JPH0369102B2 - - Google Patents

Info

Publication number
JPH0369102B2
JPH0369102B2 JP11955983A JP11955983A JPH0369102B2 JP H0369102 B2 JPH0369102 B2 JP H0369102B2 JP 11955983 A JP11955983 A JP 11955983A JP 11955983 A JP11955983 A JP 11955983A JP H0369102 B2 JPH0369102 B2 JP H0369102B2
Authority
JP
Japan
Prior art keywords
group
atom
alkyl group
substituted
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11955983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6012544A (ja
Inventor
Minoru Maeda
Masayuki Iwasaki
Fumiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11955983A priority Critical patent/JPS6012544A/ja
Priority to EP84107585A priority patent/EP0131824B1/en
Priority to DE8484107585T priority patent/DE3482215D1/de
Priority to US06/626,950 priority patent/US4543318A/en
Publication of JPS6012544A publication Critical patent/JPS6012544A/ja
Publication of JPH0369102B2 publication Critical patent/JPH0369102B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP11955983A 1983-07-01 1983-07-01 光重合性組成物 Granted JPS6012544A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP11955983A JPS6012544A (ja) 1983-07-01 1983-07-01 光重合性組成物
EP84107585A EP0131824B1 (en) 1983-07-01 1984-06-29 Photopolymerizable composition
DE8484107585T DE3482215D1 (de) 1983-07-01 1984-06-29 Photopolymerisierbare zusammensetzung.
US06/626,950 US4543318A (en) 1983-07-01 1984-07-02 Photopolymerizable composition containing heterocyclic additives

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11955983A JPS6012544A (ja) 1983-07-01 1983-07-01 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS6012544A JPS6012544A (ja) 1985-01-22
JPH0369102B2 true JPH0369102B2 (US06824948-20041130-C00029.png) 1991-10-30

Family

ID=14764313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11955983A Granted JPS6012544A (ja) 1983-07-01 1983-07-01 光重合性組成物

Country Status (1)

Country Link
JP (1) JPS6012544A (US06824948-20041130-C00029.png)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6417048A (en) * 1987-07-10 1989-01-20 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH0820736B2 (ja) * 1988-08-04 1996-03-04 富士写真フイルム株式会社 光重合性組成物
JP4177280B2 (ja) * 2004-03-25 2008-11-05 東芝ソリューション株式会社 計画業務管理支援システム、及び計画業務管理支援プログラム

Also Published As

Publication number Publication date
JPS6012544A (ja) 1985-01-22

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