JPH04264118A - Novolac resin and its production - Google Patents
Novolac resin and its productionInfo
- Publication number
- JPH04264118A JPH04264118A JP4540091A JP4540091A JPH04264118A JP H04264118 A JPH04264118 A JP H04264118A JP 4540091 A JP4540091 A JP 4540091A JP 4540091 A JP4540091 A JP 4540091A JP H04264118 A JPH04264118 A JP H04264118A
- Authority
- JP
- Japan
- Prior art keywords
- naphthol
- weight
- compound
- dimethylol
- type resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920003986 novolac Polymers 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 229920005989 resin Polymers 0.000 claims abstract description 28
- 239000011347 resin Substances 0.000 claims abstract description 28
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000003377 acid catalyst Substances 0.000 claims abstract description 8
- 238000004821 distillation Methods 0.000 claims abstract description 6
- 239000011541 reaction mixture Substances 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 45
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 abstract description 18
- 229920000647 polyepoxide Polymers 0.000 abstract description 18
- 239000002994 raw material Substances 0.000 abstract description 3
- 239000000047 product Substances 0.000 description 35
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 11
- 239000000460 chlorine Substances 0.000 description 11
- 229910052801 chlorine Inorganic materials 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 235000011121 sodium hydroxide Nutrition 0.000 description 5
- 238000001256 steam distillation Methods 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- KUMMBDBTERQYCG-UHFFFAOYSA-N 2,6-bis(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CO)=C1 KUMMBDBTERQYCG-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 238000003918 potentiometric titration Methods 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- NSBGRQGYTRBWNG-UHFFFAOYSA-N 2,4-bis(hydroxymethyl)-6-methylphenol Chemical compound CC1=CC(CO)=CC(CO)=C1O NSBGRQGYTRBWNG-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- GISYGQUPPLNCJX-UHFFFAOYSA-N 2-tert-butyl-4,6-bis(hydroxymethyl)phenol Chemical compound CC(C)(C)C1=CC(CO)=CC(CO)=C1O GISYGQUPPLNCJX-UHFFFAOYSA-N 0.000 description 1
- SIBBGGADHQDMHI-UHFFFAOYSA-N 4-tert-butyl-2,6-bis(hydroxymethyl)phenol Chemical compound CC(C)(C)C1=CC(CO)=C(O)C(CO)=C1 SIBBGGADHQDMHI-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Landscapes
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
【0001】
【産業上の利用分野】本発明は、耐湿性、耐熱性に優れ
た硬化物を与えるエポキシ樹脂の原料として又、エポキ
シ樹脂の硬化剤として有用な、軟化点の低いノボラック
型樹脂及びその製法に関する。
【0002】
【従来の技術】特開平3−717には、ジメチロール化
合物とナフトールとを酸触媒の存在下に反応させて得ら
れるノボラック型樹脂が記載されている。
【0003】
【発明が解決しようとする課題】特開平3−717の実
施例では、ジメチロール化合物とナフトールの反応を9
0〜95℃で行なっており、又、反応混合物中の過剰の
ナフトールを水蒸気蒸留により除去している。
【0004】しかしながら、この方法では水蒸気蒸留下
での酸化反応等により、反応生成物が分解したり再縮合
したりするため、後述の三核体化合物のノボラック型樹
脂中に占める割合が低下し、更に三核体化合物より低分
子量の化合物の含量が増加し、得られるノボラック型樹
脂及びそのエポキシ化物は軟化点が高くなり、取り扱い
易い低粘度品を得ることはできない。
【0005】更に、このノボラック型樹脂をエポキシ化
して得られるエポキシ樹脂を用いた硬化物は、耐湿性、
耐熱性の点で優れているが、更に耐湿性、耐熱性の向上
が望まれている。
【0006】
【課題を解決するための手段】そこで、本発明者らは、
上記課題を解決すべく鋭意検討した結果、本発明を完成
した。即ち、本発明は、(1)式(A)【0007】
【0008】(式中、Rは炭素数1−4のアルキル基を
示す)で示されるジメチロール化合物とナフトールとを
反応させて得られ、式(B)
【0009】
【0010】(式中、Rは前記と同じ意味を表す)で示
される三核体化合物を30重量%以上含み、該三核体化
合物より低分子量の化合物の含有量が10重量%以下で
あるノボラック型樹脂。
【0011】(2)七核体以上の多核体化合物の合計含
有量が25重量%以下である上記(1)記載のノボラッ
ク型樹脂。
【0012】(3)上記ジメチロール化合物(A)とナ
フトールとを酸触媒の存在下40〜85℃の温度で反応
させ、反応混合物中の過剰のナフトールを減圧下200
℃以下の温度で加熱蒸留して除去することを特徴とする
上記(1)又は(2)記載のノボラック型樹脂の製法。
に関する。
【0013】以下、本発明を詳細に説明する。ジメチロ
ール化合物(A)において、Rとしては、メチル基、エ
チル基、n−プロピル基、イソプロピル基、n−ブチル
基、イソブチル基、sec−ブチル基、t−ブチル基が
挙げられるが、特にメチル基が好ましい。
【0014】ジメチロール化合物(A)の具体例として
は、例えば、2,6−ジメチロール−4−メチルフェノ
ール、2,6−ジメチロール−4−t−ブチルフェノー
ル、4,6−ジメチロール−2−メチルフェノール、4
,6−ジメチロール−2−t−ブチルフェノール等が挙
げられる。ナフトールとしては、α−ナフトール及びβ
−ナフトールが挙げられる。
【0015】上記(1)のノボラック型樹脂は、ジメチ
ロール化合物(A)とナフトールとを、一般に酸触媒の
存在下に反応(脱水縮合)させることにより製造するこ
とができ、そのため、式(C)
【0016】
【0017】(式中、Rは前記と同じ意味を表し、nは
0−2の値をとる)で示される化合物を主成分として含
むが、三核体化合物(B)を30重量%以上、好ましく
は35重量%以上、特に好ましくは40重量%以上含む
。
【0018】本発明のノボラック型樹脂中には、その他
に、蒸留等の過程で発生する分解物や再縮合物等の副生
物が含有されるが、ノボラック型樹脂中の三核体化合物
(B)より低分子量の化合物(上記副生物等)の含有量
は10重量%以下、好ましくは7重量%以下、特に好ま
しくは5重量%以下である。
【0019】又、七核体以上の多核体化合物の合計含有
量は25重量%以下であることが好ましく、特に20重
量%以下であることが好ましい。なお、X核体化合物と
は、1分子中のベンゼン核とナフタレン核の数の和がX
である化合物をいう。
【0020】本発明のノボラック型樹脂は、例えば前記
(3)の方法により製造することができる。前記(3)
の方法において、ジメチロール化合物(A)1モルに対
してナフトールを2〜10モル用いるのが好ましく、特
に3〜6モル用いるのが好ましい。
【0021】酸触媒としては、塩酸、硫酸、リン酸、p
−トルエンスルホン酸、しゅう酸等種々の化合物が使用
できるが、反応の円滑性及び三核体化合物(B)の生成
量を増加させることを考えると、p−トルエンスルホン
酸が好ましい。酸触媒の使用量は、ジメチロール化合物
(A)に対して0.01〜10重量%用いるのが好まし
いが、0.1〜1重量%用いれば十分である。
【0022】反応温度は40〜85℃であるが、50〜
80℃が特に好ましい。反応は、無溶媒でも、メタノー
ル、エタノール、プロパノ−ル、ブタノール、ベンゼン
、トルエン、メチルイソブチルケトン等の溶媒中でも行
なうことができる。反応時間は、好ましくは2〜15時
間、特に好ましくは4〜10時間である。
【0023】ここで充分に反応を実施することは、次い
で行う過剰の未反応ナフトールを除却する際の高分子化
を防ぐのに有効である。かくして反応を実施した後、水
洗により酸触媒を除き中性にする。
【0024】ついで、本発明の重要な点である過剰の未
反応ナフトールの除去を減圧下200℃以下で行う。こ
の際、200℃を超える温度で行うと、三核体化合物(
B)が高分化反応を起し、ノボラック型樹脂の粘度を下
げるという目的がそこなわれる。
【0025】又、一般的にフェノール類やナフトール類
を除去する方法である水蒸気蒸留では、酸化状態による
分解、再縮合等の副反応によりノボラック型樹脂の変質
を起こしてしまう。従って、本発明の方法においては、
減圧下、200℃以下で加熱蒸留することは極めて重要
である。
【0026】本発明の方法によれば、副反応は抑制され
、得られるノボラック型樹脂は、上記のような変質を起
こしていない為、三核体化合物(B)を30重量%以上
含むことになる。
【0027】本発明のノボラック型樹脂は、軟化温度が
低く粘度が低いため取り扱い易く、作業性に優れ、しか
も、本発明のノボラック型樹脂をエポキシ化して得られ
るエポキシ樹脂も粘度が低く作業性に優れ、更にこのエ
ポキシ樹脂を用いた硬化物は、耐湿性、耐熱性に優れて
いる。
【0028】なお、本発明のノボラック型樹脂のエポキ
シ化は常法により行なうことができ、例えば、ノボラッ
ク型樹脂をエピクロロヒドリンと塩基性化合物の存在下
に反応させることにより得ることができ、得られるエポ
キシ樹脂は、本発明のノボラック型樹脂やフェノールノ
ボラック等の公知の硬化剤を用いて常法により硬化させ
ることができる。尚、本発明のノボラック型樹脂は通常
のエポキシ樹脂の硬化剤としても利用出来、耐湿性、耐
熱性にすぐれた硬化物を与える。
【0029】
【実施例】以下に、実施例及び応用例を挙げて本発明を
更に具体的に説明する。
【0030】実施例1
パラクレゾール108g(1モル)、パラホルムアルデ
ヒド60g(2モル)及び水100mlを温度計、冷却
管、滴下ロート及び攪拌機を付けた1リットルのフラス
コに仕込み、窒素を吹込みながら攪拌した。
【0031】室温下、15%苛性ソーダ水溶液80g(
苛性ソーダとして0.3モル)を発熱に注意しながら液
温が50℃を越えないようにゆっくり滴下した。その後
、水浴中で50℃まで加熱し、10時間反応した。反応
終了後、水200mlを加え室温まで冷却し発熱に注意
しながら、10%塩酸水溶液で徐々に中和し、さらにp
Hが4になるまで塩酸水溶液を添加した。
【0032】その後、析出した結晶をロ別し、結晶をさ
らに水により洗浄した。得られた結晶を減圧下(10m
mHg) 50℃で乾燥し、白色の2,6−ジメチロー
ル−4−メチルフェノールを得た。得量は143gであ
った。
(パラクレゾールからの収率は85%)【0033】2
,6−ジメチロール−4−メチルフェノール168gを
温度計、攪拌機を付けたガラス容器に仕込み、さらにα
