JPH03290327A - Mold for forming optical element - Google Patents
Mold for forming optical elementInfo
- Publication number
- JPH03290327A JPH03290327A JP9056590A JP9056590A JPH03290327A JP H03290327 A JPH03290327 A JP H03290327A JP 9056590 A JP9056590 A JP 9056590A JP 9056590 A JP9056590 A JP 9056590A JP H03290327 A JPH03290327 A JP H03290327A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- interlayer
- molding
- optical element
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 21
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000000126 substance Substances 0.000 claims abstract description 5
- 238000000465 moulding Methods 0.000 claims description 35
- 230000003647 oxidation Effects 0.000 abstract description 8
- 238000007254 oxidation reaction Methods 0.000 abstract description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 150000001875 compounds Chemical class 0.000 abstract description 3
- 229910052593 corundum Inorganic materials 0.000 abstract description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 3
- 239000011229 interlayer Substances 0.000 abstract 7
- 239000010410 layer Substances 0.000 abstract 2
- 229910003077 Ti−O Inorganic materials 0.000 abstract 1
- 229910007746 Zr—O Inorganic materials 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 18
- 230000003746 surface roughness Effects 0.000 description 8
- 239000000047 product Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/20—Oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光学素子成形用型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding an optical element.
〔従来の技術］
一般ニ、通常１３００〜１５００℃に加熱して溶融した
ガラスを所望形状に加工した一対の成形用型間に直接挿
入してプレス成形し、ガラス製品を得る方法が行われて
いる。この方法によれば、研磨レンズでは得ることがで
きない非球面形状のレンズ等を安価にして容易に製造す
ることができ、非常に有用である。ところが、この方法
で用（する光学素子成形用型の成形面には、高温のガラ
スが繰り返して接触するために、酸化による肌荒れや熱
衝撃によるクランク等が発生する虞がある。したがって
、成形面は、良好な耐酸化性および耐熱衝撃性が求めら
れる。[Prior Art] Generally, glass products are obtained by directly inserting molten glass heated to 1,300 to 1,500°C between a pair of molds that have been processed into a desired shape and press-molding the glass. There is. According to this method, lenses with aspherical surfaces, etc., which cannot be obtained with polished lenses, can be easily manufactured at low cost, and are very useful. However, since the molding surface of the optical element mold used in this method is repeatedly contacted with high-temperature glass, there is a risk that roughness due to oxidation or cracking due to thermal shock may occur. is required to have good oxidation resistance and thermal shock resistance.
従来、かかる要求を満足させるべく、特公昭６１−１０
４０７号公報に開示されるように、型基材上にＴｔＣ，
ＴｉＮ、Ｔ１ＣＮ からなる中間層を介してＡｌ２Ｏ３
層を形成した成形用型が知られている。この成形用型に
おいて、成形面のＡ ｌ ｚ Ｏｓ層は、高温であって
も良好な耐酸化性を有するので型基材を酸化から保護す
る役目を持つ。また、Ｔ ｉ Ｎ等の中間層は、熱衝撃
による。’Ｍ！、Ｏ，層の剥離を付着力の向上により防
止する役目を持つ。In the past, in order to satisfy such requirements,
As disclosed in Japanese Patent No. 407, TtC,
Al2O3 through an intermediate layer consisting of TiN and T1CN
Layered molds are known. In this mold, the Al z Os layer on the molding surface has good oxidation resistance even at high temperatures, and therefore serves to protect the mold base material from oxidation. Further, an intermediate layer such as T i N is caused by thermal shock. 'M! , O, has the role of preventing layer peeling by improving adhesion.
ここに、ＴｔはＯを介してＡ！と結合している。Here, Tt is A! via O! is combined with
また、鉄鋼などに直接Ａｌｔｏ、を付着させると、Ｆｅ
が０を介してＡ２と結合する。Ｔｉ−０の結合とＦｅ−
００結合とでは、Ｔｉ−０の結合の方が熱力学的に安定
である。したがって、型基材とＡ ｌ ｔ０３層との中
間層をＴｉ化合物により形成すると、Ａｘ＊ｏユ層の付
着力を向上させることができるのである。Also, if Alto is attached directly to steel etc., Fe
is connected to A2 via 0. Ti-0 bond and Fe-
Compared to the 00 bond, the Ti-0 bond is thermodynamically more stable. Therefore, if the intermediate layer between the mold base material and the Al t03 layer is formed of a Ti compound, the adhesion of the Ax*o layer can be improved.
しかし、上記従来の成形用型では、一般のガラス製品を
製造する場合には問題ないものの、精密な形状を有する
光学素子を製造する場合には不適当であった。However, although the above-mentioned conventional molding molds pose no problem when manufacturing general glass products, they are unsuitable when manufacturing optical elements having precise shapes.
すなわち、光学素子の場合には、一般のガラス製品と異
なり、ガラスの収縮による正規な形状からのズレ、いわ
ゆるヒケが全く許されない。このヒケの発生を防止する
には、成形用型内のガラスに大きな圧力を加え、さらに
長時間高温のままでガラスを保持する必要がある。した
がって、成形用型の成形面は、一般のガラス製品を製造
する場合よりもはるかに長時間高温（通常６００“Ｃ以
上）にさらされることになる。That is, in the case of optical elements, unlike general glass products, deviations from the regular shape due to shrinkage of the glass, so-called sink marks, are not allowed at all. In order to prevent the occurrence of sink marks, it is necessary to apply a large amount of pressure to the glass in the mold and to hold the glass at high temperature for a long period of time. Therefore, the molding surface of the molding die is exposed to high temperatures (usually 600"C or higher) for a much longer period of time than when manufacturing general glass products.
ここで、Ａ Ｉ２ ｔ Ｏｓは非常に安定な物質なので
、６００°Ｃ以上程度の温度に長時間さらされても変化
しない、しかし、Ｔｉは、高温に長時間さらされると、
拡散によってＡ ｌ ｚ Ｏｓ層を突き抜けてしまい、
成形面の表面に析出してしまう。そして、表面で２、激
に酸化が進行して表面粗さが大きくなり、成形品の外観
を悪化したり、ガラスの焼付きを生じたりしてしまった
。Here, A I2 t Os is a very stable substance, so it does not change even if exposed to temperatures of about 600°C or more for a long time. However, when exposed to high temperatures for a long time, Ti
It penetrates the Al z Os layer due to diffusion,
It will precipitate on the surface of the molding surface. Then, oxidation progressed rapidly on the surface, increasing the surface roughness, deteriorating the appearance of the molded product, and causing the glass to seize.
本発明は、かかる従来の問題点に鑑みてなされたもので
、精密な形状の光学素子をプレス成形する場合でも、成
形面における表面粗さの増大がなく、長時間安定して使
用できる光学素子成形用型を提供することを目的とする
。The present invention has been made in view of such conventional problems, and is an optical element that can be used stably for a long time without increasing the surface roughness of the molded surface even when press-molding an optical element with a precise shape. The purpose is to provide molds for molding.
上記目的を達成するために、本発明は、型基材上に中間
層を介してＡ ｉｔ ｚ Ｏｓ層を形成してなる光学素
子成形用型において、前記中間層をＺｒＮ。In order to achieve the above object, the present invention provides a mold for molding an optical element in which an A it z Os layer is formed on a mold base material via an intermediate layer, in which the intermediate layer is made of ZrN.
ＺｒＣ，ＺｒＣＮ のうち少なくとも１種の物質により
形成した。It was formed from at least one substance among ZrC and ZrCN.
上記構成の光学素子成形用型において、Ａ ｊ！ ！
Ｏｓは、既に述べたように、高温でも非常に安定であり
、高温のガラスが長時間接触しても変化しない、また、
中間層に含まれるＺｒは０を介してＡｌと結合する。Ｚ
ｒＯ，とＴ ｉ Ｏｔの標準生成自由エネルギーを比較
すると、ＺｒＯ□が一１０４０ｋＪ／ｍｏ１．Ｔｉｏｇ
が一８９０ｋＪ／ｍｏｌであり、Ｚｒ−０の方がＴ ｉ
−０より強い結合であることがわかる。また、Ｚｒと
Ｔｉの拡散し易さを比較すると、Ｚｒの方がＴｔよりも
小さく、高温においてもＺｒが表面まで析出することは
ない。In the optical element molding mold having the above configuration, A j! !
As already mentioned, Os is very stable even at high temperatures, and does not change even when hot glass comes into contact with it for a long time.
Zr contained in the intermediate layer is bonded to Al through 0. Z
Comparing the standard free energies of formation of rO, and T i Ot, ZrO□ is 11040 kJ/mo1. Tiog
is 1890 kJ/mol, and Zr-0 has T i
It can be seen that the bond is stronger than -0. Further, when comparing the ease of diffusion of Zr and Ti, Zr is smaller than Tt, and Zr does not precipitate to the surface even at high temperatures.
つまり、ＺｒＮ、ＺｒＣ，ＺｒＣＮ により中間層を形
成したことによって、初期的な付着力も大きく、高温下
で使用しても表面で急激な酸化が起こることがない。That is, by forming the intermediate layer of ZrN, ZrC, and ZrCN, the initial adhesion is strong, and rapid oxidation does not occur on the surface even when used at high temperatures.
以上の作用の他に、中間層のＺｒＮ、 ＺｒＣＺｒＣＮ
は、非常に硬いという特性も有している。In addition to the above effects, ZrN, ZrCZrCN in the intermediate layer
It also has the property of being very hard.
成形面は高精度に加工しであるので、傷などは許されな
い、その点について、これらの中間層は、傷つきにくさ
を成形面に与えるのである。Since the molding surface is processed with high precision, scratches are not allowed, and in this regard, these intermediate layers make the molding surface more resistant to scratches.
［実 施 例］
（第１実施例）
本実施例の光学素子成形用型は、第１図に示すように、
非球面形状を成形基礎面１ａとする型基材１が超硬合金
であるＷＣにより作製されている。[Example] (First Example) As shown in FIG. 1, the mold for molding an optical element of this example was
A mold base material 1 having an aspherical shape as a molding base surface 1a is made of WC, which is a cemented carbide.
成形基礎面１ａは、表面粗さが０．０６μｍ以下になる
まで、研摩加工されている。そして、型基材１の成形基
礎面ｌａ上には、ＺｒＮからなる中間層２が形成され、
さらにその中間層２上には、成形面として、Ａ ｆ 、
０３層３が形成されている。The molded base surface 1a is polished until the surface roughness becomes 0.06 μm or less. Then, on the mold base surface la of the mold base material 1, an intermediate layer 2 made of ZrN is formed,
Furthermore, on the intermediate layer 2, A f , as a molding surface,
03 layer 3 is formed.
ここで、ＺｒＮの中間層２は、Ｚｒをターゲットとして
、投入電力５００Ｗ、Ｎｚ圧力ｌＸｌ０−’Ｔｏｒｒ、
Ａｒ圧力Ｉ Ｘ １０− ＴｏｒｒでＲＦ−７グ不ト
ロンスバンタ法により形成した。膜厚は約５０００人で
ある。Ａｆｆｉ！Ｏ，層３は１，１１をターゲットとし
て、投入電力５００Ｗ、Ｏ，圧力Ｉ Ｘ １０− ”Ｔ
ｏｒｒ。Here, the ZrN intermediate layer 2 is constructed using Zr as a target, input power of 500 W, Nz pressure lXl0-'Torr,
It was formed by the RF-7 irradiation vanter method at an Ar pressure of I.times.10-Torr. The film thickness is approximately 5,000 people. Affi! O, Layer 3 targets 1,11, input power is 500 W, O, pressure I x 10-”T
orr.
Ａｒ圧力Ｉ Ｘ １０− ”ＴｏｒｒでＲＦマグネトロ
ンスパッタ法で形成した。膜厚は５０００人である。It was formed by RF magnetron sputtering at an Ar pressure of I x 10-'' Torr.The film thickness was 5,000 mm.
ＺｒＮとＡｌ２Ｏ，は同し装置で真空を破らずに形成し
ているので、界面での汚染がない。Since ZrN and Al2O are formed in the same device without breaking the vacuum, there is no contamination at the interface.
