JPH0251433A - Mold for molding optical element - Google Patents
Mold for molding optical elementInfo
- Publication number
- JPH0251433A JPH0251433A JP20089388A JP20089388A JPH0251433A JP H0251433 A JPH0251433 A JP H0251433A JP 20089388 A JP20089388 A JP 20089388A JP 20089388 A JP20089388 A JP 20089388A JP H0251433 A JPH0251433 A JP H0251433A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- molding
- optical element
- film
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000465 moulding Methods 0.000 title claims description 43
- 230000003287 optical effect Effects 0.000 title claims description 27
- 150000004767 nitrides Chemical class 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 4
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 3
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 3
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 3
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 3
- 229910052582 BN Inorganic materials 0.000 claims description 9
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 7
- 230000003647 oxidation Effects 0.000 abstract description 8
- 238000007254 oxidation reaction Methods 0.000 abstract description 8
- 238000005498 polishing Methods 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- 229910052735 hafnium Inorganic materials 0.000 abstract description 2
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 22
- 230000003746 surface roughness Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000011195 cermet Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野］ 本発明は、光学素子成形用金型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding an optical element.
従来、光学素子成形用型としては、例えば特開昭５５−
２３０８６号公報に開示されるように、少なくとも表面
が硼素含有材料からなるものが知られている。この光学
素子成形用型は、ガラス接触面において、ホウ素を酸化
させて、Ｂｌ ０３からなる膜を形成し、耐高温性およ
び離型性の維持を図っている。また、上記光学素子成形
用型は、多孔質材料の気孔に硼素含有物を存在させ、離
型剤的に硼素を用いてもよいものである。Conventionally, as molds for molding optical elements, for example, JP-A-55-
As disclosed in Japanese Patent No. 23086, at least the surface thereof is made of a boron-containing material. This mold for molding an optical element oxidizes boron on the glass contact surface to form a film made of Bl 03 in order to maintain high temperature resistance and mold releasability. Further, in the mold for molding an optical element, a boron-containing material may be present in the pores of the porous material, and boron may be used as a mold release agent.
一方、従来、型基材の成形面にｃ−ＢＮやｈＢＮからな
る膜を形成した光学素子成形用型も知られている。On the other hand, conventionally known molds for molding optical elements have a film made of c-BN or hBN formed on the molding surface of a mold base material.
しかし、上記従来のＢｌ Ｏｘ膜を形成した光学素子成
形用型にあっては、十分な反転性を必要とするガラスレ
ンズ成形等の場合に、離型効果が不十分で焼付きを生じ
易く、型寿命も短いという問題があった。また、多孔質
材料の気孔に硼素含有物を存在させた光学素子成形用型
では、仕上り面の粗さが悪く、カーボン粉、ＢＮ粉等の
離型剤を用いた従来例と大差なく、平滑な面とするには
後工程を要するという問題があった。However, in the conventional mold for molding an optical element formed with the above-mentioned Bl Ox film, the mold release effect is insufficient and seizure is likely to occur when molding a glass lens, etc., which requires sufficient reversibility. There was also a problem that the mold life was short. In addition, with molds for molding optical elements in which boron-containing material is present in the pores of porous materials, the finished surface has a poor roughness, and is not much different from conventional molds using mold release agents such as carbon powder or BN powder, and is smooth and smooth. There was a problem in that post-processing was required to obtain a clear surface.
一方、ｃ−ＢＮ膜を形成した従来の光学素子成形用型は
、耐高温酸化性には優れているものの、ｃ−ＢＮ膜と型
基材との密着性の点で実用的な問題があり、例えばＳｉ
Ｃ型基材等でしか使用できず、また成形時のコストが高
く、一部の硝材または光学素子にその適用が制限されて
しまった。また、ｈ−ＢＮ膜を形成した光学素子成形用
型は、高温での酸化進行が速いという問題があった。On the other hand, conventional optical element molds formed with c-BN films have excellent high-temperature oxidation resistance, but have practical problems in terms of adhesion between the c-BN film and the mold base material. , for example Si
It can only be used for C-type substrates, etc., and the cost during molding is high, so its application is limited to some glass materials or optical elements. Furthermore, the mold for molding an optical element in which the h-BN film is formed has a problem in that oxidation progresses rapidly at high temperatures.
本発明は、かかる従来の問題点に鑑みなてされたもので
、耐酸化性および離型性が良好で極めて平滑な面を存し
、型寿命の長い光学素子成形用型を提供することを目的
とする。The present invention has been made in view of such conventional problems, and aims to provide a mold for molding optical elements that has good oxidation resistance and mold release properties, has an extremely smooth surface, and has a long mold life. purpose.
