JPH0355552B2 - - Google Patents

Info

Publication number
JPH0355552B2
JPH0355552B2 JP59138153A JP13815384A JPH0355552B2 JP H0355552 B2 JPH0355552 B2 JP H0355552B2 JP 59138153 A JP59138153 A JP 59138153A JP 13815384 A JP13815384 A JP 13815384A JP H0355552 B2 JPH0355552 B2 JP H0355552B2
Authority
JP
Japan
Prior art keywords
reaction tube
plasma
reaction
substrate
holding part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59138153A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6115976A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13815384A priority Critical patent/JPS6115976A/ja
Publication of JPS6115976A publication Critical patent/JPS6115976A/ja
Publication of JPH0355552B2 publication Critical patent/JPH0355552B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP13815384A 1984-07-03 1984-07-03 プラズマ反応装置およびその使用方法 Granted JPS6115976A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13815384A JPS6115976A (ja) 1984-07-03 1984-07-03 プラズマ反応装置およびその使用方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13815384A JPS6115976A (ja) 1984-07-03 1984-07-03 プラズマ反応装置およびその使用方法

Publications (2)

Publication Number Publication Date
JPS6115976A JPS6115976A (ja) 1986-01-24
JPH0355552B2 true JPH0355552B2 (enrdf_load_stackoverflow) 1991-08-23

Family

ID=15215253

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13815384A Granted JPS6115976A (ja) 1984-07-03 1984-07-03 プラズマ反応装置およびその使用方法

Country Status (1)

Country Link
JP (1) JPS6115976A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998058731A2 (en) * 1997-06-20 1998-12-30 Flowgenix Corporation Apparatus for exposing substrates to gas-phase radicals
TWI322462B (en) * 2001-09-29 2010-03-21 Cree Inc Apparatus for inverted multi-wafer mocvd fabrication
KR100745130B1 (ko) 2006-02-09 2007-08-01 삼성전자주식회사 박막 증착 장치 및 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53101276A (en) * 1977-02-16 1978-09-04 Hitachi Ltd Decompression cvd device

Also Published As

Publication number Publication date
JPS6115976A (ja) 1986-01-24

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees