JPH0411634B2 - - Google Patents

Info

Publication number
JPH0411634B2
JPH0411634B2 JP58186677A JP18667783A JPH0411634B2 JP H0411634 B2 JPH0411634 B2 JP H0411634B2 JP 58186677 A JP58186677 A JP 58186677A JP 18667783 A JP18667783 A JP 18667783A JP H0411634 B2 JPH0411634 B2 JP H0411634B2
Authority
JP
Japan
Prior art keywords
plating
mask
deformable
component
selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58186677A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5985887A (ja
Inventor
Aasaa Richaazu Maikuru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ESU JII OOEN Ltd
Original Assignee
ESU JII OOEN Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10533383&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH0411634(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by ESU JII OOEN Ltd filed Critical ESU JII OOEN Ltd
Publication of JPS5985887A publication Critical patent/JPS5985887A/ja
Publication of JPH0411634B2 publication Critical patent/JPH0411634B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Glass Compositions (AREA)
  • Lead Frames For Integrated Circuits (AREA)
JP58186677A 1982-10-05 1983-10-05 選択めっき装置及び方法 Granted JPS5985887A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8228378 1982-10-05
GB8228378 1982-10-05

Publications (2)

Publication Number Publication Date
JPS5985887A JPS5985887A (ja) 1984-05-17
JPH0411634B2 true JPH0411634B2 (OSRAM) 1992-03-02

Family

ID=10533383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58186677A Granted JPS5985887A (ja) 1982-10-05 1983-10-05 選択めっき装置及び方法

Country Status (6)

Country Link
US (1) US4518636A (OSRAM)
EP (1) EP0107417B1 (OSRAM)
JP (1) JPS5985887A (OSRAM)
AT (1) ATE40156T1 (OSRAM)
DE (1) DE3378981D1 (OSRAM)
GB (1) GB2127853B (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8600838A (nl) * 1986-04-02 1987-11-02 Meco Equip Eng Werkwijze en inrichting voor het langs electrolytische weg aanbrengen van een metaalbedekking op in een band samenhangende langwerpige metalen en /of gemetalliseerde voorwerpen.
JP2786787B2 (ja) * 1992-12-02 1998-08-13 株式会社東芝 噴射メッキ装置及び噴射メッキ方法
US5397598A (en) * 1993-11-12 1995-03-14 International Business Machines Corporation Method for selectively coating a member having a shank by masking a portion of the shank with a washer
US7282240B1 (en) 1998-04-21 2007-10-16 President And Fellows Of Harvard College Elastomeric mask and use in fabrication of devices
US6893850B2 (en) * 2000-03-17 2005-05-17 President And Fellows Of Harvard College Method for cell patterning
US9583125B1 (en) * 2009-12-16 2017-02-28 Magnecomp Corporation Low resistance interface metal for disk drive suspension component grounding

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1396342A (en) * 1972-05-24 1975-06-04 Galentan Ag Plating apparatus
US3257308A (en) * 1961-07-11 1966-06-21 Western Electric Co Article holder for electroplating articles
FR1508573A (fr) * 1967-01-18 1968-01-05 Eugene Arbez Ets Procédé pour déposer un revêtement en plomb sur des plaques solides, notamment en vue de leur impression par matriçage, ainsi que les plaques conformes à celles obtenues par le présent procédé ou procédé similaire
US3835017A (en) * 1972-12-22 1974-09-10 Buckbee Mears Co Reusable shields for selective electrodeposition
DE2324834C2 (de) * 1973-05-17 1978-09-07 Dr. Eugen Duerrwaechter Doduco, 7530 Pforzheim Vorrichtung zum kontinuierlichen selektiven Bandgalvanisieren
US3974056A (en) * 1975-05-23 1976-08-10 Ann Arbor Circuits, Inc. Electroplating selected portions of a strip
GB1549862A (en) * 1976-04-20 1979-08-08 Owens Ltd S Electroplating
EP0055130B1 (en) * 1980-12-23 1984-07-25 S.G. Owen Limited Improvements in or relating to selective plating
GB2094344B (en) * 1980-12-23 1983-09-07 Owen S G Ltd Improvements in or relating to selective plating
US4374004A (en) * 1981-06-29 1983-02-15 Northern Telecom Limited Method and apparatus for surface-treating predetermined areas of a surface of a body
JPS5855589A (ja) * 1981-09-28 1983-04-01 Nec Kyushu Ltd メツキ装置

Also Published As

Publication number Publication date
DE3378981D1 (en) 1989-02-23
GB8326301D0 (en) 1983-11-02
ATE40156T1 (de) 1989-02-15
EP0107417A3 (en) 1984-08-08
GB2127853A (en) 1984-04-18
GB2127853B (en) 1985-11-13
EP0107417B1 (en) 1989-01-18
EP0107417A2 (en) 1984-05-02
JPS5985887A (ja) 1984-05-17
US4518636A (en) 1985-05-21

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