JP2007130690A - Carrier for planetary gear type polishing device - Google Patents

Carrier for planetary gear type polishing device Download PDF

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Publication number
JP2007130690A
JP2007130690A JP2005322980A JP2005322980A JP2007130690A JP 2007130690 A JP2007130690 A JP 2007130690A JP 2005322980 A JP2005322980 A JP 2005322980A JP 2005322980 A JP2005322980 A JP 2005322980A JP 2007130690 A JP2007130690 A JP 2007130690A
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carrier
workpiece
work
polishing
holding hole
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JP2005322980A
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Japanese (ja)
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Kazuhiko Toyoda
和彦 豊田
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Hamai Co Ltd
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Hamai Co Ltd
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Priority to JP2005322980A priority Critical patent/JP2007130690A/en
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To improve stable working accuracy by preventing cracks and breaks of a work 15 occurring in the process of polishing the square work 15 in a planetary gear type polishing device. <P>SOLUTION: In this carrier, in order to polish a thinner work 15 while preventing cracks and breaks of the work 15 due to deformation of machining surfaces of an upper plate and a lower plate 11 occurring in the process of polishing, the shape of a work holding hole 16 of the carrier 14 is such that in the process of polishing, the work 15 draws a locus of a character 8-shaped to the upper plate 10 and the lower plate 11 by rotation and revolving motion of the carrier 14, whereby the shape of the work holding hole 16 is thus added to make the machined work 15 have higher accuracy and decrease cracks and breaks. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、水晶、シリコン、ガラス、金属その他種々の材料の表面を両面同時に研磨加工を行う研磨装置のキャリヤに関する。   The present invention relates to a carrier for a polishing apparatus for simultaneously polishing both surfaces of quartz, silicon, glass, metal and other various materials.

従来よりシリコンウエハ、水晶及びガラス基板等を研磨する装置での研磨方法によれば、定盤と言われる上下プレートと中心歯車及び内歯車を備え、該ラッププレートの上に載置され、該両歯車に噛み合わされたキャリヤと言われる被加工物を保持する歯車を上プレートとで把持し、自転しつつ公転する遊星運動をさせ被加工物の上下面を研磨加工する。   Conventionally, according to a polishing method in an apparatus for polishing a silicon wafer, a crystal, a glass substrate, and the like, an upper and lower plate called a surface plate, a central gear and an internal gear are provided and placed on the lap plate. A gear holding a workpiece called a carrier meshed with the gear is held by the upper plate, and the upper and lower surfaces of the workpiece are polished by causing planetary motion to revolve while rotating.

加工作業開始時は、被加工物であるワークをキャリヤに取り付ける為に上プレートの上方に設置された上プレート昇降装置により上方に移動させキャリヤにワークをセットする。セットが終わると上プレートを下降させ下プレートの上に載置されたキャリヤに保持されたワークの上に積載しワークを押圧し、研磨剤を供給しながら上下のプレートの全面を被加工物であるワークが相対的に運動するように予め設定されたプログラムにより内歯車と中心歯車の回転及び上プレートと下プレート回転又は上プレートと下プレートの何れかを回転させる。上下プレート把持されたキャリヤに保持されたワークは、上プレートの荷重調整機構により押圧され、研磨剤を供給しつつキャリヤに自転及び公転を与えるために該内歯車と該中心歯車との適切な回転比を選択し、ワークの加工面を研磨加工していた。   At the start of the machining operation, in order to attach the workpiece, which is a workpiece, to the carrier, the workpiece is set on the carrier by being moved upward by the upper plate lifting device installed above the upper plate. When the setting is finished, the upper plate is lowered, loaded onto the work held by the carrier placed on the lower plate, pressed against the work, and while supplying the abrasive, the entire upper and lower plates are covered with the workpiece. The internal gear and the central gear are rotated and the upper plate and the lower plate are rotated or the upper plate and the lower plate are rotated by a program set in advance so that a certain workpiece moves relatively. The work held by the carrier gripped by the upper and lower plates is pressed by the load adjustment mechanism of the upper plate, and appropriate rotation of the internal gear and the central gear in order to rotate and revolve the carrier while supplying abrasive. The ratio was selected and the work surface of the workpiece was polished.

