JPH0393632U - - Google Patents
Info
- Publication number
- JPH0393632U JPH0393632U JP181290U JP181290U JPH0393632U JP H0393632 U JPH0393632 U JP H0393632U JP 181290 U JP181290 U JP 181290U JP 181290 U JP181290 U JP 181290U JP H0393632 U JPH0393632 U JP H0393632U
- Authority
- JP
- Japan
- Prior art keywords
- web
- brake
- shew
- shoe
- plate surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Braking Arrangements (AREA)
Description
第1図は本考案が適用されたシユー間隙自動調
節機構を備えたドラムブレーキの一例を示す図で
あつて、要部を示す正面図である。第2図は第1
図の−視断面の要部を拡大して示す図である
。第3図は第2図において調節部材の回動に伴つ
て引張コイルスプリングが伸張させられた状態を
示す図である。第4図は従来のシユー間隙自動調
節機構を備えたドラムブレーキの要部を示す図で
あつて、第2図に相当する図である。
12,14……ブレーキシユー、18……シユ
ーウエブ、28……パーキングレバー、40……
調節部材、44……引張コイルスプリング、46
……コイル部、54……板面。
FIG. 1 is a diagram showing an example of a drum brake equipped with an automatic shoe gap adjustment mechanism to which the present invention is applied, and is a front view showing the main parts. Figure 2 is the first
FIG. 2 is an enlarged view showing a main part of a cross-section viewed from - in the figure. 3 is a diagram showing a state in which the tension coil spring is expanded as the adjustment member rotates in FIG. 2; FIG. FIG. 4 is a diagram showing essential parts of a conventional drum brake equipped with an automatic shoe gap adjustment mechanism, and corresponds to FIG. 2. 12, 14... Brake shoe, 18... Shoe web, 28... Parking lever, 40...
Adjustment member, 44...Tension coil spring, 46
...Coil part, 54...Plate surface.
Claims (1)
ブレーキシユーと、該一対のブレーキシユーの一
方に回動可能に設けられ、パーキングブレーキ操
作力により回動させられることに基づいて該一対
のブレーキシユーを互いに拡開させるパーキング
レバーと、該一方のブレーキシユーに回動可能に
設けられ、該パーキングレバーの回動に伴つて回
動させられる調節部材と、コイル部を有して該一
方のブレーキシユーと該調節部材との間に張設さ
れ、該張設部材を該パーキングレバーのブレーキ
操作方向と反対の回動方向へ付勢するとともに、
非制動時には該コイル部の少なくとも一部が該一
方のブレーキシユーのシユーウエブの板面上に位
置し且つパーキングブレーキ制動時には該調節部
材の回動に伴つて該コイル部が該シユーウエブの
板面に押圧されつつ伸張させられて該コイル部の
該シユーウエブの板面上に位置する部分の一部が
該シユーウエブの内周縁よりも内周側へ移動させ
られる引張コイルスプリングとを備え、前記調節
部材の回動に基づいてシユー間隙を自動的に調節
する形式のシユー間隙自動調節機構を備えたドラ
ムブレーキにおいて、 前記引張コイルスプリングのコイル部の、前記
パーキングブレーキ制動に伴う伸張時に前記一方
のブレーキシユーのシユーウエブの内周縁よりも
内周側へ移動させられる部分を、該伸張時におい
ても該シユーウエブの板面上に位置する部分より
小さい径にて形成することにより、該コイル部の
該パーキングブレーキ制動時に該シユーウエブの
内周縁よりも内周側へ移動させられる部分と該シ
ユーウエブの板面との間に非制動時において所定
の隙間を形成したことを特徴とするシユー間隙自
動調節機構を備えたドラムブレーキ。[Scope of Claim for Utility Model Registration] A pair of brake shoes having an arc-shaped and plate-like shoe web, and one of the pair of brake shoes is rotatably provided and is rotated by the parking brake operating force. a parking lever that opens the pair of brake shoes relative to each other based on the above, an adjusting member rotatably provided on the one brake shoe and rotated as the parking lever rotates, and a coil. and is stretched between the one brake shoe and the adjustment member, and urges the tension member in a rotational direction opposite to the brake operating direction of the parking lever;
When braking is not applied, at least a portion of the coil portion is located on the plate surface of the shew web of the one brake shoe, and when the parking brake is applied, the coil portion is positioned on the plate surface of the shew web as the adjustment member rotates. a tension coil spring that is stretched while being pressed so that a part of the coil portion located on the plate surface of the shew web is moved inward from the inner peripheral edge of the shew web; In a drum brake equipped with an automatic shoe gap adjustment mechanism of a type that automatically adjusts a shoe gap based on rotation, when the coil portion of the tension coil spring expands due to braking of the parking brake, one of the brake shoes By forming the part of the shew web that can be moved inward from the inner circumferential edge of the shew web to have a smaller diameter than the part that is positioned on the plate surface of the shew web even when the shew web is extended, the parking brake of the coil part can be applied. A drum equipped with an automatic show gap adjustment mechanism, characterized in that a predetermined gap is formed between a portion of the show web that is moved further inward than the inner circumferential edge of the show web and a plate surface of the show web when braking is not applied. brake.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP181290U JPH0720427Y2 (en) | 1990-01-11 | 1990-01-11 | Drum brake with automatic shoe clearance adjustment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP181290U JPH0720427Y2 (en) | 1990-01-11 | 1990-01-11 | Drum brake with automatic shoe clearance adjustment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0393632U true JPH0393632U (en) | 1991-09-25 |
