JPH0425376A - Polishing device - Google Patents

Polishing device

Info

Publication number
JPH0425376A
JPH0425376A JP2127851A JP12785190A JPH0425376A JP H0425376 A JPH0425376 A JP H0425376A JP 2127851 A JP2127851 A JP 2127851A JP 12785190 A JP12785190 A JP 12785190A JP H0425376 A JPH0425376 A JP H0425376A
Authority
JP
Japan
Prior art keywords
carrier
polishing
polishing member
surface plate
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2127851A
Other languages
Japanese (ja)
Inventor
Yoichi Sato
洋一 佐藤
Ryo Hashimoto
涼 橋本
Michitaka Hashimoto
通孝 橋本
Isao Tezuka
功 手塚
Yoshinobu Kimura
義信 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2127851A priority Critical patent/JPH0425376A/en
Publication of JPH0425376A publication Critical patent/JPH0425376A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform a lift motion on a polishing member without burdening a worker, by providing a carrier receiver which receives a carrier from the lower part in the state of the both gears of sun and internal gears being bitten, in the state of its projecting to a space side in the state of not impeding the lift of the polishing member. CONSTITUTION:A carrier 6 in the state of its being placed on the upper face of a polishing member 18 at its descent stage is abutted on carrier receivers 12, 13 at the peripheral edge thereof and borne thereon, when the polishing member 8 positioned in the annular space between both gears 4, 5 of sun and internal gears is descended in order to migrate to the lower position of the space. The carrier is held by the receiver after the bearing and only the polishing member is migrated downward. When the polishing member descended to the lower position of the annular space is ascended in order to migrate into the space, the polishing member bears the carrier with its abutment on the carrier lower face in the ascent stage and the carrier is separated upward from the carrier receiver.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は、例えば磁気ディスク用アルミニウム基板等
のワークに研磨加工を施す研磨装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a polishing apparatus for polishing a workpiece such as an aluminum substrate for a magnetic disk.

従来の技術及び課題 従来、例えば磁気ディスク用アルミニウム基板の研磨を
行う研磨装置として、第7図に示されるような装置(5
1)が用いられている。
BACKGROUND ART Conventionally, as a polishing apparatus for polishing an aluminum substrate for a magnetic disk, for example, an apparatus (5) as shown in FIG.
1) is used.

同図の研磨装置(51)は、回転駆動可能に保持されか
つ上面にドーナツ盤状の砥石(52)が取着された下部
定盤(53)と、該下部定盤(53)の上方位置に該定
盤(53)と対向同軸状に配置されると共に回転駆動及
び昇降作動可能に保持されかつ下面に同じくドーナツ盤
状の砥石(54)が取着された上部定盤(55)と、各
砥石(52)(54)間において砥石の軸芯位置に配置
された太陽歯車(57)と、該太陽歯車(57)の径方
向外方位置に同心状に配置された内歯歯車(59)と、
該内歯歯車(59)及び太陽歯車(57)の両歯車に噛
合され下定盤(53)の砥石(52)上に載置された状
態で両歯車(57)  (59)間に配置された外歯歯
車状のワークキャリアー(5B)とからなる。なお、こ
のワークキャリアー(56)は、磁気ディスク用基板(
A)の外周形状に沿う円形の保持孔(60)を偏心状態
に有し、該保持孔(60)内に磁気ディスク用基板(A
)が配置された状態で該基板の上下両面がキャリア(5
6)の保持孔(60)から外方に突出した状態となるよ
うにその板厚が基板(A)よりも薄く形成されている。
The polishing device (51) in the figure includes a lower surface plate (53) which is rotatably held and has a donut-shaped grindstone (52) attached to the upper surface, and a lower surface plate (53) located above the lower surface plate (53). an upper surface plate (55) which is disposed coaxially with the surface plate (53) and is rotatably driven and movable up and down, and has a donut-shaped grindstone (54) attached to its lower surface; A sun gear (57) is arranged between the grinding wheels (52) and (54) at the axial center position of the grinding wheels, and an internal gear (59) is arranged concentrically at a position radially outward of the sun gear (57). )and,
The internal gear (59) and the sun gear (57) were meshed with each other and placed between the two gears (57) and (59) and placed on the grindstone (52) of the lower surface plate (53). It consists of an external gear-shaped work carrier (5B). In addition, this work carrier (56) is a magnetic disk substrate (
It has an eccentric circular holding hole (60) that follows the outer circumferential shape of the magnetic disk substrate (A).
) is arranged, and the top and bottom surfaces of the board are covered with carriers (5).
The plate thickness is formed to be thinner than that of the substrate (A) so that it protrudes outward from the holding hole (60) of 6).

そして、この研磨装置(51)では、上部定盤(55)
が上方待機位置に位置された状態で磁気−ディスク用基
板(A)がワークキャリアー(56)の保持孔(60)
内に配置され、上部定盤(55)が下降作動されて磁気
ディスク用基板(A)の両面が上下の砥石(52)  
(54)で挾まれる。そして、加圧状態において、太陽
歯車(57)が回転されることによりワークキャリアー
(56)が自転されながら太陽歯車(57)の回りで公
転され、更に上下の定盤(53)  (55)も回転さ
れて、磁気ディスク用基板(A)の両面の研磨加工がな
される。研磨後は、上部定盤(55)が上昇され、キャ
リアー(56)に保持されている基板(A)が取り出さ
れ、また新たな基板がキャリアー(56)に保持せしめ
られて研磨が再開される。
In this polishing device (51), the upper surface plate (55)
The magnetic disk substrate (A) is inserted into the holding hole (60) of the work carrier (56) with the
The upper surface plate (55) is lowered and both sides of the magnetic disk substrate (A) are placed inside the upper and lower grinding wheels (52).
It is caught in (54). When the sun gear (57) is rotated in the pressurized state, the work carrier (56) is rotated and revolved around the sun gear (57), and the upper and lower surface plates (53) and (55) are also rotated. The magnetic disk substrate (A) is rotated, and both sides of the magnetic disk substrate (A) are polished. After polishing, the upper surface plate (55) is raised, the substrate (A) held by the carrier (56) is taken out, a new substrate is held by the carrier (56), and polishing is restarted. .

ところで、上記研磨装置(5I)において、下部定盤(
53)が太陽、内歯の両歯車(57)  (59)間の
環状スペース内の位置と、該スペースの下方位置との間
で昇降作動される構成が採られる場合がある。
By the way, in the above polishing device (5I), the lower surface plate (
53) may be moved up and down between a position within the annular space between the sun and internal gears (57) and (59) and a position below the space.

例えば、本発明者らの研究開発に係る自動研磨装置、即
ち上記のような自転公転タイプの研磨装置(51)への
基板(A)のローディング、アンローディングの自動化
を達成するための装置では、基板(A)をローデング、
アンローディングする際の下部定盤(53)の砥石(5
2)上面の高さ位置を一定にすることを採用する。
For example, in an automatic polishing device researched and developed by the present inventors, that is, a device for achieving automation of loading and unloading of a substrate (A) into the above-mentioned rotation-revolution type polishing device (51), Loading the board (A),
The grindstone (5) on the lower surface plate (53) when unloading
2) Adopt a constant height position of the top surface.

即ち、下部定盤(53)が上下作動しない固定型のもの
である場合、砥石(52)への目立て等を繰り返すうち
、その厚さが減少して、砥石(52)の上面の高さが次
第に低くなり、それに伴ってキャリアー(5B)の配置
高さも低くなっていく。
In other words, if the lower surface plate (53) is a fixed type that does not move up and down, as the grinding wheel (52) is repeatedly sharpened, its thickness decreases and the height of the top surface of the grinding wheel (52) decreases. The height of the carrier (5B) gradually decreases, and the height of the carrier (5B) also decreases accordingly.

そのような条件下で基板(A)のローディング、アンロ
ーディングの自動化を行うとすると、ローディング、ア
ンローディング装置を、下部定盤(53)の砥石(52
)の上面の高さ位置を検知するセンサーを具備したもの
とし、かつ該装置を、その動作態様が砥石(52)の上
面の高さに応じて変化していく複雑な制御構成を有する
ものにしなければならない。このような構成では、コス
ト面等の理由からその実用化は実際上極めて困難である
If the loading and unloading of the substrate (A) is to be automated under such conditions, the loading and unloading device is connected to the grinding wheel (52) on the lower surface plate (53).
) is equipped with a sensor that detects the height position of the top surface of the grinding wheel (52), and the device has a complicated control configuration in which the operating mode changes depending on the height of the top surface of the grindstone (52). There must be. Practical implementation of such a configuration is extremely difficult due to cost and other reasons.

そこで、ローディング、アンローディング装置の動作を
パターン化し該装置の構成を簡素化して実用的な自動化
を図るべく、下部定盤(53)の砥石(52)の厚さが
減少しても該砥石(52)の上面が基板のローディング
、アンローディングの際に一定の高さ位置に位置するよ
うに、下部定盤(53)を昇降作動しうるようにするこ
とを行う。
Therefore, in order to pattern the operation of the loading and unloading device and simplify the configuration of the device for practical automation, even if the thickness of the grinding wheel (52) on the lower surface plate (53) is reduced, the grinding wheel (52) 52) The lower surface plate (53) can be moved up and down so that the upper surface of the lower surface plate (53) is located at a constant height during loading and unloading of substrates.

そしてその場合、砥石(52)の上面の高さ位置を正確
に出すために、下部定盤(53)を−旦、太陽、内歯の
両歯車(57)  (59)間のスペースの下方位置に
設定された砥石(53)上面基準位置に下降させ、その
位置を基準に一定高さ上昇させて、砥石(52)の上面
を前記スペース内の所定の一定位置に位置させるように
することを行う。
In that case, in order to accurately determine the height position of the upper surface of the grinding wheel (52), the lower surface plate (53) should be moved to the lower position of the space between the sun and internal gears (57) and (59). The upper surface of the grinding wheel (53) is lowered to a reference position for the upper surface of the grinding wheel (53) set at conduct.

かかる場合に、下部定盤(53)が歯車(57)(59
)間のスペースの下方位置まで下降されると、ワークキ
ャリアー(5B)も下部定盤(53)と共に該スペース
の下方に移行して、ワークキャリアー(56)が太陽、
内歯の両歯車(57)(59)から外れてしまう。そし
て、−旦外れると、下部定盤(53)を上昇させていく
過程でワークキャリアー(56)の歯が太陽、内歯の両
歯車(57)  (59)とうまく噛合できない場合が
多い。
In such a case, the lower surface plate (53) is connected to the gears (57) (59).
), the work carrier (5B) also moves below the space together with the lower surface plate (53), and the work carrier (56)
It comes off from both internal gears (57) and (59). If it comes off, the teeth of the work carrier (56) often cannot mesh well with the sun and internal gears (57) and (59) during the process of raising the lower surface plate (53).

これに対処するため、下部定盤(53)を下降させる際
に、作業者に研磨装置(51)からワークキャリアー(
56)を−旦取り外させ、砥石(52)上面の高さ位置
の修正を終えたのちに再びキャリアー(56)を歯車(
57)  (59)に噛合させるようにすることが一つ
の方法として考えられる。
To deal with this, when lowering the lower surface plate (53), the operator has to remove the workpiece carrier (
After removing the carrier (56) and correcting the height position of the upper surface of the grindstone (52), the carrier (56) is attached to the gear (56) again.
57) One possible method is to mesh with (59).

しかし、砥石(52)上面の高さ修正を行うたびに上記
めように作業者にキャリアー(56)の取外し・取付け
を行わせることは、作業者に大きな負担を強いることに
なる。
However, having the operator remove and attach the carrier (56) as described above every time the height of the upper surface of the grindstone (52) is adjusted imposes a heavy burden on the operator.

