JPH0393131A - Washing device for shadow mask and method of washing same - Google Patents

Washing device for shadow mask and method of washing same

Info

Publication number
JPH0393131A
JPH0393131A JP22917789A JP22917789A JPH0393131A JP H0393131 A JPH0393131 A JP H0393131A JP 22917789 A JP22917789 A JP 22917789A JP 22917789 A JP22917789 A JP 22917789A JP H0393131 A JPH0393131 A JP H0393131A
Authority
JP
Japan
Prior art keywords
shadow mask
hot air
cooled
temperature
support frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22917789A
Other languages
Japanese (ja)
Other versions
JP2972234B2 (en
Inventor
Kazuo Kato
和夫 加藤
Toshio Yokogawa
横川 寿雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1229177A priority Critical patent/JP2972234B2/en
Publication of JPH0393131A publication Critical patent/JPH0393131A/en
Application granted granted Critical
Publication of JP2972234B2 publication Critical patent/JP2972234B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent deformation of a shadow mask which coours during its washing process by forcedly cooling it after it is slowly cooled. CONSTITUTION:A shadow mask dried with hot air is first cooled gradually at a gradually cooling tunnel part 3, and then the temperature of a support frame 7 is cooled below 80 deg.C, for example, with air at 20 deg.C, keeping the temperature of the shadow mask 7 to be within 60 deg.C at which deformation in the shadow mask 7 and the support frame is not caused. The support frame below 80 deg.C is forcedly cooled in this way, and deformation in the shadow mask 7 hardly occurs even if cooling is performed in this forcible cooling process 4 so that the temperature at the shadow mask 7 and the taking-out port of the support may be below 40 deg.C.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は力2−ブラウン管に用いるシャドウマスクの洗
浄装置及び洗浄方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device and a cleaning method for a shadow mask used in a power-2 cathode ray tube.

〔従来の技術〕[Conventional technology]

シャドウマスクはサポートフレームに固定された状態で
洗浄装置により洗浄される(特開昭62−117239
号公報参照)。
The shadow mask is cleaned by a cleaning device while fixed to the support frame (Japanese Patent Laid-Open No. 117239/1983)
(see publication).

従来のシャドウマスクの洗浄は、コンベアにシャドウを
吊り下げて超音波洗浄部、熱風乾燥炉及び冷却部に順次
搬送して行われる。即ち、供給部でコンベアに吊り下げ
られたシャドウマスクは、まず超音波洗浄部に送られ、
加熱した純水の超音波照射を受けて洗浄され、純水中か
ら引き上げられる時に清浄な純水ですすぎ洗いされて熱
風乾燥炉に入る。熱風乾燥炉では高圧熱風により付着し
ている水が吹き飛ばされ々から乾燥される。乾燥された
シャドウマスクは冷却部により、冷却空気をシャドウマ
スクの両側面に吹き付けて冷却される。冷却されたシャ
ドウマスクはコンベアで取出口に送られ、取り外される
Conventional shadow mask cleaning is performed by suspending the shadow on a conveyor and sequentially conveying it to an ultrasonic cleaning section, a hot air drying oven, and a cooling section. That is, the shadow mask suspended on the conveyor in the supply section is first sent to the ultrasonic cleaning section,
It is cleaned by being irradiated with ultrasonic waves of heated pure water, and when it is pulled out of the pure water, it is rinsed with pure water and placed in a hot air drying oven. In the hot air drying oven, the attached water is blown off by high pressure hot air and the material is dried. The dried shadow mask is cooled by a cooling unit that blows cooling air onto both sides of the shadow mask. The cooled shadow mask is sent to the outlet by a conveyor and removed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

シャドウマスクは、一般的に板厚がQ,15mでかつ全
面にわたり多数の孔があり、熱容量が非常に小さい。こ
のためシャドウマスク自体の温度は外気温度に影響され
易く、風を吹き付けた場合、瞬時にしてその風の温度に
々る。一方、シャドウマスクを保持するサポート7レー
ムは、一般的に板厚が1.0〜2.3鵡でシャドウマス
クに比べた場合、熱容量が非常に大きく、その温度も容
易に変化しない。
A shadow mask generally has a plate thickness of Q, 15 m, has many holes over its entire surface, and has a very small heat capacity. For this reason, the temperature of the shadow mask itself is easily influenced by the outside air temperature, and when wind is blown onto it, it instantly reaches the temperature of the wind. On the other hand, the support 7 frame that holds the shadow mask generally has a plate thickness of 1.0 to 2.3 mm, has a very large heat capacity compared to the shadow mask, and its temperature does not change easily.

上記従来技術は、熱風乾燥後に冷却を行うので、冷却速
度を速くすると熱容量の異なるシャドウマスクとそのサ
ポート7レームに大きな温度差を生じてシャドウマスク
が変形する。そこで従来は、シャドウマスクの変形を防
止するために冷却速度を遅くしているので、洗浄装置出
口におけるサポートフレームの温度が高く、人手による
ハンドリングが困難であり、またすぐに他のプロセスへ
使用することができ々いという問題があった。
In the above-mentioned conventional technology, cooling is performed after hot air drying, so if the cooling rate is increased, a large temperature difference is generated between the shadow mask and its support 7 frames having different heat capacities, and the shadow mask is deformed. Conventionally, the cooling rate is slowed down to prevent the shadow mask from deforming, so the temperature of the support frame at the outlet of the cleaning device is high, making it difficult to handle manually, and it cannot be used immediately for other processes. The problem was that it was difficult to do.

本発明の目的は、洗浄工程中におけるシャドウマスクの
変形を防止することができると共に、取り出した後のシ
ャドウマスクのハンドリング及び他のプロセスへの使用
を容易ならしめることができるシャドウマスク洗浄装置
及び洗浄方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a shadow mask cleaning device and cleaning device that can prevent deformation of a shadow mask during a cleaning process and facilitate handling of the shadow mask after removal and use in other processes. The purpose is to provide a method.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するために、洗浄装置としては、熱風乾
燥炉と強制冷却トンネル部の間に、シャドウマスクに微
風を供給する徐冷トンネル部を設けた。
In order to achieve the above object, the cleaning device was provided with a slow cooling tunnel section that supplied a breeze to the shadow mask between the hot air drying oven and the forced cooling tunnel section.

また洗浄方法は、熱風乾燥工程と強制冷却工程の間に、
微風によってサポートフレームが80℃以下の温度にな
るまで徐冷する徐冷工程を設けた。
In addition, the cleaning method is such that between the hot air drying process and the forced cooling process,
A slow cooling step was provided in which the support frame was slowly cooled to a temperature of 80° C. or lower using a breeze.

更に強制冷却トンネル部においては、急激な温度変化を
さげるように、出口側から入口側方向に冷却空気が流れ
るように構威した。
Furthermore, in the forced cooling tunnel section, cooling air was designed to flow from the outlet side to the inlet side to reduce sudden temperature changes.

〔作用〕[Effect]

熱風乾燥されたシャドウマスクは、まず徐冷トンネル部
で徐冷されるので、シャドウマスクとサポートフレーム
の温度差がシャドウマスクの変形を生じ々い60℃以内
を保つようにしながら、ナボートフレームの温度を80
℃以下に、例えば20℃の空気を使って冷却することが
できる。
The shadow mask that has been dried with hot air is first slowly cooled in the slow cooling tunnel section, so the temperature difference between the shadow mask and the support frame is likely to cause deformation of the shadow mask. temperature to 80
It can be cooled to below 0.degree. C., for example, using air at 20.degree.

このように80℃以下になったサポートフレームを次に
強制冷却するので、この強制冷却工程ではシャドウマス
ク及びサポートの取出口における温度が40℃以下にな
るように冷却してもシャドクマスクの変形はおきにくい
The support frame, which has become below 80°C, is then forcedly cooled, so in this forced cooling process, even if the temperature at the outlet of the shadow mask and support is cooled to below 40°C, the shadow mask will not deform. It's hard to wake up.

