JPH039613B2 - - Google Patents
Info
- Publication number
- JPH039613B2 JPH039613B2 JP55108609A JP10860980A JPH039613B2 JP H039613 B2 JPH039613 B2 JP H039613B2 JP 55108609 A JP55108609 A JP 55108609A JP 10860980 A JP10860980 A JP 10860980A JP H039613 B2 JPH039613 B2 JP H039613B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- pattern
- wall
- resist pattern
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Hall/Mr Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10860980A JPS5732634A (en) | 1980-08-07 | 1980-08-07 | Production of pattern with fine gap |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10860980A JPS5732634A (en) | 1980-08-07 | 1980-08-07 | Production of pattern with fine gap |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5732634A JPS5732634A (en) | 1982-02-22 |
JPH039613B2 true JPH039613B2 (enrdf_load_stackoverflow) | 1991-02-08 |
Family
ID=14489132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10860980A Granted JPS5732634A (en) | 1980-08-07 | 1980-08-07 | Production of pattern with fine gap |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5732634A (enrdf_load_stackoverflow) |
-
1980
- 1980-08-07 JP JP10860980A patent/JPS5732634A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5732634A (en) | 1982-02-22 |