JPH0341845U - - Google Patents
Info
- Publication number
- JPH0341845U JPH0341845U JP10380989U JP10380989U JPH0341845U JP H0341845 U JPH0341845 U JP H0341845U JP 10380989 U JP10380989 U JP 10380989U JP 10380989 U JP10380989 U JP 10380989U JP H0341845 U JPH0341845 U JP H0341845U
- Authority
- JP
- Japan
- Prior art keywords
- opening
- substrate
- main
- main body
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 claims 6
- 238000001514 detection method Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 238000007733 ion plating Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
Description
第１図〜第５図は本考案の一実施例のイオンプ
レーテイング装置に係り、第１図は模式断面図、
第２図は第１図のＡ−Ａ矢視断面図、第３図は部
分断面図及びブロツク図、第４図は説明図、第５
図はフローチヤートである。第６図は他の実施例
の一部を示す断面図である。第７図及び第８図は
従来のイオンプレーテイング装置に係り、第７図
は模式断面図、第８図は第７図のＢ−Ｂ矢視断面
図である。
Ｐ……基板、Ｍ……薄膜材料、１……真空槽（
密閉容器）、１１……搬送部、１１３……可動遮
蔽板、１２……本体、１３ａ……主開口、１３ｂ
……副開口、１４……光学式膜厚モニタ、２……
蒸発源（放出装置）、４……駆動部。
1 to 5 relate to an ion plating apparatus according to an embodiment of the present invention, and FIG. 1 is a schematic cross-sectional view;
Fig. 2 is a sectional view taken along the line A-A in Fig. 1, Fig. 3 is a partial sectional view and block diagram, Fig. 4 is an explanatory drawing, and Fig. 5
The figure is a flowchart. FIG. 6 is a sectional view showing a part of another embodiment. 7 and 8 relate to a conventional ion plating apparatus, with FIG. 7 being a schematic sectional view and FIG. 8 being a sectional view taken along the line B--B in FIG. 7. P...Substrate, M...Thin film material, 1...Vacuum chamber (
airtight container), 11...Transportation section, 113...Movable shielding plate, 12...Main body, 13a...Main opening, 13b
...Sub-aperture, 14...Optical film thickness monitor, 2...
Evaporation source (emission device), 4... drive unit.
Claims (1)
口により連通する本体とからなる密閉容器と、 該本体内で該開口に対向して設けられ薄膜材料
を該基板に向かつて放出する放出装置とを具備し
、 該本体より該開口を介して飛来する該薄膜材料
により該基板表面に薄膜が成膜されるように構成
されたインライン式成膜装置において、 該開口は、該基板の搬送方向の後方に形成され
た主開口と、該主開口より搬送方向の前方に形成
された副開口とよりなり、 該密閉容器は、該主開口で成膜された該基板の
膜厚に相当する物理量を検出する膜厚モニタと、
該副開口の開口面積を可変する可動遮蔽板と、該
膜厚モニタの検出により該可動遮蔽板を駆動する
駆動部とを具備したことを特徴とするインライン
式成膜装置。[Claims for Utility Model Registration] An airtight container consisting of a conveyance section in which substrates are sequentially conveyed, a main body communicating with the conveyance section through an opening, and a sealed container provided in the main body opposite to the opening for carrying a thin film material. An in-line film forming apparatus comprising: a discharging device emitting toward a substrate, and configured such that a thin film is formed on the surface of the substrate by the thin film material flying from the main body through the opening; The opening includes a main opening formed at the rear of the substrate in the transport direction, and a sub-opening formed at the front of the main opening in the transport direction, and the sealed container is configured to hold the film formed at the main opening. a film thickness monitor that detects a physical quantity equivalent to the film thickness of the substrate;
An in-line film forming apparatus comprising: a movable shielding plate that changes the opening area of the sub-opening; and a drive unit that drives the movable shielding plate based on detection by the film thickness monitor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10380989U JPH0643176Y2 (en) | 1989-09-04 | 1989-09-04 | In-line type film deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10380989U JPH0643176Y2 (en) | 1989-09-04 | 1989-09-04 | In-line type film deposition system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0341845U true JPH0341845U (en) | 1991-04-22 |
| JPH0643176Y2 JPH0643176Y2 (en) | 1994-11-09 |
Family
ID=31652630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10380989U Expired - Lifetime JPH0643176Y2 (en) | 1989-09-04 | 1989-09-04 | In-line type film deposition system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0643176Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006330485A (en) * | 2005-05-27 | 2006-12-07 | Olympus Corp | Thin film forming device, thin film forming method and optical thin film |
| JP2008193040A (en) * | 2006-12-13 | 2008-08-21 | Denso Corp | Electronic equipment and manufacturing method therefor |
| JP2016510297A (en) * | 2013-01-18 | 2016-04-07 | サン−ゴバン グラス フランス | Method for obtaining a substrate with a coating |
-
1989
- 1989-09-04 JP JP10380989U patent/JPH0643176Y2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006330485A (en) * | 2005-05-27 | 2006-12-07 | Olympus Corp | Thin film forming device, thin film forming method and optical thin film |
| JP2008193040A (en) * | 2006-12-13 | 2008-08-21 | Denso Corp | Electronic equipment and manufacturing method therefor |
| JP2016510297A (en) * | 2013-01-18 | 2016-04-07 | サン−ゴバン グラス フランス | Method for obtaining a substrate with a coating |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0643176Y2 (en) | 1994-11-09 |
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