DE3428564C2 - - Google Patents

Info

Publication number
DE3428564C2
DE3428564C2 DE3428564A DE3428564A DE3428564C2 DE 3428564 C2 DE3428564 C2 DE 3428564C2 DE 3428564 A DE3428564 A DE 3428564A DE 3428564 A DE3428564 A DE 3428564A DE 3428564 C2 DE3428564 C2 DE 3428564C2
Authority
DE
Germany
Prior art keywords
layer
molybdenum
molybdenum nitride
nitride
reflections
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3428564A
Other languages
German (de)
English (en)
Other versions
DE3428564A1 (de
Inventor
Manjin Jerome Kim
Dale Marius Schenectady N.Y. Us Brown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE3428564A1 publication Critical patent/DE3428564A1/de
Application granted granted Critical
Publication of DE3428564C2 publication Critical patent/DE3428564C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H10P76/2043—
    • H10P14/6316—
    • H10P14/6939—

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE19843428564 1983-08-22 1984-08-02 Antireflexionsueberzug fuer molybdaen Granted DE3428564A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52509083A 1983-08-22 1983-08-22

Publications (2)

Publication Number Publication Date
DE3428564A1 DE3428564A1 (de) 1985-03-14
DE3428564C2 true DE3428564C2 (enExample) 1987-08-13

Family

ID=24091876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843428564 Granted DE3428564A1 (de) 1983-08-22 1984-08-02 Antireflexionsueberzug fuer molybdaen

Country Status (3)

Country Link
JP (1) JPS6076736A (enExample)
DE (1) DE3428564A1 (enExample)
GB (1) GB2145539B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3534600A1 (de) * 1985-09-27 1987-04-02 Siemens Ag Integrierte schaltung mit elektrischen leiterbahnen und verfahren zu ihrer herstellung
ES2063032T3 (es) * 1987-04-24 1995-01-01 Advanced Micro Devices Inc Revestimientos antirreflexivos para utilizacion en fotolitografia.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5593225A (en) * 1979-01-10 1980-07-15 Hitachi Ltd Forming method of minute pattern
GB2061615A (en) * 1979-10-25 1981-05-13 Gen Electric Composite conductors for integrated circuits

Also Published As

Publication number Publication date
GB2145539A (en) 1985-03-27
GB8416974D0 (en) 1984-08-08
JPS6076736A (ja) 1985-05-01
GB2145539B (en) 1986-08-28
DE3428564A1 (de) 1985-03-14
JPH0367260B2 (enExample) 1991-10-22

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DE3428564C2 (enExample)

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: SIEB, R., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 6947 LAUDENBACH

8339 Ceased/non-payment of the annual fee