JPH0347573B2 - - Google Patents

Info

Publication number
JPH0347573B2
JPH0347573B2 JP58151232A JP15123283A JPH0347573B2 JP H0347573 B2 JPH0347573 B2 JP H0347573B2 JP 58151232 A JP58151232 A JP 58151232A JP 15123283 A JP15123283 A JP 15123283A JP H0347573 B2 JPH0347573 B2 JP H0347573B2
Authority
JP
Japan
Prior art keywords
ion beam
workpiece
vacuum
vacuum container
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58151232A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6042832A (ja
Inventor
Yoichi Oonishi
Tanejiro Ikeda
Hiroshi Saeki
Tokuhito Hamane
Zenichi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58151232A priority Critical patent/JPS6042832A/ja
Publication of JPS6042832A publication Critical patent/JPS6042832A/ja
Publication of JPH0347573B2 publication Critical patent/JPH0347573B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP58151232A 1983-08-18 1983-08-18 イオンビ−ム装置 Granted JPS6042832A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58151232A JPS6042832A (ja) 1983-08-18 1983-08-18 イオンビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58151232A JPS6042832A (ja) 1983-08-18 1983-08-18 イオンビ−ム装置

Publications (2)

Publication Number Publication Date
JPS6042832A JPS6042832A (ja) 1985-03-07
JPH0347573B2 true JPH0347573B2 (enrdf_load_stackoverflow) 1991-07-19

Family

ID=15514129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58151232A Granted JPS6042832A (ja) 1983-08-18 1983-08-18 イオンビ−ム装置

Country Status (1)

Country Link
JP (1) JPS6042832A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4680332A (en) * 1986-01-24 1987-07-14 Xerox Corporation Ink jet compositions and process for preparation thereof
JPH1112526A (ja) * 1997-06-24 1999-01-19 Mitsubishi Pencil Co Ltd 直液式水性ボールペン用染料インキ組成物
WO2002095085A1 (de) * 2001-05-22 2002-11-28 Infineon Technologies Ag Frequenzabgleich für bulk-acoustic-wave resonatoren durch lokales ionenstrahlätzen

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130288A (en) * 1976-04-26 1977-11-01 Hitachi Ltd Patterning method
JPS5539690A (en) * 1978-09-14 1980-03-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching device
JPS5575220A (en) * 1978-12-01 1980-06-06 Nec Corp Ion-etching apparatus
JPS5946031A (ja) * 1982-09-09 1984-03-15 Fujitsu Ltd プラズマ処理装置
JPS5946748A (ja) * 1982-09-10 1984-03-16 Nippon Telegr & Teleph Corp <Ntt> イオンシヤワ装置

Also Published As

Publication number Publication date
JPS6042832A (ja) 1985-03-07

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees