JPH04323214A - Novolak resin, its production, epoxy resin, resin composition and its cured product - Google Patents
Novolak resin, its production, epoxy resin, resin composition and its cured productInfo
- Publication number
- JPH04323214A JPH04323214A JP11793291A JP11793291A JPH04323214A JP H04323214 A JPH04323214 A JP H04323214A JP 11793291 A JP11793291 A JP 11793291A JP 11793291 A JP11793291 A JP 11793291A JP H04323214 A JPH04323214 A JP H04323214A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- resin
- epoxy resin
- weight
- novolac type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 57
- 239000011347 resin Substances 0.000 title claims abstract description 57
- 229920003986 novolac Polymers 0.000 title claims description 71
- 239000003822 epoxy resin Substances 0.000 title claims description 63
- 229920000647 polyepoxide Polymers 0.000 title claims description 63
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000011342 resin composition Substances 0.000 title description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims abstract description 35
- 150000001875 compounds Chemical class 0.000 claims abstract description 18
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- -1 naphthol compound Chemical class 0.000 abstract description 3
- NNZFSOFSNBDWCH-UHFFFAOYSA-N 2,4-bis(hydroxymethyl)naphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(CO)=CC(CO)=C21 NNZFSOFSNBDWCH-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 11
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 11
- 238000009826 distribution Methods 0.000 description 11
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 239000002904 solvent Substances 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000006482 condensation reaction Methods 0.000 description 4
- 238000004811 liquid chromatography Methods 0.000 description 4
- 150000004780 naphthols Chemical class 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910015900 BF3 Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004949 mass spectrometry Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical class C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 150000003944 halohydrins Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- SRJCJJKWVSSELL-UHFFFAOYSA-N 2-methylnaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(C)=CC=C21 SRJCJJKWVSSELL-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ZSUDUDXOEGHEJR-UHFFFAOYSA-N 4-methylnaphthalen-1-ol Chemical compound C1=CC=C2C(C)=CC=C(O)C2=C1 ZSUDUDXOEGHEJR-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011968 lewis acid catalyst Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は高信頼性半導体封止用に
使用できる樹脂、その製造法、樹脂組成物及びその硬化
物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin that can be used for highly reliable semiconductor encapsulation, a method for producing the same, a resin composition, and a cured product thereof.
【0002】0002
【従来の技術】エポキシ樹脂はその硬化物の優れた電気
特性、耐熱性、接着性等により電気・電子部品等の分野
で幅広く用いられている。BACKGROUND OF THE INVENTION Epoxy resins are widely used in the fields of electrical and electronic parts due to their cured products having excellent electrical properties, heat resistance, adhesive properties, etc.
【0003】しかし、近年特に電気・電子分野の発展に
伴い、耐熱性をはじめ耐湿性、密着性等の諸特性のより
一層の向上が求められており、これら諸特性の向上を図
るためエポキシ樹脂及びその組成物について多くの提案
がなされてはいるが、吸水、吸湿後の熱衝撃によりクラ
ックが発生しやすいなど、未だ充分とはいえない。However, in recent years, especially with the development of the electrical and electronic fields, there has been a demand for further improvements in various properties such as heat resistance, moisture resistance, and adhesion.In order to improve these properties, epoxy resins Although many proposals have been made regarding these materials and their compositions, they are still insufficient, as cracks are likely to occur due to water absorption and thermal shock after moisture absorption.
【0004】又、これらの物性を改善するものとして、
ナフタレン骨格を有するノボラック型エポキシ樹脂が提
案されている(特公昭 62−20206 号公報)、
この提案は耐熱性、耐湿性の向上を図るという点では優
れたものではあるが、エポキシ樹脂の製造法上、分子量
分布制御が難しく、軟化点や溶融粘度が高く成形時の作
業性に欠けるなどの問題を有する他、低軟化点の樹脂を
合成しようとすると硬化物性、とりわけ耐熱性を低下さ
せる2核体の樹脂中の含有量が増加するなどの問題も有
する。[0004] Also, as a method for improving these physical properties,
A novolac type epoxy resin having a naphthalene skeleton has been proposed (Japanese Patent Publication No. 62-20206).
Although this proposal is excellent in terms of improving heat resistance and moisture resistance, it is difficult to control the molecular weight distribution due to the manufacturing method of epoxy resin, and the softening point and melt viscosity are high, making it difficult to work during molding. In addition to this problem, when attempting to synthesize a resin with a low softening point, there is also the problem that the content of binuclear bodies in the resin increases, which deteriorates the cured physical properties, especially the heat resistance.
【0005】[0005]
【発明が解決しようとする課題】本発明は、分子量分布
が制御され、溶融時の流動性に優れ、しかもその硬化物
において優れた耐熱性、耐湿性を与える高信頼性半導体
封止用として有用な樹脂、その製造法、樹脂組成物及び
硬化物を提供するものである。[Problems to be Solved by the Invention] The present invention is useful as a highly reliable semiconductor encapsulation device that has a controlled molecular weight distribution, has excellent fluidity when melted, and has excellent heat resistance and moisture resistance in its cured product. The present invention provides a resin, a method for producing the same, a resin composition, and a cured product.
