JPH03626B2 - - Google Patents
Info
- Publication number
- JPH03626B2 JPH03626B2 JP57015877A JP1587782A JPH03626B2 JP H03626 B2 JPH03626 B2 JP H03626B2 JP 57015877 A JP57015877 A JP 57015877A JP 1587782 A JP1587782 A JP 1587782A JP H03626 B2 JPH03626 B2 JP H03626B2
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- path
- substrate
- film forming
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007246 mechanism Effects 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 54
- 238000004519 manufacturing process Methods 0.000 claims description 45
- 108091008695 photoreceptors Proteins 0.000 claims description 43
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 230000006837 decompression Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 63
- 230000002093 peripheral effect Effects 0.000 description 12
- 238000009792 diffusion process Methods 0.000 description 8
- 238000002485 combustion reaction Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 238000004887 air purification Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57015877A JPS58132756A (ja) | 1982-02-03 | 1982-02-03 | アモルフアス・シリコン感光体製造方法とその製造装置 |
| US06/457,231 US4501766A (en) | 1982-02-03 | 1983-01-11 | Film depositing apparatus and a film depositing method |
| GB08300948A GB2114160B (en) | 1982-02-03 | 1983-01-14 | Film depositing apparatus and method |
| DE3303435A DE3303435C2 (de) | 1982-02-03 | 1983-02-02 | Vorrichtung zur Abscheidung einer Schicht aus amorphem Silizium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57015877A JPS58132756A (ja) | 1982-02-03 | 1982-02-03 | アモルフアス・シリコン感光体製造方法とその製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58132756A JPS58132756A (ja) | 1983-08-08 |
| JPH03626B2 true JPH03626B2 (de) | 1991-01-08 |
Family
ID=11901016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57015877A Granted JPS58132756A (ja) | 1982-02-03 | 1982-02-03 | アモルフアス・シリコン感光体製造方法とその製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58132756A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6010618A (ja) * | 1983-06-30 | 1985-01-19 | Canon Inc | プラズマｃｖｄ装置 |
| ATE45392T1 (de) * | 1984-02-14 | 1989-08-15 | Energy Conversion Devices Inc | Verfahren und vorrichtung zur herstellung elektrophotographischer geraete. |
-
1982
- 1982-02-03 JP JP57015877A patent/JPS58132756A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58132756A (ja) | 1983-08-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4501766A (en) | Film depositing apparatus and a film depositing method | |
| CN107686984B (zh) | 成膜装置、成膜方法以及存储介质 | |
| JPS58197262A (ja) | 量産型真空成膜装置及び真空成膜法 | |
| KR102245563B1 (ko) | 성막 장치, 성막 방법 및 기억 매체 | |
| WO2014103228A1 (ja) | インライン式プラズマｃｖｄ装置 | |
| KR100269010B1 (ko) | 3차원쉘형또는각주형기판상부박막증착형진공처리장치 | |
| JPS60184678A (ja) | 真空処理装置 | |
| JP2994652B2 (ja) | マイクロ波プラズマｃｖｄ法による堆積膜形成装置 | |
| US20180037983A1 (en) | Sputtering device | |
| JPH03626B2 (de) | ||
| JPS61110768A (ja) | アモルフアスシリコン感光体製造用装置 | |
| JPH0338586B2 (de) | ||
| US4834023A (en) | Apparatus for forming deposited film | |
| JP2009108384A (ja) | 成膜装置 | |
| JPH03625B2 (de) | ||
| JP2000282234A (ja) | スパッタリング装置 | |
| JPS6010618A (ja) | プラズマｃｖｄ装置 | |
| JPH0427293B2 (de) | ||
| WO2017156614A1 (ru) | Вакуумная установка для нанесения тонкопленочных покрытий и способ нанесения на ней оптических покрытий | |
| JPS60230981A (ja) | 気相法堆積膜製造装置 | |
| JPH06136543A (ja) | プラズマｃｖｄ装置 | |
| JPH09176856A (ja) | 枚葉式真空処理装置 | |
| JPS62146262A (ja) | 電子写真用感光体製造装置 | |
| JPH0623571Y2 (ja) | プラズマｃｖｄ装置 | |
| CN117802459A (zh) | 成膜装置 |