JPH0410213B2 - - Google Patents
Info
- Publication number
- JPH0410213B2 JPH0410213B2 JP24752986A JP24752986A JPH0410213B2 JP H0410213 B2 JPH0410213 B2 JP H0410213B2 JP 24752986 A JP24752986 A JP 24752986A JP 24752986 A JP24752986 A JP 24752986A JP H0410213 B2 JPH0410213 B2 JP H0410213B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- island
- polycrystalline silicon
- crystal semiconductor
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 40
- 239000013078 crystal Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 4
- 238000002955 isolation Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 24
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000001947 vapour-phase growth Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24752986A JPS63102220A (ja) | 1986-10-20 | 1986-10-20 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24752986A JPS63102220A (ja) | 1986-10-20 | 1986-10-20 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63102220A JPS63102220A (ja) | 1988-05-07 |
| JPH0410213B2 true JPH0410213B2 (enrdf_load_stackoverflow) | 1992-02-24 |
Family
ID=17164850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24752986A Granted JPS63102220A (ja) | 1986-10-20 | 1986-10-20 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63102220A (enrdf_load_stackoverflow) |
-
1986
- 1986-10-20 JP JP24752986A patent/JPS63102220A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63102220A (ja) | 1988-05-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |