JPH04261521A - Liquid crystal display device and method for repairing display defect thereof - Google Patents

Liquid crystal display device and method for repairing display defect thereof

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Publication number
JPH04261521A
JPH04261521A JP3004831A JP483191A JPH04261521A JP H04261521 A JPH04261521 A JP H04261521A JP 3004831 A JP3004831 A JP 3004831A JP 483191 A JP483191 A JP 483191A JP H04261521 A JPH04261521 A JP H04261521A
Authority
JP
Japan
Prior art keywords
liquid crystal
electrode
crystal display
display device
picture element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3004831A
Other languages
Japanese (ja)
Inventor
Naoki Nakagawa
直紀 中川
Masahiro Hayama
羽山 昌宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3004831A priority Critical patent/JPH04261521A/en
Publication of JPH04261521A publication Critical patent/JPH04261521A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the matrix type liquid crystal display device which can repair the display defects occurring in the defects of thin-film transistors (TFTs). CONSTITUTION:A conductive film is deposited on an insulating substrate 1 and a gate inorg. insulating film 3, a gate wiring 10 and a floating electrode 11 are formed. Two picture element electrodes 8 are formed so as to overlap on the floating electrode 11 via an insulating layer 4. The display defect point of the liquid crystal display device having such structure is detected and the defective TFT 2 is electrically disconnected from the picture element electrode 8 of the display defective part. The part where this picture element electrode 8 and the floating electrode 11 are overlapped is irradiated with a laser beam to connect the picture element electrode 8 and the floating electrode 11 indicating the display defect. The other end of the floating electrode 11 is similarly connected to the corresponding picture element electrode 8. Since the normal TFT is connected to the picture element electrode 8, the display defect is repaired.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、薄膜トランジスタを
用いたマトリックス型液晶表示装置及びその表示欠陥修
復方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a matrix type liquid crystal display device using thin film transistors and a method for repairing display defects thereof.

【0002】0002

【従来の技術】マトリックス型液晶表示装置は、例えば
日経マグロウヒル社発行の雑誌、日経エレクトロニクス
、1986年12月15日号、P.193 〜200 
に記載されているように、マトリックス状に配列された
透明性導電膜から成る画素電極とそれに電気的に接続さ
れた薄膜トランジスタ(TFT)を表面に有するTFT
アレイ基板と、それに対向して重ねられた対向基板の間
に充填された表示材料である液晶に、選択的に電圧を印
加して、液晶分子の電界方向への配向により光の透過を
制御して表示を行うものである。
2. Description of the Related Art Matrix type liquid crystal display devices are described in, for example, a magazine published by Nikkei McGraw-Hill, Nikkei Electronics, December 15, 1986 issue, p. 193 ~200
As described in , a TFT has a pixel electrode made of a transparent conductive film arranged in a matrix and a thin film transistor (TFT) electrically connected to the pixel electrode on its surface.
Voltage is selectively applied to the liquid crystal display material filled between the array substrate and the counter substrate stacked opposite it, and the transmission of light is controlled by aligning the liquid crystal molecules in the direction of the electric field. The display is performed based on the following information.

【0003】図3は従来のマトリックス型液晶表示装置
のTFTアレイ基板の画素部構造を示す平面図、図4は
そのTFT付近を示す平面図、図5は図4中のV−V線
に沿った断面図である。図において、1はガラスなどか
ら成る絶縁性基板で、絶縁性基板1上にTFT2を構成
するゲート電極3、絶縁層4、半導体層5、ソース電極
6及びドレイン電極7が積層形成されている。8は絶縁
性基板1上に形成された画素電極で、ドレイン電極7と
電気的に接続されている。9はソース電極6と電気的に
接続されたソース配線、10はゲート電極3と電気的に
接続されたゲート配線である。
FIG. 3 is a plan view showing the pixel structure of a TFT array substrate of a conventional matrix type liquid crystal display device, FIG. 4 is a plan view showing the vicinity of the TFT, and FIG. 5 is a plan view taken along line V-V in FIG. FIG. In the figure, reference numeral 1 denotes an insulating substrate made of glass or the like, and on the insulating substrate 1, a gate electrode 3, an insulating layer 4, a semiconductor layer 5, a source electrode 6, and a drain electrode 7, which constitute a TFT 2, are formed in layers. A pixel electrode 8 is formed on the insulating substrate 1 and is electrically connected to the drain electrode 7. 9 is a source wiring electrically connected to the source electrode 6, and 10 is a gate wiring electrically connected to the gate electrode 3.

【0004】次にこのようなTFTアレイ基板と透明性
導電膜から成る対向電極を有する対向基板を用いて形成
されたマトリックス型液晶表示装置の表示欠陥の発生に
ついて説明する。先ず、液晶表示装置を点灯する。いず
れかのTFT2に断線不良がある場合、そのTFTが接
続されている画素電極8とその対向電極間には電圧が印
加されないので、液晶分子は配向せずその部分は常に暗
の表示欠陥となる。また、いずれかのTFT2に短絡不
良がある場合、その画素部には常に電圧が印加されて液
晶分子は電界の方向に配向し光を透過するので、その部
分の光量を制御することができなくなる。
Next, the occurrence of display defects in a matrix type liquid crystal display device formed using such a TFT array substrate and a counter substrate having a counter electrode made of a transparent conductive film will be explained. First, the liquid crystal display device is turned on. If there is a disconnection defect in any of the TFTs 2, no voltage is applied between the pixel electrode 8 to which that TFT is connected and its opposite electrode, so the liquid crystal molecules do not align and the area always becomes a dark display defect. . Additionally, if there is a short-circuit failure in any of the TFTs 2, a voltage is always applied to that pixel part, and the liquid crystal molecules are aligned in the direction of the electric field and transmit light, making it impossible to control the amount of light in that part. .

【0005】以上のようなTFTの不良に起因する表示
欠陥の発生を防止するマトリックス型液晶表示装置とし
て、従来次のような二つのタイプが知られている。
The following two types of matrix type liquid crystal display devices are conventionally known as matrix type liquid crystal display devices that prevent the occurrence of display defects caused by TFT defects as described above.

【0006】図6は従来の表示欠陥の発生を防止するマ
トリックス型液晶表示装置の一例である。図において、
2個のTFT2が画素電極8に並列に接続されている。 他の構成部分は、図3の従来の装置の相当部分と同じで
ある。この場合、いずれか一方のTFT2に断線不良が
発生しても、画素部分は正常に動作する。しかし、TF
T2が短絡不良の場合には、画素部分は表示不良となり
、しかもどちらのTFT2が不良かを特定することがで
きず、表示欠陥の修復は不可能である。また、1画素当
りのTFT2の数は図3の従来の装置の2倍になってい
るので、短絡不良の発生率も2倍になるという問題点が
あった。
FIG. 6 shows an example of a conventional matrix type liquid crystal display device that prevents display defects from occurring. In the figure,
Two TFTs 2 are connected to the pixel electrode 8 in parallel. The other components are the same as the corresponding parts of the conventional device of FIG. In this case, even if a disconnection failure occurs in one of the TFTs 2, the pixel portion operates normally. However, T.F.
If T2 is short-circuited, the pixel portion will have a display defect, and it is not possible to identify which TFT 2 is defective, making it impossible to repair the display defect. Furthermore, since the number of TFTs 2 per pixel is twice that of the conventional device shown in FIG. 3, there is a problem that the incidence of short-circuit failures is also doubled.

【0007】不良TFTを特定することのできるマトリ
ックス型液晶表示装置として、例えば特開昭63−30
9921 に示された図7のものがある。図において、
互いに交差するソース配線9とゲート配線10に囲まれ
た領域の画素電極を2分割して、各画素電極8に1個づ
つTFT2が接続されている。他の構成部分は、図3の
従来の装置の相当部分と同じである。この場合、通電状
態の画素部を観察することにより、表示欠陥の原因とな
っているTFT2を特定することができる。しかし、図
3及び図6の従来の装置より表示欠陥部分は小さくなる
が、表示欠陥の修復はできない。
For example, as a matrix type liquid crystal display device that can identify defective TFTs,
9921 is shown in FIG. In the figure,
The pixel electrode in the area surrounded by the source wiring 9 and gate wiring 10 which intersect with each other is divided into two, and one TFT 2 is connected to each pixel electrode 8 . The other components are the same as the corresponding parts of the conventional device of FIG. In this case, by observing the pixel portion in the energized state, the TFT 2 causing the display defect can be identified. However, although the display defect portion is smaller than the conventional devices shown in FIGS. 3 and 6, the display defect cannot be repaired.