【0006】[0006]
【課題を解決するための手段】本発明者らは前記のよう
な特性を付与向上する方法について鋭意研究の結果、本
発明を完成させた。即ち、本発明は、(1)式(1)[Means for Solving the Problems] The present inventors have completed the present invention as a result of intensive research into methods for imparting and improving the above characteristics. That is, the present invention provides formula (1)
【
0007】[
0007
【化5】[C5]
【0008】(但し、nは0〜10の値を示し、Rはそ
れぞれ独立して水素原子、炭素数1〜4のアルキル基、
またはアリール基を示し、Rは互に同一でも異なってい
てもよい。)で表されるノボラック型樹脂において式(
1)のn=1の成分を30重量%以上含み、かつ式(1
)のn=0の2核体成分の含有量が10重量%以下であ
るノボラック型樹脂、(2)式(2)(However, n represents a value of 0 to 10, and R each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms,
or represents an aryl group, and R may be the same or different. ) In the novolac type resin represented by the formula (
Contains 30% by weight or more of the component n=1 of 1), and has the formula (1)
), a novolac type resin in which the content of the n=0 dinuclear component is 10% by weight or less, (2) formula (2)
【0009】[0009]
【化6】[C6]
【0010】(式中、Rは水素原子、炭素数1〜4のア
ルキル基またはアリール基を示す。)で表されるナフト
ールジメチロール体と
式(N)(In the formula, R represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group.) and a naphthol dimethylol compound represented by the formula (N)
【0011】[0011]
【化7】[C7]
【0012】(式中、Rは、水素原子、炭素数1〜4の
アルキル基またはアリール基を示す。)で表されるナフ
トール類とを反応させることを特徴とする上記(1)記
載のノボラック型樹脂の製造法、(3)式(3)The novolak according to (1) above, which is reacted with a naphthol represented by the formula (wherein R represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group) Manufacturing method of mold resin, (3) Formula (3)
【00
13】00
13]
【化8】[Chemical formula 8]
【0014】(但し,nは0〜10の値を示し、Rはそ
れぞれ独立して水素原子、炭素数1〜4のアルキル基、
またはアリール基を示し、Rは互に同一でも異なってい
てもよい。)で表されるノボラック型エポキシ樹脂にお
いて式(3)のn=1の成分を30重量%以上含み、か
つ式(3)のn=0の2核体成分の含有量が10重量%
以下であるノボラック型エポキシ樹脂、(However, n represents a value of 0 to 10, and R each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms,
or represents an aryl group, and R may be the same or different. ) A novolac type epoxy resin represented by formula (3) containing 30% by weight or more of the component where n=1, and the content of the binuclear component where n = 0 in formula (3) is 10% by weight
Novolac type epoxy resin, which is:
【0015】(
4)エポキシ樹脂、硬化剤及び必要により硬化促進剤を
含むエポキシ樹脂組成物において、エポキシ樹脂として
上記(3)のノボラック型エポキシ樹脂を含有するか、
及び/又は硬化剤として上記(1)のノボラック型樹脂
を含有する、エポキシ樹脂組成物、[0015](
4) In an epoxy resin composition containing an epoxy resin, a curing agent, and if necessary a curing accelerator, the novolac type epoxy resin of (3) above is contained as the epoxy resin, or
and/or an epoxy resin composition containing the novolac type resin of (1) above as a curing agent,
【0016】(5)
上記(4)記載のエポキシ樹脂組成物の硬化物、に関す
るものである。(5)
The present invention relates to a cured product of the epoxy resin composition described in (4) above.
【0017】上記(1)のノボラック型樹脂は、上記(
2)の製造法により、即ち、式(2)のナフトールジメ
チロール体と式(N)のナフトール類とを、酸触媒の存
在下、脱水縮合反応させることにより得ることができる
。The novolac type resin of (1) above is the above (1).
It can be obtained by the production method 2), that is, by subjecting the naphthol dimethylol compound of formula (2) and the naphthol of formula (N) to a dehydration condensation reaction in the presence of an acid catalyst.
【0018】式(2)で表されるナフトールジメチロー
ル体は公知の化合物であり、例えば、ナフトールをアル
カリ金属水酸化物の存在下ホルムアルデヒドと反応させ
ることにより合成できる。The naphthol dimethylol compound represented by formula (2) is a known compound, and can be synthesized, for example, by reacting naphthol with formaldehyde in the presence of an alkali metal hydroxide.
【0019】式(2)のナフトールジメチロール体とし
ては、例えば、2,4−ジメチロール−1−ナフトール
等が挙げられる。Examples of the naphthol dimethylol compound of formula (2) include 2,4-dimethylol-1-naphthol.
【0020】式(N)のナフトール類としては1−ナフ
トール、2−ナフトール、2−メチル−1−ナフトール
、4−メチル−1−ナフトールなどが挙げられ、これら
ナフトール類の使用量はナフトールジメチロール体1モ
ルに対して好ましくは1〜20モル倍、特に好ましくは
2〜10モル倍である。Examples of the naphthols of formula (N) include 1-naphthol, 2-naphthol, 2-methyl-1-naphthol, 4-methyl-1-naphthol, and the amount of these naphthols used is less than naphthol dimethylol. The amount is preferably 1 to 20 times, particularly preferably 2 to 10 times by mole, per mole of body.
【0021】脱水縮合反応時に用いる酸触媒としては塩
酸、硝酸、硫酸、リン酸、パラトルエンスルホン酸など
のプロトン酸、三弗化ホウ素、三弗化ホウ素エーテル錯
体、塩化亜鉛、塩化アルミニウムなどのルイス酸、酢酸
、シュウ酸等を用いることができる。これらのうち塩酸
、パラトルエンスルホン酸、シュウ酸などが好ましく用
いられ、酸触媒の使用量はナフトールジメチロール体に
対し好ましくは0.001〜0.1モル倍の間で選定さ
れる。Acid catalysts used in the dehydration condensation reaction include protonic acids such as hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, and para-toluenesulfonic acid; Lewis acid catalysts such as boron trifluoride, boron trifluoride ether complex, zinc chloride, and aluminum chloride; Acid, acetic acid, oxalic acid, etc. can be used. Among these, hydrochloric acid, para-toluenesulfonic acid, oxalic acid, etc. are preferably used, and the amount of the acid catalyst used is preferably selected between 0.001 and 0.1 moles relative to the naphthol dimethylol compound.
【0022】このナフトールジメチロール体とナフトー
ル類との酸触媒存在下における縮合反応は通常20〜1
20℃の間で行われ、好ましくは30℃〜80℃である
、更に、反応時間は通常1〜10時間の範囲で選定でき
る。また、この反応は水をはじめメタノール、メチルイ
ソブチルケトン、トルエン等の適当な溶媒の存在下に行
うことが好ましい。溶媒の使用量は特に限定されないが
、通常ナフトールジメチロール体に対し1〜30重量倍
用いる。[0022] The condensation reaction between this naphthol dimethylol compound and naphthols in the presence of an acid catalyst is usually 20 to 1
The reaction is carried out at a temperature between 20°C, preferably 30°C to 80°C, and the reaction time can usually be selected within the range of 1 to 10 hours. Further, this reaction is preferably carried out in the presence of a suitable solvent such as water, methanol, methyl isobutyl ketone, toluene, and the like. The amount of the solvent to be used is not particularly limited, but it is usually used in an amount of 1 to 30 times the weight of the naphthol dimethylol compound.
【0023】更に縮合反応液は過剰のトルエン、メチル
イソブチルケトン等の溶媒存在下その系内が中性になる
まで水洗を繰り返し、水を分離排水後、加熱減圧下溶媒
及び未反応物を除去すると、上記(1)のノボラック型
樹脂が得られる。Furthermore, the condensation reaction solution is repeatedly washed with water in the presence of excess solvents such as toluene and methyl isobutyl ketone until the system becomes neutral, and after the water is separated and drained, the solvent and unreacted substances are removed under heating and reduced pressure. , the novolac type resin of (1) above is obtained.