−ナフトール576g及びメチルイソブチルケトン10
00mlを加えて窒素雰囲気下で室温で攪拌した。そし
て、p−トルエンスルホン酸1g(2,6−ジメチロー
ル−4−メチルフェノールに対して0.6重量%)を発
熱に注意しながら、液温が50℃を越えないように徐々
に添加した。
【0034】添加後、油浴上で50℃まで加温し2時間
反応させた後、さらに70℃に加温して7時間反応させ
、その後、分液ロートに移し水洗した。洗浄水が中性を
示すまで水洗後、エバポレーターにより有機層から未反
応ナフトールを除去する為減圧下(10mmHg以下)
、浴温を195℃として減圧加熱蒸留した。蒸留時間は
2時間を要した。
【0035】この操作によりノボラック型樹脂(A−1
)372gを得た。生成物(A−1)の軟化温度は11
2℃で水酸基当量(g/mol)は137であった。又
、生成物(A−1)中の未反応ナフトールの量はガスク
ロマトグラフィーの分析の結果1重量%以下であった。
【0036】又、GPC分析により、生成物(A−1)
中の三核体化合物(B)の含有量は52重量%で、三核
体化合物(B)より低分子量の化合物の含有量は3.5
重量%であり、七核体以上の多核体化合物の合計含有量
は15重量%であった。生成物(A−1)の粘度は25
ポイズであった。
【0037】実施例2
実施例1において、α−ナフトールの使用量を504g
とし、それ以外は実施例1と同様にしてノボラック型樹
脂(A−2)375gを得た。生成物(A−2)の軟化
温度は118℃で水酸基当量(g/mol)は138で
あった。又、生成物(A−2)中の未反応ナフトールの
量はガスクロマトグラフィーの分析の結果1重量%以下
であった。
【0038】又、GPC分析により、生成物(A−2)
中の三核体化合物(B)の含有量は45重量%で、三核
体化合物(B)より低分子量の化合物の含有量は3.2
重量%であり、七核体以上の多核体化合物の合計含有量
は17重量%であった。生成物(A−2)の粘度は27
ポイズであった。
【0039】比較例1
実施例1において、分液ロートで洗浄水が中性を示すま
で水洗後、150℃の蒸気により、実施例1と同様の未
反応ナフトール量(1重量%以下)となるまで水蒸気蒸
留を実施した。水蒸気蒸留は5時間を要した。(尚、実
施例1と同様の操作時間である2時間後での未反応ナフ
トール量は3.5重量%であった。)
【0040】かくして、生成物(A−3)365gを得
た。得られた生成物(A−3)の軟化温度は135℃、
水酸基当量は143であった。又、生成物(A−3)中
の未反応ナフトールはガスクロマトグラフィーの分析の
結果1重量%以下であった。
【0041】又、GPC分析より生成物(A−3)中の
三核体化合物(B)の含有量は25重量%で、三核体化
合物(B)より低分子量の化合物の含有量は15重量%
であり、七核体以上の多核体化合物の合計含有量は30
重量%であった。生成物(A−3)の粘度は39ポイズ
であった。
【0042】応用例1
実施例1の生成物(A−1)137gを温度計、攪拌機
、及び減圧回収装置のついた反応装置に仕込み、さらに
、エピクロルヒドリン374g(3.5モル)、ジメチ
ルスルホキシド68gを添加し、溶解させた。この間、
系内は窒素が導入されている。
【0043】溶解後、反応温度を40℃に保ちながら、
固形の苛性ソーダ40g(1モル)を徐々に添加した。
添加時間は1時間を要した。苛性ソーダ添加後、さらに
40℃で1時間反応させた後、反応温度を70℃に上げ
て、さらに1時間反応させた。その結果、合計の反応時
間は3時間であった。
【0044】ついで、反応装置の浴温を130℃に上昇
させ、突沸に注意しながら徐々に減圧にし、未反応のエ
ピクロルヒドリン、ジメチルスルホキシド及び生成水を
一気に追い出した。最終の減圧度は5mmHgであり、
この間、2時間を要した。
【0045】その後、メチルイソブチルケトン500m
lを加え、樹脂分を溶解し、20%苛性ソーダ水溶液2
0gを加え、反応温度70℃で2時間反応した。反応終
了後、分液ロートで水洗をくり返し、水相を中性に戻し
た。ついで、メチルイソブチルケトン相を減圧下で加熱
し、メチルイソブチルケトンを除去した。
【0046】これにより、エポキシ樹脂である淡黄色の
固体(B−1)175gを得た。生成物(B−1)の軟
化温度は75℃で、エポキシ当量(g/mol)は21
2、粘度10ポイズ、フリー塩素量1ppm 以下、加
水分解性塩素量230ppm 、全塩素量は510pp
m 、PCTによる抽出水中の塩素イオン濃度は3pp
m であった。
【0047】応用例2
生成物(A−1)の代りに、実施例2て得られた生成物
(A−2)139gを用いた以外は応用例1と同様の操
作を実施し、エポキシ樹脂である生成物(B−2)17
2gを得た。
【0048】応用例3
生成物(A−1)の代りに、比較例1で得た生成物(A
−3)143gを使用し、ジメチルスルホキシド68g
の代りにメタノール68gを用いた以外は応用例1と同
様の操作を実施して、エポキシ樹脂である生成物(B−
3)150gを得た。
【0049】生成物(B−1)〜(B−3)の特性を表
−1に示した。
【0050】
【0051】なお、実施例、比較例及び応用例において
、フリー塩素量、加水分解性塩素量、粘度、軟化温度、
全塩素量、PCT(プレッシャー・クッカー・テスト)
による塩素量、GPC分析は次のように測定した。
【0052】(フリー塩素量)
約10gの試料(エポキシ樹脂)を200ミリリットル
のビーカーに精秤し、100ミリリットルのアセトンで
溶解し、更に、蒸留水2ミリリットルと氷酢酸1ミリリ
ットルを加え、硝酸銀水溶液にて電位差滴定を行い定量
した。
【0053】(加水分解性塩素量)
約0.5gの試料(エポキシ樹脂)を100ミリリット
ルの共栓付きフラスコに精秤し、ジオキサン30ミリリ
ットルで溶解する。溶解後、1N−KOHエタノール溶
液5ミリリットルを加え、30分間煮沸還流する。その
後、この溶液を完全に200ミリリットルのビーカーに
移し、80%濃度のアセトン水溶液100ミリリットル
を加え、更に濃硝酸2ミリリットルを加えて硝酸銀水溶
液にて電位差滴定を行い定量した。
【0054】(粘度)
ICI粘度計(コーンプレートタイプ)より150℃に
おける粘度を測定した。(軟化温度)
JIS K2425環球法により測定した。
【0055】(全塩素量)
約1gの試料(エポキシ樹脂)を100ミリリットルの
共栓付きフラスコに精秤し、n−ブチルカルビトール2
5ミリリットルを加え、加熱溶解する。溶解後、1N−
KOHプロピレングリコール溶液25ミリリットルを加
え、10分間加熱還流する。その後、この溶液を完全に
200ミリリットルのビーカーに移し、氷酢酸50ミリ
リットルを加えて硝酸銀水溶液にて電位差滴定を行い定
量した。
【0056】(PCTによる塩素量)
