JPH04144210A - Soft magnetic film with high saturation magnetic flux density - Google Patents
Soft magnetic film with high saturation magnetic flux densityInfo
- Publication number
- JPH04144210A JPH04144210A JP26805190A JP26805190A JPH04144210A JP H04144210 A JPH04144210 A JP H04144210A JP 26805190 A JP26805190 A JP 26805190A JP 26805190 A JP26805190 A JP 26805190A JP H04144210 A JPH04144210 A JP H04144210A
- Authority
- JP
- Japan
- Prior art keywords
- flux density
- magnetic flux
- saturation magnetic
- film
- soft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004907 flux Effects 0.000 title claims abstract description 27
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 229910052742 iron Inorganic materials 0.000 claims abstract description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000001301 oxygen Substances 0.000 claims abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 4
- 238000005260 corrosion Methods 0.000 abstract description 2
- 230000007797 corrosion Effects 0.000 abstract description 2
- 230000002542 deteriorative effect Effects 0.000 abstract description 2
- 239000002356 single layer Substances 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 24
- 230000005389 magnetism Effects 0.000 description 21
- 238000004544 sputter deposition Methods 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 239000011162 core material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910017086 Fe-M Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁性膜に関し、特に高密度記録用磁気ヘッド
のコア材料に好適な高い飽和磁束密度を持つ軟磁性膜に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic film, and particularly to a soft magnetic film having a high saturation magnetic flux density suitable for a core material of a magnetic head for high-density recording.
磁気記録の高密度化の要求に伴い、磁気記録媒体の高保
磁力化が精力的に進められ、現在では１５００〜２００
０ ０ｅ （エルステッド）近い保磁力を持つ記録媒
体も得られるようになってきた。With the demand for higher density magnetic recording, efforts have been made to increase the coercive force of magnetic recording media, and currently the coercive force is 1500~200.
It has become possible to obtain recording media with a coercive force close to 0 0e (Oersted).
このような記録媒体に十分な記録を行うためには、高い
飽和磁束密度を持つ磁気へラドコア材料が必要となる。In order to perform sufficient recording on such a recording medium, a magnetic herad core material with a high saturation magnetic flux density is required.
実際、今後の記録媒体の高保磁力化の進歩も考え合わせ
ると、高密度記録用磁気ヘッドのコア材料としては、１
５００Ｇ （ガウス）以上の飽和磁束密度を持つこと
が要求される。In fact, considering future progress in increasing the coercive force of recording media, the core material for high-density recording magnetic heads is 1.
It is required to have a saturation magnetic flux density of 500G (Gauss) or more.
従来より磁気ヘッドのコア材料としては、パーマロイ、
センダスト、Ｃｏ系アモルファス合金などが知られてい
る。これらの材料において、軟磁性を維持できる範囲で
の飽和磁束密度の最大値は、パーマロイではほぼ１００
ＯＯＧ、センダストではほぼ１３０００Ｇ、Ｃｏ系アモ
ルファス合金では１３０００〜１５０００Ｇである。上
記の中ではＣｏ系アモルファス合金か有望であるか、飽
和磁束密度を上げると熱的安定性が低くなり、磁気ヘッ
ド製造工程での高温処理（ガラス溶着など）により軟磁
性か劣化したり、またヘッドとしての信頼性において問
題かある。このように現在知られている磁気ヘット用コ
ア材料では高保磁力媒体の能力を十分に引き出すことが
難しく、今後の高密度磁気記録の実現に対しては、より
飽和磁束密度の高い軟磁性材料の開発が望まれている。Traditionally, permalloy,
Sendust, Co-based amorphous alloys, and the like are known. In these materials, the maximum saturation magnetic flux density within the range where soft magnetism can be maintained is approximately 100 for permalloy.
It is approximately 13,000G for OOG and Sendust, and 13,000 to 15,000G for Co-based amorphous alloy. Among the above, is Co-based amorphous alloy the most promising? If the saturation magnetic flux density is increased, the thermal stability decreases, and the soft magnetic properties deteriorate due to high-temperature treatment (glass welding, etc.) in the magnetic head manufacturing process. There is a problem with the reliability of the head. As described above, it is difficult to fully utilize the capabilities of high coercive force media with the currently known core materials for magnetic heads, and in order to realize high-density magnetic recording in the future, it is necessary to use soft magnetic materials with higher saturation magnetic flux density. Development is desired.
