JPH0345956U - - Google Patents
Info
- Publication number
- JPH0345956U JPH0345956U JP10423289U JP10423289U JPH0345956U JP H0345956 U JPH0345956 U JP H0345956U JP 10423289 U JP10423289 U JP 10423289U JP 10423289 U JP10423289 U JP 10423289U JP H0345956 U JPH0345956 U JP H0345956U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin plate
- holding means
- substrate holding
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 15
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- -1 alkoxide compound Chemical class 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10423289U JPH0345956U (ru) | 1989-09-05 | 1989-09-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10423289U JPH0345956U (ru) | 1989-09-05 | 1989-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0345956U true JPH0345956U (ru) | 1991-04-26 |
Family
ID=31653033
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10423289U Pending JPH0345956U (ru) | 1989-09-05 | 1989-09-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0345956U (ru) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008075179A (ja) * | 2006-09-19 | 2008-04-03 | Asm Japan Kk | Ｕｖ照射チャンバーをクリーニングする方法 |
-
1989
- 1989-09-05 JP JP10423289U patent/JPH0345956U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008075179A (ja) * | 2006-09-19 | 2008-04-03 | Asm Japan Kk | Ｕｖ照射チャンバーをクリーニングする方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES386190A1 (es) | Un aparato y un metodo para efectuar transportes de vaporesentre un material en fase gaseosa y una superficie de sus- trato esencialmente plana. | |
| ATE392710T1 (de) | Vorrichtung zur schnellen und gleichmässigen heizung eines halbleitersubstrats durch infrarotstrahlung | |
| JPS6273541U (ru) | ||
| JPH0345956U (ru) | ||
| JPS5737848A (en) | Heating apparatus for wafer | |
| EP0614216A4 (en) | APPARATUS FOR FORMING AN OXIDE FILM, HOT PROCESSING APPARATUS, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF. | |
| JPS5648128A (en) | Heating treatment | |
| JPS5694750A (en) | Heating treatment device | |
| JPS5266884A (en) | Process for forming film on base material | |
| JPS57202740A (en) | Manufacture of semiconductor device | |
| JPS6474717A (en) | Formation of thin film | |
| JP2002246376A5 (ru) | ||
| JP2551182B2 (ja) | 半導体製造装置 | |
| JPH0186228U (ru) | ||
| JPS57113214A (en) | Manufacture of amorphous semiconductor film | |
| JPH0299963U (ru) | ||
| JPS6339930U (ru) | ||
| JPH0414838Y2 (ru) | ||
| JPS61158947U (ru) | ||
| JPH047507Y2 (ru) | ||
| JPS5613720A (en) | Heat treating device | |
| JPS6459822A (en) | Cleaning of si surface and its apparatus | |
| FR2256014A1 (en) | Heater for vacuum forming thermoplastics sheet - comprising narrow hot air jet applied transversely across moving sheet | |
| JPH043006Y2 (ru) | ||
| JPH0621234Y2 (ja) | 半導体製造装置 |