JPH0335826B2 - - Google Patents

Info

Publication number
JPH0335826B2
JPH0335826B2 JP56058954A JP5895481A JPH0335826B2 JP H0335826 B2 JPH0335826 B2 JP H0335826B2 JP 56058954 A JP56058954 A JP 56058954A JP 5895481 A JP5895481 A JP 5895481A JP H0335826 B2 JPH0335826 B2 JP H0335826B2
Authority
JP
Japan
Prior art keywords
substrate
impurities
impurity
solid
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56058954A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57173937A (en
Inventor
Hideki Yakida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5895481A priority Critical patent/JPS57173937A/ja
Publication of JPS57173937A publication Critical patent/JPS57173937A/ja
Publication of JPH0335826B2 publication Critical patent/JPH0335826B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
  • Non-Volatile Memory (AREA)
JP5895481A 1981-04-17 1981-04-17 Treatment for solid by laser Granted JPS57173937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5895481A JPS57173937A (en) 1981-04-17 1981-04-17 Treatment for solid by laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5895481A JPS57173937A (en) 1981-04-17 1981-04-17 Treatment for solid by laser

Publications (2)

Publication Number Publication Date
JPS57173937A JPS57173937A (en) 1982-10-26
JPH0335826B2 true JPH0335826B2 (enrdf_load_html_response) 1991-05-29

Family

ID=13099225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5895481A Granted JPS57173937A (en) 1981-04-17 1981-04-17 Treatment for solid by laser

Country Status (1)

Country Link
JP (1) JPS57173937A (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5823255A (ja) * 1981-08-01 1983-02-10 Nippon Denso Co Ltd 内燃機関のアイドリング回転速度制御方法
JP2605268B2 (ja) * 1987-01-30 1997-04-30 ソニー株式会社 半導体装置の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54131866A (en) * 1978-04-05 1979-10-13 Nippon Telegr & Teleph Corp <Ntt> Heat treatment device

Also Published As

Publication number Publication date
JPS57173937A (en) 1982-10-26

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