JPH039613B2 - - Google Patents

Info

Publication number
JPH039613B2
JPH039613B2 JP55108609A JP10860980A JPH039613B2 JP H039613 B2 JPH039613 B2 JP H039613B2 JP 55108609 A JP55108609 A JP 55108609A JP 10860980 A JP10860980 A JP 10860980A JP H039613 B2 JPH039613 B2 JP H039613B2
Authority
JP
Japan
Prior art keywords
etching
pattern
wall
resist pattern
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55108609A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5732634A (en
Inventor
Niwaji Majima
Kyoshi Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10860980A priority Critical patent/JPS5732634A/ja
Publication of JPS5732634A publication Critical patent/JPS5732634A/ja
Publication of JPH039613B2 publication Critical patent/JPH039613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Hall/Mr Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10860980A 1980-08-07 1980-08-07 Production of pattern with fine gap Granted JPS5732634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10860980A JPS5732634A (en) 1980-08-07 1980-08-07 Production of pattern with fine gap

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10860980A JPS5732634A (en) 1980-08-07 1980-08-07 Production of pattern with fine gap

Publications (2)

Publication Number Publication Date
JPS5732634A JPS5732634A (en) 1982-02-22
JPH039613B2 true JPH039613B2 (enrdf_load_stackoverflow) 1991-02-08

Family

ID=14489132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10860980A Granted JPS5732634A (en) 1980-08-07 1980-08-07 Production of pattern with fine gap

Country Status (1)

Country Link
JP (1) JPS5732634A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5732634A (en) 1982-02-22

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