【0008】[0008]

【発明が解決しようとする課題】従来のマトリックス型
液晶表示装置は、以上のように構成されているので、薄
膜トランジスタ(TFT)の不良に起因する表示欠陥の
修復が困難であるという問題点があった。
[Problems to be Solved by the Invention] Since the conventional matrix type liquid crystal display device is constructed as described above, there is a problem in that it is difficult to repair display defects caused by defects in thin film transistors (TFTs). Ta.

【0009】この発明は、上記のような課題を解決する
ためになされたもので、薄膜トランジスタの不良に起因
する表示欠陥を修復することが可能なマトリックス型液
晶表示装置と、その表示欠陥修復方法を得ることを目的
としている。
The present invention was made to solve the above-mentioned problems, and provides a matrix type liquid crystal display device capable of repairing display defects caused by defects in thin film transistors, and a method for repairing the display defects. The purpose is to obtain.

【0010】0010

【課題を解決するための手段】この発明に係る液晶表示
装置は、液晶を挟持する2枚の基板の一方に設けられ上
記液晶に電圧を印加するための複数の画素電極と、上記
画素電極と電気的にそれぞれ接続され上記電圧の印加を
制御する薄膜トランジスタと、同一の駆動信号を受ける
画素電極の少なくとも2個と絶縁層を介して重なるよう
にそれぞれ設けられた浮遊電極を備えたものである。
[Means for Solving the Problems] A liquid crystal display device according to the present invention includes a plurality of pixel electrodes provided on one of two substrates sandwiching a liquid crystal for applying a voltage to the liquid crystal, and a plurality of pixel electrodes that are provided on one of two substrates sandwiching a liquid crystal. The device includes thin film transistors that are electrically connected to each other to control the application of the voltage, and floating electrodes that are respectively provided so as to overlap with at least two pixel electrodes that receive the same drive signal via an insulating layer.

【0011】また、この発明に係る液晶表示装置の表示
欠陥修復方法は、上記液晶表示装置において、表示欠陥
の原因となっているスイッチング素子を画素電極から切
り離す工程と、上記薄膜トランジスタが切り離された画
素電極と正常な画素電極間を浮遊電極を介して電気的に
接続する工程を備えたものである。
[0011] Furthermore, the method for repairing display defects in a liquid crystal display device according to the present invention includes a step of separating a switching element causing a display defect from a pixel electrode in the liquid crystal display device; This method includes a step of electrically connecting an electrode and a normal pixel electrode via a floating electrode.

【0012】0012

【作用】この発明における液晶表示装置の浮遊電極は、
それと画素電極間を絶縁する絶縁層の少なくとも一部が
取りのぞかれて、画素電極間を電気的に接続する。
[Operation] The floating electrode of the liquid crystal display device in this invention is
At least a portion of the insulating layer that insulates between the pixel electrode and the pixel electrode is removed to electrically connect the pixel electrode.

