AU2001283323A1 - Field emission devices having carbon containing tips - Google Patents

Field emission devices having carbon containing tips

Info

Publication number
AU2001283323A1
AU2001283323A1 AU2001283323A AU8332301A AU2001283323A1 AU 2001283323 A1 AU2001283323 A1 AU 2001283323A1 AU 2001283323 A AU2001283323 A AU 2001283323A AU 8332301 A AU8332301 A AU 8332301A AU 2001283323 A1 AU2001283323 A1 AU 2001283323A1
Authority
AU
Australia
Prior art keywords
substrate
dielectric
dielectric layer
coupled
extractor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001283323A
Inventor
Charles L. Britton
Michael A. Guillorn
Douglas H. Lowndes
Vladimir I. Merkulov
Michael L. Simpson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UT Battelle LLC
Original Assignee
UT Battelle LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UT Battelle LLC filed Critical UT Battelle LLC
Publication of AU2001283323A1 publication Critical patent/AU2001283323A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02Electron guns
    • H01J3/021Electron guns using a field emission, photo emission, or secondary emission electron source
    • H01J3/022Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00Electrodes common to discharge tubes
    • H01J2201/30Cold cathodes
    • H01J2201/304Field emission cathodes
    • H01J2201/30446Field emission cathodes characterised by the emitter material
    • H01J2201/30453Carbon types
    • H01J2201/30469Carbon nanotubes (CNTs)
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/842Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
    • Y10S977/843Gas phase catalytic growth, i.e. chemical vapor deposition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/842Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
    • Y10S977/847Surface modifications, e.g. functionalization, coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/89Deposition of materials, e.g. coating, cvd, or ald
    • Y10S977/891Vapor phase deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)

Abstract

Systems and methods are described for field emission devices having carbon nanofiber emitters. A method, includes: providing a substrate; depositing a catalyst, the catalyst coupled to the substrate; depositing a dielectric layer, the dielectric layer coupled to the substrate; depositing an extractor layer, the extractor layer coupled to the dielectric layer; forming an extractor aperture in the extractor layer; forming a dielectric well in the dielectric layer to uncover at least a portion of the catalyst; and then fabricating a carbon containing tip i) having a base located substantially at the bottom of the dielectric well and ii) extending substantially away from the substrate. An apparatus, includes: a substrate; an electrode structure coupled to the substrate, the electrode structure including a dielectric layer coupled to the substrate, the dielectric layer including a dielectric well that is formed in the dielectric layer after the dielectric layer is deposited; and an extractor layer coupled to the dielectric layer, the extractor layer including an extractor aperture; and a carbon containing tip coupled to the substrate, the carbon containing tip having a base located substantially at a bottom of the dielectric well and extending substantially away from the substrate, the carbon containing tip being grown from the bottom of the dielectric well using a catalyst that is introduced at the bottom of the dielectric well after the dielectric well is formed. A method, includes: providing a substrate on a heater plate in a vacuum chamber; providing a carbon source gas and an etchant gas; heating the substrate with the heater plate; and then fabricating a carbon tip on the substrate with the carbon source gas and the etchant gas using plasma enhanced chemical vapor.
AU2001283323A 2000-08-29 2001-08-09 Field emission devices having carbon containing tips Abandoned AU2001283323A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US22871300P 2000-08-29 2000-08-29
US60228713 2000-08-29
US09810531 2001-03-15
US09/810,531 US6692324B2 (en) 2000-08-29 2001-03-15 Single self-aligned carbon containing tips
PCT/US2001/025270 WO2002019372A2 (en) 2000-08-29 2001-08-09 Field emission devices having carbon containing tips

Publications (1)

Publication Number Publication Date
AU2001283323A1 true AU2001283323A1 (en) 2002-03-13

Family

ID=26922595

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001283323A Abandoned AU2001283323A1 (en) 2000-08-29 2001-08-09 Field emission devices having carbon containing tips

Country Status (6)