〔発明か解決しようとする問題点９
１５００００以上の飽和磁束密度を持つ材料としては、
ＦｅあるいはＦｅを主成分とする合金（Ｐｅ −Ａ Ｉ
、Ｆｅ−５ｉなど）が知られている。[Problem to be solved by the invention 9 Materials with a saturation magnetic flux density of 150,000 or more include:
Fe or an alloy containing Fe as the main component (Pe-A I
, Fe-5i, etc.) are known.
しかし、高密度磁気記録用ヘッドのコア材料等に使用す
る目的で、スパッタ法などの通常の製膜技術により、前
記ＦｅあるいはＦｅを主成分とする合金の磁性膜を作成
した場合、飽和磁束密度は１５０００Ｇ以上と大きくす
ることができるが、保磁力が大きくなり十分な軟磁性を
得ることか困難であった。この課題を解決するため、多
層化することなどが行われているが、特性が十分でなく
、また製造工程が複雑になるなどの問題が残されている
。そこで本発明の目的は、単層？こて１５０００Ｇ以上
の飽和磁束密度を持つ高飽和磁束密度軟磁性膜を提供す
ることにある。However, when a magnetic film of Fe or an alloy containing Fe as a main component is created by a normal film forming technique such as sputtering for the purpose of using it as a core material of a high-density magnetic recording head, the saturation magnetic flux density can be increased to 15,000 G or more, but the coercive force increases and it is difficult to obtain sufficient soft magnetism. In order to solve this problem, attempts have been made to create multiple layers, but problems such as insufficient properties and complicated manufacturing processes remain. Therefore, the purpose of the present invention is a single layer? The object of the present invention is to provide a high saturation magnetic flux density soft magnetic film having a saturation magnetic flux density of 15,000 G or more.
上記目的を達成するために本発明は、
ＦｅｘＭｙＯｚ （但し、ＭはＺｒ、Ｈｆの内少な
くとも一種の元素、Ｆｅは鉄、０は酸素を表し、ｘ 、
ｙ 、ｚは各々原子％を表す。）で示され、上記Ｋ 、
ｙ 、ｚが、７０≦ｘ≦９６．１≦ｙ≦１２．３≦２≦
２５、ｘ＋ｙ＋ｚ＝１００なる組成よりなり、かつｙと
２が、１．５ｙ≦２≦４．０Ｙなる関係を満足する組成
よりなるものである。In order to achieve the above object, the present invention provides FexMyOz (where M is at least one element among Zr and Hf, Fe is iron, 0 is oxygen, x,
y and z each represent atomic %. ), and the above K,
y and z are 70≦x≦96.1≦y≦12.3≦2≦
25, x+y+z=100, and y and 2 satisfy the relationship 1.5y≦2≦4.0Y.
上記組成の高飽和磁束密度軟磁性膜において、Ｆｅ（鉄
）は主成分であり、磁性を担う元素であり、少なくとも
１５０００Ｇ以上の飽和磁束密度を得るためには、Ｘ≧
７０原子％原子量下ａｔ％と紀ず。）が必要である。上
記Ｍ （ＭはＺｒ、Ｈｆの内少なくとも一つの元素）と
Ｏ（酸素）は軟磁性を得るために必要な元素であり、Ｆ
ｅにＭとＯを同時に、しかもＭとＯの割合か特定の値を
取るように添加することによって、膜の軟磁性は著しく
向上する。軟磁性を得るためには、膜中のＭと０の割合
が、Ｉ ５ｙ≦２≦４、Ｏｙの関係を満足しなければな
らない。ＭとＯの割合が上記関係を満たさない場合は、
好適な軟磁性を得ることができない。ＭとＯの割合が上
記関係を満たしている場合でも、ｙ＜ｌａｔ％またはｚ
＜３ａｔ％では軟磁性向上の効果が不十分であり、ｙ≧
Ｉａｔ％かつＺ≧３ａｔ％でなければならない。ｙ≧１
ａｔ％、Ｚ≧３ａｔ ％、）（＋ｙ＋ｚ＝１００より、
Ｘ≦９６ａｔ％となる。また、に≧７０ａｔ％、ｘ＋ｙ
＋ｚ＝２（１０で、１．５ｙ≦２≦４．Ｏｙより、必然
的にｙ≦１２ａｔ％、Ｚ≦２５ａｔ％になる。In the high saturation magnetic flux density soft magnetic film with the above composition, Fe (iron) is the main component and is an element responsible for magnetism, and in order to obtain a saturation magnetic flux density of at least 15000G,
The atomic weight is 70 atomic %. )is necessary. The above M (M is at least one element among Zr and Hf) and O (oxygen) are elements necessary to obtain soft magnetism, and F
By adding M and O to e at the same time and at a specific ratio of M and O, the soft magnetic properties of the film are significantly improved. In order to obtain soft magnetism, the ratio of M and 0 in the film must satisfy the relationship I5y≦2≦4, Oy. If the ratio of M and O does not satisfy the above relationship,
It is not possible to obtain suitable soft magnetism. Even if the ratio of M and O satisfies the above relationship, y<lat% or z
<3 at%, the effect of improving soft magnetism is insufficient, and y≧
It must be Iat% and Z≧3at%. y≧1
at%, Z≧3at%, ) (+y+z=100,
X≦96at%. Also, to ≧70at%, x+y
+z=2 (at 10, since 1.5y≦2≦4.Oy, y≦12at% and Z≦25at% are inevitable.
