JPH0416106B2 - - Google Patents
Info
- Publication number
- JPH0416106B2 JPH0416106B2 JP60015949A JP1594985A JPH0416106B2 JP H0416106 B2 JPH0416106 B2 JP H0416106B2 JP 60015949 A JP60015949 A JP 60015949A JP 1594985 A JP1594985 A JP 1594985A JP H0416106 B2 JPH0416106 B2 JP H0416106B2
- Authority
- JP
- Japan
- Prior art keywords
- organic film
- resist
- water
- pattern
- contrast
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60015949A JPS61179535A (ja) | 1985-01-30 | 1985-01-30 | パターン形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60015949A JPS61179535A (ja) | 1985-01-30 | 1985-01-30 | パターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61179535A JPS61179535A (ja) | 1986-08-12 |
JPH0416106B2 true JPH0416106B2 (en, 2012) | 1992-03-23 |
Family
ID=11903007
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60015949A Granted JPS61179535A (ja) | 1985-01-30 | 1985-01-30 | パターン形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61179535A (en, 2012) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62133444A (ja) * | 1985-12-04 | 1987-06-16 | Matsushita Electric Ind Co Ltd | パタ−ン形成有機材料 |
JPH06255016A (ja) * | 1993-03-01 | 1994-09-13 | Afuiniteii Kk | 自律応答積層体と製法及びそれを使用した窓 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH061373B2 (ja) * | 1984-05-14 | 1994-01-05 | 株式会社東芝 | パタ−ン形成方法 |
US4663275A (en) * | 1984-09-04 | 1987-05-05 | General Electric Company | Photolithographic method and combination including barrier layer |
-
1985
- 1985-01-30 JP JP60015949A patent/JPS61179535A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61179535A (ja) | 1986-08-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |