JPH0353770B2 - - Google Patents

Info

Publication number
JPH0353770B2
JPH0353770B2 JP55005156A JP515680A JPH0353770B2 JP H0353770 B2 JPH0353770 B2 JP H0353770B2 JP 55005156 A JP55005156 A JP 55005156A JP 515680 A JP515680 A JP 515680A JP H0353770 B2 JPH0353770 B2 JP H0353770B2
Authority
JP
Japan
Prior art keywords
mark
coordinate
axis
measurement axis
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55005156A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56102823A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP515680A priority Critical patent/JPS56102823A/ja
Priority to US06/225,049 priority patent/US4385838A/en
Publication of JPS56102823A publication Critical patent/JPS56102823A/ja
Publication of JPH0353770B2 publication Critical patent/JPH0353770B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP515680A 1980-01-19 1980-01-19 Positioning device Granted JPS56102823A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP515680A JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device
US06/225,049 US4385838A (en) 1980-01-19 1981-01-14 Alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP515680A JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device

Publications (2)

Publication Number Publication Date
JPS56102823A JPS56102823A (en) 1981-08-17
JPH0353770B2 true JPH0353770B2 (enrdf_load_html_response) 1991-08-16

Family

ID=11603394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP515680A Granted JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device

Country Status (1)

Country Link
JP (1) JPS56102823A (enrdf_load_html_response)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (ja) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト 加工片上へのマスクの投影転写装置およびその調整方法
JPS6235640A (ja) * 1985-08-09 1987-02-16 Nec Kyushu Ltd 半導体基板のプリアライメント機構
JPH0754793B2 (ja) * 1986-04-21 1995-06-07 株式会社ニコン 投影露光装置
JP2629709B2 (ja) * 1987-05-28 1997-07-16 株式会社ニコン 位置合わせ方法及び装置
JP2580651B2 (ja) * 1987-12-18 1997-02-12 株式会社ニコン 投影露光装置及び露光方法
JP2606285B2 (ja) * 1988-06-07 1997-04-30 株式会社ニコン 露光装置および位置合わせ方法
JP2713552B2 (ja) * 1994-06-20 1998-02-16 株式会社ニコン 露光装置
JPH08222514A (ja) 1995-02-17 1996-08-30 Nikon Corp 半導体製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Also Published As

Publication number Publication date
JPS56102823A (en) 1981-08-17

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