【0024】このノボラック型樹脂の3核体(式(1)
でn=1の化合物)の含有量は30重量%以上であるが
、好ましくは40重量%以上、特に好ましくは50重量
%以上である。又、2核体(式(1)でn=0の化合物
)の含有量は10重量%以下であるが、好ましくは5重
量%以下である。[0024] The trinuclear body of this novolac type resin (formula (1)
The content of the compound (where n=1) is 30% by weight or more, preferably 40% by weight or more, particularly preferably 50% by weight or more. Further, the content of dinuclear bodies (compounds where n=0 in formula (1)) is 10% by weight or less, preferably 5% by weight or less.
【0025】本発明の上記(3)のノボラック型エポキ
シ樹脂は、上記(1)のノボラック型樹脂にエピハロヒ
ドリンを反応させることによって合成することが出来る
。このエピハロヒドリンとしては、エピクロルヒドリン
、エピブロムヒドリンなどが挙げられるが工業的に入手
が容易なエピクロルヒドリンが好ましい。この反応は従
来公知のノボラック型フェノール樹脂とエピハロヒドリ
ンからポリグリシジルエーテルを得る方法に準じて行う
ことが出来る。The novolac type epoxy resin of the above (3) of the present invention can be synthesized by reacting the novolak type resin of the above (1) with epihalohydrin. Examples of the epihalohydrin include epichlorohydrin and epibromohydrin, but epichlorohydrin, which is industrially easily available, is preferred. This reaction can be carried out in accordance with a conventionally known method for obtaining polyglycidyl ether from a novolac type phenol resin and epihalohydrin.
【0026】例えば上記(1)のノボラック型樹脂と過
剰のエピクロルヒドリンとの混合物に水酸化ナトリウム
、水酸化カリウム等のアルカリ金属水酸化物の固体を添
加し、または、添加しながら20℃〜120℃の間の温
度で反応させる。この際アルカリ金属水酸化物は水溶液
を使用してもよく、その場合は該アルカリ金属水酸化物
を連続的に添加すると共に反応系内から減圧下、または
常圧下、連続的に水及びエピクロルヒドリンを留出させ
更に分液し水は除去しエピクロルヒドリンは反応系内に
連続的に戻す方法でもよい。For example, a solid alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is added to the mixture of the novolak type resin in (1) above and excess epichlorohydrin, or while being added, the mixture is heated at 20°C to 120°C. The reaction is carried out at a temperature between At this time, an aqueous solution of the alkali metal hydroxide may be used. In that case, the alkali metal hydroxide is continuously added and water and epichlorohydrin are continuously added from the reaction system under reduced pressure or normal pressure. A method may also be used in which the water is removed by distillation, followed by liquid separation, and the epichlorohydrin is continuously returned to the reaction system.
【0027】上記の方法においてエピクロルヒドリンの
使用量はノボラック型樹脂の水酸基1当量に対して通常
1〜20モル、好ましくは2〜10モルである。またア
ルカリ金属水酸化物の使用量はノボラック型樹脂の水酸
基1当量に対して通常0.8〜1.5モル、好ましくは
0.9〜1.1モルの範囲である。更に、反応を円滑に
進行させるためにメタノール、エタノール、などのアル
コール類の他ジメチルスルホン、ジメチルスルホキシド
(以下DMSO)などの非プロトン性極性溶媒等を添加
することは好ましい、この反応は通常1〜20時間の範
囲で行われる。In the above method, the amount of epichlorohydrin used is usually 1 to 20 mol, preferably 2 to 10 mol, per equivalent of hydroxyl group in the novolak resin. The amount of alkali metal hydroxide used is generally 0.8 to 1.5 mol, preferably 0.9 to 1.1 mol, per equivalent of hydroxyl group in the novolak resin. Furthermore, in order to make the reaction proceed smoothly, it is preferable to add an aprotic polar solvent such as dimethyl sulfone, dimethyl sulfoxide (hereinafter referred to as DMSO) in addition to alcohols such as methanol and ethanol. It will take place over a period of 20 hours.
【0028】又、ノボラック型樹脂と過剰のエピハロヒ
ドリンとの混合物にテトラメチルアンモニウムクロライ
ド、テトラメチルアンモニウムブロマイド、トリメチル
ベンジルアンモニウムクロライド等の第四級アンモニウ
ム塩を触媒として添加し50〜150℃で反応させ得ら
れる該ノボラック型樹脂のハロヒドリンエーテルに水酸
化ナトリウム、水酸化カリウム等のアルカリ金属水酸化
物の固体または水溶液を加えて再び20〜120℃の間
の温度で反応させてハロヒドリンエーテルを閉環させて
該ノボラック型樹脂のグリシジルエーテルを得ることも
できる。この場合第四級アンモニウム塩の使用量はノボ
ラック型樹脂の水酸基1当量に対して好ましくは0.0
01〜0.1モルの範囲で選定することが出来る。Alternatively, a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, trimethylbenzylammonium chloride or the like can be added as a catalyst to a mixture of novolak type resin and excess epihalohydrin, and the reaction can be carried out at 50 to 150°C. A solid or aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is added to the halohydrin ether of the novolac type resin and reacted again at a temperature between 20 and 120°C to form a halohydrin ether. The glycidyl ether of the novolac type resin can also be obtained by ring closure. In this case, the amount of quaternary ammonium salt used is preferably 0.0 per equivalent of hydroxyl group of the novolac type resin.
The amount can be selected within the range of 0.01 to 0.1 mole.
【0029】通常これらの1段目の反応物は水洗後、ま
たは水洗無しに加熱減圧下に過剰のエピハロヒドリンを
除去した後、再びトルエン、メチルイソブチルケトン等
の溶媒に溶解し、水酸化ナトリウム、水酸化カリウム等
のアルカリ金属水酸化物の水溶液を加えて2段目反応を
行う。この場合アルカリ金属水酸化物の使用量は使用し
たノボラック型樹脂の水酸基1モルに対して通常0.0
1〜0.2モル、好ましくは0.05〜0.1モルであ
る。又、反応温度は通常50〜120℃の間で行われ、
反応時間は通常0.5〜2時間である。Usually, these first-stage reactants are washed with water, or after removing excess epihalohydrin by heating under reduced pressure without washing with water, they are dissolved again in a solvent such as toluene or methyl isobutyl ketone, and dissolved in sodium hydroxide and water. A second reaction is carried out by adding an aqueous solution of an alkali metal hydroxide such as potassium oxide. In this case, the amount of alkali metal hydroxide used is usually 0.0 per mole of hydroxyl group in the novolak resin used.
The amount is 1 to 0.2 mol, preferably 0.05 to 0.1 mol. In addition, the reaction temperature is usually carried out between 50 and 120°C,
The reaction time is usually 0.5 to 2 hours.
【0030】反応終了後、副生した塩を濾過、水洗等に
より除去し、更に、加熱減圧下トルエン、メチルイソブ
チルケトン等の溶媒を留去することにより本発明のノボ
ラック型エポキシ樹脂を得ることが出来る。After the completion of the reaction, the by-produced salts are removed by filtration, washing with water, etc., and the novolac type epoxy resin of the present invention can be obtained by distilling off solvents such as toluene and methyl isobutyl ketone under heating and reduced pressure. I can do it.
【0031】このノボラック型エポキシ樹脂の3核体(
式(3)でn=1の化合物)の含有量は30重量%以上
であるが、好ましくは40重量%以上、特に好ましくは
50重量%以上である。又、2核体(式(3)でn=0
の化合物)の含有量は10重量%以下であるが、好まし
くは5重量%以下である。[0031] The trinuclear body of this novolac type epoxy resin (
The content of the compound (n=1 in formula (3)) is 30% by weight or more, preferably 40% by weight or more, particularly preferably 50% by weight or more. In addition, a dinuclear body (n=0 in formula (3)
The content of the compound) is 10% by weight or less, preferably 5% by weight or less.
【0032】以下、本発明のエポキシ樹脂組成物につい
て説明する。前記(4)のエポキシ樹脂組成物において
、本発明の前記(3)のノボラック型エポキシ樹脂を用
いる場合、本発明のノボラック型エポキシ樹脂は単独で
又は、他のエポキシ樹脂と併用して使用することができ
る。併用する場合、本発明のノボラック型エポキシ樹脂
の全エポキシ樹脂中に占める割合は30重量%以上が好
ましく、特に40重量%以上が好ましい。The epoxy resin composition of the present invention will be explained below. In the epoxy resin composition of (4) above, when using the novolac type epoxy resin of the above (3) of the present invention, the novolac type epoxy resin of the present invention may be used alone or in combination with other epoxy resins. Can be done. When used together, the proportion of the novolac type epoxy resin of the present invention in the total epoxy resin is preferably 30% by weight or more, particularly preferably 40% by weight or more.
【0033】本発明のノボラック型エポキシ樹脂と併用
されうる他のエポキシ樹脂としては、ノボラック型エポ
キシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェ
ノールF型エポキシ樹脂、ビスフェノールS型エポキシ
樹脂、脂環式エポキシ樹脂、ビフェニル型エポキシ樹脂
等が挙げられるが、ノボラック型エポキシ樹脂の使用が
耐熱性の点で特に有利である。その具体例としては、ク
レゾールノボラック型エポキシ樹脂、フェノールノボラ
ック型エポキシ樹脂、臭素化フェノールノボラック型エ
ポキシ樹脂などが挙げられるがこれらに限定されるもの
ではない。これらは単独で用いてもよく、2種以上併用
してもよい。Other epoxy resins that can be used in combination with the novolak epoxy resin of the present invention include novolac epoxy resins, bisphenol A epoxy resins, bisphenol F epoxy resins, bisphenol S epoxy resins, alicyclic epoxy resins, Examples include biphenyl epoxy resins, but novolak epoxy resins are particularly advantageous in terms of heat resistance. Specific examples thereof include, but are not limited to, cresol novolac type epoxy resins, phenol novolac type epoxy resins, brominated phenol novolac type epoxy resins, and the like. These may be used alone or in combination of two or more.
【0034】前記(4)のエポキシ樹脂組成物において
、本発明の前記(1)のノボラック型樹脂を用いる場合
、本発明のノボラック型樹脂は単独で又は、他の硬化剤
と併用して使用することができる。併用する場合、本発
明のノボラック型樹脂の全硬化剤中に占める割合は、3
0重量%以上が好ましく、特に40重量%以上が好まし
い。[0034] In the epoxy resin composition (4) above, when the novolac type resin of the present invention (1) is used, the novolak type resin of the present invention is used alone or in combination with other curing agents. be able to. When used together, the proportion of the novolac type resin of the present invention in the total curing agent is 3.
The content is preferably 0% by weight or more, particularly preferably 40% by weight or more.
【0035】本発明のノボラック型樹脂と併用されうる
他の硬化剤としては、例えば、脂肪族ポリアミン、芳香
族ポリアミン、ポリアミドポリアミン等のポリアミン系
硬化剤、無水ヘキサヒドロフタル酸、無水メチルテトラ
ヒドロフタル酸等の酸無水物系硬化剤、フェノールノボ
ラック、クレゾールノボラック等のフェノール系硬化剤
、三フッ化ホウ素等のルイス酸又はそれらの塩類、ジシ
アンジアミド類等の硬化剤が挙げられるが、これらに限
定されるものではない。これらは単独で用いてもよく、
2種以上併用してもよい。Other curing agents that can be used in combination with the novolac type resin of the present invention include, for example, polyamine curing agents such as aliphatic polyamines, aromatic polyamines, polyamide polyamines, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, etc. Examples include, but are not limited to, acid anhydride curing agents such as phenol novolak, phenol curing agents such as cresol novolac, Lewis acids such as boron trifluoride or their salts, and dicyandiamides. It's not a thing. These may be used alone,
Two or more types may be used in combination.
【0036】本発明のエポキシ樹脂組成物において、硬
化剤の使用量は、エポキシ樹脂のエポキシ基1当量に対
して0.5〜1.5当量が好ましく特に0.6〜1.2
当量が好ましい。In the epoxy resin composition of the present invention, the amount of curing agent used is preferably 0.5 to 1.5 equivalents, particularly 0.6 to 1.2 equivalents per equivalent of epoxy groups in the epoxy resin.
Equivalent amounts are preferred.
【0037】硬化促進剤は必要に応じて使用され、2−
メチルイミダゾール、2−エチルイミダゾール等のイミ
ダゾール系化合物、2−(ジメチルアミノメチル)フェ
ノール等の第3アミン系化合物、トリフェニルホスフィ
ン化合物等、公知の種々の硬化促進剤が使用でき、特に
限定されるものではない。硬化促進剤を用いる場合、そ
の使用量はエポキシ樹脂100重量部に対して0.01
〜15重量部の範囲が好ましく、特に、0.1〜10重
量部の範囲が好ましい。[0037] A curing accelerator is used as necessary, and 2-
Various known curing accelerators can be used, including imidazole compounds such as methylimidazole and 2-ethylimidazole, tertiary amine compounds such as 2-(dimethylaminomethyl)phenol, and triphenylphosphine compounds, and are not particularly limited. It's not a thing. When using a curing accelerator, the amount used is 0.01 parts by weight per 100 parts by weight of the epoxy resin.
A range of 15 parts by weight is preferred, and a range of 0.1 to 10 parts by weight is particularly preferred.
【0038】本発明のエポキシ樹脂組成物には、さらに
必要に応じて公知の添加剤を配合することができ、添加
剤としては、例えば、シリカ、アルミナ、タルク、ガラ
ス繊維等の無機充填剤、シランカップリング剤のような
充填材の表面処理剤、離型剤、顔料等が挙げられる。[0038] The epoxy resin composition of the present invention may further contain known additives as required. Examples of additives include inorganic fillers such as silica, alumina, talc, and glass fiber; Examples include surface treating agents for fillers such as silane coupling agents, mold release agents, and pigments.
【0039】本発明のエポキシ樹脂組成物は、各成分を
均一に混合することにより得られ、通常130〜170
℃の温度で30〜300秒の範囲で予備硬化し、さらに
150〜200℃の温度で2〜8時間、後硬化すること
により充分な硬化反応が進行し、本発明の硬化物が得ら
れる。又、エポキシ樹脂組成物の成分を溶剤等に均一に
分散又は溶解させ、溶媒を除去し硬化させることもでき
る。The epoxy resin composition of the present invention is obtained by uniformly mixing each component, and usually has a molecular weight of 130 to 170
By carrying out preliminary curing at a temperature of 150 to 200° C. for 30 to 300 seconds and further post-curing at a temperature of 150 to 200° C. for 2 to 8 hours, a sufficient curing reaction proceeds and the cured product of the present invention is obtained. Alternatively, the components of the epoxy resin composition can be uniformly dispersed or dissolved in a solvent, and the composition can be cured after removing the solvent.
【0040】こうして得られる硬化物は、耐熱性を保持
しながら、耐湿性を有するという二つの特性を兼ね備え
た優れた性能を有する。また、エポキシ樹脂成分、硬化
剤成分の両方に本発明の樹脂を用いることによりその効
果は倍増する。従って、本発明の上記(1)又は(3)
の樹脂は、耐熱性、耐湿性の要求される広範な分野で、
エポキシ樹脂として、あるいは、硬化剤として用いるこ
とができる。具体的には、絶縁材料、積層板、封止材料
等あらゆる電気・電子材料の配合成分として有用である
。又、成形材料、複合材料等の分野に用いることができ
る。The cured product thus obtained has excellent performance, having both heat resistance and moisture resistance. Moreover, the effect is doubled by using the resin of the present invention for both the epoxy resin component and the curing agent component. Therefore, the above (1) or (3) of the present invention
The resin is used in a wide range of fields where heat resistance and moisture resistance are required.
It can be used as an epoxy resin or as a curing agent. Specifically, it is useful as a compounding component of all electrical and electronic materials such as insulating materials, laminates, and sealing materials. Moreover, it can be used in fields such as molding materials and composite materials.
【0041】さらに、本発明の上記(1)又は(3)の
樹脂は、ナフトール環を有するにも拘らず軟化点が低く
抑えられているためトランファー成型等、従来通りの手
法を用いることもでき作業性も良好である。[0041]Furthermore, the resin of the above (1) or (3) of the present invention has a low softening point despite having a naphthol ring, so conventional methods such as transfer molding can be used. The workability is also good.
【0042】[0042]
【実施例】以下本発明を実施例により、更に具体的に説
明する。尚、実施例中の軟化点とはJIS K242
5(環球法)による値を、水酸基当量、エポキシ当量は
g/eqを示す。なお、本発明はこれら実施例に限定さ
れるものではない。[Examples] The present invention will be explained in more detail below with reference to Examples. In addition, the softening point in the examples is JIS K242.
5 (ring and ball method), and the hydroxyl equivalent and epoxy equivalent are shown in g/eq. Note that the present invention is not limited to these Examples.
【0043】実施例1
(1)ナフトールジメチロール体の合成温度計、冷却管
、滴下ロート、撹拌器を取り付けたフラスコに1−ナフ
トール144重量部(1モル)、20wt%−水酸化ナ
トリウム水溶液212重量部(1.06モル)を仕込み
40℃で30分間反応させた。次いで系内を10℃に冷
却し、粒状パラホルムアルデヒド(純度92重量%)6
8重量部(1.05モル)を一気に添加し2時間反応さ
せた。Example 1 (1) Synthesis of naphthol dimethylol compound 144 parts by weight (1 mol) of 1-naphthol and 212 parts by weight of a 20 wt% sodium hydroxide aqueous solution were placed in a flask equipped with a thermometer, a cooling tube, a dropping funnel, and a stirrer. Part by weight (1.06 mol) was charged and reacted at 40°C for 30 minutes. Next, the inside of the system was cooled to 10°C, and granular paraformaldehyde (purity 92% by weight) 6
8 parts by weight (1.05 mol) was added at once and reacted for 2 hours.
【0044】反応終了後、この反応液の一部を中和し液
体クロマトグラフィー(逆相−RI)で分析したところ
ナフトールジメチロール体〔式(2)〕が95%(面積
%)であることが判った。After the reaction was completed, a portion of this reaction solution was neutralized and analyzed by liquid chromatography (reversed phase-RI), which revealed that the naphthol dimethylol compound [formula (2)] was 95% (area %). It turns out.
【0045】(2)ノボラック型樹脂の合成上記反応液
にメチルイソブチルケトン600重量部を添加し、次い
で、1−ナフトール576重量部(4モル)を仕込み、
更に、38wt%−塩酸水溶液100重量部(1.04
モル)を発熱に注意しながら30分間で添加し中和を行
った。次いで、系内を40℃に加熱して38wt%−塩
酸水溶液5重量部を添加し、更に、60℃で2時間反応
させた。(2) Synthesis of novolac type resin 600 parts by weight of methyl isobutyl ketone was added to the above reaction solution, and then 576 parts by weight (4 mol) of 1-naphthol was charged.
Furthermore, 100 parts by weight of a 38 wt% hydrochloric acid aqueous solution (1.04 parts by weight)
mol) was added over 30 minutes while being careful not to generate heat to effect neutralization. Next, the inside of the system was heated to 40°C, 5 parts by weight of a 38 wt % aqueous hydrochloric acid solution was added, and the mixture was further reacted at 60°C for 2 hours.
