound. The obtained epoxy resin can be cured by a conventional method using a known curing agent such as the novolak resin of the present invention or phenol novolak. The novolak resin of the present invention can also be used as a curing agent for ordinary epoxy resins, and gives a cured product having excellent moisture resistance and heat resistance.

【0029】[0029]

【実施例】以下に、実施例及び応用例を挙げて本発明を
更に具体的に説明する。
The present invention will be described more specifically below with reference to examples and application examples.

【0030】実施例1 パラクレゾール108g(1モル)、パラホルムアルデ
ヒド60g(2モル)及び水100mlを温度計、冷却
管、滴下ロート及び攪拌機を付けた1リットルのフラス
コに仕込み、窒素を吹込みながら攪拌した。
Example 1 108 g (1 mol) of paracresol, 60 g (2 mol) of paraformaldehyde and 100 ml of water were charged into a 1-liter flask equipped with a thermometer, a cooling tube, a dropping funnel and a stirrer, and nitrogen was blown into the flask. Stirred.

【0031】室温下、15%苛性ソーダ水溶液80g
(苛性ソーダとして0.3モル)を発熱に注意しながら
液温が50℃を越えないようにゆっくり滴下した。その
後、水浴中で50℃まで加熱し、10時間反応した。反
応終了後、水200mlを加え室温まで冷却し発熱に注意
しながら、10%塩酸水溶液で徐々に中和し、さらにp
Hが4になるまで塩酸水溶液を添加した。
80 g of a 15% aqueous sodium hydroxide solution at room temperature
(0.3 mol as caustic soda) was slowly added dropwise while paying attention to heat generation so that the liquid temperature did not exceed 50 ° C. Thereafter, the mixture was heated to 50 ° C. in a water bath and reacted for 10 hours. After completion of the reaction, 200 ml of water was added, the mixture was cooled to room temperature, and neutralized gradually with a 10% aqueous hydrochloric acid solution while paying attention to heat generation.
An aqueous solution of hydrochloric acid was added until H was 4.

【0032】その後、析出した結晶をロ別し、結晶をさ
らに水により洗浄した。得られた結晶を減圧下(10mm
Hg) 50℃で乾燥し、白色の2,6−ジメチロール−4
−メチルフェノールを得た。得量は143gであった。
(パラクレゾールからの収率は85%)
Thereafter, the precipitated crystals were separated by filtration, and the crystals were further washed with water. The obtained crystals were removed under reduced pressure (10 mm
Hg) dried at 50 ° C. to give white 2,6-dimethylol-4
-Methylphenol was obtained. The yield was 143 g.
(Yield from paracresol is 85%)

【0033】2,6−ジメチロール−4−メチルフェノ
ール168gを温度計、攪拌機を付けたガラス容器に仕
込み、さらにα−ナフトール576g及びメチルイソブ
チルケトン1000mlを加えて窒素雰囲気下で室温で攪
拌した。そして、p−トルエンスルホン酸1g(2,6
−ジメチロール−4−メチルフェノールに対して0.6
重量%)を発熱に注意しながら、液温が50℃を越えな
いように徐々に添加した。
168 g of 2,6-dimethylol-4-methylphenol was charged into a glass container equipped with a thermometer and a stirrer, 576 g of α-naphthol and 1000 ml of methyl isobutyl ketone were added, and the mixture was stirred at room temperature under a nitrogen atmosphere. Then, 1 g of p-toluenesulfonic acid (2, 6
0.6 with respect to dimethylol-4-methylphenol
(% By weight) was carefully added so that the liquid temperature did not exceed 50 ° C. while paying attention to heat generation.

【0034】添加後、油浴上で50℃まで加温し2時間
反応させた後、さらに70℃に加温して7時間反応さ
せ、その後、分液ロートに移し水洗した。洗浄水が中性
を示すまで水洗後、エバポレーターにより有機層から未
反応ナフトールを除去する為減圧下(10mmHg以下)、
浴温を195℃として減圧加熱蒸留した。蒸留時間は2
時間を要した。
After the addition, the mixture was heated to 50 ° C. on an oil bath and reacted for 2 hours, and further heated to 70 ° C. and reacted for 7 hours, and then transferred to a separating funnel and washed with water. After washing with water until the washing water shows neutrality, remove the unreacted naphthol from the organic layer using an evaporator under reduced pressure (10 mmHg or less).
The bath temperature was reduced to 195 ° C., and the mixture was distilled under reduced pressure. Distillation time is 2
It took time.

【0035】この操作によりノボラック型樹脂(A−
1)372gを得た。生成物(A−1)の軟化温度は1
12℃で水酸基当量(g/mol)は137であった。又、
生成物(A−1)中の未反応ナフトールの量はガスクロ
マトグラフィーの分析の結果1重量%以下であった。
By this operation, the novolak resin (A-
1) 372 g was obtained. The softening temperature of the product (A-1) is 1
At 12 ° C., the hydroxyl equivalent (g / mol) was 137. or,
The amount of unreacted naphthol in the product (A-1) was 1% by weight or less as a result of analysis by gas chromatography.

【0036】又、GPC分析により、生成物(A−1)
中の三核体化合物(B)の含有量は52重量%で、三核
体化合物(B)より低分子量の化合物の含有量は3.5
重量%であり、七核体以上の多核体化合物の合計含有量
は15重量%であった。生成物(A−1)の粘度は25
ポイズであった。
The product (A-1) was analyzed by GPC analysis.
The content of the trinuclear compound (B) was 52% by weight, and the content of the compound having a lower molecular weight than the trinuclear compound (B) was 3.5.
% By weight, and the total content of polynuclear compounds having seven or more nuclei was 15% by weight. The viscosity of the product (A-1) is 25
Poise.

【0037】実施例2 実施例1において、α−ナフトールの使用量を504g
とし、それ以外は実施例1と同様にしてノボラック型樹
脂(A−2)375gを得た。生成物(A−2)の軟化
温度は118℃で水酸基当量(g/mol)は138であっ
た。又、生成物(A−2)中の未反応ナフトールの量は
ガスクロマトグラフィーの分析の結果1重量%以下であ
った。
Example 2 In Example 1, the amount of α-naphthol used was changed to 504 g.
Otherwise in the same manner as in Example 1, 375 g of novolak resin (A-2) was obtained. The softening temperature of the product (A-2) was 118 ° C and the hydroxyl equivalent (g / mol) was 138. The amount of unreacted naphthol in the product (A-2) was 1% by weight or less as a result of analysis by gas chromatography.

【0038】又、GPC分析により、生成物(A−2)
中の三核体化合物(B)の含有量は45重量%で、三核
体化合物(B)より低分子量の化合物の含有量は3.2
重量%であり、七核体以上の多核体化合物の合計含有量
は17重量%であった。生成物(A−2)の粘度は27
ポイズであった。
The product (A-2) was analyzed by GPC analysis.
The content of the trinuclear compound (B) was 45% by weight, and the content of the compound having a lower molecular weight than the trinuclear compound (B) was 3.2%.
%, And the total content of polynuclear compounds of seven or more nuclei was 17% by weight. The viscosity of the product (A-2) is 27
Poise.

【0039】比較例1 実施例1において、分液ロートで洗浄水が中性を示すま
で水洗後、150℃の蒸気により、実施例1と同様の未
反応ナフトール量(1重量%以下)となるまで水蒸気蒸
留を実施した。水蒸気蒸留は5時間を要した。(尚、実
施例1と同様の操作時間である2時間後での未反応ナフ
トール量は3.5重量%であった。)
Comparative Example 1 In Example 1, after the water was washed with a separating funnel until the washing water became neutral, the amount of unreacted naphthol (1% by weight or less) was the same as in Example 1 by steam at 150 ° C. Steam distillation was carried out until. Steam distillation took 5 hours. (The amount of unreacted naphthol after 2 hours, the same operation time as in Example 1, was 3.5% by weight.)