JPH0720427Y2 JPH0720427Y2 (en) | 1995-05-15 |
Family
ID=31505705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP181290U Expired - Lifetime JPH0720427Y2 (en) | 1990-01-11 | 1990-01-11 | Drum brake with automatic shoe clearance adjustment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0720427Y2 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007279440A (en) * | 2006-04-07 | 2007-10-25 | Toshiba Corp | Halftone phase shift mask and its manufacturing method |
JP2007298631A (en) * | 2006-04-28 | 2007-11-15 | Shin Etsu Chem Co Ltd | Method for manufacturing photomask blank, and the photomask blank |
JP2008116583A (en) * | 2006-11-01 | 2008-05-22 | Hoya Corp | Method of manufacturing mask blank and method of manufacturing photomask, and method of manufacturing reflective mask |
JP2008261958A (en) * | 2007-04-10 | 2008-10-30 | Sk Electronics:Kk | Multilevel gradation photomask and method for manufacturing the same |
US7618753B2 (en) | 2004-09-10 | 2009-11-17 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method for producing those |
US7691546B2 (en) | 2004-09-10 | 2010-04-06 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
US7767366B2 (en) | 2006-03-10 | 2010-08-03 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
US7767367B2 (en) | 2006-03-10 | 2010-08-03 | Toppan Printing Co., Ltd. | Photomask blank and photomask making method |
US7771893B2 (en) | 2005-07-21 | 2010-08-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and fabrication method thereof |
US7790339B2 (en) | 2006-04-21 | 2010-09-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
EP2881790A2 (en) | 2013-12-06 | 2015-06-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
EP2980645A2 (en) | 2014-07-30 | 2016-02-03 | Shin-Etsu Chemical Co., Ltd. | Designing of photomask blank and photomask blank |
EP3125041A1 (en) | 2015-07-27 | 2017-02-01 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and method for preparing photomask |
EP3139211A2 (en) | 2015-09-03 | 2017-03-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
-
1990
- 1990-01-11 JP JP181290U patent/JPH0720427Y2/en not_active Expired - Lifetime
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7618753B2 (en) | 2004-09-10 | 2009-11-17 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method for producing those |
US7691546B2 (en) | 2004-09-10 | 2010-04-06 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
US7771893B2 (en) | 2005-07-21 | 2010-08-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and fabrication method thereof |
US7767366B2 (en) | 2006-03-10 | 2010-08-03 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
US7767367B2 (en) | 2006-03-10 | 2010-08-03 | Toppan Printing Co., Ltd. | Photomask blank and photomask making method |
JP2007279440A (en) * | 2006-04-07 | 2007-10-25 | Toshiba Corp | Halftone phase shift mask and its manufacturing method |
US7790339B2 (en) | 2006-04-21 | 2010-09-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
JP2007298631A (en) * | 2006-04-28 | 2007-11-15 | Shin Etsu Chem Co Ltd | Method for manufacturing photomask blank, and the photomask blank |
JP2008116583A (en) * | 2006-11-01 | 2008-05-22 | Hoya Corp | Method of manufacturing mask blank and method of manufacturing photomask, and method of manufacturing reflective mask |
JP2008261958A (en) * | 2007-04-10 | 2008-10-30 | Sk Electronics:Kk | Multilevel gradation photomask and method for manufacturing the same |
EP2881790A2 (en) | 2013-12-06 | 2015-06-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
EP2980645A2 (en) | 2014-07-30 | 2016-02-03 | Shin-Etsu Chemical Co., Ltd. | Designing of photomask blank and photomask blank |
EP3125041A1 (en) | 2015-07-27 | 2017-02-01 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and method for preparing photomask |
EP3139211A2 (en) | 2015-09-03 | 2017-03-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
Also Published As
Publication number | Publication date |
---|---|
JPH0720427Y2 (en) | 1995-05-15 |
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