JPH0337174B2 - - Google Patents

Info

Publication number
JPH0337174B2
JPH0337174B2 JP56056935A JP5693581A JPH0337174B2 JP H0337174 B2 JPH0337174 B2 JP H0337174B2 JP 56056935 A JP56056935 A JP 56056935A JP 5693581 A JP5693581 A JP 5693581A JP H0337174 B2 JPH0337174 B2 JP H0337174B2
Authority
JP
Japan
Prior art keywords
weight
parts
resin
photosensitive
phenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56056935A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57172337A (en
Inventor
Hiroshi Komano
Shunichi Kasukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP5693581A priority Critical patent/JPS57172337A/ja
Publication of JPS57172337A publication Critical patent/JPS57172337A/ja
Publication of JPH0337174B2 publication Critical patent/JPH0337174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP5693581A 1981-04-17 1981-04-17 Photosensitive resin composition Granted JPS57172337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5693581A JPS57172337A (en) 1981-04-17 1981-04-17 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5693581A JPS57172337A (en) 1981-04-17 1981-04-17 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57172337A JPS57172337A (en) 1982-10-23
JPH0337174B2 true JPH0337174B2 (enrdf_load_stackoverflow) 1991-06-04

Family

ID=13041372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5693581A Granted JPS57172337A (en) 1981-04-17 1981-04-17 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57172337A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
JPS61228439A (ja) * 1985-04-01 1986-10-11 Fuji Photo Film Co Ltd 感光性組成物および感光性材料
JPH0650394B2 (ja) * 1985-03-22 1994-06-29 富士写真フイルム株式会社 感光性組成物および感光性材料

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271224A (en) * 1975-12-11 1977-06-14 Toshiba Corp Positive type light sensitive composition
JPS599896B2 (ja) * 1976-11-05 1984-03-06 株式会社東芝 ポジ型フオトレジスト材料

Also Published As

Publication number Publication date
JPS57172337A (en) 1982-10-23

Similar Documents

Publication Publication Date Title
US4275139A (en) Light-sensitive mixture and copying material produced therefrom
US4536465A (en) Positive-working photosensitive composition with o-quinone diazide and admixture of resins
JPH021296B2 (enrdf_load_stackoverflow)
JPH0455298B2 (enrdf_load_stackoverflow)
JPS6313529B2 (enrdf_load_stackoverflow)
JPH0138289B2 (enrdf_load_stackoverflow)
JPS6156499B2 (enrdf_load_stackoverflow)
JP2834469B2 (ja) ポジ型感光性混合物、ポジ型記録材料および該記録材料の製造方法
JPS5934293B2 (ja) 感光性組成物
JPH0149933B2 (enrdf_load_stackoverflow)
JPS6223788B2 (enrdf_load_stackoverflow)
JPH0145901B2 (enrdf_load_stackoverflow)
JPH0337174B2 (enrdf_load_stackoverflow)
JP2541736B2 (ja) オルトナフトキノンジアジドスルフォン酸エステルを含む感光性混合物、およびそれでつくった記録材料
KR100608966B1 (ko) 감방사선성수지조성물
JP2985400B2 (ja) 感放射線性樹脂組成物
JPH07104467A (ja) ポジ型レジスト組成物及びパターン形成方法
JP3215556B2 (ja) 新規ヒドロキシメチル基含有フェノール化合物
JP3589940B2 (ja) 新規ヒドロキシメチル基含有フェノール化合物
JPH0519478A (ja) 感光性組成物
JP3629692B2 (ja) ポジ型レジスト組成物
JP3215551B2 (ja) 新規ヒドロキシメチル基含有フェノール化合物
JP2921518B2 (ja) 感放射線性樹脂組成物
JP2704318B2 (ja) 感光性組成物
JPS6260407B2 (enrdf_load_stackoverflow)