JPH036496B2 - - Google Patents

Info

Publication number
JPH036496B2
JPH036496B2 JP59148734A JP14873484A JPH036496B2 JP H036496 B2 JPH036496 B2 JP H036496B2 JP 59148734 A JP59148734 A JP 59148734A JP 14873484 A JP14873484 A JP 14873484A JP H036496 B2 JPH036496 B2 JP H036496B2
Authority
JP
Japan
Prior art keywords
group
compound
resin composition
photosensitive resin
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59148734A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6127535A (ja
Inventor
Kunio Yanagisawa
Yasuhiko Araki
Hajime Shobi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP14873484A priority Critical patent/JPS6127535A/ja
Publication of JPS6127535A publication Critical patent/JPS6127535A/ja
Publication of JPH036496B2 publication Critical patent/JPH036496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14873484A 1984-07-17 1984-07-17 感光性樹脂組成物 Granted JPS6127535A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14873484A JPS6127535A (ja) 1984-07-17 1984-07-17 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14873484A JPS6127535A (ja) 1984-07-17 1984-07-17 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6127535A JPS6127535A (ja) 1986-02-07
JPH036496B2 true JPH036496B2 (enrdf_load_html_response) 1991-01-30

Family

ID=15459413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14873484A Granted JPS6127535A (ja) 1984-07-17 1984-07-17 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6127535A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2585224B2 (ja) * 1986-07-03 1997-02-26 三井東圧化学株式会社 感光性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3131448A1 (de) * 1981-08-07 1983-02-24 Basf Ag, 6700 Ludwigshafen Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse

Also Published As

Publication number Publication date
JPS6127535A (ja) 1986-02-07

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