JPH0367260B2 - - Google Patents

Info

Publication number
JPH0367260B2
JPH0367260B2 JP59166624A JP16662484A JPH0367260B2 JP H0367260 B2 JPH0367260 B2 JP H0367260B2 JP 59166624 A JP59166624 A JP 59166624A JP 16662484 A JP16662484 A JP 16662484A JP H0367260 B2 JPH0367260 B2 JP H0367260B2
Authority
JP
Japan
Prior art keywords
layer
molybdenum
molybdenum nitride
nitride layer
angstroms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59166624A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6076736A (ja
Inventor
Jeroomu Kimu Manjin
Mariusu Buraun Deiru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS6076736A publication Critical patent/JPS6076736A/ja
Publication of JPH0367260B2 publication Critical patent/JPH0367260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H10P76/2043—
    • H10P14/6316—
    • H10P14/6939—

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP59166624A 1983-08-22 1984-08-10 モリブデン層からの反射光低減法 Granted JPS6076736A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52509083A 1983-08-22 1983-08-22
US525090 1990-05-16

Publications (2)

Publication Number Publication Date
JPS6076736A JPS6076736A (ja) 1985-05-01
JPH0367260B2 true JPH0367260B2 (enExample) 1991-10-22

Family

ID=24091876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59166624A Granted JPS6076736A (ja) 1983-08-22 1984-08-10 モリブデン層からの反射光低減法

Country Status (3)

Country Link
JP (1) JPS6076736A (enExample)
DE (1) DE3428564A1 (enExample)
GB (1) GB2145539B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3534600A1 (de) * 1985-09-27 1987-04-02 Siemens Ag Integrierte schaltung mit elektrischen leiterbahnen und verfahren zu ihrer herstellung
ES2063032T3 (es) * 1987-04-24 1995-01-01 Advanced Micro Devices Inc Revestimientos antirreflexivos para utilizacion en fotolitografia.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5593225A (en) * 1979-01-10 1980-07-15 Hitachi Ltd Forming method of minute pattern
GB2061615A (en) * 1979-10-25 1981-05-13 Gen Electric Composite conductors for integrated circuits

Also Published As

Publication number Publication date
GB2145539A (en) 1985-03-27
GB8416974D0 (en) 1984-08-08
JPS6076736A (ja) 1985-05-01
GB2145539B (en) 1986-08-28
DE3428564A1 (de) 1985-03-14
DE3428564C2 (enExample) 1987-08-13

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