この強制冷却においては、冷却風をシャドクマスクの搬
送方向と逆方向に流すと、冷却風の温度勾配は入口側よ
り出口側が低くなるので、急激な温度変化がさげられ、
より効果的に冷却させることができる。
In this forced cooling, when the cooling air is flowed in the opposite direction to the conveyance direction of the shadow mask, the temperature gradient of the cooling air is lower on the exit side than on the inlet side, so sudden temperature changes are reduced.
It can be cooled more effectively.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図により説明する。純水
を用いた超音波洗浄部1、熱風乾燥炉2、徐冷トンネル
部3及び強制冷却トンネル部4が順次配設されており、
これらの各部1〜4には矢印5方向に間欠駆動されるコ
ンベア6にシャドウマスク7が吊り下げられて搬送され
る。
An embodiment of the present invention will be described below with reference to FIG. An ultrasonic cleaning section 1 using pure water, a hot air drying oven 2, a slow cooling tunnel section 3, and a forced cooling tunnel section 4 are arranged in this order.
A shadow mask 7 is suspended and conveyed to each of these parts 1 to 4 by a conveyor 6 that is driven intermittently in the direction of arrow 5.

シャドウマスク7は供給部6aでコンベア6に投入して
吊D下げられ、まず超音波洗浄部1に入る。超音波洗浄
部1は、大きくは、純水を満した純水タンクと、純水か
ら生ずる湯気を室内に散らさないように集めるカバーと
から構成されている。
The shadow mask 7 is fed into the conveyor 6 in the supply section 6a, suspended D, and first enters the ultrasonic cleaning section 1. The ultrasonic cleaning section 1 is broadly composed of a pure water tank filled with pure water and a cover that collects steam generated from the pure water so as not to scatter it into the room.

純水タンクには、純水を50〜85℃に加熱するヒータ
及びシャドウマスク7が通遇する両サイドに超音波振動
子が設けられている。またシャドウマスク7が純水から
引き上げられる部分にはスプレーによるリンスユニット
が設けられている。またカバーで集められた湯気は排気
口1aから外部に強制排出される。々お、1bは き窓
を示す。
The pure water tank is provided with ultrasonic vibrators on both sides where the shadow mask 7 and a heater that heats the pure water to 50 to 85°C are in contact. Further, a spray rinsing unit is provided at a portion where the shadow mask 7 is lifted out of the pure water. Further, the steam collected by the cover is forcibly discharged to the outside from the exhaust port 1a. 1b indicates the window.

従って、シャドウマスク7は、純水タンク中を通過する
間に50〜85℃に加熱された純水によつて超音波の照
射を受けて洗浄される。洗浄されたシャドウマスク7は
、純水から引き上げられる時に清浄な純水ですすぎ洗い
され、次の熱風乾燥炉2に入る。
Therefore, the shadow mask 7 is cleaned by ultrasonic irradiation with pure water heated to 50 to 85° C. while passing through a pure water tank. When the washed shadow mask 7 is pulled up from the pure water, it is rinsed with clean pure water and then enters the next hot air drying oven 2.

熱風乾燥炉2内には、外部より図示しない熱風発生器に
より高圧熱風(0.5〜2々/d,80〜130℃)が
供給されるようになっており、またこの80−130℃
の熱風を循環させるファンが配設されている。従って、
シャドウマスク7に付着している水を高圧熱風により吹
き飛ばしながら乾燥し、次にファンによって循環してい
る80〜130℃の熱風によって乾燥される。なお、湿
気を帯びた熱風は排気口2aより強制排出される。
High pressure hot air (0.5~2/d, 80~130°C) is supplied into the hot air drying oven 2 from the outside by a hot air generator (not shown), and this 80~130°C
A fan is installed to circulate hot air. Therefore,
The water adhering to the shadow mask 7 is dried while being blown off with high-pressure hot air, and then the shadow mask 7 is dried with hot air of 80 to 130°C circulated by a fan. Note that the humid hot air is forcibly discharged from the exhaust port 2a.