エポキシ樹脂5gにイオン交換水50gを加え、180
℃で20時間保持した時の抽出水中の塩素イオン濃度を
イオンクロマトにより定量した。
【0057】(GPC分析)
GPC装置;島津製作所
(カラム;TSK−G−3000XL(1本)+TSK
−G−2000XL(2本)
溶 媒 ;テトラヒドロフラン 1ml/min
検 出 ;UV(254nm)
【0058】応用例4〜6
表−2に示す割合で、フェノールノボラック(日本化薬
(株)製、軟化温度85℃、水酸基当量(g/mol)
105)と応用例1〜3で得られた生成物(B−1)〜
(B−3)と2−メチルイミダゾールを配合し、組成物
を得た。
【0059】この組成物を70〜80℃で15分間ロー
ル混練し、これを冷却、粉砕し、タブレット化し、更に
トランスファー成形機により成型後、160℃で2時間
予備硬化し、180℃で8時間ポストキュアを行なって
硬化物(試験片)を得た。この硬化物のガラス転移温度
(Tg)、熱変形温度(HDT)及び吸水率を次の条件
で測定した。
【0060】ガラス転移温度
熱機械測定装置(TMA) : 真空理工(株)T
M−7000
昇温速度 : 2℃/min
熱変形温度
JIS K7207に規定された条件【0061
】吸 水 率
試 験 片 直径 50
mm(硬化物) 厚サ
3mm 円板条 件
100℃の水中で50時間煮沸した後の重量増
加量
(重量%)
硬化物の評価結果を表−2に示した。
【0062】
【0063】
【発明の効果】本発明のノボラック型樹脂は粘度が低く
、作業性に優れ、これから得られるエポキシ樹脂も低粘
度で作業性に優れ、更にこのエポキシ樹脂の硬化物は耐
湿性、耐熱性に優れている。本発明の方法によれば、該
ノボラック樹脂を容易に得ることができる。Detailed Description of the Invention [0001] [Industrial Application Field] The present invention provides a softening agent useful as a raw material for epoxy resin that provides a cured product with excellent moisture resistance and heat resistance, and as a curing agent for epoxy resin. This invention relates to a novolak type resin with a low score and its manufacturing method. [0002] JP-A-3-717 describes a novolak type resin obtained by reacting a dimethylol compound and naphthol in the presence of an acid catalyst. Problems to be Solved by the Invention In the example of JP-A-3-717, the reaction between a dimethylol compound and naphthol was
The reaction was carried out at a temperature of 0 to 95°C, and excess naphthol in the reaction mixture was removed by steam distillation. However, in this method, the reaction products are decomposed or recondensed due to the oxidation reaction under steam distillation, so the proportion of the trinuclear compound described below in the novolac type resin decreases. Furthermore, the content of a compound having a lower molecular weight than the trinuclear compound increases, and the resulting novolac type resin and its epoxidized product have a high softening point, making it impossible to obtain a low-viscosity product that is easy to handle. Furthermore, a cured product using an epoxy resin obtained by epoxidizing this novolak type resin has moisture resistance,
It has excellent heat resistance, but further improvements in moisture resistance and heat resistance are desired. [Means for Solving the Problems] Therefore, the present inventors
As a result of intensive studies to solve the above problems, the present invention has been completed. That is, the present invention provides dimethylol compounds represented by formula (1) (A) ##STR1## (wherein R represents an alkyl group having 1 to 4 carbon atoms) and naphthol. , formula (B) [0010] (wherein R represents the same meaning as above) containing 30% by weight or more of a trinuclear compound and containing a compound having a lower molecular weight than the trinuclear compound Novolak-type resin in an amount of 10% by weight or less. (2) The novolak type resin according to (1) above, wherein the total content of polynuclear compounds of hepta-nuclear or higher is 25% by weight or less. (3) The above dimethylol compound (A) and naphthol are reacted at a temperature of 40 to 85°C in the presence of an acid catalyst, and excess naphthol in the reaction mixture is removed under reduced pressure at 200°C.
