JPH0346884B2 - - Google Patents
Info
- Publication number
- JPH0346884B2 JPH0346884B2 JP23238985A JP23238985A JPH0346884B2 JP H0346884 B2 JPH0346884 B2 JP H0346884B2 JP 23238985 A JP23238985 A JP 23238985A JP 23238985 A JP23238985 A JP 23238985A JP H0346884 B2 JPH0346884 B2 JP H0346884B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- sensor gap
- gap
- yoke
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005291 magnetic effect Effects 0.000 claims description 162
- 239000010409 thin film Substances 0.000 claims description 39
- 239000010408 film Substances 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 32
- 239000004020 conductor Substances 0.000 claims description 21
- 230000004907 flux Effects 0.000 claims description 16
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000012790 adhesive layer Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000615 nonconductor Substances 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 230000005294 ferromagnetic effect Effects 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 229910000702 sendust Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018182 Al—Cu Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3916—Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide
- G11B5/3919—Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide the guide being interposed in the flux path
- G11B5/3922—Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide the guide being interposed in the flux path the read-out elements being disposed in magnetic shunt relative to at least two parts of the flux guide structure
- G11B5/3925—Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide the guide being interposed in the flux path the read-out elements being disposed in magnetic shunt relative to at least two parts of the flux guide structure the two parts being thin films
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23238985A JPS6292219A (ja) | 1985-10-18 | 1985-10-18 | 磁気抵抗効果型薄膜磁気ヘツド |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23238985A JPS6292219A (ja) | 1985-10-18 | 1985-10-18 | 磁気抵抗効果型薄膜磁気ヘツド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6292219A JPS6292219A (ja) | 1987-04-27 |
| JPH0346884B2 true JPH0346884B2 (enrdf_load_stackoverflow) | 1991-07-17 |
Family
ID=16938469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23238985A Granted JPS6292219A (ja) | 1985-10-18 | 1985-10-18 | 磁気抵抗効果型薄膜磁気ヘツド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6292219A (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69419642T2 (de) * | 1993-03-22 | 2000-02-17 | Onstream, Inc. | Herstellungsverfahren eines Dünnfilmmagnetkopfes und danach hergestellter Magnetkopf |
| BE1006925A3 (nl) * | 1993-03-22 | 1995-01-24 | Koninkl Philips Electronics Nv | Werkwijze voor het vervaardigen van een dunnefilm magneetkop en magneetkop vervaardigd volgens de werkwijze. |
| MY111205A (en) * | 1993-03-22 | 1999-09-30 | Onstream Inc | Method of manufacturing a thin-film magnetic head |
| EP0617410B1 (en) * | 1993-03-22 | 1999-09-22 | OnStream, Inc. | Method of manufacturing a thin-film magnetic head, and magnetic head obtainable by means of said method |
| BE1007992A3 (nl) * | 1993-12-17 | 1995-12-05 | Philips Electronics Nv | Werkwijze voor het vervaardigen van een dunnefilmmagneetkop en magneetkop vervaardigd volgens de werkwijze. |
-
1985
- 1985-10-18 JP JP23238985A patent/JPS6292219A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6292219A (ja) | 1987-04-27 |
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