この発明は、上記のような問題点を解決し、砥石等によ
る環盤状の研磨加工部材が、太陽、内歯の両歯車間の環
状スペース内の位置と該スペースの下方位置との間で昇
降作動される構成が採られている研磨装置について、研
磨加工部材を前記スペースの下方位置に移行させても、
キャリアーを太陽、内歯の両歯車に噛合させた状態に保
持することができ、もって作業者に負担をかけずに研磨
加工部材に昇降作動を行わせることができる研磨装置を
提供することを目的とする。
This invention solves the above-mentioned problems, and the annular polishing member using a grindstone or the like is placed between the position within the annular space between the sun and internal gears and the lower position of the space. For a polishing device that is configured to move up and down, even if the polishing member is moved to a position below the space,
It is an object of the present invention to provide a polishing device that can hold a carrier in mesh with both a sun gear and an internal gear, thereby allowing a polishing member to be raised and lowered without putting a burden on the operator. shall be.

課題を解決しようとする手段 上記目的において、この発明は、太陽歯車の同心外方部
に環状のスペースをおいて内歯歯車が配置されると共に
、該環状スペース内に太陽、内歯の両歯車と噛合状態に
外歯歯車状のワークキャリアーが配置され、かつ前記環
状スペース内の位置と該スペースの下方位置との間で昇
降される砥石等による環盤状の研磨加工部材か具備され
た研磨装置であって、 前記太陽歯車及び内歯歯車のそれぞれに、前記研磨加工
部材が前記環状スペースの下方位置に移行された際にキ
ャリアーを太陽、内歯の両歯車に噛合させた状態で下方
から受けるキャリアー受けが、前記研磨加工部材の昇降
を妨げない態様において前記スペース側に突出した状態
に設けられてなることを特徴とする研磨装置を要旨とす
る。
Means for Solving the Problems To achieve the above object, the present invention provides an internal gear in which an internal gear is arranged with an annular space in the concentric outer part of a sun gear, and both the sun and internal gears are arranged in the annular space. An external gear-shaped work carrier is disposed in mesh with the annular space, and the polishing member is equipped with an annular polishing member using a grindstone or the like that is raised and lowered between a position within the annular space and a position below the space. The apparatus comprises: applying the polishing member to each of the sun gear and the internal gear from below with the carrier meshing with both the sun gear and the internal gear when the polishing member is moved to a position below the annular space; The gist of the polishing apparatus is that a carrier receiver for receiving the polishing member is provided in a state of protruding toward the space in a manner that does not prevent the polishing member from moving up and down.

なお、上記構成において、前記太陽歯車、内歯歯車及び
ワークキャリアー相互間の歯数比が、太陽歯車又は/及
び内歯歯車の所定回数の回転により前記キャリアーの全
ワーク保持部が回転開始時の位置関係と同じ位置関係に
復帰する歯数比に設定されると共に、前記太陽歯車又は
/及び内歯歯車が、前記所定回数の回転により前記ワー
クの研磨加工を終了した時点で一時的に停止される態様
において間欠駆動制御されるようになされているのが好
ましい。
In the above configuration, the gear ratio between the sun gear, the internal gear, and the workpiece carrier is such that all the workpiece holding parts of the carrier start rotating by a predetermined number of rotations of the sun gear and/or the internal gear. The gear ratio is set to return to the same positional relationship as the positional relationship, and the sun gear and/or internal gear are temporarily stopped when polishing the workpiece is completed by rotating the predetermined number of times. It is preferable that intermittent drive control be performed in this embodiment.

作用 上記構成の研磨装置では、太陽、内歯の両歯車間の環状
スペース内に位置されている研磨加工部材が、該スペー
スの下方位置に移行すべく下降すると、その下降過程に
おいて、該研磨加工部材の上面に載置状態にあるキャリ
アーが、その周縁部においてキャリアー受けに当接しこ
れに支承される。支承後はキャリアーは該受けに保持さ
れ、研磨加工部材だけが下方に移行していく。また、前
記環状スペースの下方位置に下降された研磨加工部材が
該スペース内に移行すべく上昇すると、その上昇過程に
おいて、研磨加工部材がキャリアーの下面に当接してこ
れを支承し、該キャリアーがキャリアー受けから上方に
離間される。
Operation In the polishing device having the above configuration, when the polishing member located in the annular space between the sun gear and the internal gear descends to move to a position below the space, the polishing member is The carrier placed on the upper surface of the member contacts and is supported by the carrier receiver at its peripheral edge. After being supported, the carrier is held by the receiver, and only the polished member moves downward. Further, when the polishing member lowered to the lower position of the annular space rises to move into the space, the polishing member comes into contact with and supports the lower surface of the carrier during the rising process, and the carrier It is separated upward from the carrier receiver.

実施例 以下、この発明の研磨装置を磁気ディスク用アルミニウ
ム基板の研磨加工を行う装置に適用した実施例を、図面
に基づいて説明する。
EXAMPLE Hereinafter, an example in which a polishing apparatus of the present invention is applied to an apparatus for polishing an aluminum substrate for a magnetic disk will be described with reference to the drawings.

第1図及び第2図に示される研磨装置(1)において、
(2)は下部定盤、(3)は上部定盤、(4)は太陽歯
車、(5)は内歯歯車、(6)はワークキャリアー (
7)は目立て部材である。
In the polishing apparatus (1) shown in FIGS. 1 and 2,
(2) is the lower surface plate, (3) is the upper surface plate, (4) is the sun gear, (5) is the internal gear, (6) is the work carrier (
7) is a sharpening member.

太陽歯車(4)は、図示しない回転駆動装置により自軸
回りでの回転を行いうるものとなされている。この回転
駆動装置は、設定回転回数に応じた回数たけ太陽歯車(
4)を回転させることができる、例えばACサーボモー
タなどによる。
The sun gear (4) is capable of rotating around its own axis by a rotation drive device (not shown). This rotary drive device uses a sun gear (
4) by an AC servo motor, for example.

