JPH0361615B2 - - Google Patents
Info
- Publication number
- JPH0361615B2 JPH0361615B2 JP962286A JP962286A JPH0361615B2 JP H0361615 B2 JPH0361615 B2 JP H0361615B2 JP 962286 A JP962286 A JP 962286A JP 962286 A JP962286 A JP 962286A JP H0361615 B2 JPH0361615 B2 JP H0361615B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- molding
- thin film
- adhesion
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000465 moulding Methods 0.000 claims description 34
- 239000010409 thin film Substances 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 11
- 239000011521 glass Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- BLOIXGFLXPCOGW-UHFFFAOYSA-N [Ti].[Sn] Chemical compound [Ti].[Sn] BLOIXGFLXPCOGW-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910000816 inconels 718 Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/11—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、光学素子成形用型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding an optical element.
［従来の技術］
一般に、光学ガラスを加熱プレスにより所望に
成形して光学素子を得ることは、例えば特公昭55
−11624号公報により知られている。ところで、
この加熱プレス手段による場合は、成形用型の離
型性のよいことが必要であり、特に像形成用光学
レンズに要求される厳密な表面形状及び表面特性
を満足するには、離型性が重要な問題である。通
常、離型性は、成形用型の材料に起因するガラス
接着力に大きく依存している。[Prior Art] In general, obtaining an optical element by molding optical glass into a desired shape by hot pressing is known as, for example,
It is known from the publication No.-11624. by the way,
When using this hot pressing method, it is necessary that the mold has good mold releasability, and in particular, in order to satisfy the strict surface shape and surface characteristics required for image forming optical lenses, the mold must have good mold releasability. This is an important issue. Usually, the mold releasability largely depends on the glass adhesive strength caused by the material of the mold.
従来、光学素子成形用型としては、米国特許第
316861号明細書に開示さえるようにSUS400系ス
テンレス鋼を用いたものや、特開昭59−123629号
公報に開示されているように金属材料からなる型
の表面に密化チタン（TiN）層を形成したもの
がある。又、その他の技術としては、型表面に
Crメツキを施したものがある。 Conventionally, as a mold for molding optical elements, U.S. Patent No.
There are molds made of SUS400 stainless steel as disclosed in the specification of No. 316861, and densified titanium (TiN) layers on the surface of molds made of metal materials as disclosed in Japanese Patent Application Laid-open No. 123629/1983. There is something that has been formed. In addition, other techniques include
Some are coated with Cr plating.
［発明が解決しようとする問題点］
しかしながら、上記従来の成形型においては、
金型の離型性及び型表面に形成される金属表層膜
の密着性が悪く、金型寿命も著しく短命であると
いう問題点があつた。[Problems to be solved by the invention] However, in the above conventional mold,
There were problems in that the releasability of the mold and the adhesion of the metal surface film formed on the mold surface were poor, and the life of the mold was extremely short.
本発明は、上記従来の問題点に鑑みなされたも
のであつて、金型の離型性、金型表層膜の密着性
を良好にした光学素子成形用型を提供することを
目的とする。 The present invention has been made in view of the above-mentioned conventional problems, and an object of the present invention is to provide a mold for molding an optical element that has improved mold releasability and adhesion of a mold surface film.
［問題点を解決するための手段及び作用］
本発明は、金属又はセラミツクスよりなる金型
基台の少なくとも成形面にＣ−BN及びアモルフ
アスBNの混在した薄膜を被着して構成し、金型
の離型性及び被着膜の密着性を最良のものとし、
金型寿命を延命化させたものである。[Means and effects for solving the problems] The present invention is constructed by coating a thin film containing a mixture of C-BN and amorphous BN on at least the molding surface of a mold base made of metal or ceramics. The mold releasability and adhesion of the deposited film are the best,
This extends the life of the mold.
［実施例］
以下、図面を用いて本発明の実施例について詳
細に説明する。[Example] Hereinafter, an example of the present invention will be described in detail using the drawings.