【0040】かくして、生成物(A−3)365gを得
た。得られた生成物(A−3)の軟化温度は135℃、
水酸基当量は143であった。又、生成物(A−3)中
の未反応ナフトールはガスクロマトグラフィーの分析の
結果1重量%以下であった。
Thus, 365 g of the product (A-3) was obtained. The softening temperature of the obtained product (A-3) is 135 ° C,
The hydroxyl equivalent was 143. The unreacted naphthol in the product (A-3) was 1% by weight or less as a result of analysis by gas chromatography.

【0041】又、GPC分析より生成物(A−3)中の
三核体化合物(B)の含有量は25重量%で、三核体化
合物(B)より低分子量の化合物の含有量は15重量%
であり、七核体以上の多核体化合物の合計含有量は30
重量%であった。生成物(A−3)の粘度は39ポイズ
であった。
According to GPC analysis, the content of the trinuclear compound (B) in the product (A-3) was 25% by weight, and the content of the compound having a lower molecular weight than the trinuclear compound (B) was 15%. weight%
And the total content of polynuclear compounds of seven or more nuclei is 30.
% By weight. The viscosity of the product (A-3) was 39 poise.

【0042】応用例1 実施例1の生成物(A−1)137gを温度計、攪拌
機、及び減圧回収装置のついた反応装置に仕込み、さら
に、エピクロルヒドリン374g(3.5モル)、ジメ
チルスルホキシド68gを添加し、溶解させた。この
間、系内は窒素が導入されている。
Application Example 1 137 g of the product (A-1) of Example 1 was charged into a reactor equipped with a thermometer, a stirrer, and a vacuum recovery device, and 374 g (3.5 mol) of epichlorohydrin and 68 g of dimethyl sulfoxide were further added. Was added and dissolved. During this time, nitrogen has been introduced into the system.

【0043】溶解後、反応温度を40℃に保ちながら、
固形の苛性ソーダ40g(1モル)を徐々に添加した。
添加時間は1時間を要した。苛性ソーダ添加後、さらに
40℃で1時間反応させた後、反応温度を70℃に上げ
て、さらに1時間反応させた。その結果、合計の反応時
間は3時間であった。
After dissolution, while maintaining the reaction temperature at 40 ° C.
40 g (1 mol) of solid caustic soda was slowly added.
The addition time required one hour. After the addition of caustic soda, the reaction was further performed at 40 ° C. for 1 hour, then the reaction temperature was increased to 70 ° C., and the reaction was further performed for 1 hour. As a result, the total reaction time was 3 hours.

【0044】ついで、反応装置の浴温を130℃に上昇
させ、突沸に注意しながら徐々に減圧にし、未反応のエ
ピクロルヒドリン、ジメチルスルホキシド及び生成水を
一気に追い出した。最終の減圧度は5mmHgであり、この
間、2時間を要した。
Then, the bath temperature of the reactor was raised to 130 ° C., and the pressure was gradually reduced while paying attention to bumping, so that unreacted epichlorohydrin, dimethyl sulfoxide and produced water were expelled at once. The final degree of vacuum was 5 mmHg, during which it took 2 hours.

【0045】その後、メチルイソブチルケトン500ml
を加え、樹脂分を溶解し、20%苛性ソーダ水溶液20
gを加え、反応温度70℃で2時間反応した。反応終了
後、分液ロートで水洗をくり返し、水相を中性に戻し
た。ついで、メチルイソブチルケトン相を減圧下で加熱
し、メチルイソブチルケトンを除去した。
Thereafter, 500 ml of methyl isobutyl ketone
To dissolve the resin component, and add 20% aqueous sodium hydroxide solution 20
g was added and reacted at a reaction temperature of 70 ° C. for 2 hours. After the completion of the reaction, washing with water was repeated with a separating funnel to return the aqueous phase to neutral. Then, the methyl isobutyl ketone phase was heated under reduced pressure to remove methyl isobutyl ketone.

【0046】これにより、エポキシ樹脂である淡黄色の
固体(B−1)175gを得た。生成物(B−1)の軟
化温度は75℃で、エポキシ当量(g/mol)は212、
粘度10ポイズ、フリー塩素量1ppm 以下、加水分解性
塩素量230ppm 、全塩素量は510ppm 、PCTによ
る抽出水中の塩素イオン濃度は3ppm であった。
As a result, 175 g of a pale yellow solid (B-1) as an epoxy resin was obtained. The softening temperature of the product (B-1) is 75 ° C., the epoxy equivalent (g / mol) is 212,
The viscosity was 10 poise, the amount of free chlorine was 1 ppm or less, the amount of hydrolyzable chlorine was 230 ppm, the total amount of chlorine was 510 ppm, and the concentration of chloride ions in the water extracted by PCT was 3 ppm.

【0047】応用例2 生成物(A−1)の代りに、実施例2て得られた生成物
(A−2)139gを用いた以外は応用例1と同様の操
作を実施し、エポキシ樹脂である生成物(B−2)17
2gを得た。
Application Example 2 The same operation as in Application Example 1 was carried out except that 139 g of the product (A-2) obtained in Example 2 was used instead of the product (A-1), and an epoxy resin was used. (B-2) 17 which is
2 g were obtained.

【0048】応用例3 生成物(A−1)の代りに、比較例1で得た生成物(A
−3)143gを使用し、ジメチルスルホキシド68g
の代りにメタノール68gを用いた以外は応用例1と同
様の操作を実施して、エポキシ樹脂である生成物(B−
3)150gを得た。
Application Example 3 Instead of the product (A-1), the product (A
-3) Using 143 g, dimethyl sulfoxide 68 g
Was performed in the same manner as in Application Example 1 except that 68 g of methanol was used instead of
3) 150 g was obtained.

【0049】生成物(B−1)〜(B−3)の特性を表
−1に示した。
The properties of the products (B-1) to (B-3) are shown in Table 1.

【0050】 [0050]

【0051】なお、実施例、比較例及び応用例におい
て、フリー塩素量、加水分解性塩素量、粘度、軟化温
度、全塩素量、PCT(プレッシャー・クッカー・テス
ト)による塩素量、GPC分析は次のように測定した。
In Examples, Comparative Examples and Application Examples, the free chlorine amount, hydrolyzable chlorine amount, viscosity, softening temperature, total chlorine amount, chlorine amount by PCT (pressure cooker test), and GPC analysis are as follows. Was measured as follows.

【0052】(フリー塩素量) 約10gの試料(エポキシ樹脂)を200ミリリットル
のビーカーに精秤し、100ミリリットルのアセトンで
溶解し、更に、蒸留水2ミリリットルと氷酢酸1ミリリ
ットルを加え、硝酸銀水溶液にて電位差滴定を行い定量
した。
(Amount of Free Chlorine) About 10 g of a sample (epoxy resin) was precisely weighed in a 200 ml beaker, dissolved in 100 ml of acetone, further added with 2 ml of distilled water and 1 ml of glacial acetic acid, and added with an aqueous solution of silver nitrate. Potentiometric titration was performed to determine the amount.

【0053】(加水分解性塩素量) 約0.5gの試料(エポキシ樹脂)を100ミリリット
ルの共栓付きフラスコに精秤し、ジオキサン30ミリリ
ットルで溶解する。溶解後、1N−KOHエタノール溶
液5ミリリットルを加え、30分間煮沸還流する。その
後、この溶液を完全に200ミリリットルのビーカーに
移し、80%濃度のアセトン水溶液100ミリリットル
を加え、更に濃硝酸2ミリリットルを加えて硝酸銀水溶
液にて電位差滴定を行い定量した。
(Amount of Hydrolyzable Chlorine) About 0.5 g of a sample (epoxy resin) is precisely weighed in a 100 ml stoppered flask and dissolved in 30 ml of dioxane. After dissolution, 5 ml of a 1N-KOH ethanol solution is added, and the mixture is boiled under reflux for 30 minutes. Thereafter, this solution was completely transferred to a 200 ml beaker, 100 ml of an 80% strength aqueous acetone solution was added, and 2 ml of concentrated nitric acid was further added.