また、内歯歯車(5)は、太陽歯車(4)の径方向外方
位置に、太陽歯車(4)との間に環状のスペースをおい
て同心状に固定状態で配置されている。
Further, the internal gear (5) is fixedly arranged concentrically at a position radially outward of the sun gear (4) with an annular space between the internal gear (5) and the sun gear (4).

更に、ワークキャリアー(6)は、薄板状外歯歯車によ
るもので、上記太陽歯車(4)と内歯歯車(5)との間
の環状スペース内に、太陽、内歯の両歯車(4)(5)
と噛合状態に1個ないし複数個配置されている。なお、
ワークキャリアー(6)には、その中心位置から偏心し
た位置に、磁気ディスク用基板(A)の外周形状に沿う
円形の保持孔(10)が1個ないし複数個設けられてい
る。また、このワークキャリアー(6)の厚さは、磁気
ディスク用基板(A)の厚さよりも薄く形成され、前記
保持孔(10)内に磁気ディスク用基板(A)を配置し
た状態でその上下の面が保持孔(10)の外方に突出し
うるちのとなされている。
Furthermore, the work carrier (6) is based on a thin plate-shaped external gear, and both sun and internal gears (4) are provided in the annular space between the sun gear (4) and the internal gear (5). (5)
One or more pieces are arranged in mesh with each other. In addition,
The work carrier (6) is provided with one or more circular holding holes (10) that follow the outer circumferential shape of the magnetic disk substrate (A) at positions eccentric from its center position. Further, the thickness of this work carrier (6) is formed to be thinner than the thickness of the magnetic disk substrate (A), and when the magnetic disk substrate (A) is placed in the holding hole (10), The surface protrudes outward from the holding hole (10) and is shaped like an opening.

ここに、上記太陽歯車(4)、内歯歯車(5)及びワー
クキャリアー(6)相互間の歯数比は1:3:1に設定
され、また太陽歯車(4)はその回転駆動装置により4
の整数倍数回回転された時点で停止されるものとなされ
、それによって太陽歯車(4)の回転停止時にキャリア
ー(6)がその公転経路上の定位置で停止され、かつそ
の保持孔(10)も自転公転開始時の位置で停止される
ものとなされている。
Here, the gear ratio among the sun gear (4), internal gear (5), and work carrier (6) is set to 1:3:1, and the sun gear (4) is rotated by its rotational drive device. 4
The carrier (6) is stopped at a fixed position on its revolving path when the sun gear (4) stops rotating, and its holding hole (10) is rotated an integral multiple of times. It is also assumed that the robot is stopped at the position at the start of its rotation and revolution.

下部定盤(2)は、その上部に研磨加工部材としての所
定厚さの環盤状の砥石(8)が取着されたもので、図示
しない回転駆動装置により自軸回りでの回転を行い、か
つ該砥石(8)の上面が前記環状スペース内のワーク加
工位置(第5図のhΩaの位置)と該スペースの下方位
置(同図のhΩ0の位置)との間で位置の変更を行いつ
るよう、図示しない昇降作動装置により昇降作動される
ものとなされている。
The lower surface plate (2) has an annular grindstone (8) of a predetermined thickness attached thereto as a polishing member, and is rotated around its own axis by a rotation drive device (not shown). , and the upper surface of the grindstone (8) changes its position between the workpiece processing position within the annular space (position hΩa in Figure 5) and the lower position of the space (position hΩ0 in the figure). It is designed to be raised and lowered by a lifting device (not shown).

上部定盤(3)は、下部定盤(2)の上方位置に同軸状
に対向配置され、その下部に同じく環盤状の砥石(9)
が前記砥石(8)に対向するように取着されたものであ
る。そして、この上部定盤(3)も、回転駆動装置によ
り自軸回りでの回転を行い、昇降駆動装置により昇降作
動されるものとなされている。
The upper surface plate (3) is disposed coaxially opposite the lower surface plate (2), and a ring-shaped grindstone (9) is placed at the bottom of the upper surface plate (3).
is attached so as to face the grindstone (8). The upper surface plate (3) is also rotated about its own axis by a rotational drive device, and is moved up and down by an elevation drive device.

そして、前記太陽歯車(4)、及び内歯歯車(5)のそ
れぞれには、第1図、第2図及び第4図に示されるよう
に、キャリアー受け(12)(13)が取着されている
As shown in FIGS. 1, 2, and 4, carrier receivers (12) and (13) are attached to each of the sun gear (4) and internal gear (5). ing.

太陽歯車(4)側のキャリアー受け(12)は、太陽歯
車(4)の回転駆動軸を通す孔を中心部に有し、かつ周
縁部に全周に亘る立ち上がり状の屈曲部(12a)を有
する円板材によるもので、太陽歯車(4)の下部に外嵌
状態に配置され、その下面において締結部材により太陽
歯車(4)に固着されている。この固着状態において、
前記屈曲部(12a )は、その上縁部が下部定盤(2
)の砥石(8)のワーク加工高さhΩaよりも若干低い
位置に位置された状態で太陽歯車(4)の歯の上下方向
の下部部分と対向状に位置するものとなされている。
The carrier receiver (12) on the sun gear (4) side has a hole in the center through which the rotational drive shaft of the sun gear (4) passes, and a rising bent part (12a) extending all around the circumference. The sun gear (4) is made of a disc material, and is disposed externally on the lower part of the sun gear (4), and is fixed to the sun gear (4) by a fastening member on the lower surface thereof. In this fixed state,
The upper edge of the bent portion (12a) is connected to the lower surface plate (2).
) is positioned slightly lower than the workpiece machining height hΩa of the grindstone (8), and is positioned opposite to the lower portion of the teeth of the sun gear (4) in the vertical direction.

また一方、内歯歯車(5)側のキャリアー受け(13)
は、内歯歯車(5)の周方向に沿うように緩やかに湾曲
成形された所定長さの断面り字状の部材によるもので、
その立ち上がり状の屈曲部(13a )を内歯歯車(5
)の歯の下部側と対向させ、水平辺部を内歯歯車(5)
の下面に対向させた状態で、該水平部を内歯歯車(5)
の下面に締結部材等により固着することで内歯歯車(5
)に取着されている。この屈曲部(13a)の上縁部高
さは、前記太陽歯車(4)側のキャリアー受け(12)
の屈曲部(12a)の上縁部高さと同じ高さに設定され
ている。なお、本実施例装置(1)は、キャリアー(6
)をその公転経路上の定位置で停止させる構成となされ
ているので、図示のようにキャリアー(6)の停止位置
に対応する所定長さ部分においてのみこのキャリアー受
け(13)を設けたものとしているが、太陽歯車(4)
側のキャリアー受け(12)と同様に、内歯歯車(5)
の全周に亘って設けるものとしてもよい。
On the other hand, the carrier receiver (13) on the internal gear (5) side
is formed by a member having a predetermined length and a cross-section shaped like a letter, which is gently curved along the circumferential direction of the internal gear (5).
The rising bent portion (13a) is connected to the internal gear (5).
) with the horizontal side facing the lower side of the teeth of the internal gear (5).
With the horizontal part facing the lower surface of the internal gear (5)
By fixing to the bottom surface of the internal gear (5
) is attached to. The height of the upper edge of this bent portion (13a) is equal to the height of the carrier receiver (12) on the sun gear (4) side.
The height is set to be the same as the upper edge height of the bent portion (12a). Note that the device (1) of this embodiment has a carrier (6
) is configured to stop at a fixed position on its revolving path, so it is assumed that this carrier receiver (13) is provided only in a predetermined length portion corresponding to the stop position of the carrier (6) as shown in the figure. There is a sun gear (4)
Similar to the side carrier receiver (12), the internal gear (5)
It may be provided over the entire circumference.

一方、目立て部材(7)は、上下両定盤(2)(3)の
側方位置に配置され、シリンダー装置により該側方位置
から上下両定盤(2)(’3)ひいては上下の砥石(8
)(9)の回転中心部に向けて半径線方向に水平進退作
動されるものとなされている。
On the other hand, the sharpening member (7) is placed at a side position of both the upper and lower surface plates (2) and (3), and is moved from the side position by a cylinder device to both the upper and lower surface plates (2) ('3) and also to the upper and lower grindstones. (8
) (9) It is designed to move horizontally forward and backward in the radial direction toward the center of rotation.

この目立て部材(7)は、エアーシリンダーのシリンダ
ーロッド(15)の先端に取り付けらたバイト保持用ブ
ロック(1B)と、該ブロック(16)に上下方向に向
けられて上下突出状態に取り付けられた目立て用バイト
(14)によるものである。
This sharpening member (7) is attached to a cutting tool holding block (1B) attached to the tip of the cylinder rod (15) of the air cylinder, and to the block (16) so as to project upwardly and downwardly. This is due to the sharpening tool (14).

次に、上記研磨装置(1)の作動を装置の制御方法と併
せて説明する。
Next, the operation of the polishing apparatus (1) will be explained together with a method of controlling the apparatus.

まず、第5図に示されるように、下方の第1基準位置h
Ω1で待機されている下部定盤(2)が、その砥石(8
)の上面を太陽、内歯の両歯車(4)(5)間の環状ス
ペース内のワーク加工位置hΩaに位置させるように距
離hρWだけ上昇作゛動される。その状態で、ワークキ
ャリアー(6)が、太陽歯車(4)と内歯歯車(5)と
の間の周方向所定の位置、即ち内歯歯車(5)側のキャ
リアー受け(13)の配置位置に対応する位置に、所定
の方向に向けられて噛合状態に配置される。
First, as shown in FIG.
The lower surface plate (2) waiting at Ω1 is
) is moved upward by a distance hρW so that the upper surface of the workpiece is located at the workpiece machining position hΩa within the annular space between the sun and internal gears (4) and (5). In this state, the work carrier (6) is positioned at a predetermined position in the circumferential direction between the sun gear (4) and the internal gear (5), that is, at the arrangement position of the carrier receiver (13) on the internal gear (5) side. They are arranged in a meshed position at a position corresponding to a predetermined direction.

そして、パターン化された動作を行う図示しないワーク
ローデング装置が作動され、磁気ディスク用基板(A)
がキャリアー(6)のワーク保持部(lO)に配置され
る。
Then, a workload loading device (not shown) that performs a patterned operation is activated, and the magnetic disk substrate (A) is
is placed in the work holding part (lO) of the carrier (6).

基板配置完了後、上方の第1基準位置hu1で待機され
ていた上部定盤(3)がその砥石(9)の下面をワーク
加工位置huaに位置させるように距離huwだけ下降
作動され、かつ図示しない加圧装置により基板(A)が
上下の砥石(8)(9)で加圧状態にされる。
After the board placement is completed, the upper surface plate (3), which was waiting at the first reference position hu1 above, is lowered by a distance huw so that the lower surface of its grindstone (9) is positioned at the workpiece processing position hua, and The substrate (A) is pressurized by the upper and lower grindstones (8) and (9) using a pressurizing device.

そして、その状態で太陽歯車(4)が回転駆動されるこ
とによりキャリアー(6)が自転・公転され、また同時
に上下の定盤(2)(3)も回転駆動されて、磁気ディ
スク用基板(A)が上下の砥石(8)(9)に対して摺
動されて研磨される。そして、太陽歯車(4)は、予め
入力されていた回数(4の整数倍数回)回転作動された
時点で停止される。その停止状態で、キャリアー(6)
は太陽歯車(4)の回転開始時点における位置、即ち内
歯歯車(5)側のキャリアー受け(I3)の配置位置に
対応する位置に復帰した状態となっており、かつワーク
保持孔(60)の周方向位置も回転開始時の位置に復帰
した状態となっている。
In this state, the sun gear (4) is rotationally driven to rotate and revolve the carrier (6), and at the same time, the upper and lower surface plates (2) and (3) are also rotationally driven to rotate the magnetic disk substrate ( A) is polished by sliding it against the upper and lower grindstones (8) and (9). Then, the sun gear (4) is stopped when it has been rotated a pre-input number of times (an integral multiple of 4). In its stopped state, the carrier (6)
has returned to the position at the start of rotation of the sun gear (4), that is, the position corresponding to the arrangement position of the carrier receiver (I3) on the internal gear (5) side, and the work holding hole (60) The position in the circumferential direction has also returned to the position at the start of rotation.

