JPH0339329B2 - - Google Patents
Info
- Publication number
- JPH0339329B2 JPH0339329B2 JP23874284A JP23874284A JPH0339329B2 JP H0339329 B2 JPH0339329 B2 JP H0339329B2 JP 23874284 A JP23874284 A JP 23874284A JP 23874284 A JP23874284 A JP 23874284A JP H0339329 B2 JPH0339329 B2 JP H0339329B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- nitrogen
- magnetic
- less
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 73
- 239000010408 film Substances 0.000 claims description 44
- 229910052757 nitrogen Inorganic materials 0.000 claims description 38
- 239000010409 thin film Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 238000004544 sputter deposition Methods 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 229910020630 Co Ni Inorganic materials 0.000 claims description 8
- 229910002440 Co–Ni Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 8
- 230000004907 flux Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- -1 nickel nitrides Chemical class 0.000 description 3
- 238000001552 radio frequency sputter deposition Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23874284A JPS61153827A (ja) | 1984-11-13 | 1984-11-13 | 磁性記録媒体膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23874284A JPS61153827A (ja) | 1984-11-13 | 1984-11-13 | 磁性記録媒体膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61153827A JPS61153827A (ja) | 1986-07-12 |
JPH0339329B2 true JPH0339329B2 (enrdf_load_stackoverflow) | 1991-06-13 |
Family
ID=17034579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23874284A Granted JPS61153827A (ja) | 1984-11-13 | 1984-11-13 | 磁性記録媒体膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61153827A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH062920B2 (ja) * | 1986-09-30 | 1994-01-12 | 住友金属鉱山株式会社 | 蒸着用コバルト合金 |
-
1984
- 1984-11-13 JP JP23874284A patent/JPS61153827A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61153827A (ja) | 1986-07-12 |
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