【0013】[0013]

【実施例】この発明の一実施例を図1及び図2を用いて
説明する。図1はこの発明の実施例によるマトリックス
型液晶表示装置のTFTアレイ基板の画素部構造を示す
平面図、図2は図1中のII−II線に沿った断面図で
ある。図1及び図2において、11は浮遊電極である。 ガラスから成る絶縁性基板1上に、所定のパターンを有
するマスクを用いたフォトリングラフィにより所定の位
置にCr の導電性膜を堆積させ、ゲート電極3、ゲー
ト配線10及び浮遊電極11を形成する。次に所定のパ
ターンのマスクを用いて、シリコン窒化膜(Si NX
 )から成る絶縁層4、アモルファスシリコン(i−a
−Si )膜及び隣がドーピングされたアモルファスシ
リコン(n+ −a−Si )膜を順に堆積して、所定
の位置に半導体層5を形成する。さらに所定のパターン
のマスクを用いて、インジュウム/すず酸化物(ITO
)から成る透明性導電膜を堆積し、所定の位置に画素電
極8を形成する。画素電極8は2分割され、各画素電極
8に1個づつTFT2が接続されている。浮遊電極11
は、絶縁層4を介して2個の画素電極8と重なるような
位置に設けられている。 次に所定のパターンのマスクを用いて、Al膜を堆積し
、所定の位置にソース電極6、ソース配線9及びドレイ
ン電極7を形成した後、ソース電極6とドレイン電極7
の間のn+ −a−Si 膜を除去する。最上部にSi
 Nx から成る保護膜12を形成してTFTアレイ基
板を得る。
[Embodiment] An embodiment of the present invention will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view showing the pixel structure of a TFT array substrate of a matrix type liquid crystal display device according to an embodiment of the present invention, and FIG. 2 is a sectional view taken along line II--II in FIG. 1. In FIGS. 1 and 2, 11 is a floating electrode. A conductive film of Cr is deposited at predetermined positions on an insulating substrate 1 made of glass by photolithography using a mask having a predetermined pattern, thereby forming a gate electrode 3, a gate wiring 10, and a floating electrode 11. . Next, using a mask with a predetermined pattern, a silicon nitride film (SiNX
), an insulating layer 4 consisting of amorphous silicon (ia
-Si) film and an adjacent doped amorphous silicon (n+-a-Si) film are sequentially deposited to form a semiconductor layer 5 at a predetermined position. Furthermore, using a mask with a predetermined pattern, indium/tin oxide (ITO)
) is deposited to form a pixel electrode 8 at a predetermined position. The pixel electrode 8 is divided into two parts, and one TFT 2 is connected to each pixel electrode 8. floating electrode 11
are provided at positions overlapping the two pixel electrodes 8 with the insulating layer 4 in between. Next, using a mask with a predetermined pattern, an Al film is deposited to form a source electrode 6, a source wiring 9, and a drain electrode 7 at predetermined positions.
The n+-a-Si film between the layers is removed. Si on top
A protective film 12 made of Nx is formed to obtain a TFT array substrate.

【0014】次に動作について説明する。TFTアレイ
基板と、対向基板との間に液晶を挟持して形成されたマ
トリックス型液晶表示装置を点灯して明及び暗状態を観
察し、表示欠陥箇所を検出する。表示欠陥部のドレイン
電極7にレーザ光を照射して、画素電極8から不良TF
T2を電気的に切り離す。次にその画素電極8と浮遊電
極11が重なる部分に、絶縁性基板1側または対向基板
側からレーザ光を照射する。レーザ光のエネルギーによ
り、絶縁層4の一部が蒸発して消失するとともにに、浮
遊電極11または画素電極8或いは両方が溶融して、表
示欠陥を示した画素電極8と浮遊電極11とを電気的に
接続する。そして、上記浮遊電極11の他端も上記と同
様にして、対応する画素電極8と電気的に接続する。こ
のようにして表示欠陥は修復されることになり、装置の
表示品質及び製造歩留りを向上し得る。
Next, the operation will be explained. A matrix type liquid crystal display device formed by sandwiching a liquid crystal between a TFT array substrate and a counter substrate is turned on and bright and dark states are observed to detect display defects. The defective TF is removed from the pixel electrode 8 by irradiating the drain electrode 7 in the display defect area with laser light.
Electrically disconnect T2. Next, a portion where the pixel electrode 8 and the floating electrode 11 overlap is irradiated with laser light from the insulating substrate 1 side or the opposing substrate side. Due to the energy of the laser beam, a part of the insulating layer 4 evaporates and disappears, and the floating electrode 11 or the pixel electrode 8, or both, melts, and the pixel electrode 8 and the floating electrode 11 exhibiting a display defect are electrically disconnected. Connect to. The other end of the floating electrode 11 is also electrically connected to the corresponding pixel electrode 8 in the same manner as described above. In this way, display defects are repaired, and the display quality and manufacturing yield of the device can be improved.