【0046】反応終了後、水洗を数回繰り返し中性に戻
した。その後、油層からロータリーエバポレーターを使
って加熱減圧下、メチルイソブチルケトン及び、未反応
1−ナフトールを除去し、室温で褐色、固体のノボラッ
ク型樹脂(A)195重量部を得た。得られたノボラッ
ク型樹脂(A)の150℃におけるICI粘度は16p
s、軟化点は110.5℃であり、水酸基当量(OH当
量)は153であった。After the reaction was completed, water washing was repeated several times to return to neutrality. Thereafter, methyl isobutyl ketone and unreacted 1-naphthol were removed from the oil layer under heating and reduced pressure using a rotary evaporator to obtain 195 parts by weight of a novolac type resin (A) that was brown and solid at room temperature. The ICI viscosity of the obtained novolac type resin (A) at 150°C is 16p.
s, the softening point was 110.5°C, and the hydroxyl equivalent (OH equivalent) was 153.
【0047】又、このノボラック型樹脂(A)を溶媒に
テトラヒドロフラン(以下THF)を用いて次のGPC
分析装置により分析したところ図1に示される分子量分
布曲線を得た。[0047] Further, this novolac type resin (A) was subjected to the following GPC using tetrahydrofuran (hereinafter referred to as THF) as a solvent.
When analyzed using an analyzer, a molecular weight distribution curve shown in FIG. 1 was obtained.
【0048】
GPC装置
送液ポンプ:LC−6000
(日立製作所製) カラム :GPC
KF−803(1本)+GPC KF−802.
5(2本) +GPC KF
−802(1本)(昭和電工製)カラム温度:40℃
溶媒 :THF 1ml/min検出
器 :RI ERC−7510
(エルマ光学製)データ処理:D−2500
(日立製作所製)GPC device liquid pump: LC-6000
(Manufactured by Hitachi) Column: GPC
KF-803 (1 piece) + GPC KF-802.
5 (2 pieces) +GPC KF
-802 (1 piece) (manufactured by Showa Denko) Column temperature: 40°C Solvent: THF 1ml/min Detector: RI ERC-7510
(Manufactured by Elma Optical) Data processing: D-2500
(Manufactured by Hitachi)
【00
49】上記分析条件で分析を行ったノボラック型樹脂(
A)のメインピークのリテンションタイムは、標準ポリ
スチレンを使用した検量線よりナフトール環3個を有す
る3核体の分子量に相当し、この3核体と思われるピー
ク成分を分取し、マススペクトル(FAB−MS)によ
って分析したところM+ 456が得られたことにより
、この成分は式(4)で表される3核体であることを確
認した。又、この3核体のノボラック型樹脂(A)中の
含有量は68重量%、2核体の含有量は4重量%であっ
た。00
49] Novolak type resin analyzed under the above analysis conditions (
The retention time of the main peak in A) corresponds to the molecular weight of a trinuclear substance having three naphthol rings, based on a calibration curve using standard polystyrene, and the peak component that is thought to be this trinuclear substance was fractionated, and the mass spectrum ( When analyzed by FAB-MS), M+ 456 was obtained, confirming that this component was a trinuclear body represented by formula (4). Further, the content of the trinuclear substance in the novolac type resin (A) was 68% by weight, and the content of the dinuclear substance was 4% by weight.
【0050】[0050]
【化9】[Chemical formula 9]
【0051】(3)ノボラック型エポキシ樹脂の合成次
に、このようにして得られたノボラック型樹脂(A)1
53重量部にエピクロルヒドリン555重量部(6モル
)、DMSO140重量部を加え溶解後50℃に加熱し
、フレーク状水酸化ナトリウム(純分99%)42重量
部(1.04モル)を100分間を要して添加し、その
後、更に60℃で2時間、80℃で1時間反応させた。
次いで、水洗を繰り返し中性に戻した後、油層からロー
タリーエバポレーターを使用し加熱減圧下、過剰のエピ
クロルヒドリンを留去した。次いで、この残留物に50
0重量部のメチルイソブチルケトンを添加し溶解した。(3) Synthesis of novolac type epoxy resin Next, the novolac type resin (A) 1 obtained in this way
Add 555 parts by weight (6 mol) of epichlorohydrin and 140 parts by weight of DMSO to 53 parts by weight, dissolve and heat to 50°C, and add 42 parts by weight (1.04 mol) of flaky sodium hydroxide (99% purity) for 100 minutes. After that, the reaction was further carried out at 60°C for 2 hours and at 80°C for 1 hour. Next, after repeatedly washing with water to return to neutrality, excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure using a rotary evaporator. This residue was then given 50
0 parts by weight of methyl isobutyl ketone was added and dissolved.
【0052】更に、このメチルイソブチルケトンの溶液
を80℃に加熱し30重量%の水酸化ナトリウム水溶液
10重量部を添加し、1時間反応させた後、水洗を繰り
返し行い中性とした。次いで、油層から加熱減圧下、メ
チルイソブチルケトンを留去し、ノボラック型エポキシ
樹脂(B)193重量部を得た。得られたノボラック型
エポキシ樹脂(B)の150℃におけるICI粘度は4
ps、軟化点は83.5℃、エポキシ当量は215であ
った。Further, this methyl isobutyl ketone solution was heated to 80° C., 10 parts by weight of a 30% by weight aqueous sodium hydroxide solution was added, and after reacting for 1 hour, the solution was made neutral by repeated washing with water. Next, methyl isobutyl ketone was distilled off from the oil layer under heating and reduced pressure to obtain 193 parts by weight of novolac type epoxy resin (B). The obtained novolac type epoxy resin (B) has an ICI viscosity of 4 at 150°C.
ps, the softening point was 83.5°C, and the epoxy equivalent was 215.
【0053】このノボラック型エポキシ樹脂(B)を液
体クロマトグラフィー(GPC、分析条件は上記ノボラ
ック樹脂の分析と同じ)で分析し、図2に示される分子
量分布曲線をえた。又、3核体と思われるピーク成分を
分取しマススペクトル(FAB−MS)により分析した
ところM+ 624が得られたことにより、この成分は
式(5)で表される3核体であることを確認した。又、
この3核体のノボラック型エポキシ樹脂(B)中の含有
量は59重量%、2核体の含有量は4.3重量%であっ
た。This novolac type epoxy resin (B) was analyzed by liquid chromatography (GPC, the analysis conditions were the same as those for the above-mentioned novolak resin), and the molecular weight distribution curve shown in FIG. 2 was obtained. In addition, when the peak component thought to be a trinuclear substance was fractionated and analyzed by mass spectrometry (FAB-MS), M+ 624 was obtained, indicating that this component is a trinuclear substance represented by formula (5). It was confirmed. or,
The content of this trinuclear substance in the novolac type epoxy resin (B) was 59% by weight, and the content of the dinuclear substance was 4.3% by weight.