The method for producing a novolak-type resin according to (1) or (2) above, characterized in that the removal is carried out by heating and distillation at a temperature of 0.degree. C. or lower. Regarding. The present invention will be explained in detail below. In the dimethylol compound (A), examples of R include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, and t-butyl group, but especially methyl group is preferred. Specific examples of the dimethylol compound (A) include 2,6-dimethylol-4-methylphenol, 2,6-dimethylol-4-t-butylphenol, 4,6-dimethylol-2-methylphenol, 4
, 6-dimethylol-2-t-butylphenol and the like. Naphthol includes α-naphthol and β-naphthol.
- Naphthol. The novolac type resin of the above (1) can be produced by reacting (dehydration condensation) the dimethylol compound (A) and naphthol, generally in the presence of an acid catalyst, and therefore has the formula (C). [0017] Contains as a main component a compound represented by the formula (wherein R represents the same meaning as above and n takes a value of 0-2), but contains 30% by weight of trinuclear compound (B). % or more, preferably 35% by weight or more, particularly preferably 40% by weight or more. The novolac type resin of the present invention also contains by-products such as decomposition products and recondensation products generated in the process of distillation, etc., but the trinuclear compound (B ) The content of lower molecular weight compounds (such as the above-mentioned by-products) is 10% by weight or less, preferably 7% by weight or less, particularly preferably 5% by weight or less. The total content of polynuclear compounds of hepta-nuclear or higher is preferably 25% by weight or less, particularly preferably 20% by weight or less. Furthermore, an X-nuclear compound is one in which the sum of the numbers of benzene nuclei and naphthalene nuclei in one molecule is
refers to a compound that is The novolac type resin of the present invention can be produced, for example, by the method (3) above. (3) above
In the method, it is preferable to use 2 to 10 moles of naphthol, particularly preferably 3 to 6 moles, per 1 mole of dimethylol compound (A). [0021] As the acid catalyst, hydrochloric acid, sulfuric acid, phosphoric acid, p
Although various compounds such as -toluenesulfonic acid and oxalic acid can be used, p-toluenesulfonic acid is preferable in view of smoothness of the reaction and increasing the amount of trinuclear compound (B) produced. The amount of acid catalyst to be used is preferably 0.01 to 10% by weight based on the dimethylol compound (A), but 0.1 to 1% by weight is sufficient. [0022] The reaction temperature is 40 to 85°C, but 50 to 85°C.
Particularly preferred is 80°C. The reaction can be carried out without a solvent or in a solvent such as methanol, ethanol, propanol, butanol, benzene, toluene, or methyl isobutyl ketone. The reaction time is preferably 2 to 15 hours, particularly preferably 4 to 10 hours. [0023] Performing the reaction sufficiently here is effective in preventing polymerization during the subsequent removal of excess unreacted naphthol. After carrying out the reaction in this manner, the acid catalyst is removed by washing with water to make it neutral. [0024] Next, the removal of excess unreacted naphthol, which is an important point of the present invention, is carried out under reduced pressure at 200°C or lower. At this time, if carried out at a temperature exceeding 200°C, the trinuclear compound (
B) causes a high differentiation reaction, which defeats the purpose of lowering the viscosity of the novolac type resin. In addition, steam distillation, which is generally a method for removing phenols and naphthols, causes deterioration of the novolac type resin due to side reactions such as decomposition and recondensation due to oxidation state. Therefore, in the method of the present invention,
It is extremely important to carry out heating distillation at 200° C. or lower under reduced pressure. [0026] According to the method of the present invention, side reactions are suppressed, and the obtained novolac type resin does not undergo the above-mentioned alterations, so it contains at least 30% by weight of the trinuclear compound (B). Become. The novolac type resin of the present invention has a low softening temperature and low viscosity, so it is easy to handle and has excellent workability. Furthermore, the epoxy resin obtained by epoxidizing the novolac type resin of the present invention also has a low viscosity and good workability. Furthermore, cured products using this epoxy resin have excellent moisture resistance and heat resistance. The epoxidation of the novolac type resin of the present invention can be carried out by a conventional method. For example, it can be obtained by reacting the novolac type resin with epichlorohydrin in the presence of a basic compound. The obtained epoxy resin can be cured by a conventional method using a known curing agent such as the novolak type resin of the present invention or a phenol novolak. The novolac type resin of the present invention can also be used as a curing agent for ordinary epoxy resins, and provides a cured product with excellent moisture resistance and heat resistance. [Examples] The present invention will be explained in more detail below with reference to Examples and Application Examples. Example 1 108 g (1 mol) of para-cresol, 60 g (2 mol) of paraformaldehyde, and 100 ml of water were placed in a 1-liter flask equipped with a thermometer, condenser, dropping funnel, and stirrer, and the mixture was heated while blowing nitrogen. Stirred. At room temperature, 80 g of 15% caustic soda aqueous solution (
0.3 mol (as caustic soda) was slowly added dropwise to the solution while being careful not to generate heat so that the liquid temperature did not exceed 50°C. Thereafter, the mixture was heated to 50° C. in a water bath and reacted for 10 hours. After the reaction, add 200 ml of water, cool to room temperature, and gradually neutralize with 10% hydrochloric acid aqueous solution while paying attention to heat generation.
Aqueous hydrochloric acid solution was added until H was 4. Thereafter, the precipitated crystals were filtered and further washed with water. The obtained crystals were dried under reduced pressure (10 m
mHg) was dried at 50°C to obtain white 2,6-dimethylol-4-methylphenol. The yield was 143g. (Yield from para-cresol is 85%) 2
, 168 g of 6-dimethylol-4-methylphenol was placed in a glass container equipped with a thermometer and a stirrer, and further α
- 576 g of naphthol and 10 g of methyl isobutyl ketone
00 ml was added thereto and stirred at room temperature under nitrogen atmosphere. Then, 1 g of p-toluenesulfonic acid (0.6% by weight based on 2,6-dimethylol-4-methylphenol) was gradually added while paying attention to heat generation so that the liquid temperature did not exceed 50°C. After the addition, the mixture was heated to 50°C on an oil bath and reacted for 2 hours, further heated to 70°C and reacted for 7 hours, and then transferred to a separatory funnel and washed with water. After washing with water until the washing water becomes neutral, remove unreacted naphthol from the organic layer using an evaporator under reduced pressure (10 mmHg or less).
The mixture was distilled under reduced pressure and heated at a bath temperature of 195°C. Distillation time required 2 hours. [0035] Through this operation, novolac type resin (A-1
) 372g was obtained. The softening temperature of product (A-1) is 11
The hydroxyl equivalent (g/mol) was 137 at 2°C. Further, the amount of unreacted naphthol in the product (A-1) was found to be 1% by weight or less as a result of gas chromatography analysis. [0036] Furthermore, by GPC analysis, product (A-1)
The content of the trinuclear compound (B) in it is 52% by weight, and the content of compounds with lower molecular weight than the trinuclear compound (B) is 3.5%.
% by weight, and the total content of polynuclear compounds of hepta-nuclear or higher was 15% by weight. The viscosity of the product (A-1) is 25
It was Poise. Example 2 In Example 1, the amount of α-naphthol used was 504 g.
Except for that, 375 g of novolac type resin (A-2) was obtained in the same manner as in Example 1. The product (A-2) had a softening temperature of 118°C and a hydroxyl equivalent (g/mol) of 138. Further, the amount of unreacted naphthol in the product (A-2) was found to be 1% by weight or less as a result of gas chromatography analysis. [0038] Furthermore, by GPC analysis, product (A-2)
The content of the trinuclear compound (B) in it is 45% by weight, and the content of compounds with lower molecular weight than the trinuclear compound (B) is 3.2%.