そして、上部定盤(3)が第1基準位置hu1に上昇作
動され、キャリアー(6)の保持孔(10)内の基板(
A)が、パターン動作を行う図示しないワークアンロー
デング装置によって取り出される。
Then, the upper surface plate (3) is moved upward to the first reference position hu1, and the substrate (
A) is taken out by a work unloading device (not shown) that performs a pattern operation.

その後、前記ワークローデング装置が再び作動され、磁
気ディスク用基板(A)がキャリアー(6)のワーク保
持孔(10)内に配置され、上部定盤(3)が第1基準
位置hu1から同じく距離huwだけ下降作動され、太
陽歯車(4)が回転駆動されるという上記同様の動作が
行われて、基板(A)の研磨加工が繰り返される。
Thereafter, the work loading device is operated again, the magnetic disk substrate (A) is placed in the work holding hole (10) of the carrier (6), and the upper surface plate (3) is moved at the same distance from the first reference position hu1. The same operation as above is performed in which the sun gear (4) is lowered by huw and driven to rotate, and the polishing process of the substrate (A) is repeated.

そして、この研磨加工を繰返し行っていくうち、上下の
砥石(8)(9)に目つまり、目つぶれを生じて砥石(
8)に目立てを行う必要を生じた場合には、上下の定盤
(2)(3)に次のような高さ制御がなされる。
As this polishing process is repeated, the upper and lower whetstones (8) and (9) become clogged and clogged.
When it becomes necessary to sharpen 8), the following height control is performed on the upper and lower surface plates (2) and (3).

即ち、上部定盤(3)が第1基準位置hu1に上昇復帰
されかつ基板(A)が装置(1)から取り出された状態
において、下部定盤(2)が、研磨加工位置hQaから
目立て処理位置hρbのα(αニドレス厚さ)だけ上方
の位置に移行される。また、上部定盤(3)が下降作動
されて、その砥石(9)の下面が目立て処理位置hub
のα(αニドレス厚さ)だけ下方の位置に移行される。
That is, in a state where the upper surface plate (3) is raised back to the first reference position hu1 and the substrate (A) is taken out from the apparatus (1), the lower surface plate (2) is moved from the polishing position hQa to the polishing process. It is moved to a position above the position hρb by α (α width thickness). Also, the upper surface plate (3) is lowered and the lower surface of the grindstone (9) is placed at the sharpening processing position hub.
is moved to a lower position by α (α Nidress thickness).

なお、その状態では、ワークキャリアー(6)は予め目
立て部材(7)の進退移動経路上に位置しないような状
態で停止されている。そしてその状態において、上下の
定盤(2)(3)が回転駆動され、目立て部材(7)が
定盤(2)(3)の側方位置から定盤の回転中心部に向
けて径方向内方に水平に進出作動され、バイト(14)
が砥石(8)(9)の内周端部に達したところで今度は
砥石(8)(9)の外周端部側に向けて径方向外方に水
平に退出作動されて、両砥石(8)(9)の目立てがな
される。
In this state, the work carrier (6) is previously stopped in such a manner that it is not located on the advancing/retreating path of the dressing member (7). In this state, the upper and lower surface plates (2) and (3) are driven to rotate, and the dressing member (7) is radially moved from the lateral position of the surface plates (2) and (3) toward the center of rotation of the surface plates. Moves inward horizontally and bites (14)
When the wheels (8) and (9) reach the inner circumferential ends of the grinding wheels (8) and (9), they are moved horizontally outward in the radial direction toward the outer circumferential ends of the grinding wheels (8) and (9). ) (9) is finished.

そして、目立て後、下部定盤(2)が下降されて第2基
準位置hΩ2に位置されると共に、上部定盤(3)が上
昇されて第2基準位置hu2に位置される。これらの第
2基準位置hΩ2、hu2は、下部定盤(2)及び上部
定盤(3)が第1基準位置hΩ1、hu2に位置してい
たときの目立て処理前の砥石(8)(9)の両対向面の
高さ位置hΩo、hugに目立て後の砥石の両対向面が
位置するような高さ位置に設定される。そして、下部定
盤(2)がその第2基準位置hΩ2から前記と同じく距
離hΩWだけ上昇されて砥石(8)の上面がワーク加工
位置hflaに位置され、かつ基板配置後上部定盤(3
)が第2基準位置hu2から前記と同じく距離huwだ
け下降されて砥石(9)の下面がワーク加工位置hua
に位置されて、基板(A)の研磨加工が再開される。
After sharpening, the lower surface plate (2) is lowered and positioned at the second reference position hΩ2, and the upper surface plate (3) is raised and positioned at the second reference position hu2. These second reference positions hΩ2 and hu2 are the grindstones (8) and (9) before the sharpening process when the lower surface plate (2) and the upper surface plate (3) are located at the first reference positions hΩ1 and hu2. The height position hΩo of both opposing surfaces of the grindstone is set at a height such that both opposing surfaces of the grindstone after sharpening are located at hug. Then, the lower surface plate (2) is raised from its second reference position hΩ2 by a distance hΩW in the same manner as described above, the upper surface of the grinding wheel (8) is positioned at the workpiece processing position hfla, and after placing the substrate, the upper surface plate (3)
) is lowered from the second reference position hu2 by the distance huw in the same manner as above, and the lower surface of the grinding wheel (9) is at the workpiece processing position hua.
The polishing process of the substrate (A) is restarted.

そして、上記のように目立て後に下部定盤(2)が目立
て処理位置hρbから第2基準位置hΩ2に下降されて
いく過程で、砥石(8)の上面に載置状態にあるキャリ
アー(6)がその周縁部においてキャリアー受け(12
)  (13)の屈曲部(12a )  (13a )
の上縁部に当接しこれに支承される。支承後は、第3図
及び第4図に示されるように、キャリアー(6)は太陽
、内歯の両歯車(4)(5)との噛台状懇において該受
け(12)  (13)に保持され、下部定盤(2)だ
けが下方に移行していく。
Then, in the process of lowering the lower surface plate (2) from the sharpening processing position hρb to the second reference position hΩ2 after sharpening as described above, the carrier (6) placed on the upper surface of the grinding wheel (8) The carrier receiver (12
) (13) bent portions (12a) (13a)
Abuts against and is supported by the upper edge of. After bearing, as shown in FIGS. 3 and 4, the carrier (6) is in contact with the sun and internal toothed gears (4) and (5) in the form of a rest, and the receivers (12) (13) , and only the lower surface plate (2) moves downward.

そして、前述のように、下部定盤(2)が第2基準位置
hΩ2に達し、そこから、距離hρWだけ上昇されてい
く過程において、その砥石(8)の上面がキャリアー受
け(12)  (13)の屈曲部(12a )  (1
3a )の上縁部位置を越えて上方に移行するようにな
ると、キャリアー(6)は、該砥石(8)の上面で支承
され、キ・ヤリアー受け(12)  (L()から離間
される。
Then, as described above, while the lower surface plate (2) reaches the second reference position hΩ2 and is raised by the distance hρW from there, the upper surface of the grinding wheel (8) is placed on the carrier receiver (12) (13 ) bending part (12a) (1
3a), the carrier (6) is supported on the upper surface of the grinding wheel (8) and is spaced apart from the carrier receiver (12) (L()). .

このように、本発明によれば、下部定盤(2)の砥石(
8)が、太陽、内歯の両歯車(4)(5)間のスペース
内の位置と該スペースの下方位置との間で昇降作動され
る場合でも、キャリアー(6)を太陽、内歯の両歯車(
4)(5)に常時噛合させた状態に保持することができ
、下部定盤(2)の昇降作動に伴う作業者によるキャリ
アー(6)の取外し、取付は作業を不要なものにし、研
磨加工の自動化に寄与することができる。
As described above, according to the present invention, the grinding wheel (
Even if the carrier (6) is moved up and down between the position in the space between the sun and internal tooth gears (4) and (5) and the position below the space, the carrier (6) Both gears (
4) The carrier (6) can be kept in a state of engagement with (5) at all times, eliminating the need for the operator to remove and install the carrier (6) as the lower surface plate (2) moves up and down, and polishing. can contribute to automation.

また、上記実施例のように、本発明を、キャリアー(6
)のワーク保持部(10)を定位置で停止させる構成、
即ち太陽歯車(4)、内歯歯車(5)及びキャリアー(
6)相互の歯数比を特定の比率に設定し、かつ太陽歯車
(4)の回転回数を所定の態様に制御した構成の研磨装
置に適用することにより、キャリアー(6)の取外し、
取付けに伴う太陽歯車(4)、内歯歯車(5)及びキャ
リアー(6)相互間の噛合位置関係の狂いの発生を回避
でき、そのため下部定盤(2)の上記昇降作動の前後に
おいてキャリアー(6)の保持部(10)の位置に誤差
を生じるのを防止できて、基板(A)のローディング、
アンローディングの自動化を更に効果的に達成すること
ができる。
Further, as in the above embodiment, the present invention can be carried out using a carrier (6
) configuration for stopping the workpiece holding part (10) at a fixed position;
That is, the sun gear (4), the internal gear (5) and the carrier (
6) Removal of the carrier (6) by applying it to a polishing device configured to set the mutual tooth number ratio to a specific ratio and control the number of rotations of the sun gear (4) in a predetermined manner;
It is possible to avoid misalignment of the meshing positional relationship between the sun gear (4), internal gear (5), and carrier (6) due to installation, and therefore, the carrier ( 6) It is possible to prevent errors in the position of the holding part (10), and the loading of the substrate (A),
Automation of unloading can be achieved more effectively.

なお、キャリアー受けとしては、上記実施例装置におけ
るものの他、第6図(イ)(ロ)に示されるように、太
陽、内歯の両歯車(4)(5)の歯部間に、キャリアー
受は用のピン(20)を複数個、周方向に列状に植設し
、該ピン(20)の上縁部にてキャリアー(6)の周縁
部下面を支承しうるように構成したものが採用されても
よい。
In addition to the carrier receiver in the above-mentioned embodiment, as shown in FIGS. The support is constructed by installing a plurality of pins (20) in a row in the circumferential direction so that the upper edge of the pins (20) can support the lower surface of the circumference of the carrier (6). may be adopted.

また、この発明の研磨装置における研磨加工部材の昇降
作動は、上記実施例における下部定盤(2)の昇降作動
目的、即ち、砥石(8)の目立てに伴う下部定盤(2)
の高さ位置の調整を目的とするものでなくとも、例えば
砥石の交換等の目的においてなされる場合をも含む。即
ち、本発明は、何等かの理由において下部定盤が昇降作
動されるように構成されている研磨装置に広く適用され
るものである。
In addition, the raising and lowering operation of the polishing member in the polishing apparatus of the present invention is for the purpose of raising and lowering the lower surface plate (2) in the above embodiment, that is, the lifting operation of the lower surface plate (2) in conjunction with sharpening of the grindstone (8).
Even if the purpose is not to adjust the height position of the grinding wheel, it also includes cases where it is done for the purpose of replacing the grindstone, for example. That is, the present invention is widely applicable to polishing apparatuses in which the lower surface plate is moved up and down for some reason.

