JPH0374506B2 - - Google Patents
Info
- Publication number
- JPH0374506B2 JPH0374506B2 JP60010616A JP1061685A JPH0374506B2 JP H0374506 B2 JPH0374506 B2 JP H0374506B2 JP 60010616 A JP60010616 A JP 60010616A JP 1061685 A JP1061685 A JP 1061685A JP H0374506 B2 JPH0374506 B2 JP H0374506B2
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- cassette
- stocker
- disk
- stored
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P72/3404—
-
- H10P72/3411—
Landscapes
- Specific Conveyance Elements (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60010616A JPS61168934A (ja) | 1985-01-22 | 1985-01-22 | ウエハハンドリング方法 |
| US06/819,253 US4759681A (en) | 1985-01-22 | 1986-01-16 | End station for an ion implantation apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60010616A JPS61168934A (ja) | 1985-01-22 | 1985-01-22 | ウエハハンドリング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61168934A JPS61168934A (ja) | 1986-07-30 |
| JPH0374506B2 true JPH0374506B2 (enExample) | 1991-11-27 |
Family
ID=11755164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60010616A Granted JPS61168934A (ja) | 1985-01-22 | 1985-01-22 | ウエハハンドリング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61168934A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0265252A (ja) * | 1988-08-31 | 1990-03-05 | Nec Kyushu Ltd | 半導体製造装置 |
| JPH0727955B2 (ja) * | 1990-08-03 | 1995-03-29 | 国際電気株式会社 | ウェーハ移載方法及びその制御装置及び半導体製造装置 |
| JP2584927Y2 (ja) * | 1992-06-25 | 1998-11-11 | 日新電機株式会社 | イオン注入装置 |
| JP2014225707A (ja) * | 2014-09-01 | 2014-12-04 | 東京エレクトロン株式会社 | 基板処理装置 |
| JP7345437B2 (ja) * | 2020-06-30 | 2023-09-15 | 三菱電機株式会社 | イオン注入装置および半導体装置の製造方法 |
-
1985
- 1985-01-22 JP JP60010616A patent/JPS61168934A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61168934A (ja) | 1986-07-30 |
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