以上のようにして得られた本実施例の光学素子成形用型
を用いて、ＳＫＩ １に相当するガラスを１４００℃で
溶融してプレス成形を行った。型温は８００℃に保持し
た。約５００００ショット成形した後も成形面は０．０
６μｍ以下の表面粗さであり、ガラスの焼付きも発生し
なかった。Using the mold for molding an optical element of this example obtained as described above, glass corresponding to SKI 1 was melted at 1400° C. and press-molded. The mold temperature was maintained at 800°C. The molding surface remains 0.0 even after approximately 50,000 shots.
The surface roughness was 6 μm or less, and no glass seizure occurred.
（第２実施例）
本実施例の光学素子成形用型は、第２図に示すように、
非球面形状を成形基礎面４ａとする型基材４がＳｉＣ焼
結体により作成されている。成形基礎面４ａは、表面粗
さが０．０６μｍ以下になるまで研摩加工されている。(Second Example) As shown in FIG. 2, the mold for molding an optical element of this example is
A mold base material 4 having an aspherical shape as a molding base surface 4a is made of a SiC sintered body. The molded base surface 4a is polished until the surface roughness becomes 0.06 μm or less.
そして、型基材４の成形基礎面４ａ上には、ＺｒＣから
なる中間層５が形成され、さらにその中間層５上には、
成形面としてＡｆｆｉ、Ｏ，層６が形成されている。Then, an intermediate layer 5 made of ZrC is formed on the molding base surface 4a of the mold base material 4, and further on the intermediate layer 5,
Affi, O, layer 6 is formed as a molding surface.
ここで、ＺｒＣの中間層５は、Ｚｒをターゲットとして
、投入電力５００Ｗ、ＣＨ，圧力２Ｘ１０−”Ｔｏｒｒ
、 Ａ ｒ圧力Ｉ Ｘｌ０−”ＴｏｒｒＲＦマグネト
ロンスパッタ法により形成した。膜厚は約１μｍである
。Here, the ZrC intermediate layer 5 is formed using Zr as a target, an input power of 500 W, CH, and a pressure of 2×10-” Torr.
, Ar pressure I Xl0-''Torr It was formed by RF magnetron sputtering. The film thickness is about 1 μm.
Ａｆ、Ｏ，層６は、ＡｌＩＣ１，を５％、ＣＯｔを１０
％、Ｈｚを残りとした反応ガスを流す熱ＣＶＤにより形
成した。膜厚は約１μｍである。Af, O, layer 6 contains 5% AlIC1, 10% COt.
%, Hz was formed by thermal CVD in which a reaction gas was flowed. The film thickness is approximately 1 μm.
以上のようにして得られた本実施例の光学素子成形用型
を用いて、ＳＦ６に相当するガラスを１３５０℃溶融し
てプレス成形を行った。型温は７００℃に保持した。約
５ｏｏｏｏシラツト成形した後も成形面は００．０６μ
ｍ以下の表面粗さであり、ガラスの焼付きも発生しなか
った。Using the mold for molding an optical element of this example obtained as described above, glass corresponding to SF6 was melted at 1350° C. and press-molded. The mold temperature was maintained at 700°C. Approximately 5oooo Even after molding the molding surface is 00.06μ
The surface roughness was less than m, and no glass seizure occurred.
（第３実施例）
本実施例の光学素子成形用型は、第３図に示すように、
非球面形状を成形基礎面７ａとする型基材７がＷ単結晶
により作成されている。成形基礎面７ａは、表面粗さが
０．０６μｍ以下になるまで研摩加工されている。そし
て、型基材７の成形基礎面７ａ上には、ＺｒＣＮからな
る中間層８が形成され、さらにその中間層８上には、成
形面としてＡｌ４．０．層９が形成されている。(Third Example) As shown in FIG. 3, the optical element molding mold of this example has the following features:
A mold base material 7 having an aspherical shape as a molding base surface 7a is made of W single crystal. The molded base surface 7a is polished until the surface roughness becomes 0.06 μm or less. Then, an intermediate layer 8 made of ZrCN is formed on the molding base surface 7a of the mold base material 7, and further on the intermediate layer 8, Al4.0. Layer 9 is formed.
