JPH0356469B2 - - Google Patents

Info

Publication number
JPH0356469B2
JPH0356469B2 JP57208471A JP20847182A JPH0356469B2 JP H0356469 B2 JPH0356469 B2 JP H0356469B2 JP 57208471 A JP57208471 A JP 57208471A JP 20847182 A JP20847182 A JP 20847182A JP H0356469 B2 JPH0356469 B2 JP H0356469B2
Authority
JP
Japan
Prior art keywords
rinsing
ipa
resist
chloroacrylate
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57208471A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5999720A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57208471A priority Critical patent/JPS5999720A/ja
Publication of JPS5999720A publication Critical patent/JPS5999720A/ja
Publication of JPH0356469B2 publication Critical patent/JPH0356469B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57208471A 1982-11-30 1982-11-30 レジスト像形成方法 Granted JPS5999720A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57208471A JPS5999720A (ja) 1982-11-30 1982-11-30 レジスト像形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57208471A JPS5999720A (ja) 1982-11-30 1982-11-30 レジスト像形成方法

Publications (2)

Publication Number Publication Date
JPS5999720A JPS5999720A (ja) 1984-06-08
JPH0356469B2 true JPH0356469B2 (enExample) 1991-08-28

Family

ID=16556720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57208471A Granted JPS5999720A (ja) 1982-11-30 1982-11-30 レジスト像形成方法

Country Status (1)

Country Link
JP (1) JPS5999720A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69032464T2 (de) * 1989-10-19 1998-11-12 Fujitsu Ltd Verfahren zur Herstellung von Photolackmustern
JP2007191399A (ja) * 2006-01-17 2007-08-02 Arakawa Chem Ind Co Ltd 脂環式化合物およびその製造方法
JP6379293B2 (ja) * 2015-06-23 2018-08-22 富士フイルム株式会社 パターン形成方法、及び電子デバイスの製造方法

Also Published As

Publication number Publication date
JPS5999720A (ja) 1984-06-08

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