JPH0393632U - - Google Patents

Info

Publication number
JPH0393632U
JPH0393632U JP181290U JP181290U JPH0393632U JP H0393632 U JPH0393632 U JP H0393632U JP 181290 U JP181290 U JP 181290U JP 181290 U JP181290 U JP 181290U JP H0393632 U JPH0393632 U JP H0393632U
Authority
JP
Japan
Prior art keywords
web
brake
shew
shoe
plate surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP181290U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0720427Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP181290U priority Critical patent/JPH0720427Y2/ja
Publication of JPH0393632U publication Critical patent/JPH0393632U/ja
Application granted granted Critical
Publication of JPH0720427Y2 publication Critical patent/JPH0720427Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Braking Arrangements (AREA)
JP181290U 1990-01-11 1990-01-11 シュー間隙自動調節機構を備えたドラムブレーキ Expired - Lifetime JPH0720427Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP181290U JPH0720427Y2 (ja) 1990-01-11 1990-01-11 シュー間隙自動調節機構を備えたドラムブレーキ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP181290U JPH0720427Y2 (ja) 1990-01-11 1990-01-11 シュー間隙自動調節機構を備えたドラムブレーキ

Publications (2)

Publication Number Publication Date
JPH0393632U true JPH0393632U (en:Method) 1991-09-25
JPH0720427Y2 JPH0720427Y2 (ja) 1995-05-15

Family

ID=31505705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP181290U Expired - Lifetime JPH0720427Y2 (ja) 1990-01-11 1990-01-11 シュー間隙自動調節機構を備えたドラムブレーキ

Country Status (1)

Country Link
JP (1) JPH0720427Y2 (en:Method)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007279440A (ja) * 2006-04-07 2007-10-25 Toshiba Corp ハーフトーン型位相シフトマスク及びその製造方法
JP2007298631A (ja) * 2006-04-28 2007-11-15 Shin Etsu Chem Co Ltd フォトマスクブランクの製造方法およびフォトマスクブランク
JP2008116583A (ja) * 2006-11-01 2008-05-22 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法、並びに反射型マスクの製造方法
JP2008261958A (ja) * 2007-04-10 2008-10-30 Sk Electronics:Kk 多階調フォトマスク及びその製造方法
US7618753B2 (en) 2004-09-10 2009-11-17 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and method for producing those
US7691546B2 (en) 2004-09-10 2010-04-06 Shin-Etsu Chemical Co., Ltd. Photomask blank and photomask
US7767366B2 (en) 2006-03-10 2010-08-03 Shin-Etsu Chemical Co., Ltd. Photomask blank and photomask
US7767367B2 (en) 2006-03-10 2010-08-03 Toppan Printing Co., Ltd. Photomask blank and photomask making method
US7771893B2 (en) 2005-07-21 2010-08-10 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and fabrication method thereof
US7790339B2 (en) 2006-04-21 2010-09-07 Shin-Etsu Chemical Co., Ltd. Photomask blank
EP2881790A2 (en) 2013-12-06 2015-06-10 Shin-Etsu Chemical Co., Ltd. Photomask blank
EP2980645A2 (en) 2014-07-30 2016-02-03 Shin-Etsu Chemical Co., Ltd. Designing of photomask blank and photomask blank
EP3125041A1 (en) 2015-07-27 2017-02-01 Shin-Etsu Chemical Co., Ltd. Photomask blank and method for preparing photomask
EP3139211A2 (en) 2015-09-03 2017-03-08 Shin-Etsu Chemical Co., Ltd. Photomask blank

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7618753B2 (en) 2004-09-10 2009-11-17 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and method for producing those
US7691546B2 (en) 2004-09-10 2010-04-06 Shin-Etsu Chemical Co., Ltd. Photomask blank and photomask
US7771893B2 (en) 2005-07-21 2010-08-10 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and fabrication method thereof
US7767366B2 (en) 2006-03-10 2010-08-03 Shin-Etsu Chemical Co., Ltd. Photomask blank and photomask
US7767367B2 (en) 2006-03-10 2010-08-03 Toppan Printing Co., Ltd. Photomask blank and photomask making method
JP2007279440A (ja) * 2006-04-07 2007-10-25 Toshiba Corp ハーフトーン型位相シフトマスク及びその製造方法
US7790339B2 (en) 2006-04-21 2010-09-07 Shin-Etsu Chemical Co., Ltd. Photomask blank
JP2007298631A (ja) * 2006-04-28 2007-11-15 Shin Etsu Chem Co Ltd フォトマスクブランクの製造方法およびフォトマスクブランク
JP2008116583A (ja) * 2006-11-01 2008-05-22 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法、並びに反射型マスクの製造方法
JP2008261958A (ja) * 2007-04-10 2008-10-30 Sk Electronics:Kk 多階調フォトマスク及びその製造方法
EP2881790A2 (en) 2013-12-06 2015-06-10 Shin-Etsu Chemical Co., Ltd. Photomask blank
EP2980645A2 (en) 2014-07-30 2016-02-03 Shin-Etsu Chemical Co., Ltd. Designing of photomask blank and photomask blank
EP3125041A1 (en) 2015-07-27 2017-02-01 Shin-Etsu Chemical Co., Ltd. Photomask blank and method for preparing photomask
EP3139211A2 (en) 2015-09-03 2017-03-08 Shin-Etsu Chemical Co., Ltd. Photomask blank

Also Published As

Publication number Publication date
JPH0720427Y2 (ja) 1995-05-15

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