【0015】なお、上記一実施例では互いに交差するソ
ース配線とゲート配線に囲まれた領域に画素電極を2個
設けているが、この画素電極の数に制約はなく、絶縁層
を介して2個以上と重なるように浮遊電極を設けること
により、上記一実施例と同様の効果が得られる。また、
ソース配線とゲート配線に囲まれた領域以外にある画素
電極でも、上記領域内のものと同じ駆動信号を受ける画
素電極との間であれば浮遊電極を設けてもよく、上記一
実施例と同様の効果が得られる。
In the above embodiment, two pixel electrodes are provided in the area surrounded by the source wiring and gate wiring that intersect with each other, but there is no restriction on the number of pixel electrodes, and two pixel electrodes are provided through an insulating layer. By providing floating electrodes so as to overlap with each other, the same effect as in the above embodiment can be obtained. Also,
Even if the pixel electrode is in a region other than the region surrounded by the source wiring and the gate wiring, a floating electrode may be provided as long as it is between the pixel electrode that receives the same drive signal as that in the region, similar to the above embodiment. The effect of this can be obtained.

【0016】[0016]

【発明の効果】この発明による液晶表示装置は、液晶を
挟持する2枚の基板の一方に設けられ上記液晶に電圧を
印加するための複数の画素電極と、上記画素電極と電気
的にそれぞれ接続され上記電圧の印加を制御する薄膜ト
ランジスタと、同一の駆動信号を受ける画素電極の少な
くとも2個と絶縁層を介して重なるようにそれぞれ設け
られた浮遊電極を備えるように構成されているので、表
示欠陥の原因となっている薄膜トランジスタの特定が容
易で、しかも該トランジスタから画素電極を切離し、切
り離された画素電極と正常な画素電極間を浮遊電極を介
して電気的に接続することにより、表示欠陥を容易に修
復できる効果が得られる。
Effects of the Invention The liquid crystal display device according to the present invention has a plurality of pixel electrodes provided on one of two substrates sandwiching a liquid crystal and for applying a voltage to the liquid crystal, and each electrically connected to the pixel electrode. A thin film transistor that controls the application of the voltage described above, and a floating electrode that overlaps at least two pixel electrodes that receive the same drive signal with an insulating layer in between. It is easy to identify the thin film transistor causing the display defect, and by separating the pixel electrode from the transistor and electrically connecting the separated pixel electrode and the normal pixel electrode via a floating electrode, it is possible to eliminate display defects. Effects that can be easily repaired can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】この発明の一実施例によるマトリックス型液晶
表示装置のTFTアレイ基板の画素構造を示す平面図で
ある。
FIG. 1 is a plan view showing a pixel structure of a TFT array substrate of a matrix type liquid crystal display device according to an embodiment of the present invention.

【図2】図1のTFTアレイ基板のII−II線に沿っ
た断面図である。
FIG. 2 is a cross-sectional view of the TFT array substrate of FIG. 1 taken along line II-II.

【図3】従来のマトリックス型液晶表示装置のTFTア
レイ基板の画素部構造を示す平面図である。
FIG. 3 is a plan view showing the pixel structure of a TFT array substrate of a conventional matrix type liquid crystal display device.

【図4】図3の装置のTFT付近を示す平面図である。FIG. 4 is a plan view showing the vicinity of the TFT of the device shown in FIG. 3;

【図5】図4の装置のV−V線に沿った断面図である。FIG. 5 is a cross-sectional view of the device of FIG. 4 along line V-V.

【図6】従来の表示欠陥の発生を防止するマトリックス
型液晶表示装置のTFTアレイ基板の画素部構造を示す
平面図である。
FIG. 6 is a plan view showing the structure of a pixel portion of a TFT array substrate of a conventional matrix type liquid crystal display device that prevents the occurrence of display defects.