上記目的を達成するために、本発明は、少なくとも型面
の最表層の一部または全部を、Ａｌ２゜Ｔｉ、 Ｖ、
Ｃｒ、 Ｎｉ、 Ｙ、 Ｚｒ、 Ｎｂ、 Ｍｏ。In order to achieve the above object, the present invention provides at least a part or all of the outermost layer of the mold surface with Al2°Ti, V,
Cr, Ni, Y, Zr, Nb, Mo.
Ｈｆ、Ｔａ、Ｗ、Ｉ ｒの元素より選んだ一種以上の窒
硼化物または前記元素より選んだ１種以上の窒化物およ
び窒化硼素の混在物として光学素子成形用型を構成した
ものである。The mold for molding an optical element is made of one or more boron nitrides selected from the elements Hf, Ta, W, and Ir, or a mixture of one or more nitrides selected from the above elements and boron nitride.
本発明の光学素子成形用型は、例えば型基材の成形面を
光学的鏡面に仕上げた後、スパッタリング等のＰＶＤ法
またはＣＶＤ法により、成形面に窒硼化物層また窒化物
と窒化硼素との混在物層を形成する。このようにして製
造した光学素子成形用型は、そのままガラス成形に適用
できるが、特にＣＶＤ法による成膜では、成膜条件によ
っては表面が粗くなることがあり、後加工（研磨）を要
する場合がある。In the optical element molding mold of the present invention, for example, after finishing the molding surface of the mold base material into an optical mirror surface, a nitride-boride layer or a nitride and boron nitride layer is formed on the molding surface by a PVD method such as sputtering or a CVD method. Forms an inclusion layer. The mold for molding optical elements manufactured in this way can be used as is for glass molding, but especially when forming a film using the CVD method, the surface may become rough depending on the film forming conditions, and post-processing (polishing) may be required. There is.
また、型基材の材質としては、高温での機械的強度に優
れかつ組織が安定であるものが適当である。すなわち、
ガラスの加工温度は４００〜７００°Ｃ以上に達するた
め、その温度領域で成形面の形状や面粗さ等が変化しな
い材料で型基材を構成する必要がある。このような材料
の例としては、ＷＣ−Ｎｉ系合金、 Ｃｒ ｒ Ｃｚ系
サーメット。Further, as the material for the mold base material, one that has excellent mechanical strength at high temperatures and has a stable structure is suitable. That is,
Since the processing temperature of glass reaches 400 to 700°C or higher, the mold base material must be made of a material that does not change the shape or surface roughness of the molding surface in that temperature range. Examples of such materials include WC-Ni alloys and Cr r Cz cermets.
Ｔ ｉ Ｃ−ｖＴａＮ系サーメット、ＳｉＣ，５ｉＣ−
３ｉ、Ｎ、系セラミックス、５ｉＣ−Ａ／！Ｎ系セラミ
ックス等がある。かかる材料により型基材を形成すれば
、本発明における窒硼化物層または窒化物と窒化硼素と
の混在層が、型基材に良好に密着し、剥離等の不具合を
生じることがない。T i C-vTaN cermet, SiC, 5iC-
3i, N, ceramics, 5iC-A/! There are N-based ceramics, etc. If the mold base material is formed of such a material, the boron nitride layer or the mixed layer of nitride and boron nitride in the present invention will adhere well to the mold base material, and problems such as peeling will not occur.
上記構成の光学素子成形用型によれば、耐酸化性および
離型性に優れ、成形時に焼付きを生じることがない、ま
た、Ａｌ、Ｔ１等の窒化物と窒化硼素との混在物質を設
けたものは、ＢＮ単独膜に比してより耐食性（特に酸性
溶液）に優れている。According to the mold for molding an optical element having the above configuration, it has excellent oxidation resistance and mold releasability, does not cause seizure during molding, and also contains a mixed substance of nitrides such as Al and T1 and boron nitride. This film has better corrosion resistance (especially against acidic solutions) than a BN film alone.
さらに、本発明の光学素子成形用型は、平滑な面を有し
、成形後においても面粗さの劣化が橿めて少なく、型寿
命が長い。Furthermore, the mold for molding an optical element of the present invention has a smooth surface, and even after molding, there is little deterioration in surface roughness, and the mold has a long life.
