JPH0364869B2 - - Google Patents
Info
- Publication number
- JPH0364869B2 JPH0364869B2 JP57078857A JP7885782A JPH0364869B2 JP H0364869 B2 JPH0364869 B2 JP H0364869B2 JP 57078857 A JP57078857 A JP 57078857A JP 7885782 A JP7885782 A JP 7885782A JP H0364869 B2 JPH0364869 B2 JP H0364869B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- nickel
- transparent conductive
- conductive film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 42
- 238000007747 plating Methods 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 22
- 229910052759 nickel Inorganic materials 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000005530 etching Methods 0.000 claims description 15
- 229910000510 noble metal Inorganic materials 0.000 claims description 9
- 239000004973 liquid crystal related substance Substances 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 claims description 4
- 239000010970 precious metal Substances 0.000 claims description 4
- 238000000059 patterning Methods 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 239000010931 gold Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 10
- 229910052737 gold Inorganic materials 0.000 description 7
- 238000007772 electroless plating Methods 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 229910003437 indium oxide Inorganic materials 0.000 description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- 229910018104 Ni-P Inorganic materials 0.000 description 3
- 229910018536 Ni—P Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 101150003085 Pdcl gene Proteins 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000002574 poison Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910017888 Cu—P Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7885782A JPS58194084A (ja) | 1982-05-10 | 1982-05-10 | 表示パネルの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7885782A JPS58194084A (ja) | 1982-05-10 | 1982-05-10 | 表示パネルの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58194084A JPS58194084A (ja) | 1983-11-11 |
| JPH0364869B2 true JPH0364869B2 (ko) | 1991-10-08 |
Family
ID=13673492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7885782A Granted JPS58194084A (ja) | 1982-05-10 | 1982-05-10 | 表示パネルの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58194084A (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017057484A (ja) * | 2015-09-18 | 2017-03-23 | 石原ケミカル株式会社 | 透明導電膜上への導電性皮膜形成方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5463770A (en) * | 1977-10-14 | 1979-05-22 | Nippon Telegr & Teleph Corp <Ntt> | Electrochromic display plate |
| JPS556346A (en) * | 1978-06-27 | 1980-01-17 | Sharp Kk | Electrode pattern and method of forming same |
| JPS5548935A (en) * | 1978-10-03 | 1980-04-08 | Sharp Corp | Forming of electrode pattern |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5938068Y2 (ja) * | 1980-03-27 | 1984-10-22 | 株式会社日立製作所 | 基板上のパタ−ン構造 |
-
1982
- 1982-05-10 JP JP7885782A patent/JPS58194084A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5463770A (en) * | 1977-10-14 | 1979-05-22 | Nippon Telegr & Teleph Corp <Ntt> | Electrochromic display plate |
| JPS556346A (en) * | 1978-06-27 | 1980-01-17 | Sharp Kk | Electrode pattern and method of forming same |
| JPS5548935A (en) * | 1978-10-03 | 1980-04-08 | Sharp Corp | Forming of electrode pattern |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017057484A (ja) * | 2015-09-18 | 2017-03-23 | 石原ケミカル株式会社 | 透明導電膜上への導電性皮膜形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58194084A (ja) | 1983-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100463818B1 (ko) | 전기 배선의 제조방법 및 이 방법에 의해 제조된 전기배선을 갖는 배선 기판 | |
| US4859036A (en) | Device plate having conductive films selected to prevent pin-holes | |
| US6156413A (en) | Glass circuit substrate and fabrication method thereof | |
| CN100516986C (zh) | 导电结构及其形成方法、阵列基板以及液晶显示面板 | |
| JPS6219756B2 (ko) | ||
| US5485294A (en) | Process for producing MIM elements by electrolytic polymerization | |
| EP0083458B1 (en) | Method of partially metallising electrically conductive non-metallic patterns | |
| US5384154A (en) | Method of selectively providing a pattern of a material other than glass on a glass substrate by electroless metallization | |
| US4385976A (en) | Solderable layer system, its use and method for manufacturing same | |
| JPH0364869B2 (ko) | ||
| JPH022948B2 (ko) | ||
| JP2003051463A (ja) | 金属配線の製造方法およびその方法を用いた金属配線基板 | |
| JPH0283533A (ja) | 液晶表示装置及びそれに用いる電極基板 | |
| JPH0470613B2 (ko) | ||
| JPH027475B2 (ko) | ||
| JPH04357692A (ja) | 薄膜ヒータ及びその製造方法 | |
| JP3299167B2 (ja) | 埋設電極付き基板の製造方法 | |
| JPS6161667B2 (ko) | ||
| JPS60245781A (ja) | 透明導電膜パタ−ン上へのめつき方法 | |
| JPH05335424A (ja) | 絶縁層を介した上部電極と下部電極の導通方法及びその構造 | |
| JP2000259096A (ja) | 表示デバイス用基板の製造方法および表示デバイス用基板 | |
| JPH0447923B2 (ko) | ||
| JPH0585637B2 (ko) | ||
| JP3047183B2 (ja) | 液晶装置の製造方法 | |
| JPS614094A (ja) | 電気光学的機能素子及びその製造方法 |