（第一実施例）
第１図は、本発明に係る光学素子成形用型１を
示すものであり、図に示すをごとく成形用型１
は、金型基台（金型基材もしくは金型基体））２
と金型基台２における成形面２ａに被着された薄
膜層３とにより構成してある。金型基台２全体に
薄膜層３を被着してもよいことは勿論である。(First Embodiment) FIG. 1 shows a mold 1 for molding an optical element according to the present invention.
is the mold base (mold base material or mold base)) 2
and a thin film layer 3 adhered to the molding surface 2a of the mold base 2. Of course, the thin film layer 3 may be applied to the entire mold base 2.
金型基台２は、SUS鋼（ステンレス鋼）種に
比較して変態点、融点等が高く、強酸、強塩基に
対しても安定である等の特性を有するNi超合金
材料（例えばインコネル７１８）を加工して形設
してある。金型基台２の成形面２ａは、ダイヤモ
ンドパウダー、SiO2系研磨剤を用いて0.05μm
（Rmax）以下、望ましくは0.02μm（Rmax）以下
に研磨加工仕上げしてあり、この研磨加工された
成形面２ａにて直接光学素子を成形しうる程度に
研磨仕上げしてある。成形面２ａが非球面形状
（アスフエリカル等）の場合には、ダイヤモンド
砥石にて研削加工した後にSiO2系又はAl2O3系研
磨剤を用いて仕上げ研磨することにより、
0.05μm（Rmax）以下、望ましくは0.02μm
（Rmax）に仕上げ加工する。 The mold base 2 is made of a Ni superalloy material (for example, Inconel 718), which has a higher transformation point, melting point, etc. than SUS steel (stainless steel), and is stable against strong acids and bases. ) is processed and shaped. The molding surface 2a of the mold base 2 is polished to 0.05 μm using diamond powder and SiO 2 abrasive.
(Rmax) or less, preferably 0.02 μm (Rmax) or less, and the polished molding surface 2a is polished to such an extent that an optical element can be directly molded. If the molding surface 2a has an aspherical shape (such as an aspherical surface), it can be ground with a diamond grindstone and then finished polished using an SiO 2 or Al 2 O 3 abrasive.
0.05μm (Rmax) or less, preferably 0.02μm
(Rmax).
金型基台２の成形面２ａに被着される薄膜層３
は、Ｃ−BN及びａ−BN（アモルフアスBN）の
混在したBN膜にて構成されており、この薄膜層
３は、PVD法（物理的蒸着法）の一種であるス
パツタリングの応用により金型基台２の成形面２
ａに被着構成してある。薄膜層３、即ちBN膜の
膜厚は、0.1μm〜5μm程度、特に0.5μm〜1.5μm
の膜厚が最も有効であり、本実施例では約1μmの
厚さにて被着してある。0.1μm以下の膜厚の場合
には密着性もよくないし、殆どんどＣ−BNのも
のは存在しておらず、又5μm以上の膜厚の場合に
は硬質の膜となつて膜中にクラツクを生ずる傾向
が生じてしまうので除外してある。薄膜層３の被
着手段としては、CVD法（化学的蒸着法）を用
いてもよい。PVD法、CVD法のいずれの場合に
も蒸着速度を大きくとることはできないが、膜層
面の表面粗さは基台研磨面（成形面２ａ）のそれ
よりも良好である。 Thin film layer 3 applied to molding surface 2a of mold base 2
is composed of a BN film containing a mixture of C-BN and a-BN (amorphous BN), and this thin film layer 3 is formed on the mold base by applying sputtering, which is a type of PVD method (physical vapor deposition method). Molding surface 2 of stand 2
It is configured to be adhered to a. The thickness of the thin film layer 3, that is, the BN film, is approximately 0.1 μm to 5 μm, particularly 0.5 μm to 1.5 μm.
The most effective film thickness is approximately 1 μm in this example. If the film thickness is less than 0.1 μm, the adhesion is not good and almost no C-BN exists, and if the film thickness is more than 5 μm, it becomes a hard film and cracks may occur in the film. It has been excluded because it tends to cause As a method for depositing the thin film layer 3, a CVD method (chemical vapor deposition method) may be used. Although it is not possible to increase the deposition rate in either the PVD method or the CVD method, the surface roughness of the film layer surface is better than that of the polished surface of the base (molding surface 2a).
