JPH0336520Y2 - - Google Patents
Info
- Publication number
- JPH0336520Y2 JPH0336520Y2 JP1986144149U JP14414986U JPH0336520Y2 JP H0336520 Y2 JPH0336520 Y2 JP H0336520Y2 JP 1986144149 U JP1986144149 U JP 1986144149U JP 14414986 U JP14414986 U JP 14414986U JP H0336520 Y2 JPH0336520 Y2 JP H0336520Y2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- gas
- metal plate
- porous metal
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 239000011148 porous material Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 4
- 238000005553 drilling Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986144149U JPH0336520Y2 (nl) | 1986-09-22 | 1986-09-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986144149U JPH0336520Y2 (nl) | 1986-09-22 | 1986-09-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6350878U JPS6350878U (nl) | 1988-04-06 |
| JPH0336520Y2 true JPH0336520Y2 (nl) | 1991-08-02 |
Family
ID=31054492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986144149U Expired JPH0336520Y2 (nl) | 1986-09-22 | 1986-09-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0336520Y2 (nl) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5741367A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Chemical vapor deposition device |
| JPS58163432A (ja) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | プラズマ化学気相成長装置 |
-
1986
- 1986-09-22 JP JP1986144149U patent/JPH0336520Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5741367A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Chemical vapor deposition device |
| JPS58163432A (ja) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | プラズマ化学気相成長装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6350878U (nl) | 1988-04-06 |
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