Country Link
US (1) US6692324B2 (en)
EP (1) EP1314176B1 (en)
AT (1) ATE338340T1 (en)
AU (1) AU2001283323A1 (en)
DE (1) DE60122747T2 (en)
WO (1) WO2002019372A2 (en)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6858455B2 (en) * 2001-05-25 2005-02-22 Ut-Battelle, Llc Gated fabrication of nanostructure field emission cathode material within a device
US6982519B2 (en) * 2001-09-18 2006-01-03 Ut-Battelle Llc Individually electrically addressable vertically aligned carbon nanofibers on insulating substrates
US6984579B2 (en) * 2003-02-27 2006-01-10 Applied Materials, Inc. Ultra low k plasma CVD nanotube/spin-on dielectrics with improved properties for advanced nanoelectronic device fabrication
FR2851737B1 (en) * 2003-02-28 2006-05-26 Commissariat Energie Atomique CATALYST STRUCTURE, IN PARTICULAR FOR THE PRODUCTION OF FIELD EMISSION DISPLAY SCREENS
US7521851B2 (en) * 2003-03-24 2009-04-21 Zhidan L Tolt Electron emitting composite based on regulated nano-structures and a cold electron source using the composite
US7390535B2 (en) * 2003-07-03 2008-06-24 Aeromet Technologies, Inc. Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
US7279686B2 (en) * 2003-07-08 2007-10-09 Biomed Solutions, Llc Integrated sub-nanometer-scale electron beam systems
WO2005033001A2 (en) * 2003-09-03 2005-04-14 Honda Motor Co., Ltd. Methods for preparation of one-dimensional carbon nanostructures
US8541054B2 (en) * 2003-09-08 2013-09-24 Honda Motor Co., Ltd Methods for preparation of one-dimensional carbon nanostructures
US8408077B2 (en) * 2003-09-22 2013-04-02 Brother International Corporation Method and apparatus for sensing applied forces
US7459839B2 (en) * 2003-12-05 2008-12-02 Zhidan Li Tolt Low voltage electron source with self aligned gate apertures, and luminous display using the electron source
US8102108B2 (en) * 2003-12-05 2012-01-24 Zhidan Li Tolt Low voltage electron source with self aligned gate apertures, fabrication method thereof, and devices using the electron source
FR2865946B1 (en) * 2004-02-09 2007-12-21 Commissariat Energie Atomique METHOD FOR PRODUCING A LAYER OF MATERIAL ON A SUPPORT
US8642126B2 (en) * 2004-07-27 2014-02-04 Dainippon Screen Mfg. Co., Ltd. Carbon nanotube device and process for producing the same
US20060275537A1 (en) * 2005-06-02 2006-12-07 The Regents Of The University Of California Method and apparatus for field-emission high-pressure-discharge laser chemical vapor deposition of free-standing structures
US7763353B2 (en) * 2005-06-10 2010-07-27 Ut-Battelle, Llc Fabrication of high thermal conductivity arrays of carbon nanotubes and their composites
KR100634547B1 (en) * 2005-07-09 2006-10-13 삼성에스디아이 주식회사 Field emission device and its fabrication method with ring type emitter
CN100436311C (en) * 2005-07-22 2008-11-26 清华大学 Method for making carbon nano tube array
CN100462300C (en) * 2005-07-29 2009-02-18 鸿富锦精密工业(深圳)有限公司 Growing device of carbon nano-tube
CN100418876C (en) * 2005-08-19 2008-09-17 清华大学 Device and method for preparing array of Nano carbon tube
US7544523B2 (en) * 2005-12-23 2009-06-09 Fei Company Method of fabricating nanodevices
US7927666B2 (en) * 2006-06-30 2011-04-19 The University Of Akron Aligned carbon nanotube-polymer materials, systems and methods
US8535791B2 (en) 2006-06-30 2013-09-17 The University Of Akron Aligned carbon nanotube-polymer materials, systems and methods
TWI340985B (en) * 2007-07-06 2011-04-21 Chunghwa Picture Tubes Ltd Field emission device array substrate and fabricating method thereof
WO2010109454A1 (en) * 2009-03-23 2010-09-30 El-Mul Technologies, Ltd. Nanotube-based electron emission device and method for fabrication thereof
KR101864219B1 (en) * 2011-05-31 2018-06-05 한국전자통신연구원 Field Emitter
US9306167B2 (en) * 2012-01-19 2016-04-05 Technion Research & Development Foundation Limited Field emission device and method of fabricating the same
US8815780B2 (en) 2012-02-09 2014-08-26 Ut-Battelle, Llc Platform for immobilization and observation of subcellular processes
US9053890B2 (en) 2013-08-02 2015-06-09 University Health Network Nanostructure field emission cathode structure and method for making
JP6448594B2 (en) * 2016-09-13 2019-01-09 株式会社東芝 Conductive probe, electrical property evaluation system, scanning probe microscope, conductive probe manufacturing method, and electrical property measurement method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4405768A1 (en) * 1994-02-23 1995-08-24 Till Keesmann Field emission cathode device and method for its manufacture
US5872422A (en) * 1995-12-20 1999-02-16 Advanced Technology Materials, Inc. Carbon fiber-based field emission devices
US5892231A (en) * 1997-02-05 1999-04-06 Lockheed Martin Energy Research Corporation Virtual mask digital electron beam lithography
US5855675A (en) * 1997-03-03 1999-01-05 Genus, Inc. Multipurpose processing chamber for chemical vapor deposition processes
US6062931A (en) * 1999-09-01 2000-05-16 Industrial Technology Research Institute Carbon nanotube emitter with triode structure
US6512235B1 (en) * 2000-05-01 2003-01-28 El-Mul Technologies Ltd. Nanotube-based electron emission device and systems using the same