Ｃ−BN及びａ−BNの混在したBN膜よりなる
薄膜層３は、密着性の点から考察すると、完全に
結晶化したBN膜よりもより高く、金型基台２へ
の被着膜としてはＣ−BN及びａ−BNの混在し
たBN膜の方がより有効であることが出願人の研
究により判つた。即ち、ガラスを成形して光学素
子を得る場合、成形用型１は常時400〜500℃以上
の温度にさらされ、さらにガラス素材との間で熱
交換が行なわれるが、この場合、完全に結晶化し
た膜よりもＣ−BNとａ−BNとが混在した膜の
方がいわゆる耐ヒートシヨツク性が良好なのであ
る。かかる理由から、成形面２ａの薄膜層３とし
てＣ−BN及びａ−BN混在したものである。BN
は、特にアモルフアスBNの場合は、Ｂ（ボロン）
とＮ（窒素）の元素比が１：１になりにくく、Ｎ
に対してＢが多く含まれ易い傾向にあるので、で
きるだけＢとＮの元素比が１：１となるようにＮ
イオンビームを適用して被着させるのが有効であ
る。本実施例においては、各種分析手段からＢの
成分40〜80mol％、Ｎの成分15〜50mol％にて薄
膜層３を構成してあり、この成分が最も有効であ
ることを認識した。スパツタリングにより金型基
台２の成形面２ａにＣ−BN及びａ−BNの混在
したBN膜を被着する場合には、高周波によるプ
ラズマを発生させ、BNの結晶化を補助し、さら
にＮイオンビームを成形面（被覆面）２ａに対し
て照射することにより、BNの非化学量論生を小
さくすることができる。又、Ｃ−BNとａ−BN
の混在した中にまれにｈ−BNの存在が認られる
場合もあるが、この場合にも、成形用型１への適
用には何ら問題はない。 Considering the adhesion of the thin film layer 3 made of a BN film containing a mixture of C-BN and a-BN, it has higher adhesion than a completely crystallized BN film, and is suitable for adhesion to the mold base 2. The applicant's research has revealed that a BN film containing a mixture of C-BN and a-BN is more effective. That is, when molding glass to obtain an optical element, the mold 1 is constantly exposed to a temperature of 400 to 500°C or higher, and heat exchange is performed with the glass material, but in this case, the mold 1 is completely crystallized. A film in which C-BN and a-BN are mixed has better so-called heat shock resistance than a film in which C-BN and a-BN are mixed. For this reason, C-BN and a-BN are mixed as the thin film layer 3 on the molding surface 2a. BN
is B (boron), especially in the case of amorphous BN.
The elemental ratio of N and N (nitrogen) is difficult to be 1:1, and N
Since there is a tendency for B to be included in large amounts compared to
It is effective to deposit by applying an ion beam. In this example, the thin film layer 3 was composed of 40 to 80 mol% of B component and 15 to 50 mol% of N component, and it was recognized from various analytical methods that these components were the most effective. When depositing a BN film containing a mixture of C-BN and a-BN on the molding surface 2a of the mold base 2 by sputtering, high-frequency plasma is generated to assist the crystallization of BN, and further N ions By irradiating the forming surface (coated surface) 2a with the beam, the non-stoichiometric production of BN can be reduced. Also, C-BN and a-BN
In rare cases, the presence of h-BN is recognized in the mixture of h-BN, but even in this case, there is no problem in applying it to the mold 1.
次に、上記構成に基づく作用について説明す
る。 Next, the operation based on the above configuration will be explained.
