JPH037752B2 - - Google Patents

Info

Publication number
JPH037752B2
JPH037752B2 JP59259777A JP25977784A JPH037752B2 JP H037752 B2 JPH037752 B2 JP H037752B2 JP 59259777 A JP59259777 A JP 59259777A JP 25977784 A JP25977784 A JP 25977784A JP H037752 B2 JPH037752 B2 JP H037752B2
Authority
JP
Japan
Prior art keywords
susceptor
susceptors
bell gear
vapor phase
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59259777A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61136676A (ja
Inventor
Seiichi Nakamura
Satoru Nakayama
Fuminori Higami
Junichi Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP25977784A priority Critical patent/JPS61136676A/ja
Publication of JPS61136676A publication Critical patent/JPS61136676A/ja
Publication of JPH037752B2 publication Critical patent/JPH037752B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP25977784A 1984-12-07 1984-12-07 気相成長装置 Granted JPS61136676A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25977784A JPS61136676A (ja) 1984-12-07 1984-12-07 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25977784A JPS61136676A (ja) 1984-12-07 1984-12-07 気相成長装置

Publications (2)

Publication Number Publication Date
JPS61136676A JPS61136676A (ja) 1986-06-24
JPH037752B2 true JPH037752B2 (enrdf_load_stackoverflow) 1991-02-04

Family

ID=17338826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25977784A Granted JPS61136676A (ja) 1984-12-07 1984-12-07 気相成長装置

Country Status (1)

Country Link
JP (1) JPS61136676A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8540818B2 (en) * 2009-04-28 2013-09-24 Mitsubishi Materials Corporation Polycrystalline silicon reactor
CN102485953B (zh) * 2010-12-01 2014-07-30 北京北方微电子基地设备工艺研究中心有限责任公司 托盘装置及结晶膜生长设备
JP6407762B2 (ja) 2015-02-23 2018-10-17 東京エレクトロン株式会社 成膜装置
US11390950B2 (en) * 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4062318A (en) * 1976-11-19 1977-12-13 Rca Corporation Apparatus for chemical vapor deposition

Also Published As

Publication number Publication date
JPS61136676A (ja) 1986-06-24

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