【0054】[0054]
【化10】[Chemical formula 10]
【0055】比較例1
(1)ノボラック型樹脂の合成
温度計、冷却管、滴下ロート、撹拌器を取り付けたフラ
スコに1−ナフトール144重量部(1モル)、ホルマ
リン(純度30重量%)67重量部を仕込み系内を40
℃に昇温した。次いで、パラトルエンスルホン酸2重量
部を加え、40℃1時間、更に、70℃4時間反応させ
た。Comparative Example 1 (1) Synthesis of novolac type resin 144 parts by weight (1 mol) of 1-naphthol and 67 parts by weight of formalin (purity 30% by weight) were placed in a flask equipped with a thermometer, cooling tube, dropping funnel, and stirrer. The preparation system is 40
The temperature was raised to ℃. Next, 2 parts by weight of para-toluenesulfonic acid was added, and the mixture was reacted at 40°C for 1 hour and then at 70°C for 4 hours.
【0056】反応終了後、反応混合物にメチルイソブチ
ルケトン500重量部を添加し、水道水で水洗を数回繰
り返し中性に戻した。その後、油層からロータリーエバ
ポレーターを使って加熱、減圧下、メチルイソブチルケ
トン及び、未反応1−ナフトールを除去し、室温で褐色
、固体のノボラック型樹脂(C)150重量部を得た。
得られたノボラック型樹脂(C)の150℃におけるI
CI粘度は40ps以上、軟化点は114℃、水酸基当
量(OH当量)は152であった。After the reaction was completed, 500 parts by weight of methyl isobutyl ketone was added to the reaction mixture, and the mixture was washed with tap water several times to return to neutrality. Thereafter, methyl isobutyl ketone and unreacted 1-naphthol were removed from the oil layer using a rotary evaporator under heating and reduced pressure to obtain 150 parts by weight of novolac type resin (C) which was brown and solid at room temperature. I of the obtained novolac type resin (C) at 150°C
The CI viscosity was 40 ps or more, the softening point was 114°C, and the hydroxyl equivalent (OH equivalent) was 152.
【0057】このノボラック型樹脂(C)を液体クロマ
トグラフィー(GPC、分析条件は実施例1と同じ)で
分析したところ図3に示される分子量分布曲線を得た。
又、3核体と思われるピーク成分を分取し、マススペク
トル(FAB−MS)により分析したところM+ 45
6が得られたことにより、この成分は式(4)で表され
る1−ナフトールの3核体であることを確認した。又、
この3核体のノボラック型樹脂(C)中の含有量は19
重量%、2核体の含有量は30重量%であった。When this novolak type resin (C) was analyzed by liquid chromatography (GPC, analysis conditions were the same as in Example 1), a molecular weight distribution curve shown in FIG. 3 was obtained. In addition, a peak component believed to be a trinuclear substance was fractionated and analyzed by mass spectrometry (FAB-MS), and it was found to be M+ 45.
By obtaining 6, it was confirmed that this component was a trinuclear body of 1-naphthol represented by formula (4). or,
The content of this trinuclear body in the novolac type resin (C) is 19
The content of binuclear bodies was 30% by weight.
【0058】(2)エポキシ樹脂の合成上記ノボラック
型樹脂(C)152重量部を使用した以外は実施例1と
同様にエポキシ化反応を行い、エポキシ樹脂(D)19
0重量部を得た。得られたエポキシ樹脂(D)の150
℃におけるICI粘度は8ps、軟化点は92℃、エポ
キシ当量は227であった。(2) Synthesis of epoxy resin Epoxidation reaction was carried out in the same manner as in Example 1 except that 152 parts by weight of the above novolac type resin (C) was used.
0 parts by weight were obtained. 150 of the obtained epoxy resin (D)
The ICI viscosity at °C was 8 ps, the softening point was 92 °C, and the epoxy equivalent was 227.
【0059】このエポキシ樹脂(D)を液体クロマトグ
ラフィー(GPC、分析条件は実施例1と同じ)で分析
したところ図4に示される分子量分布曲線を得た。又、
3核体と思われるピーク成分を分取し、マススペクトル
(FAB−MS)により分析したところM+ 624が
得られたことにより、この成分は式(5)で表される3
核体であることを確認した。又、この3核体のエポキシ
樹脂(D)中の含有量は16重量%、2核体の含有量は
29重量%であった。When this epoxy resin (D) was analyzed by liquid chromatography (GPC, analysis conditions were the same as in Example 1), the molecular weight distribution curve shown in FIG. 4 was obtained. or,
When a peak component that was thought to be a trinuclear body was fractionated and analyzed by mass spectrometry (FAB-MS), M+ 624 was obtained, indicating that this component is 3 expressed by formula (5)
It was confirmed that it was a nuclear body. Further, the content of the trinuclear substance in the epoxy resin (D) was 16% by weight, and the content of the dinuclear substance was 29% by weight.
【0060】試験例1〜2、比較例1〜2上記実施例1
及び比較例1で得られた樹脂(A)〜(D)市販の硬化
剤PN−80(フェノールノボラック樹脂(日本化薬(
株)製、150℃におけるICI粘度1.5ps、軟化
点86℃、水酸基当量106)又はエポキシ樹脂EOC
N1020(o−クレゾールノボラック型エポキシ樹脂
(日本化薬(株)製、エポキシ当量200、150℃に
おけるICI粘度3.2ps)及び硬化促進剤(トリフ
ェニルフォスフィン)をそれぞれ表1に示す割合で配合
し、トランスファー成形により樹脂成形体を調製し、更
に、表1に示す硬化条件で硬化させた。これにより得ら
れた硬化物の熱変形温度、吸水率を測定した結果を表1
に示す。Test Examples 1-2, Comparative Examples 1-2 Above Example 1
and Resins (A) to (D) obtained in Comparative Example 1, commercially available curing agent PN-80 (phenol novolac resin (Nippon Kayaku)
Co., Ltd., ICI viscosity 1.5 ps at 150°C, softening point 86°C, hydroxyl equivalent 106) or epoxy resin EOC
N1020 (o-cresol novolac type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent 200, ICI viscosity at 150°C 3.2 ps) and curing accelerator (triphenylphosphine) were blended in the proportions shown in Table 1. Then, a resin molded body was prepared by transfer molding, and further cured under the curing conditions shown in Table 1.The results of measuring the heat distortion temperature and water absorption of the cured product thus obtained are shown in Table 1.