（第１実施例）
ＷＣ−Ｎｉ−Ｃｒ−Ｍｏ系超硬合金により型基材を形成
し、研削・研磨により成形面を成形して十分に平滑化し
た。その後、イオンビームスパッタ法により、成形面に
膜厚約２０００人のＴａＢ、膜を形成し、さらに最表層
として膜厚約３０００人のＴａ−Ｂ−Ｎ膜を形成した。(First Example) A mold base material was formed from a WC-Ni-Cr-Mo based cemented carbide, and the molding surface was formed by grinding and polishing to make it sufficiently smooth. Thereafter, a TaB film with a thickness of about 2,000 thick was formed on the molding surface by ion beam sputtering, and a Ta-B-N film with a thickness of about 3,000 thick was further formed as the outermost layer.
最表層における面粗さは、Ｒｍａｘｏ、０２μｍ以下で
あった。The surface roughness of the outermost layer was Rmaxo, 02 μm or less.
上記光学素子成形用型を用いて、Ｌａ５Ｋ系光学硝材の
成形を行ったところ、３０００シヨツトの成形後、面粗
さに君子の劣化はあったものの、十分使用可能な面が維
持されており、耐酸化性および離型性に優れ、型基材と
膜との密着性も良好であった。When La5K optical glass material was molded using the above mold for molding optical elements, after 3000 shots, although there was some deterioration in surface roughness, the surface remained sufficiently usable. It had excellent oxidation resistance and mold releasability, and also had good adhesion between the mold base material and the film.
（第２実施例）
Ｓ Ｉ Ｃ−ＡＩＮセラミックスにより型基材を形成し
、ダイヤモンドパウダー等で成形面を鏡面近くに仕上げ
た。その後、プラズマＣＶＤ法により、成形面に膜厚的
２０μｍのＴｉ−Ｂ−Ｎ膜を形成した０次に、光学素子
の成形面に最適となるように、膜面を鏡面に研磨した。(Second Example) A mold base material was formed from SIC-AIN ceramics, and the molding surface was finished to a near-mirror surface using diamond powder or the like. Thereafter, a Ti-B-N film with a thickness of 20 μm was formed on the molding surface by plasma CVD, and the film surface was polished to a mirror surface so as to be optimal for the molding surface of an optical element.
膜面の面粗さは、Ｒｍａｘｏ、０２μｍ以下であり、平
滑でボアーのない面が得られた。The surface roughness of the membrane surface was Rmaxo, 02 μm or less, and a smooth surface without bores was obtained.
上記光学素子成形用型を用いて、５Ｋ１６硝材の成形を
行ったところ、３０００シヨツトの成形後においても表
面に荒れ等がな（、また変色もな（、十分に継続使用が
可能な状態であった。When 5K16 glass material was molded using the above mold for molding optical elements, there was no surface roughness (or discoloration) even after 3,000 shots were molded, and the mold was in a condition that allowed continued use. Ta.
特に、本実施例では、ＣＶＤ法により成膜を行ったので
、膜の緻密性が高く、酸化の進行も遅く、単なるＴｉＢ
ｇ膜コーテコ−グを施した従来の成形用型に比して型寿
命が３〜７倍に長くなっ（第３〜１５実施例）
ＳｉＣセラミックスまたはＷＣ−Ｎｉ系サーメットによ
り型基材を形成し、イオンビームスパッタ法、ＲＦスパ
ッタ法、プラズマＣＶＤ法等により、型基材の研磨面（
成形面）に成膜して次表に示す構成の光学素子成形用型
を得た。In particular, in this example, the film was formed by the CVD method, so the film was highly dense and the oxidation progressed slowly, making it possible to form a film using only TiB.
The mold life is 3 to 7 times longer than that of conventional molding molds coated with g-film coatecog (3rd to 15th examples) The mold base material is made of SiC ceramics or WC-Ni cermet. , ion beam sputtering method, RF sputtering method, plasma CVD method, etc.
A film was formed on the molding surface) to obtain a mold for molding an optical element having the configuration shown in the following table.
この光学素子成形用型を用いて、ＳＦ？光学ガラスのレ
ンズ成形を連続１０００シッット行った。Using this mold for molding optical elements, SF? Lens molding of optical glass was performed continuously for 1000 shots.
その結果を次表に示す。The results are shown in the table below.
