JPH0358528B2 - - Google Patents

Info

Publication number
JPH0358528B2
JPH0358528B2 JP59036164A JP3616484A JPH0358528B2 JP H0358528 B2 JPH0358528 B2 JP H0358528B2 JP 59036164 A JP59036164 A JP 59036164A JP 3616484 A JP3616484 A JP 3616484A JP H0358528 B2 JPH0358528 B2 JP H0358528B2
Authority
JP
Japan
Prior art keywords
mirror
light
drive source
photoelectric detector
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59036164A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60181745A (ja
Inventor
Yoichi Kuroki
Ryozo Hiraga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59036164A priority Critical patent/JPS60181745A/ja
Publication of JPS60181745A publication Critical patent/JPS60181745A/ja
Publication of JPH0358528B2 publication Critical patent/JPH0358528B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59036164A 1984-02-29 1984-02-29 光学装置 Granted JPS60181745A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59036164A JPS60181745A (ja) 1984-02-29 1984-02-29 光学装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59036164A JPS60181745A (ja) 1984-02-29 1984-02-29 光学装置

Publications (2)

Publication Number Publication Date
JPS60181745A JPS60181745A (ja) 1985-09-17
JPH0358528B2 true JPH0358528B2 (enrdf_load_html_response) 1991-09-05

Family

ID=12462122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59036164A Granted JPS60181745A (ja) 1984-02-29 1984-02-29 光学装置

Country Status (1)

Country Link
JP (1) JPS60181745A (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPS60181745A (ja) 1985-09-17

Similar Documents

Publication Publication Date Title
US5162642A (en) Device for detecting the position of a surface
JP2785146B2 (ja) 自動焦点調整制御装置
US4232969A (en) Projection optical system for aligning an image on a surface
US4468565A (en) Automatic focus and deflection correction in E-beam system using optical target height measurements
US4686359A (en) Picture scanning and recording using a photoelectric focusing system
JPS63281427A (ja) 投影露光装置
JP3162458B2 (ja) 自動アライメント調整装置
JPS62191812A (ja) 光学式結像装置及びマスクパタ−ン結像装置
JP2000194082A (ja) レンチキュラ―材料のプリントにおけるスキュ―補正
JP3068843B2 (ja) 露光装置の位置決め方法と位置決め機構
JPH0358528B2 (enrdf_load_html_response)
JPS6336526A (ja) ウエハ露光装置
JPS6372115A (ja) アライメント装置
JP2630302B2 (ja) 投影光学系における基板の位置決定方法及び投影露光方法
JP2593483B2 (ja) ＸＹθテーブルの初期設定方法
JPH0358529B2 (enrdf_load_html_response)
JPS6327690B2 (enrdf_load_html_response)
JPS623280A (ja) 回折格子露光装置
JP3174362B2 (ja) 描画装置
JPH11281319A (ja) 光学素子の位置設定装置、及び光学素子の位置設定方法
JPH08145625A (ja) 光学式変位測定装置
JP2868546B2 (ja) 露光装置
JPS61123492A (ja) レ−ザ加工装置
JPH02120818A (ja) コリメーターレンズ機構
JPS62220838A (ja) 表面検査装置