JPH0299963U - - Google Patents

Info

Publication number

JPH0299963U

JPH0299963U JP710389U JP710389U JPH0299963U JP H0299963 U JPH0299963 U JP H0299963U JP 710389 U JP710389 U JP 710389U JP 710389 U JP710389 U JP 710389U JP H0299963 U JPH0299963 U JP H0299963U

Authority

JP

Japan

Prior art keywords

reaction chamber

excitation light

thin film

silicon thin

chamber

Prior art date

1989-01-25

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 230000005284 excitation Effects 0.000 claims description 3
• 239000000758 substrate Substances 0.000 claims description 3
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
• 230000001443 photoexcitation Effects 0.000 claims 2
• 229910052710 silicon Inorganic materials 0.000 claims 2
• 239000010703 silicon Substances 0.000 claims 2
• 239000010409 thin film Substances 0.000 claims 2
• BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
• 238000004519 manufacturing process Methods 0.000 claims 1
• 229910000077 silane Inorganic materials 0.000 claims 1
• 238000010438 heat treatment Methods 0.000 description 2