なお、本発明における高飽和磁束密度軟磁性膜は、磁歪
定数の調整や耐食性の改善を目的として、飽和磁束密度
を大きく低下させたり、軟磁性を劣化させない範囲で、
航記３元組成に他の元素を添加することも可能である。In addition, the high saturation magnetic flux density soft magnetic film in the present invention has the following properties, for the purpose of adjusting the magnetostriction constant and improving corrosion resistance, within the range of not greatly reducing the saturation magnetic flux density or deteriorating the soft magnetism.
It is also possible to add other elements to the ternary composition.
本発明における高飽和磁束密度軟磁性膜は、ＦｅにＭ
（ＭはＺｒ、Ｈｆの内少なくとも一つの元素）とＯを同
時にしかもＭとＯの割合が特定の範囲になるよう？こ添
加することによって、１５０００Ｇ以上の高い飽和磁束
密度と軟磁性を同時に実現するものであって、スパッタ
法や真空蒸着法などの通常−射的な薄膜作製法により作
製される。The high saturation magnetic flux density soft magnetic film in the present invention has Fe and M
(M is at least one element among Zr and Hf) and O at the same time, and the ratio of M and O is within a specific range? By adding this, a high saturation magnetic flux density of 15,000 G or more and soft magnetism can be achieved at the same time, and the material is manufactured by a conventional thin film manufacturing method such as a sputtering method or a vacuum evaporation method.
スパッタ法により本発明における高飽和磁束密度軟磁性
膜を作製する場合、装置としては、ＤＣスパッタ、ＲＦ
スパッタ、マグネトロンスパッタ、対向ターゲット式ス
パッタ、イオンビームスパッタ装置等の既存の装置を使
用することができる。When producing the high saturation magnetic flux density soft magnetic film of the present invention by the sputtering method, the equipment includes DC sputtering, RF
Existing equipment such as sputtering, magnetron sputtering, facing target sputtering, and ion beam sputtering equipment can be used.
Ｏは膜中に添加する方法としては、Ａｒ等の不活性ガス
中にＯ，ガスを混合したＡｒ＋Ｏｎ混合雰囲気ガスでス
パッタを行う反応性スパッタが有効である。また、Ｆｅ
あるいはＦｅ−Ｍ（ＭはＺ ｒ ｓＨｆの内少なくとも
一種の元素）合金ターゲットの上にＦｅあるいはＭの酸
化物を配置した複合ターゲットを用いてＡｒ等の不活性
ガス中で作製することもできる。An effective method for adding O into the film is reactive sputtering in which sputtering is performed using an Ar+On mixed atmospheric gas in which O and gas are mixed in an inert gas such as Ar. Also, Fe
Alternatively, it can also be produced in an inert gas such as Ar using a composite target in which an oxide of Fe or M is placed on an Fe-M (M is at least one element among Z r sHf) alloy targets.
以下本発明の実施例について説明する。 Examples of the present invention will be described below.
〔実施例１〕
高周波マグネトロンスパッタ装置により、Ｆｅ ｔｏｏ
−ＸＺｒ ｘ（ｘ＝０．１．５，３，７，１１．１５）
合金ターゲット （ａ ｔ％）を用いて、Ａｒ＋０１％
０１、Ａｒ＋０．５％０９、Ａｒ＋１．０％０、雰囲気
で、成膜を行った。主なスパッタ条件を以下７こ示す。[Example 1] Fe too
-XZr x (x=0.1.5, 3, 7, 11.15)
Ar+01% using alloy target (a t%)
Film formation was performed in an atmosphere of 01, Ar + 0.5% 09, Ar + 1.0% 0. Seven main sputtering conditions are shown below.
予備排気 ｌＸｌ０−５Ｐａ以下
高周波電力 ４００Ｗ
Ａｒガス圧 １．０Ｐａ
基板 結晶化ガラス基板（間接水冷）電極開路
＠ ７０ｍｍ
膜厚２μｍになるようスパッタ時間を調節した。Preliminary exhaust: 1Xl0-5 Pa or less High frequency power: 400 W Ar gas pressure: 1.0 Pa Substrate: Crystallized glass substrate (indirect water cooling) Electrode open circuit @ 70 mm Sputtering time was adjusted so that the film thickness was 2 μm.
次に得られた膜の軟磁性を改善するため、真空中で４０
０℃Ｘ１ｈｒの熱処理を行った。Next, in order to improve the soft magnetic properties of the obtained film, we
Heat treatment was performed at 0° C. for 1 hr.
膜の組成は、誘導結合プラズマ（ＩＣＰ）発光分析法及
び、Ｘ線マイクロアナライザー（ＥＰＭＡ）により決定
した。飽和磁束密度と保磁力をＶＳＭにより測定した。The composition of the film was determined by inductively coupled plasma (ICP) emission spectrometry and X-ray microanalyzer (EPMA). The saturation magnetic flux density and coercive force were measured by VSM.
膜組成、飽和磁束密度及び保磁力の主な測定結果を第１
表に示す。サンプル１〜５が特許請求項記載の組成より
なる膜で、Ｂｓ≧１５０００Ｇであり、Ｈｅ≦２ ０ｅ
の軟磁性を示している。サンプル１〜５と軟磁性の得ら
れなかつ１こサンプル６．７とを比較すると、軟磁性を
得るため？こけ、ＯがＺｒのおよそ１．５倍以上必要で
あることがわかる。また、同様にサンプル８．９と比較
すると、軟磁性を得るためには、ＯがＺｒのおよそ４倍
以下でなければならない。サンプルｌ０１１１は、それ
ぞれＺｒか１．Ｏａｔ％以下、０が３０ａｔ％以下で良
好な軟磁性が得られなかった例である。サンプルＩ２は
、ＯがＺｒの１．５倍から４倍の間にあり、良好な軟磁
性は得られているが、Ｆｅが７０ａｔ％以下で、Ｂｓが
２５０００Ｇより小さくなっている。The main measurement results of film composition, saturation magnetic flux density, and coercive force are
Shown in the table. Samples 1 to 5 are films having the composition described in the patent claims, Bs≧15000G, He≦20e
It shows soft magnetism. Comparing Samples 1 to 5 with Sample 6.7, which did not have soft magnetism, it was found that it was due to obtaining soft magnetism. It can be seen that O is approximately 1.5 times or more necessary than Zr. Similarly, when compared with sample 8.9, in order to obtain soft magnetism, O must be approximately 4 times or less than Zr. Sample 10111 is Zr or 1. This is an example in which good soft magnetism was not obtained when 0 was less than 30 at%. In sample I2, O is between 1.5 and 4 times that of Zr, and good soft magnetism is obtained, but Fe is less than 70 at % and Bs is less than 25,000G.
Ｃ実施例２フ
高周波マグネトロンスパッタ装置により、Ｆｅ ＋ｏｏ
−Ｘ Ｈｆ Ｘ （ｘ ＝０．１．５，３．５，７
．１３．１５）合金ターゲット （ａ ｔ％）を用いて
、Ａｒ＋０．１％０１、Ａｒ＋０．５％Ｏ７、Ａｒ＋１
．０％Ｏｔ雰囲気中で、成膜を行った。スパッタ条件は
実施例１と同様とした。次に得られた膜の軟磁性を改善
するため、真空中で４００℃ＸＩｈｒの熱処理を行った
。C Example 2 Fe+oo
−X Hf X (x = 0.1.5, 3.5, 7
．． 13.15) Using alloy target (a t%), Ar+0.1%01, Ar+0.5%O7, Ar+1
．． Film formation was performed in a 0% Ot atmosphere. The sputtering conditions were the same as in Example 1. Next, in order to improve the soft magnetic properties of the obtained film, heat treatment was performed at 400° C. for 1 hour in a vacuum.
膜の組成は、誘導結合プラズマＣＩＣＰン発光分析法及
び、Ｘ１ｓマイクロアナライザー （Ｅ Ｐ ＭＡ）に
より決定した。飽和磁束密度と保磁力をＶＳＭにより測
定した。The composition of the film was determined by inductively coupled plasma CICP emission spectrometry and X1s microanalyzer (EPMA). The saturation magnetic flux density and coercive force were measured by VSM.
膜組成、飽和磁束密度及び保磁力の主な測定結果を第２
表に示す。サンプル１３〜１９が特許請求項記載の組成
よりなる膜で、Ｂｓ≧１５０００Ｇであり、Ｈｃ≦２０
８の軟磁性を示している。The main measurement results of film composition, saturation magnetic flux density, and coercive force are shown in the second section.
Shown in the table. Samples 13 to 19 are films having the composition described in the patent claims, Bs≧15000G, and Hc≦20.
It shows soft magnetism of 8.
サンプル１３〜Ｉ９と軟磁性の得られなかったサンプル
２０と比較すると、良好な軟磁性を得るためには、Ｏが
Ｈｆのおよそ１．５倍以上必要であることがわかる。ま
た、同様にサンプル２１．２２と比較すると、良好な軟
磁性を得るためには、０かＨｆのおよそ４倍以下でなけ
ればならない。Comparing Samples 13 to I9 with Sample 20 in which soft magnetism was not obtained, it can be seen that in order to obtain good soft magnetism, O is required to be about 1.5 times or more as much as Hf. Similarly, when compared with Samples 21 and 22, in order to obtain good soft magnetism, it must be 0 or about 4 times less than Hf.
サンプル２３は、０が３．Ｏａｔ％以下で良好な軟磁性
か得られなかった例である。サンプル２４はＯがＨｆの
１５倍から４倍の間にあり軟磁性は得られているが、Ｆ
ｅが７０ａｔ％以下で、Ｂｓが１５０００Ｇより小さく
なっている。In sample 23, 0 is 3. This is an example in which good soft magnetism could not be obtained at Oat% or less. In sample 24, O is between 15 and 4 times that of Hf, and soft magnetism is obtained, but F
When e is 70 at% or less, Bs is smaller than 15000G.
（以下、余白）
第
表
第
表
〔発明の効果〕
上述したように、本発明は、高い飽和磁束密度（，１５
０００Ｇ以上）を持つＦｅ系軟磁性膜を提供するもので
ある。従って本発明による高飽和磁束密度軟磁性膜は、
高密度記録用磁気ヘッドのコア材料等に最適であり、ま
たその他の磁気応用製品への適用も可能である。(Hereinafter, blank space) Table 1 [Effects of the invention] As described above, the present invention has a high saturation magnetic flux density (,15
000G or more). Therefore, the high saturation magnetic flux density soft magnetic film according to the present invention is
It is ideal as a core material for magnetic heads for high-density recording, and can also be applied to other magnetic application products.
Claims (1)
ｅは鉄、Ｏは酸素を表し、ｘ，ｙ，ｚは各々原子％を表
す。） で示され、上記ｘ，ｙ，ｚが、 ７０≦ｘ≦９６ １≦ｙ≦１２ ３≦ｚ≦２５ ｘ＋ｙ＋ｚ＝１００ なる組成よりなり、かつｙとｚが、 １．５ｙ≦ｚ≦４．０ｙ なる関係を満足する組成よりなる高飽和磁束密度軟磁性
膜。[Claims] Fe_xM_yO_z (However, M is at least one element among Zr and Hf, F
e represents iron, O represents oxygen, and x, y, and z each represent atomic %. ), the x, y, and z have the following composition: 70≦x≦96 1≦y≦12 3≦z≦25 x+y+z=100, and y and z have the following composition: 1.5y≦z≦4. A high saturation magnetic flux density soft magnetic film having a composition that satisfies the relationship: 0y.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26805190A JPH04144210A (en) | 1990-10-05 | 1990-10-05 | Soft magnetic film with high saturation magnetic flux density |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26805190A JPH04144210A (en) | 1990-10-05 | 1990-10-05 | Soft magnetic film with high saturation magnetic flux density |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04144210A true JPH04144210A (en) | 1992-05-18 |
Family
ID=17453202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26805190A Pending JPH04144210A (en) | 1990-10-05 | 1990-10-05 | Soft magnetic film with high saturation magnetic flux density |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04144210A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6873499B2 (en) | 1998-12-04 | 2005-03-29 | International Business Machines Corporation | Read head having high resistance soft magnetic flux guide layer for enhancing read sensor efficiency |
-
1990
- 1990-10-05 JP JP26805190A patent/JPH04144210A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6873499B2 (en) | 1998-12-04 | 2005-03-29 | International Business Machines Corporation | Read head having high resistance soft magnetic flux guide layer for enhancing read sensor efficiency |
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