% by weight, and the total content of polynuclear compounds of heptanucleates or more was 17% by weight. The viscosity of the product (A-2) is 27
It was Poise. Comparative Example 1 In Example 1, after washing with water in a separatory funnel until the washing water becomes neutral, the amount of unreacted naphthol (less than 1% by weight) is reduced to the same amount as in Example 1 by using steam at 150°C. Steam distillation was performed until Steam distillation took 5 hours. (The amount of unreacted naphthol after 2 hours, which was the same operating time as in Example 1, was 3.5% by weight.) In this way, 365 g of product (A-3) was obtained. The softening temperature of the obtained product (A-3) was 135°C,
The hydroxyl equivalent was 143. Moreover, as a result of gas chromatography analysis, the amount of unreacted naphthol in the product (A-3) was 1% by weight or less. Furthermore, according to GPC analysis, the content of the trinuclear compound (B) in the product (A-3) is 25% by weight, and the content of compounds with lower molecular weight than the trinuclear compound (B) is 15% by weight. weight%
, and the total content of polynuclear compounds of heptanucleates or more is 30
% by weight. The viscosity of the product (A-3) was 39 poise. Application Example 1 137 g of the product (A-1) of Example 1 was charged into a reactor equipped with a thermometer, a stirrer, and a vacuum recovery device, and 374 g (3.5 mol) of epichlorohydrin and 68 g of dimethyl sulfoxide were added. was added and dissolved. During this time,
Nitrogen is introduced into the system. After dissolution, while keeping the reaction temperature at 40°C,
40 g (1 mole) of solid caustic soda was slowly added. The addition time required 1 hour. After the addition of caustic soda, the reaction was further carried out at 40°C for 1 hour, and then the reaction temperature was raised to 70°C, and the reaction was further carried out for 1 hour. As a result, the total reaction time was 3 hours. [0044] Next, the bath temperature of the reactor was raised to 130°C, and the pressure was gradually reduced while paying attention to bumping, to expel unreacted epichlorohydrin, dimethyl sulfoxide, and produced water all at once. The final degree of vacuum is 5 mmHg,
This took two hours. Then, 500 m of methyl isobutyl ketone
1, dissolve the resin, and add 20% caustic soda aqueous solution 2.
0 g was added, and the reaction was carried out at a reaction temperature of 70° C. for 2 hours. After the reaction was completed, washing with water was repeated using a separatory funnel to return the aqueous phase to neutrality. The methyl isobutyl ketone phase was then heated under reduced pressure to remove the methyl isobutyl ketone. As a result, 175 g of a pale yellow solid (B-1), which is an epoxy resin, was obtained. The softening temperature of the product (B-1) is 75°C, and the epoxy equivalent (g/mol) is 21
2. Viscosity: 10 poise, free chlorine amount: 1 ppm or less, hydrolyzable chlorine amount: 230 ppm, total chlorine amount: 510 ppm
m, the chloride ion concentration in the extracted water by PCT is 3pp
It was m. Application Example 2 The same operation as in Application Example 1 was carried out except that 139 g of the product (A-2) obtained in Example 2 was used instead of the product (A-1), and the epoxy resin was The product (B-2) 17
2g was obtained. Application Example 3 The product (A-1) obtained in Comparative Example 1 was replaced with the product (A-1).