Shown below.
【0061】
表1
試験例
比較例
1
2 1
2 樹脂(A)wt部
150 樹脂(B)wt部
150 樹脂(C)wt部
150 樹脂(D)wt部
150 EOC
N1020 wt部 196
197 PN−80
wt部 7
4 70
硬化促進剤 wt部 2.0
1.5 2.0 1.5
硬化条件 160℃×
2時間+180℃×8時間 熱変形温度(℃)*1
177 175 172
171 吸水率(wt%) *2
0.95 0.96 1.07
1.00[0061]
Table 1
Test example
Comparative example
1
2 1
2 Resin (A) wt part
150 Resin (B) wt part
150 Resin (C) wt part
150 Resin (D) wt part
150 EOC
N1020 wt part 196
197 PN-80
wt part 7
4 70
Curing accelerator wt part 2.0
1.5 2.0 1.5
Curing conditions 160℃×
2 hours + 180℃ x 8 hours Heat distortion temperature (℃) *1
177 175 172
171 Water absorption rate (wt%) *2
0.95 0.96 1.07
1.00
【0062】*1 JIS K72
07による値 (℃)
*2 厚さ3mm*直径50mmの円盤、煮沸水中2
4時間後の吸水率(wt%)*1 JIS K72
Value according to 07 (°C) *2 Disc of thickness 3mm * diameter 50mm, boiling water 2
Water absorption rate after 4 hours (wt%)
【0063】[0063]
【発明の効果】本発明のノボラック型樹脂、ノボラック
型エポキシ樹脂は溶融時の粘度(150℃におけるIC
I粘度)が低く流動性が向上しているにもかかわらず、
その硬化物において優れた耐熱性、耐湿性を得ることが
出来る。又、本発明の製造法によれば、3核体含有量が
30重量%以上で、2核体含有量が10重量%以下の分
子量分布の制御された樹脂を容易に得ることが出来る。Effects of the Invention The novolac type resin and novolac type epoxy resin of the present invention have a viscosity at the time of melting (IC at 150°C).
Despite the low viscosity and improved fluidity,
The cured product can have excellent heat resistance and moisture resistance. Further, according to the production method of the present invention, it is possible to easily obtain a resin with a controlled molecular weight distribution in which the trinuclear content is 30% by weight or more and the dinuclear content is 10% by weight or less.
図1 ノボラック型樹脂(A)のGPC分析による分
子量分布曲線
図2 ノボラック型エポキシ樹脂(B)のGPC分析
による分子量分布曲線
図3 ノボラック型樹脂(C)のGPC分析による分
子量分布曲線
図4 エポキシ樹脂(D)のGPC分析による分子量
分布曲線Figure 1 Molecular weight distribution curve of novolak type resin (A) by GPC analysis Figure 2 Molecular weight distribution curve of novolac type epoxy resin (B) by GPC analysis Figure 3 Molecular weight distribution curve of novolac type resin (C) by GPC analysis Figure 4 Epoxy resin (D) Molecular weight distribution curve by GPC analysis
Claims (5)
て水素原子、炭素数1〜4のアルキル基、またはアリー
ル基を示し、Rは互に同一でも異なっていてもよい。)
で表されるノボラック型樹脂において式(1)のn=1
の成分を30重量%以上含み、かつ式(1)のn=0の
2核体成分の含有量が10重量%以下であるノボラック
型樹脂。Claim 1: Formula (1) [Formula 1] (where n represents a value of 0 to 10, R each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group, R may be the same or different.)
In the novolac type resin represented by the formula (1), n=1
A novolac-type resin containing 30% by weight or more of the component and having a content of the binuclear component of formula (1) where n=0 is 10% by weight or less.
はアリール基を示す。)で表されるナフトールジメチロ
ール体と式(N) 【化3】 (式中、Rは、水素原子、炭素数1〜4のアルキル基ま
たはアリール基を示す。)で表されるナフトール類とを
反応させることを特徴とする請求項1記載のノボラック
型樹脂の製造法。[Claim 2] A naphthol dimethylol compound represented by formula (2) [Chemical formula 2] (wherein R represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group) and formula (N) 3. The novolak according to claim 1, wherein the novolak is reacted with a naphthol represented by: Method of manufacturing mold resin.
て水素原子、炭素数1〜4のアルキル基、またはアリー
ル基を示しRは互に同一でも異なっていてもよい。)で
表されるノボラック型エポキシ樹脂において式(3)の
n=1の成分を30重量%以上含み、かつ式(3)のn
=0の2核体成分の含有量が10重量%以下であるノボ
ラック型エポキシ樹脂。[Claim 3] Formula (3) [Formula 4] (where n represents a value of 0 to 10, R each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group; R may be the same or different.) Contains 30% by weight or more of the component where n=1 in formula (3), and where n in formula (3)
A novolak-type epoxy resin in which the content of the binuclear component with =0 is 10% by weight or less.
促進剤を含むエポキシ樹脂組成物において、エポキシ樹
脂として請求項3のノボラック型エポキシ樹脂を含有す
るか、及び/又は、硬化剤として請求項1のノボラック
型樹脂を含有する、エポキシ樹脂組成物。4. An epoxy resin composition containing an epoxy resin, a curing agent, and optionally a curing accelerator, which contains the novolac type epoxy resin of claim 3 as the epoxy resin and/or the novolac type epoxy resin of claim 1 as the curing agent. An epoxy resin composition containing a novolac type resin.
物。5. A cured product of the epoxy resin composition according to claim 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11793291A JPH04323214A (en) | 1991-04-23 | 1991-04-23 | Novolak resin, its production, epoxy resin, resin composition and its cured product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11793291A JPH04323214A (en) | 1991-04-23 | 1991-04-23 | Novolak resin, its production, epoxy resin, resin composition and its cured product |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04323214A true JPH04323214A (en) | 1992-11-12 |
Family
ID=14723777
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11793291A Pending JPH04323214A (en) | 1991-04-23 | 1991-04-23 | Novolak resin, its production, epoxy resin, resin composition and its cured product |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04323214A (en) |
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1991
- 1991-04-23 JP JP11793291A patent/JPH04323214A/en active Pending
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