Ａ：良好
Ｂ：イー１可
Ｃ：条件により使用可
Ｄ：不可
第３〜１５実施例の光学素子成形用型は、いずれも１０
００シヨツト成形後においても使用可能であり、得られ
たレンズの表面は極めて平滑な状態であった。これに対
し、従来のようにＢ！０゜膜を形成した光学素子成形用
型（比較例）にあっては、離型性が悪く、微小な焼付き
を発生し、結果として面粗さが劣化してしまった。A: Good B: E1 Acceptable C: Usable depending on conditions D: Not applicable The molds for molding optical elements of Examples 3 to 15 were all 10
The lens could be used even after 00 shot molding, and the surface of the obtained lens was extremely smooth. On the other hand, as before, B! The mold for molding an optical element (comparative example) in which a 0° film was formed had poor mold releasability, caused minute burn-in, and as a result, surface roughness deteriorated.
以上のように、本発明の光学素子成形用型によれば、少
なくとも型面の最表層の一部または全部を、Ａｌ、Ｔｉ
、Ｖ、Ｃｒ、Ｎｉ等の元素より選んだ１種以上の窒硼化
物または前記元素より選んだ１種以上の窒化物および窒
化硼素の混在物で形成しているので、耐酸化性および離
型性に優れ、平滑な面を有しており、成形後においても
面粗さの劣化が橿めて少なく、メンテナンスフリーの状
態で型寿命が著しく長くなる。また特に、低い転移点を
有する硝材の成形にあっては、低コスト化を図ることが
できる。As described above, according to the mold for molding an optical element of the present invention, at least a part or all of the outermost layer of the mold surface is made of Al, Ti, etc.
, V, Cr, Ni, etc., or a mixture of one or more nitrides selected from the above elements and boron nitride, resulting in excellent oxidation resistance and mold release. It has excellent properties and a smooth surface, and even after molding, there is little deterioration in surface roughness, and the life of the mold is significantly longer in a maintenance-free state. In particular, when molding glass materials having a low transition point, it is possible to reduce costs.
Claims (1)
ｌ、Ｔｉ、Ｖ、Ｃｒ、Ｎｉ、Ｙ、Ｚｒ、Ｎｂ、Ｍｏ、Ｈ
ｆ、Ｔａ、Ｗ、Ｉｒの元素より選んだ１種以上の窒硼化
物または前記元素より選んだ１種以上の窒化物および窒
化硼素の混在物からなることを特徴とする光学素子成形
用型。(1) At least a part or all of the outermost layer of the mold surface is A
l, Ti, V, Cr, Ni, Y, Zr, Nb, Mo, H
1. A mold for molding an optical element, comprising one or more boron nitrides selected from the elements f, Ta, W, and Ir, or a mixture of one or more nitrides selected from the above elements and boron nitride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63200893A JP2583581B2 (en) | 1988-08-11 | 1988-08-11 | Mold for optical element molding |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63200893A JP2583581B2 (en) | 1988-08-11 | 1988-08-11 | Mold for optical element molding |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0251433A true JPH0251433A (en) | 1990-02-21 |
| JP2583581B2 JP2583581B2 (en) | 1997-02-19 |
Family
ID=16432007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63200893A Expired - Fee Related JP2583581B2 (en) | 1988-08-11 | 1988-08-11 | Mold for optical element molding |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2583581B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101132082B1 (en) * | 2009-07-16 | 2012-04-02 | 울산대학교 산학협력단 | Superhard CrAlBN nano -multilayered thin films and method thereof |
| US20140004362A1 (en) * | 2007-08-02 | 2014-01-02 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Hard coating film, material coated with hard coating film and die for cold plastic working and method for forming hard coating film |
| US20160067755A1 (en) * | 2012-11-13 | 2016-03-10 | Oerlikon Surface Solutions Ag, Trübbach | Coating for high temperature applications with tribological stress |
-
1988
- 1988-08-11 JP JP63200893A patent/JP2583581B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140004362A1 (en) * | 2007-08-02 | 2014-01-02 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Hard coating film, material coated with hard coating film and die for cold plastic working and method for forming hard coating film |
| US8828562B2 (en) * | 2007-08-02 | 2014-09-09 | Kobe Steel, Ltd. | Hard coating film, material coated with hard coating film and die for cold plastic working and method for forming hard coating film |
| KR101132082B1 (en) * | 2009-07-16 | 2012-04-02 | 울산대학교 산학협력단 | Superhard CrAlBN nano -multilayered thin films and method thereof |
| US20160067755A1 (en) * | 2012-11-13 | 2016-03-10 | Oerlikon Surface Solutions Ag, Trübbach | Coating for high temperature applications with tribological stress |
| US9623468B2 (en) * | 2012-11-13 | 2017-04-18 | Oerlikon Surface Solutions Ag, Pfäffikon | Coating for high temperature applications with tribological stress |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2583581B2 (en) | 1997-02-19 |
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