乾燥されたシャドウマスク7は次の徐冷トンネル部3に
入る。徐冷トンネル部3にはトンネル内の温度を20〜
60℃に保つように微風が供給されており、シャドウマ
スク7はこの徐冷トンネル部3で80℃以下の温度にな
るまで徐冷される。
The dried shadow mask 7 enters the next slow cooling tunnel section 3. In the slow cooling tunnel section 3, the temperature inside the tunnel is set to 20~
A breeze is supplied to maintain the temperature at 60° C., and the shadow mask 7 is gradually cooled in this slow cooling tunnel section 3 until the temperature reaches 80° C. or less.

また高温になった空気は排気口3aより排気される。Moreover, the high temperature air is exhausted from the exhaust port 3a.

徐冷トンネル部3を出たシャドウマスク7は次の強制冷
却トンネル部4に入る。強制冷却トンネル部4には、冷
却空気を強制的に供給する吹き込み口4aが出口側に設
けられ、また冷却空気を排出する排出口4bが入口側に
設けられている。従って、強制冷却トンネル部4内を移
動中にシャドウマスク7は冷却用空気によって急速に冷
却される。この場合、冷却風は強制冷却トンネル部4の
出口側から入口側に流れているので、急激な温度変化を
さげながらシャドウマスク7は冷却され、取出口6bに
到達するまでに40℃以下に冷却させることができる。
The shadow mask 7 that has exited the slow cooling tunnel section 3 enters the next forced cooling tunnel section 4. The forced cooling tunnel portion 4 is provided with an inlet 4a on the outlet side for forcibly supplying cooling air, and an outlet 4b on the inlet side for discharging the cooling air. Therefore, the shadow mask 7 is rapidly cooled by the cooling air while moving within the forced cooling tunnel section 4. In this case, since the cooling air flows from the exit side to the entrance side of the forced cooling tunnel section 4, the shadow mask 7 is cooled while reducing sudden temperature changes, and is cooled to below 40°C by the time it reaches the outlet 6b. can be done.

強制冷却トンネル部4を出たシャドクマスク7は取出口
6bでコンベア6より取り出される。
The shadow mask 7 that has exited the forced cooling tunnel section 4 is taken out from the conveyor 6 at the takeout port 6b.

txお、上記実施例においては、洗浄部1として、タン
ク内の加熱した純水にシャドウマスクを浸して超音波を
照射して洗浄する場合について説明したが、加熱した純
水のシャワーで洗浄してもよい。
tx Oh, in the above embodiment, the case where the shadow mask is immersed in heated pure water in a tank and irradiated with ultrasonic waves for cleaning is explained as the cleaning part 1. You can.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、徐冷後に強制冷却するので、熱容量の
異なるシャドウマスクとサポートフレームの温度差をシ
ャドウマスクが変化を起さむい60℃以内にコントロー
ルしながら冷却することができる。また、シャドウマス
クの変形を防止しながら、取出口に至るまでにシャドウ
マスク及びサポートフレームをハンドリングが容易で、
次のプロセスに直ちに使用できる温度まで冷却すること
ができる。
According to the present invention, since forced cooling is performed after slow cooling, cooling can be performed while controlling the temperature difference between the shadow mask and the support frame, which have different heat capacities, to within 60° C. without causing any change in the shadow mask. In addition, while preventing deformation of the shadow mask, it is easy to handle the shadow mask and support frame before reaching the extraction port.
It can be cooled to a temperature where it can be used immediately for the next process.