【0054】(粘度) ICI粘度計(コーンプレートタイプ)より150℃に
おける粘度を測定した。(軟化温度) JIS K2425環球法により測定した。
(Viscosity) The viscosity at 150 ° C. was measured with an ICI viscometer (cone plate type). (Softening temperature) It was measured by JIS K2425 ring and ball method.

【0055】(全塩素量) 約1gの試料(エポキシ樹脂)を100ミリリットルの
共栓付きフラスコに精秤し、n−ブチルカルビトール2
5ミリリットルを加え、加熱溶解する。溶解後、1N−
KOHプロピレングリコール溶液25ミリリットルを加
え、10分間加熱還流する。その後、この溶液を完全に
200ミリリットルのビーカーに移し、氷酢酸50ミリ
リットルを加えて硝酸銀水溶液にて電位差滴定を行い定
量した。
(Total Chlorine Content) About 1 g of a sample (epoxy resin) was precisely weighed into a 100 ml stoppered flask, and n-butyl carbitol 2 was added.
Add 5 ml and heat to dissolve. After dissolution, 1N-
Add 25 ml of KOH propylene glycol solution and heat to reflux for 10 minutes. Thereafter, this solution was completely transferred to a 200 ml beaker, 50 ml of glacial acetic acid was added, and the solution was quantified by potentiometric titration with an aqueous silver nitrate solution.

【0056】(PCTによる塩素量) エポキシ樹脂5gにイオン交換水50gを加え、180
℃で20時間保持した時の抽出水中の塩素イオン濃度を
イオンクロマトにより定量した。
(Amount of chlorine by PCT) 50 g of ion-exchanged water was added to 5 g of epoxy resin,
The chlorine ion concentration in the extraction water when kept at 20 ° C. for 20 hours was quantified by ion chromatography.

【0057】(GPC分析) GPC装置;島津製作所 (カラム;TSK−G−3000XL(1本)+ TSK−G−2000XL(2本) 溶 媒 ;テトラヒドロフラン 1ml/min 検 出 ;UV(254nm)(GPC analysis) GPC apparatus; Shimadzu Corporation (Column: TSK-G-3000XL (one) + TSK-G-2000XL (two)) Solvent: Tetrahydrofuran 1 ml / min Detection: UV (254 nm)

【0058】応用例4〜6 表−2に示す割合で、フェノールノボラック(日本化薬
(株)製、軟化温度85℃、水酸基当量(g/mol)10
5)と応用例1〜3で得られた生成物(B−1)〜(B
−3)と2−メチルイミダゾールを配合し、組成物を得
た。
Application Examples 4 to 6 Phenol novolak (manufactured by Nippon Kayaku Co., Ltd., softening temperature 85 ° C., hydroxyl equivalent (g / mol) 10
5) and products (B-1) to (B) obtained in application examples 1 to 3.
-3) and 2-methylimidazole were blended to obtain a composition.

【0059】この組成物を70〜80℃で15分間ロー
ル混練し、これを冷却、粉砕し、タブレット化し、更に
トランスファー成形機により成型後、160℃で2時間
予備硬化し、180℃で8時間ポストキュアを行なって
硬化物(試験片)を得た。この硬化物のガラス転移温度
(Tg)、熱変形温度(HDT)及び吸水率を次の条件
で測定した。
The composition was roll-kneaded at 70-80 ° C. for 15 minutes, cooled, pulverized, tableted, molded by a transfer molding machine, pre-cured at 160 ° C. for 2 hours, and 180 ° C. for 8 hours Post-curing was performed to obtain a cured product (test piece). The glass transition temperature (Tg), heat distortion temperature (HDT) and water absorption of the cured product were measured under the following conditions.

【0060】ガラス転移温度 熱機械測定装置(TMA) : 真空理工(株) TM−7000 昇温速度 : 2℃/min 熱変形温度 JIS K7207に規定された条件Glass transition temperature Thermomechanical instrument (TMA): Vacuum Riko Co., Ltd. TM-7000 Heating rate: 2 ° C./min Heat deformation temperature Conditions specified in JIS K7207

【0061】吸 水 率 試 験 片 直径 50mm (硬化物) 厚サ 3mm 円板 条 件 100℃の水中で50時間 煮沸した後の重量増加量 (重量%) 硬化物の評価結果を表−2に示した。Water absorption test piece Diameter: 50 mm (cured product) Thickness: 3 mm Disk condition Weight increase after boiling in water at 100 ° C. for 50 hours (% by weight) The evaluation results of the cured product are shown in Table-2. Indicated.

【0062】 [0062]

【0063】[0063]

【発明の効果】本発明により得られるノボラック型樹脂
は粘度が低く、作業性に優れ、これから得られるエポキ
シ樹脂も低粘度で作業性に優れ、更にこのエポキシ樹脂
の硬化物は耐湿性、耐熱性に優れている。
The novolak type resin obtained by the present invention has a low viscosity and excellent workability, and the epoxy resin obtained therefrom has a low viscosity and excellent workability. Further, the cured product of this epoxy resin has moisture resistance and heat resistance. Is excellent.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭56−100827(JP,A) 特開 昭56−98229(JP,A) 特開 平4−211422(JP,A) 特開 平4−155939(JP,A) 特開 平3−717(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 8/12 C08G 59/06 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-56-110287 (JP, A) JP-A-56-98229 (JP, A) JP-A-4-211422 (JP, A) JP-A-4-112 155939 (JP, A) JP-A-3-717 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C08G 8/12 C08G 59/06

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】式(A) (式中、Rは炭素数1−4のアルキル基を示す)で示さ
れるジメチロール化合物(A)とナフトールとを酸触媒
の存在下で40〜85℃の温度で反応させ、反応混合物
中の過剰のナフトールを減圧下200℃以下の温度で加
熱蒸留して除去することを特徴とするノボラック型樹脂
の製法。
1. The formula (A) (Wherein R represents an alkyl group having 1 to 4 carbon atoms), the dimethylol compound (A) is reacted with naphthol at a temperature of 40 to 85 ° C in the presence of an acid catalyst, and the excess in the reaction mixture. And removing the naphthol by heating distillation at a temperature of 200 ° C. or less under reduced pressure.
JP03045400A 1991-02-19 1991-02-19 Novolak resin manufacturing method Expired - Fee Related JP3104915B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03045400A JP3104915B2 (en) 1991-02-19 1991-02-19 Novolak resin manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03045400A JP3104915B2 (en) 1991-02-19 1991-02-19 Novolak resin manufacturing method

Publications (2)

Publication Number Publication Date
JPH04264118A JPH04264118A (en) 1992-09-18
JP3104915B2 true JP3104915B2 (en) 2000-10-30

Family

ID=12718208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03045400A Expired - Fee Related JP3104915B2 (en) 1991-02-19 1991-02-19 Novolak resin manufacturing method

Country Status (1)

Country Link
JP (1) JP3104915B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6248267B1 (en) 1996-03-06 2001-06-19 Mitsubishi Rayon Co., Ltd. Method for manufacturing fibril system fiber

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6248267B1 (en) 1996-03-06 2001-06-19 Mitsubishi Rayon Co., Ltd. Method for manufacturing fibril system fiber

Also Published As

Publication number Publication date
JPH04264118A (en) 1992-09-18

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