ここで、ＺｒＣＮの中間層８は、ＺｒＣｊ！ａを５％、
ＮＨａを５％、ＣＨ４を５％、Ｈ工を残りとした反応ガ
スを流す熱ＣＶＤにより形成した。膜厚は約１．５μｍ
である。 Ａｌ２．０．層９は、０３ガスをＩ Ｘｌ０
−’Ｔｏｒｒ導入した反応性真空蒸着で形成した。膜厚
は約１ｔＩｍである。Here, the ZrCN intermediate layer 8 is ZrCj! a 5%,
It was formed by thermal CVD in which a reaction gas containing 5% NHa, 5% CH4, and the remainder H was flowed. Film thickness is approximately 1.5μm
It is. Al2.0. Layer 9 contains 03 gas I Xl0
-'Torr was introduced by reactive vacuum deposition. The film thickness is approximately 1 tIm.
以上のようにして得られた本実施例の光学素子成形用型
を用いて、１ａｓＦｏ １に相当するガラスを１５００
°Ｃで溶融してプレス成形を行った。Using the mold for molding an optical element of this example obtained as described above, glass corresponding to 1asFo 1 was molded into 1500
It was melted at °C and press-molded.
型温は８００°Ｃに保持した。約５００００シヨツト成
形した後も成形面は０．０６μｍ以下の表面粗さであり
、ガラスの焼付きも発生しなかった。The mold temperature was maintained at 800°C. Even after approximately 50,000 shots were molded, the molded surface had a surface roughness of 0.06 μm or less, and no glass seizure occurred.
なお、以上の実施例の他に中間層の物質を変えたり、膜
厚を変えたりした実施例を成製に示した。In addition to the above examples, examples in which the material of the intermediate layer was changed and the film thickness was changed were also shown.
（以下余白）
〔発明の効果〕
以上のように、本発明の光学素子成形用型によれば、中
間層をＺｒＮ、ＺｒＣ，ＺｒＣＮ のうちの少なくとも
１種の物質により形成したので、精密な形状の光学素子
をプレス成形するために成形面が高温に長時間さらされ
ても、ＡＩ２．Ｏ，層表面での急激な酸化が起きず、成
形品の外観を悪化させることがなく、ガラスの焼付きも
発生しない。(The following is a blank space) [Effects of the Invention] As described above, according to the mold for molding an optical element of the present invention, since the intermediate layer is formed of at least one substance selected from ZrN, ZrC, and ZrCN, a precise shape can be formed. Even if the molding surface is exposed to high temperatures for a long time to press mold an optical element of AI2. O: Rapid oxidation does not occur on the layer surface, the appearance of the molded product does not deteriorate, and glass seizure does not occur.
第１図、第２図および第３図はそれぞれ本発明の光学素
子成形用型の第１、第２および第３実施例を示す縦断面
図である。
１．４．７・・・型基材
２．５．８・・・中間層
３．６．９・・・Ａ ｌ ｚ Ｏｘ層FIGS. 1, 2, and 3 are longitudinal sectional views showing first, second, and third embodiments of the mold for molding an optical element of the present invention, respectively. 1.4.7... Mold base material 2.5.8... Intermediate layer 3.6.9... Alz Ox layer
Claims (1)
成してなる光学素子成形用型において、前記中間層をＺ
ｒＮ、ＺｒＣ、ＺｒＣＮのうち少なくとも１種の物質に
より形成したことを特徴とする光学素子成形用型。(1) In a mold for molding an optical element in which an Al_2O_3 layer is formed on a mold base material via an intermediate layer, the intermediate layer is
A mold for molding an optical element, characterized in that it is formed of at least one substance selected from rN, ZrC, and ZrCN.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9056590A JPH03290327A (en) | 1990-04-05 | 1990-04-05 | Mold for forming optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9056590A JPH03290327A (en) | 1990-04-05 | 1990-04-05 | Mold for forming optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03290327A true JPH03290327A (en) | 1991-12-20 |
Family
ID=14001955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9056590A Pending JPH03290327A (en) | 1990-04-05 | 1990-04-05 | Mold for forming optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03290327A (en) |
-
1990
- 1990-04-05 JP JP9056590A patent/JPH03290327A/en active Pending
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