発明の効果 上述の次第で、この発明の研磨装置は、太陽歯車及び内
歯歯車のそれぞれに、研磨加工部材が太陽、内歯の両歯
車間の環状スペースの下方位置に移行された際にキャリ
アーを太陽、内歯の両歯車に噛合させた状態で下方から
受けるキャリアー受けが、前記研磨加工部材の昇降を妨
げない態様において前記スペース側に突出した状態に設
けられているから、研磨加工部材が、前記スペース内の
位置と該スペースの下方位置との間で昇降作動される場
合でもキャリアーを太陽、内歯の両歯車に常時噛合させ
た状態に保持することができ、従って作業者1こ負担を
かけることなく研磨加工部材に昇降作動を行わせること
ができる。特に研磨加工の自動化を図ろうとする場合に
それに大きく貢献することができる。
Effects of the Invention As described above, the polishing device of the present invention provides a carrier for each of the sun gear and the internal gear when the polished member is moved to a position below the annular space between the sun gear and the internal gear. The carrier receiver, which receives the sun and internal gears from below in a state in which it is meshed with both internal gears, is provided in a state that protrudes toward the space side in a manner that does not prevent the polishing member from moving up and down. Even when the carrier is moved up and down between a position within the space and a position below the space, the carrier can be maintained in a state in which both the sun gear and the internal gear are always meshed, so that the burden on one worker is reduced. The polishing member can be moved up and down without applying stress. In particular, it can greatly contribute to the automation of polishing processes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第5図はこの発明の研磨装置の一実施例を
示すもので、第1図は研磨装置の垂直断面図、第2図は
第1図の■−■線矢視図、第3図はキャリアーがキャリ
アー受けに支承された状態を示す研磨装置の垂直断面図
、第4図は同状態を拡大して示す斜視図、第5図は上下
定盤の昇降作動態様を説明する装置の垂直断面図である
。第6図はこの発明の他の実施例を示すもので、同図(
イ)は装置の要部垂直断面図同図(ロ)は図(イ)のV
l−VI線矢視図である。 第7図は従来の研磨装置を示す斜視図である。 (4)・・・太陽歯車、(5)・・・内歯歯車、(6)
・・・ワークキャリアー (8)・・・砥石(研磨加工
部材)、(1)・・・研磨装置、(12)  (13)
  (20)・・・キャリアー受け、(A)・・・磁気
ディスク用アルミニウム基板(ワーク)。 以上 第1 図 第2図 第5図
1 to 5 show an embodiment of the polishing apparatus of the present invention. FIG. 1 is a vertical sectional view of the polishing apparatus, FIG. 2 is a view taken along the line ■-■ in FIG. Figure 3 is a vertical sectional view of the polishing device showing a state in which the carrier is supported by a carrier holder, Figure 4 is an enlarged perspective view of the same state, and Figure 5 is a device explaining the lifting and lowering operation of the upper and lower surface plates. FIG. FIG. 6 shows another embodiment of the present invention.
A) is a vertical cross-sectional view of the main part of the device.
It is a view taken along the line l-VI. FIG. 7 is a perspective view showing a conventional polishing device. (4)...Sun gear, (5)...Internal gear, (6)
... Work carrier (8) ... Grindstone (polishing processing member), (1) ... Polishing device, (12) (13)
(20)...Carrier holder, (A)...Aluminum substrate for magnetic disk (work). Above Figure 1 Figure 2 Figure 5

Claims (1)

【特許請求の範囲】[Claims] 太陽歯車の同心外方部に環状のスペースをおいて内歯歯
車が配置されると共に、該環状スペース内に太陽、内歯
の両歯車と噛合状態に外歯歯車状のワークキャリアーが
配置され、かつ前記環状スペース内の位置と該スペース
の下方位置との間で昇降される砥石等による環盤状の研
磨加工部材が具備された研磨装置であって、前記太陽歯
車及び内歯歯車のそれぞれに、前記研磨加工部材が前記
環状スペースの下方位置に移行された際にキャリアーを
太陽、内歯の両歯車に噛合させた状態で下方から受ける
キャリアー受けが、前記研磨加工部材の昇降を妨げない
態様において前記スペース側に突出した状態に設けられ
てなることを特徴とする研磨装置。
An internal gear is disposed at a concentric outer portion of the sun gear with an annular space therebetween, and an external gear-shaped work carrier is disposed within the annular space in mesh with both the sun and internal gears, and a polishing device equipped with an annular polishing member using a grindstone or the like that is raised and lowered between a position within the annular space and a position below the space, the polishing device comprising: , when the polishing member is moved to the lower position of the annular space, the carrier receiver receives the carrier from below with the carrier meshed with both the sun and internal gears, and does not prevent the polishing member from moving up and down. A polishing device, characterized in that the polishing device is provided in a state protruding toward the space side.
JP2127851A 1990-05-16 1990-05-16 Polishing device Pending JPH0425376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2127851A JPH0425376A (en) 1990-05-16 1990-05-16 Polishing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2127851A JPH0425376A (en) 1990-05-16 1990-05-16 Polishing device

Publications (1)

Publication Number Publication Date
JPH0425376A true JPH0425376A (en) 1992-01-29

Family

ID=14970239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2127851A Pending JPH0425376A (en) 1990-05-16 1990-05-16 Polishing device

Country Status (1)

Country Link
JP (1) JPH0425376A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014103985A1 (en) * 2012-12-28 2014-07-03 Hoya株式会社 Glass substrate for use in information recording medium, and manufacturing method and manufacturing device of glass substrate for use in information recording medium
US10300390B2 (en) 2016-04-01 2019-05-28 Activision Publishing, Inc. System and method of automatically annotating gameplay of a video game based on triggering events

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642861A (en) * 1987-03-30 1989-01-06 Hoya Corp Polishing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642861A (en) * 1987-03-30 1989-01-06 Hoya Corp Polishing device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014103985A1 (en) * 2012-12-28 2014-07-03 Hoya株式会社 Glass substrate for use in information recording medium, and manufacturing method and manufacturing device of glass substrate for use in information recording medium
JP5960288B2 (en) * 2012-12-28 2016-08-02 Hoya株式会社 Method and apparatus for manufacturing glass substrate for information recording medium, and carrier
US10300390B2 (en) 2016-04-01 2019-05-28 Activision Publishing, Inc. System and method of automatically annotating gameplay of a video game based on triggering events

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