JPH039613B2 - - Google Patents
Info
- Publication number
- JPH039613B2 JPH039613B2 JP55108609A JP10860980A JPH039613B2 JP H039613 B2 JPH039613 B2 JP H039613B2 JP 55108609 A JP55108609 A JP 55108609A JP 10860980 A JP10860980 A JP 10860980A JP H039613 B2 JPH039613 B2 JP H039613B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- pattern
- wall
- resist pattern
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P95/00—
Landscapes
- Drying Of Semiconductors (AREA)
- Hall/Mr Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10860980A JPS5732634A (en) | 1980-08-07 | 1980-08-07 | Production of pattern with fine gap |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10860980A JPS5732634A (en) | 1980-08-07 | 1980-08-07 | Production of pattern with fine gap |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5732634A JPS5732634A (en) | 1982-02-22 |
| JPH039613B2 true JPH039613B2 (OSRAM) | 1991-02-08 |
Family
ID=14489132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10860980A Granted JPS5732634A (en) | 1980-08-07 | 1980-08-07 | Production of pattern with fine gap |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5732634A (OSRAM) |
-
1980
- 1980-08-07 JP JP10860980A patent/JPS5732634A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5732634A (en) | 1982-02-22 |
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