JPH0341845U - - Google Patents

Info

Publication number
JPH0341845U
JPH0341845U JP10380989U JP10380989U JPH0341845U JP H0341845 U JPH0341845 U JP H0341845U JP 10380989 U JP10380989 U JP 10380989U JP 10380989 U JP10380989 U JP 10380989U JP H0341845 U JPH0341845 U JP H0341845U
Authority
JP
Japan
Prior art keywords
opening
substrate
main
main body
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10380989U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0643176Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10380989U priority Critical patent/JPH0643176Y2/ja
Publication of JPH0341845U publication Critical patent/JPH0341845U/ja
Application granted granted Critical
Publication of JPH0643176Y2 publication Critical patent/JPH0643176Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP10380989U 1989-09-04 1989-09-04 インライン式成膜装置 Expired - Lifetime JPH0643176Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10380989U JPH0643176Y2 (ja) 1989-09-04 1989-09-04 インライン式成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10380989U JPH0643176Y2 (ja) 1989-09-04 1989-09-04 インライン式成膜装置

Publications (2)

Publication Number Publication Date
JPH0341845U true JPH0341845U (en:Method) 1991-04-22
JPH0643176Y2 JPH0643176Y2 (ja) 1994-11-09

Family

ID=31652630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10380989U Expired - Lifetime JPH0643176Y2 (ja) 1989-09-04 1989-09-04 インライン式成膜装置

Country Status (1)

Country Link
JP (1) JPH0643176Y2 (en:Method)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006330485A (ja) * 2005-05-27 2006-12-07 Olympus Corp 薄膜形成装置及び薄膜形成方法並びに光学薄膜
JP2008193040A (ja) * 2006-12-13 2008-08-21 Denso Corp 電子装置及び電子装置の製造方法
JP2016510297A (ja) * 2013-01-18 2016-04-07 サン−ゴバン グラス フランス コーティングを備えた基材を得る方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006330485A (ja) * 2005-05-27 2006-12-07 Olympus Corp 薄膜形成装置及び薄膜形成方法並びに光学薄膜
JP2008193040A (ja) * 2006-12-13 2008-08-21 Denso Corp 電子装置及び電子装置の製造方法
JP2016510297A (ja) * 2013-01-18 2016-04-07 サン−ゴバン グラス フランス コーティングを備えた基材を得る方法

Also Published As

Publication number Publication date
JPH0643176Y2 (ja) 1994-11-09

Similar Documents

Publication Publication Date Title
JP2001180822A (ja) 基板の受渡し方法及び装置
KR960031642A (ko) 멀티 챔버 스퍼터링 장치
JPH0341845U (en:Method)
ATE169062T1 (de) Verfahren und vorrichtung zum sputtern supraleitender dünnschichten aus niob auf kupferne viertelwellen-resonanzhohlräume zur beschleunigung schwerer ionen
JPS6245825U (en:Method)
JPS6373358U (en:Method)
JPH01125357U (en:Method)
JPS6373357U (en:Method)
JPS6473075A (en) Film forming device by ion beam sputtering
JPH0314146U (en:Method)
JPS6443915A (en) Manufacture of superconductive material
JPS5571027A (en) Continuous surface treatment apparatus
Hance et al. FABRICATION OF ALUMINUM OXIDE FILMS.
JPH0252436U (en:Method)
JPH02106457U (en:Method)
JPS58158255A (ja) 多層薄膜形成装置における膜厚監視装置
JPS5785972A (en) Thin film former
JPH089160Y2 (ja) 成膜装置
JPH01147273U (en:Method)
JPS62157968U (en:Method)
JPH03126868A (ja) インライン式成膜装置
JPH02127640U (en:Method)
JPH0322063U (en:Method)
JPH0415831U (en:Method)
JPS594515A (ja) 振動搬送装置