JPH0416780B2 - - Google Patents

Info

Publication number
JPH0416780B2
JPH0416780B2 JP57123051A JP12305182A JPH0416780B2 JP H0416780 B2 JPH0416780 B2 JP H0416780B2 JP 57123051 A JP57123051 A JP 57123051A JP 12305182 A JP12305182 A JP 12305182A JP H0416780 B2 JPH0416780 B2 JP H0416780B2
Authority
JP
Japan
Prior art keywords
layer
mixture
gravure printing
relief
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57123051A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5825636A (ja
Inventor
Rinchi Joon
Erutsuaa Aruberuto
Shetsufueru Geruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS5825636A publication Critical patent/JPS5825636A/ja
Publication of JPH0416780B2 publication Critical patent/JPH0416780B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP57123051A 1981-07-22 1982-07-16 光重合グラビア印刷版の製造方法 Granted JPS5825636A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE31289517 1981-07-22
DE19813128951 DE3128951A1 (de) 1981-07-22 1981-07-22 Verfahren zur herstellung von fotopolymer-tiefdurckformen

Publications (2)

Publication Number Publication Date
JPS5825636A JPS5825636A (ja) 1983-02-15
JPH0416780B2 true JPH0416780B2 (enExample) 1992-03-25

Family

ID=6137478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57123051A Granted JPS5825636A (ja) 1981-07-22 1982-07-16 光重合グラビア印刷版の製造方法

Country Status (5)

Country Link
EP (1) EP0070510B1 (enExample)
JP (1) JPS5825636A (enExample)
CA (1) CA1176896A (enExample)
DE (2) DE3128951A1 (enExample)
DK (1) DK327382A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3736180A1 (de) * 1987-10-26 1989-05-03 Basf Ag Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT293449B (de) * 1965-11-24 1971-10-11 Kalle Ag Verfahren zum Herstellen einer Offsetdruckplatte aus vorsensibilisiertem Druckplattenmaterial
DE1447963B2 (de) * 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4187331A (en) * 1978-08-24 1980-02-05 International Business Machines Corp. Fluorine plasma resist image hardening
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates

Also Published As

Publication number Publication date
EP0070510B1 (de) 1985-10-23
EP0070510A1 (de) 1983-01-26
DE3128951A1 (de) 1983-02-10
DE3267018D1 (en) 1985-11-28
JPS5825636A (ja) 1983-02-15
DK327382A (da) 1983-01-23
CA1176896A (en) 1984-10-30

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