Also Published As

Publication number Publication date
US6692324B2 (en) 2004-02-17
EP1314176B1 (en) 2006-08-30
EP1314176A2 (en) 2003-05-28
WO2002019372A2 (en) 2002-03-07
US20020024279A1 (en) 2002-02-28
WO2002019372A3 (en) 2002-06-06
ATE338340T1 (en) 2006-09-15
DE60122747T2 (en) 2007-09-06
DE60122747D1 (en) 2006-10-12

Similar Documents

Publication Publication Date Title
AU2001283323A1 (en) Field emission devices having carbon containing tips
US5290610A (en) Forming a diamond material layer on an electron emitter using hydrocarbon reactant gases ionized by emitted electrons
JP4963539B2 (en) Method for producing carbon nanotube and plasma CVD apparatus for carrying out the method
TW469534B (en) Plasma processing method and apparatus
JPS63210099A (en) Preparation of diamond film
WO2005021430A1 (en) Carbon nanowall producing method, carbon nanowall, and production apparatus
EP0878823A3 (en) Plasma-enhanced chemical vapor deposition apparatus and method M
US6670629B1 (en) Insulated gate field emitter array
US20030059968A1 (en) Method of producing field emission display
KR20010029762A (en) Method for manufacturing of field emission display device using carbon nanotube
EP1737012A3 (en) Field emission devices having carbon containing tips
KR20080114316A (en) Apparatus for depositing thin film
KR100362899B1 (en) Method for manufacturing field emission display device using carbon nanotube
US7691441B2 (en) Method of forming carbon fibers using metal-organic chemical vapor deposition
JPS61238981A (en) Method for making uniform high-frequency etching
JP2003137521A (en) Deposition method
JP4284438B2 (en) Deposition method
EP1098346A2 (en) Cold cathode and methods for producing the same
JP2594961B2 (en) Gas ion source device
JP4051982B2 (en) Plasma film forming apparatus and carbon film forming method
JP2001192830A (en) Plasma enhanced cvd system for large-diameter carbon nanotube thin film deposition, and method of deposition for the thin film
JP2001049441A (en) Plasma cvd device and thin film depositing method using the same
JP2001064775A (en) Carbon nanotube thin film forming device and forming method
KR100276061B1 (en) Plasma Deposition Equipment and Method for Manufacturing Hydrogen-Containing Amorphous Carbon Thin Film Using the Same
JPS6167765A (en) Ion plating device