この研磨装置に使われるワークを保持するキャリヤのワーク保持孔は、ワーク寸法にプラス公差を付加した形状としていた。したがって、ワークが円形の場合は、保持孔は円形とし、矩形の場合は矩形とすることが原則であった。   The workpiece holding hole of the carrier for holding the workpiece used in this polishing apparatus has a shape with a plus tolerance added to the workpiece dimension. Therefore, in principle, when the workpiece is circular, the holding hole is circular, and when it is rectangular, the holding hole is rectangular.

ワークが四辺形の場合、従来からのキャリヤの孔形状は、ワークと同じ四辺形としていた。この従来からの孔形状では、ワークがキャリヤ内に固定させるため、研磨加工後の厚みバラツキの減少が少なく、再度の加工による厚みの修正を行なわなくてはならないという課題があった。   When the workpiece is a quadrilateral, the conventional hole shape of the carrier is the same quadrilateral as the workpiece. In this conventional hole shape, since the work is fixed in the carrier, there is little decrease in thickness variation after the polishing process, and there is a problem that the thickness must be corrected by re-working.

課題を解決する手段として、円形状のワークを保持するキャリヤのワーク保持孔は、ワーク寸法にプラス公差を付加し、研磨加工中のワークがキャリヤの保持孔内で自転及び公転運動に更に付加された第3の運動である回転運動が付加されるため、運動奇跡が複雑になり、良好の結果が得られる。   As a means for solving the problem, the workpiece holding hole of the carrier that holds the circular workpiece adds a plus tolerance to the workpiece dimension, and the workpiece being polished is further added to the rotation and revolution motion in the holding hole of the carrier. In addition, since the rotational motion which is the third motion is added, the motion miracle becomes complicated and good results are obtained.

しかし、四辺形のワークでは、キャリヤのワーク保持孔の形状を従来のワーク寸法にプラス公差を付加した形状のみとするため、プレート研磨面に描く運動軌跡が限定されるので、加工後のより高い精度を望むことは、困難であった。   However, in the case of a quadrilateral workpiece, the shape of the workpiece holding hole of the carrier is limited to a shape obtained by adding a plus tolerance to the conventional workpiece dimensions, so the movement trajectory drawn on the plate polishing surface is limited, which is higher than after processing It was difficult to desire accuracy.

上記のような問題を解決しるためには、ワークをキャリヤのワーク保持孔内でより複雑な動きを付与又は供与するようにしなくてはならない。   In order to solve the above problems, the work must be imparted or provided with a more complex movement within the work holding hole of the carrier.

本発明は、上述した課題を解決するためになされたもので、四辺形のワークを保持するキャリヤのワーク保持孔の形状を従来のワーク寸法にプラス公差を付加し各辺でワークを保持する形状より各辺の直交する部分に逃げを与える形状としたため、研磨加工中のワークがキャリヤ保持孔内で自転及び公転運動に付加された第3の運動を供与されるため、上下プレートに描く運動軌跡が複雑になり良好の結果が得られた。   The present invention has been made to solve the above-described problems. The shape of the workpiece holding hole of the carrier holding the quadrilateral workpiece is added to the conventional workpiece dimensions by adding a plus tolerance, and the workpiece is held at each side. Since the shape that gives more relief to the orthogonal parts of each side is provided, the work being polished is given a third movement added to the rotation and revolution movement in the carrier holding hole, so the movement locus drawn on the upper and lower plates Became complicated and good results were obtained.

研磨装置でワークを保持し各辺の直交する部分に逃げを与えることにより、研磨加工中にワークがキャリヤ保持孔内で自転及び公転運動に付加された第3の運動を供与されるため、上下プレートに描く運動軌跡がさらに複雑となり、加工後の割れカケが減少し精度の向上がはかられ良好の結果が得られた。   By holding the workpiece with the polishing apparatus and giving relief to the orthogonal parts of each side, the workpiece is given a third movement in addition to the rotation and revolution movement in the carrier holding hole during the polishing process. The movement trajectory drawn on the plate became more complicated, cracking after processing was reduced, accuracy was improved, and good results were obtained.

なお、ワークを保持するキャリヤ保持孔の保持位置は、ワーク各辺の中央部分とし他は逃げ部分とし、加工後の高精度平面を維持する方法とする。   In addition, the holding position of the carrier holding hole for holding the workpiece is a central portion of each side of the workpiece, and the others are escape portions, and a method of maintaining a high-accuracy plane after processing is adopted.