【図面の簡単な説明】[Brief explanation of drawings]

第l図は本発明の一実施例を示す概略説明図である。 1・・・超音波洗浄部、   2・・・熱風乾燥炉、3
・・・徐冷トンネル部、   4・・・強制冷却トンネ
ル部、   4a・・・吹き込み口、   4b・・・
排出口、6・・・コンベア、   7・・・シャドウマ
スク。 第 l 図 4:強#I’J々却トンネル舒 6:コンベ7 7:シャト゛勺マスク
FIG. 1 is a schematic explanatory diagram showing one embodiment of the present invention. 1... Ultrasonic cleaning section, 2... Hot air drying oven, 3
...Slow cooling tunnel part, 4...Forced cooling tunnel part, 4a...Blowing port, 4b...
Discharge port, 6...conveyor, 7...shadow mask. Figure 4: Strong #I'J tunnel switch 6: Combe 7 7: Shatton mask

Claims (1)

【特許請求の範囲】 1、シヤドウマスクを加熱した純水で洗浄する洗浄部と
、洗浄されたシヤドウマスクに加熱した高圧空気及び熱
風を吹き付けて水切り乾燥する熱風乾燥炉と、乾燥され
たシヤドウマスクに微風を供給する徐冷トンネル部と、
徐冷されたシヤドウマスクに冷却空気を供給する強制冷
却トンネル部と、シヤドウマスクを吊して前記各面に順
次搬送するコンベアとを備えたシヤドウマスク洗浄装置
。 2、シヤドウマスクを50〜85℃に加熱された純水で
洗浄する洗浄工程と、0.5〜2Kg/cm^3及び8
0〜130℃の高圧熱風によりシヤドウマスクに付着し
た水を吹き飛ばしながら乾燥し、次に80〜130℃の
熱風で乾燥する熱風乾燥工程と、微風によつてシヤドウ
マスクを保持するサポートフレームが80℃以下の温度
になるまで徐冷する徐冷工程と、シヤドウマスクの取出
口においてシヤドウマスク及びサポートフレームの温度
が40℃以下になるように冷却空気で強制冷却する強制
冷却工程とからなるシヤドウマスク洗浄方法。
[Scope of Claims] 1. A cleaning unit that cleans the shadow mask with heated pure water, a hot air drying oven that blows heated high-pressure air and hot air onto the washed shadow mask to drain and dry it, and a breeze blows onto the dried shadow mask. A slow cooling tunnel section for supplying
A shadow mask cleaning device comprising a forced cooling tunnel section that supplies cooling air to a slowly cooled shadow mask, and a conveyor that suspends the shadow mask and sequentially conveys it to each of the surfaces. 2. A cleaning process in which the shadow mask is washed with pure water heated to 50-85℃, and 0.5-2Kg/cm^3 and 8
A hot air drying process involves blowing away the water adhering to the shadow mask using high-pressure hot air at 0 to 130 degrees Celsius, and then drying it with hot air at 80 to 130 degrees Celsius. A method for cleaning a shadow mask, which comprises a slow cooling step in which the shadow mask and support frame are cooled slowly until the temperature reaches a certain temperature, and a forced cooling step in which the shadow mask and support frame are forcibly cooled with cooling air so that the temperature of the shadow mask and support frame becomes 40° C. or less at the outlet of the shadow mask.
JP1229177A 1989-09-06 1989-09-06 SHADOW MASK CLEANING APPARATUS AND CLEANING METHOD Expired - Fee Related JP2972234B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1229177A JP2972234B2 (en) 1989-09-06 1989-09-06 SHADOW MASK CLEANING APPARATUS AND CLEANING METHOD

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1229177A JP2972234B2 (en) 1989-09-06 1989-09-06 SHADOW MASK CLEANING APPARATUS AND CLEANING METHOD

Publications (2)

Publication Number Publication Date
JPH0393131A true JPH0393131A (en) 1991-04-18
JP2972234B2 JP2972234B2 (en) 1999-11-08

Family

ID=16888003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1229177A Expired - Fee Related JP2972234B2 (en) 1989-09-06 1989-09-06 SHADOW MASK CLEANING APPARATUS AND CLEANING METHOD

Country Status (1)

Country Link
JP (1) JP2972234B2 (en)

Also Published As

Publication number Publication date
JP2972234B2 (en) 1999-11-08

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