JPH038579B2 - - Google Patents

Info

Publication number
JPH038579B2
JPH038579B2 JP59171332A JP17133284A JPH038579B2 JP H038579 B2 JPH038579 B2 JP H038579B2 JP 59171332 A JP59171332 A JP 59171332A JP 17133284 A JP17133284 A JP 17133284A JP H038579 B2 JPH038579 B2 JP H038579B2
Authority
JP
Japan
Prior art keywords
film
carbon plate
carbon
layer
polycrystalline silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59171332A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6149416A (ja
Inventor
Ichiro Hide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hokusan Co Ltd
Original Assignee
Hokusan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hokusan Co Ltd filed Critical Hokusan Co Ltd
Priority to JP17133284A priority Critical patent/JPS6149416A/ja
Publication of JPS6149416A publication Critical patent/JPS6149416A/ja
Publication of JPH038579B2 publication Critical patent/JPH038579B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Photovoltaic Devices (AREA)
  • Recrystallisation Techniques (AREA)
  • Silicon Compounds (AREA)
JP17133284A 1984-08-17 1984-08-17 多結晶シリコンウエハ製造用カ−ボン皿のコ−テイング方法 Granted JPS6149416A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17133284A JPS6149416A (ja) 1984-08-17 1984-08-17 多結晶シリコンウエハ製造用カ−ボン皿のコ−テイング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17133284A JPS6149416A (ja) 1984-08-17 1984-08-17 多結晶シリコンウエハ製造用カ−ボン皿のコ−テイング方法

Publications (2)

Publication Number Publication Date
JPS6149416A JPS6149416A (ja) 1986-03-11
JPH038579B2 true JPH038579B2 (enrdf_load_stackoverflow) 1991-02-06

Family

ID=15921265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17133284A Granted JPS6149416A (ja) 1984-08-17 1984-08-17 多結晶シリコンウエハ製造用カ−ボン皿のコ−テイング方法

Country Status (1)

Country Link
JP (1) JPS6149416A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6200388B1 (en) * 1998-02-11 2001-03-13 Applied Materials, Inc. Substrate support for a thermal processing chamber
CN103978746B (zh) * 2014-05-06 2016-06-08 上海天马有机发光显示技术有限公司 一种膜及其制备方法、显示面板及显示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS609656B2 (ja) * 1981-02-10 1985-03-12 工業技術院長 多結晶シリコン半導体の製造方法
JPS5953208B2 (ja) * 1981-07-28 1984-12-24 工業技術院長 多結晶シリコン半導体の製造方法
JPS5953209B2 (ja) * 1981-08-06 1984-12-24 工業技術院長 多結晶シリコンインゴットの鋳造法

Also Published As

Publication number Publication date
JPS6149416A (ja) 1986-03-11

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term