JPH0363734B2 - - Google Patents

Info

Publication number
JPH0363734B2
JPH0363734B2 JP11323183A JP11323183A JPH0363734B2 JP H0363734 B2 JPH0363734 B2 JP H0363734B2 JP 11323183 A JP11323183 A JP 11323183A JP 11323183 A JP11323183 A JP 11323183A JP H0363734 B2 JPH0363734 B2 JP H0363734B2
Authority
JP
Japan
Prior art keywords
pattern
unnecessary
substrate
photomask
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11323183A
Other languages
English (en)
Japanese (ja)
Other versions
JPS605523A (ja
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58113231A priority Critical patent/JPS605523A/ja
Publication of JPS605523A publication Critical patent/JPS605523A/ja
Publication of JPH0363734B2 publication Critical patent/JPH0363734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58113231A 1983-06-23 1983-06-23 マスク修正方法 Granted JPS605523A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58113231A JPS605523A (ja) 1983-06-23 1983-06-23 マスク修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58113231A JPS605523A (ja) 1983-06-23 1983-06-23 マスク修正方法

Publications (2)

Publication Number Publication Date
JPS605523A JPS605523A (ja) 1985-01-12
JPH0363734B2 true JPH0363734B2 (enExample) 1991-10-02

Family

ID=14606884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58113231A Granted JPS605523A (ja) 1983-06-23 1983-06-23 マスク修正方法

Country Status (1)

Country Link
JP (1) JPS605523A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62158106A (ja) * 1985-12-30 1987-07-14 Hitachi Chem Co Ltd ＳｉＣ被覆用黒鉛材の製造法

Also Published As

Publication number Publication date
JPS605523A (ja) 1985-01-12

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