-3) Using 143g, 68g of dimethyl sulfoxide
The same operation as in Application Example 1 was carried out except that 68 g of methanol was used instead of the epoxy resin (B-
3) 150g was obtained. The properties of the products (B-1) to (B-3) are shown in Table 1. In the Examples, Comparative Examples and Application Examples, the amount of free chlorine, the amount of hydrolyzable chlorine, the viscosity, the softening temperature,
Total chlorine content, PCT (pressure cooker test)
The amount of chlorine was measured by GPC analysis as follows. (Amount of free chlorine) Approximately 10 g of the sample (epoxy resin) was accurately weighed into a 200 ml beaker, dissolved in 100 ml of acetone, and then 2 ml of distilled water and 1 ml of glacial acetic acid were added to prepare a silver nitrate aqueous solution. The amount was determined by potentiometric titration. (Amount of Hydrolyzable Chlorine) Approximately 0.5 g of a sample (epoxy resin) is accurately weighed into a 100 ml flask with a stopper, and dissolved in 30 ml of dioxane. After dissolution, 5 ml of 1N-KOH ethanol solution is added, and the mixture is boiled and refluxed for 30 minutes. Thereafter, this solution was completely transferred to a 200 ml beaker, 100 ml of an 80% aqueous acetone solution was added thereto, 2 ml of concentrated nitric acid was further added, and the amount was determined by potentiometric titration with an aqueous silver nitrate solution. (Viscosity) The viscosity at 150°C was measured using an ICI viscometer (cone plate type). (Softening temperature) Measured by JIS K2425 ring and ball method. (Total chlorine amount) Approximately 1 g of the sample (epoxy resin) was accurately weighed into a 100 ml flask with a stopper, and n-butylcarbitol 2
Add 5ml and heat to dissolve. After dissolving, 1N-
Add 25 ml of KOH propylene glycol solution and heat to reflux for 10 minutes. Thereafter, this solution was completely transferred to a 200 ml beaker, 50 ml of glacial acetic acid was added, and the amount was determined by potentiometric titration with an aqueous silver nitrate solution. (Amount of chlorine according to PCT) Add 50 g of ion exchange water to 5 g of epoxy resin,
The chloride ion concentration in the extracted water was determined by ion chromatography when the extract was kept at ℃ for 20 hours. (GPC analysis) GPC device: Shimadzu Corporation (column: TSK-G-3000XL (1 piece) + TSK
-G-2000XL (2 bottles) Solvent: Tetrahydrofuran 1ml/min
Detection: UV (254 nm) [0058] Application Examples 4 to 6 Phenol novolac (manufactured by Nippon Kayaku Co., Ltd., softening temperature 85°C, hydroxyl group equivalent (g/mol)
105) and the products (B-1) obtained in Application Examples 1 to 3
(B-3) and 2-methylimidazole were blended to obtain a composition. [0059] This composition was roll-kneaded at 70 to 80°C for 15 minutes, cooled, crushed, and tableted. After molding using a transfer molding machine, it was precured at 160°C for 2 hours, and then at 180°C for 8 hours. Post-curing was performed to obtain a cured product (test piece). The glass transition temperature (Tg), heat distortion temperature (HDT), and water absorption of this cured product were measured under the following conditions. Glass transition temperature thermomechanical measuring device (TMA): Shinku Riko Co., Ltd. T
M-7000 Heating rate: 2℃/min Heat distortion temperature Conditions specified in JIS K7207 0061
】Water absorption test piece diameter 50
mm (cured product) thickness
3mm disc condition
Weight increase (% by weight) after boiling in water at 100°C for 50 hours The evaluation results of the cured product are shown in Table 2. Effects of the Invention: The novolak resin of the present invention has low viscosity and excellent workability, and the epoxy resin obtained from it also has low viscosity and excellent workability, and furthermore, the cured product of this epoxy resin is moisture resistant. Excellent strength and heat resistance. According to the method of the present invention, the novolak resin can be easily obtained.
Claims (3)
れるジメチロール化合物とナフトールとを反応させて得
られ、式(B) (式中、Rは前記と同じ意味を表す)で示される三核体
化合物を30重量%以上含み、該三核体化合物より低分
子量の化合物の含有量が10重量%以下であるノボラッ
ク型樹脂。Claim 1: A dimethylol compound represented by the formula (A) (wherein R represents an alkyl group having 1 to 4 carbon atoms) and naphthol, which is obtained by reacting a dimethylol compound represented by the formula (B) (wherein R represents an alkyl group having 1 to 4 carbon atoms) has the same meaning as above), and the content of a compound having a lower molecular weight than the trinuclear compound is 10% by weight or less.
量が25重量%以下である請求項1記載のノボラック型
樹脂。2. The novolak type resin according to claim 1, wherein the total content of polynuclear compounds of hepta-nuclear or higher is 25% by weight or less.
A)とナフトールとを酸触媒の存在下で40〜85℃の
温度で反応させ、反応混合物中の過剰のナフトールを減
圧下200℃以下の温度で加熱蒸留して除去することを
特徴とする請求項1又は請求項2記載のノボラック型樹
脂の製法。3. The dimethylol compound according to claim 1 (
A) and naphthol are reacted in the presence of an acid catalyst at a temperature of 40 to 85°C, and excess naphthol in the reaction mixture is removed by heat distillation at a temperature of 200°C or less under reduced pressure. A method for producing a novolac type resin according to claim 1 or claim 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03045400A JP3104915B2 (en) | 1991-02-19 | 1991-02-19 | Novolak resin manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03045400A JP3104915B2 (en) | 1991-02-19 | 1991-02-19 | Novolak resin manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04264118A true JPH04264118A (en) | 1992-09-18 |
JP3104915B2 JP3104915B2 (en) | 2000-10-30 |
Family
ID=12718208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP03045400A Expired - Fee Related JP3104915B2 (en) | 1991-02-19 | 1991-02-19 | Novolak resin manufacturing method |
Country Status (1)
Country | Link |
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JP (1) | JP3104915B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2156839C2 (en) | 1996-03-06 | 2000-09-27 | Мицубиси Рэйон Ко., Лтд. | Fibril system filaments (versions), formed article, fibril system filament manufacture method, spinning die for manufacture of fibril system filaments |
-
1991
- 1991-02-19 JP JP03045400A patent/JP3104915B2/en not_active Expired - Fee Related
Also Published As
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JP3104915B2 (en) | 2000-10-30 |
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