課題を解決する手段として、四辺形のワークを保持するキャリヤのワーク保持孔の形状を従来のワーク寸法にプラス公差を付加し各辺の全辺でワークを保持する形状に変えて、各辺中央位置でワークを保持する形状としたため、研磨加工中のワークがキャリヤ保持孔内で自転及び公転運動に付加された第3の運動を供与されるため、上下プレートに描く運動奇跡がより複雑になり良好の結果が得られた。   As a means to solve the problem, the shape of the workpiece holding hole of the carrier that holds the quadrilateral workpiece is changed to the shape of holding the workpiece on all sides of each side by adding a plus tolerance to the conventional workpiece dimensions, and the center of each side Since the workpiece is held in position, the workpiece being polished is given a third movement added to the rotation and revolution movement in the carrier holding hole, so the movement miracle drawn on the upper and lower plates becomes more complicated. Good results were obtained.

本発明の四辺形のワークを高精度に加工するキャリヤのワーク保持孔の形状は、前記で述べたように各辺中央位置でワークを保持する形状とするため、研磨加工中のワークがキャリヤ保持孔内で自転及び公転運動に付加された第3の運動を供与されるため、上下プレートに描く運動軌跡がより複雑になりプレートの平面を維持できるためワークの平面を高精度に加工できる。   Since the shape of the workpiece holding hole of the carrier for processing the quadrilateral workpiece of the present invention with high accuracy is the shape that holds the workpiece at the center position of each side as described above, the workpiece being polished is held by the carrier. Since the third movement added to the rotation and revolution movements in the hole is provided, the movement trajectory drawn on the upper and lower plates becomes more complicated, and the plane of the plate can be maintained, so that the plane of the workpiece can be processed with high accuracy.

以下、本発明に係るキャリヤについて図面を参照しながら説明する。   Hereinafter, the carrier according to the present invention will be described with reference to the drawings.

図1は、上記で述べた遊星歯車式研磨装置に使われる本発明のキャリヤ平面図であり、ワーク保持孔にワークを保持した状態である。   FIG. 1 is a plan view of the carrier of the present invention used in the planetary gear type polishing apparatus described above, and shows a state in which a workpiece is held in a workpiece holding hole.

図2は、本発明のキャリヤを使用した遊星歯車式研磨装置の実施形態を示す装置断面図であり、11は下プレートであり、上方に位置する上プレート10は省略されている。そして上下プレートに把持されたワーク15を保持する研磨加工治具である14はキャリヤであり、ワーク15を保持しつつ、中心歯車13及び内歯車12とそれぞれ噛み合い回転する。   FIG. 2 is an apparatus cross-sectional view showing an embodiment of a planetary gear type polishing apparatus using the carrier of the present invention, in which 11 is a lower plate, and an upper plate 10 located above is omitted. A polishing jig 14 for holding the workpiece 15 held by the upper and lower plates is a carrier, which rotates while meshing with the central gear 13 and the internal gear 12 while holding the workpiece 15.

加工開始と共にワーク15には研磨剤が供与され、各軸は駆動を開始する。上下プレート10及11に把持されたワーク15は、上下プレート10及び11の加工面の凹凸とワーク15の被加工面の摩擦抵抗が大きくなった時には、キャリヤのワーク保持孔16内でワーク15が摩擦抵抗を減少する方向に微少に動き割れやカケを防ぐ。この摩擦抵抗を排除する動きが、ワーク15の割れカケ及び加工後の精度に重要な要素となってくる。   Along with the start of processing, the workpiece 15 is supplied with an abrasive, and each axis starts driving. When the workpiece 15 held by the upper and lower plates 10 and 11 has increased frictional resistance between the processed surfaces of the upper and lower plates 10 and 11 and the processed surface of the workpiece 15, the workpiece 15 is placed in the workpiece holding hole 16 of the carrier. Slightly moves in the direction of decreasing frictional resistance to prevent cracking and chipping. The movement that eliminates this frictional resistance becomes an important factor for cracking of the workpiece 15 and accuracy after processing.

図3は、二重キャリヤ式と称呼されている従来からの加工方法による四辺形ワーク対応のキャリヤ14である。この方法は、研磨加工中に発生する摩擦抵抗を減少させるためにワーク15が360度回転する事が出来るが、薄いワークの研磨加工には適さない。この二重キャリヤと呼ばれる方式は、薄いワーク15では、ホルダ17も薄くしなくてはならず、加工中にキャリヤ14よりホルダ17が外れ、またワーク15も外れてしまうことが多いからである。   FIG. 3 shows a carrier 14 corresponding to a quadrilateral workpiece according to a conventional processing method called a double carrier type. This method can rotate the work 15 360 degrees in order to reduce the frictional resistance generated during the polishing process, but is not suitable for polishing a thin work. This method called a double carrier is because the holder 17 must be made thinner in the thin work 15, and the holder 17 comes off from the carrier 14 during processing, and the work 15 often comes off.

図4は、従来から使われているワークキャリヤ14である。ワーク15寸法にプラスする公差の穴をワーク保持孔とし、割れカケ防止と言うことで公差を小さくする。   FIG. 4 shows a work carrier 14 conventionally used. The tolerance hole which is added to the dimension of the workpiece 15 is used as a workpiece holding hole, and the tolerance is reduced by preventing cracking.

本発明によるキャリヤがワークを保持した平面図である。It is the top view in which the carrier by the present invention held the work. 本発明による実施例1での遊星歯車式研磨装置に使われるキャリヤの実施形態を示す装置要部平面図である。It is an apparatus principal part top view which shows embodiment of the carrier used for the planetary gear type grinding | polishing apparatus in Example 1 by this invention. 従来から使われている四辺形ワーク対応の2重式キャリヤ平面図である。It is a double type carrier top view corresponding to the quadrilateral work conventionally used. 従来から使われている四辺形ワーク対応のキャリヤ平面図である。It is a carrier top view corresponding to the quadrilateral work conventionally used.

符号の説明Explanation of symbols

10 上プレート
11 下プレート
12 内歯車
13 中心歯車
14 キャリヤ
15 ワーク
16 ワーク保持孔
17 ホルダ
10 Upper plate
11 Lower plate
12 Internal gear
13 Central gear
14 Carrier
15 work
16 Workpiece holding hole
17 Holder

Claims (1)

水平面内に組み込まれた中心歯車と内歯車との間に、被加工物を保持する複数個のキャリヤを等間隔に配置させて被加工物であるワークを挿入した後、上ラッププレートを下降させて下ラッププレートとで挟み込んだ状態で、研磨剤を供給しつつワークキャリヤを自転及び公転させる遊星運動と上下ラッププレートの相対的な回転運動を同時に行う研磨装置において、研磨加工中に四角のワークが、上下ラッププレートへの軌跡が8の字を描く形状としたワーク孔を保持した遊星歯式研磨装置用キャリヤ。
A plurality of carriers holding the workpiece are arranged at equal intervals between the central gear and the internal gear incorporated in the horizontal plane, and the workpiece, which is the workpiece, is inserted, and then the upper lap plate is lowered. In a polishing machine that simultaneously performs a planetary movement that rotates and revolves the work carrier while supplying the abrasive while being sandwiched between the lower lap plate and a relative rotational movement of the upper and lower lap plates, However, the carrier for the planetary-type polishing apparatus holding the work hole having a shape in which the locus to the upper and lower lap plates draws a figure of 8.
JP2005322980A 2005-11-08 2005-11-08 Carrier for planetary gear type polishing device Pending JP2007130690A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194631A (en) * 2008-02-14 2009-08-27 Seiko Instruments Inc Wafer, wafer polishing device, method of polishing wafer, method of manufacturing piezoelectric vibrator, piezoelectric vibrator, oscillator, electronic equipment, and radio clock
JP2009190159A (en) * 2008-02-18 2009-08-27 Seiko Instruments Inc Carrier and wafer grinder
CN113183028A (en) * 2021-04-08 2021-07-30 江西钨业控股集团有限公司 Planet disc clamp, process for machining diamond-shaped blade by using planet disc clamp and diamond-shaped blade

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194631A (en) * 2008-02-14 2009-08-27 Seiko Instruments Inc Wafer, wafer polishing device, method of polishing wafer, method of manufacturing piezoelectric vibrator, piezoelectric vibrator, oscillator, electronic equipment, and radio clock
JP2009190159A (en) * 2008-02-18 2009-08-27 Seiko Instruments Inc Carrier and wafer grinder
CN113183028A (en) * 2021-04-08 2021-07-30 江西钨业控股集团有限公司 Planet disc clamp, process for machining diamond-shaped blade by using planet disc clamp and diamond-shaped blade

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