【図7】従来の不良TFTを特定することのできるマト
リックス型液晶表示装置のTFTアレイ基板の画素部構
造を示す平面図である。
FIG. 7 is a plan view showing a structure of a pixel portion of a TFT array substrate of a matrix type liquid crystal display device in which a conventional defective TFT can be identified.

【符号の説明】[Explanation of symbols]

2  薄膜トランジスタ(TFT) 4  絶縁層 8  画素電極 11  浮遊電極 2 Thin film transistor (TFT) 4 Insulating layer 8 Pixel electrode 11 Floating electrode

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  液晶を狭持する2枚の基盤の一方に設
けられ上記液晶に電圧を印加するための複数の画素電極
と、上記画素電極と電気的にそれぞれ接続され上記電圧
の印加を制御する薄膜トランジスタと、同一の駆動信号
を受ける画素電極の少なくとも2個と絶縁層を介して重
なるようにそれぞれ設けられた浮遊電極を備えたことを
特徴とする液晶表示装置。
1. A plurality of pixel electrodes provided on one of two substrates sandwiching a liquid crystal for applying a voltage to the liquid crystal, and a plurality of pixel electrodes each electrically connected to the pixel electrode to control the application of the voltage. What is claimed is: 1. A liquid crystal display device comprising: a thin film transistor that receives the same drive signal; and floating electrodes that are respectively provided so as to overlap with at least two pixel electrodes with an insulating layer interposed therebetween, which receive the same drive signal.
【請求項2】  請求項1の液晶表示装置において、表
示欠陥の原因となっている薄膜トランジスタを画素電極
から切り離す工程と、上記薄膜トランジスタが切り離さ
れた画素電極と正常な画素電極間を浮遊電極を介して電
気的に接続する工程を備えたことを特徴とする液晶表示
装置の表示欠陥修復方法。
2. The liquid crystal display device according to claim 1, including the step of separating the thin film transistor causing the display defect from the pixel electrode, and connecting the thin film transistor between the separated pixel electrode and the normal pixel electrode via a floating electrode. 1. A method for repairing a display defect in a liquid crystal display device, comprising a step of electrically connecting the liquid crystal display device.
JP3004831A 1991-01-21 1991-01-21 Liquid crystal display device and method for repairing display defect thereof Pending JPH04261521A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3004831A JPH04261521A (en) 1991-01-21 1991-01-21 Liquid crystal display device and method for repairing display defect thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3004831A JPH04261521A (en) 1991-01-21 1991-01-21 Liquid crystal display device and method for repairing display defect thereof

Publications (1)

Publication Number Publication Date
JPH04261521A true JPH04261521A (en) 1992-09-17

Family

ID=11594644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3004831A Pending JPH04261521A (en) 1991-01-21 1991-01-21 Liquid crystal display device and method for repairing display defect thereof

Country Status (1)

Country Link
JP (1) JPH04261521A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100263829B1 (en) * 1996-05-09 2000-08-16 마찌다 가쯔히꼬 Active matrix substrate and correcting method of structural defect
KR100363140B1 (en) * 1995-05-30 2003-08-14 가부시키가이샤 아드반스트 디스프레이 TFT array substrate, liquid crystal display using the same, and manufacturing method of TFT array substrate
JP2012113090A (en) * 2010-11-24 2012-06-14 Hitachi Displays Ltd Liquid crystal display device and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100363140B1 (en) * 1995-05-30 2003-08-14 가부시키가이샤 아드반스트 디스프레이 TFT array substrate, liquid crystal display using the same, and manufacturing method of TFT array substrate
KR100263829B1 (en) * 1996-05-09 2000-08-16 마찌다 가쯔히꼬 Active matrix substrate and correcting method of structural defect
US6297520B1 (en) 1996-05-09 2001-10-02 Sharp Kabushiki Kaisha Active matrix substrate and correcting method of structural defect thereof
JP2012113090A (en) * 2010-11-24 2012-06-14 Hitachi Displays Ltd Liquid crystal display device and manufacturing method thereof

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