光学素子成形用の金型１は、特に高温状態にて
プレス成形を行なう場合には、高温耐酸化性、耐
食性、形状精度、表面粗さ、硬度等について高レ
ベルの特性が要求されるが、さらにガラスモール
ドレンズ成形用型の場合には、離型性の良いこと
が要求される。又、金型基台に被膜を施す場合に
はその密着性の良好なことが要求される。上記構
成よりなる本実施例の成形用型１を用いて、フリ
ント系光学ガラスを成形素材として金型温度500
℃以上で光学素子の連続成形を行なつたところ、
10000シヨツトの成形後も表面形状に異常はなく、
表面粗さも成形前と比較して殆ど変化が認められ
なかつた。さらに、電子顕微鏡にて拡大して観察
してみたがクラツク等の発生は一切認められなか
つた。従つて、本実施例の構成によれば従来技術
のようにCr系メツキやTiNを被覆した金型に比
して密着性等の点において極めて優れていること
が実証された。 The mold 1 for molding optical elements is required to have high-level properties such as high-temperature oxidation resistance, corrosion resistance, shape accuracy, surface roughness, and hardness, especially when press molding is performed at high temperatures. Furthermore, in the case of a glass mold lens mold, good mold releasability is required. Furthermore, when a coating is applied to a mold base, it is required that the coating has good adhesion. Using the mold 1 of this example having the above configuration, the mold temperature was set at 500 m using flint-based optical glass as the molding material.
When continuously molding optical elements at temperatures above ℃,
There was no abnormality in the surface shape even after molding 10,000 shots.
Almost no change in surface roughness was observed compared to before molding. Further, when the sample was enlarged and observed using an electron microscope, no occurrence of cracks or the like was observed. Therefore, it has been demonstrated that the configuration of this example is extremely superior in terms of adhesion, etc., compared to the prior art molds coated with Cr-based plating or TiN.
又、本発明の初期的な性能を調べるため、加熱
したガラスと成形用型１との接着力（密着性）を
測定した。第２図に、従来技術における接着力と
本実施例における接着力とを比較した結果を示
す。図は、横軸に金型温度（℃）をとり、縦軸に
接着力（MPa）をとつたグラフであり、１０で
示すグラフは本実施例の成形用型１の場合、１１
で示すグラフはTiNを被覆した金型の場合はCr
系のメツキを施した金型の場合を示すものであ
る。このグラフ図からも判るように、本実施例の
成形用型１の場合には、従来技術の金型に比して
最も金型温度に適した480℃において1/3以下の接
着力であり、離型性が極めて良好であることが理
解せきる。 Furthermore, in order to investigate the initial performance of the present invention, the adhesive strength (adhesion) between the heated glass and the mold 1 was measured. FIG. 2 shows the results of a comparison between the adhesive strength in the prior art and the adhesive strength in this example. The figure is a graph with mold temperature (°C) plotted on the horizontal axis and adhesive strength (MPa) plotted on the vertical axis.
The graph shown with Cr is for a mold coated with TiN.
This figure shows the case of a mold that has been plated with a certain type of plating. As can be seen from this graph, in the case of mold 1 of this example, the adhesive force is less than 1/3 at 480°C, which is the most suitable mold temperature, compared to the mold of the conventional technology. It can be seen that the mold releasability is extremely good.
以上のように、本実施例によれば、従来の金型
に比して薄膜層３と金型基台２との密着性及び離
型性が極めて良好となり、又、金型１の寿命の延
命化が図れるものである。 As described above, according to this embodiment, the adhesion and mold releasability between the thin film layer 3 and the mold base 2 are extremely good compared to conventional molds, and the life of the mold 1 is also improved. This can extend life.
（第２実施例）
成形用型１の金型基台２は、超硬合金を用いて
構成することも可能である。この場合には、第１
実施例と同様に金型基台２の成形面２ａに加工、
研磨を施し、加工、研磨後の成形面２ａにCVD
法によりＣ−BN及びａ−BNの混在したBN膜の
薄膜３を被着構成する。CVD法の場合には、
PVD法の場合よりも高い処理温度（約500〜700
℃）を必要とするが、超硬合金で構成してあるの
で問題はない。(Second Embodiment) The mold base 2 of the mold 1 can also be constructed using cemented carbide. In this case, the first
Processed on the molding surface 2a of the mold base 2 in the same way as in the example,
CVD on molding surface 2a after polishing, processing and polishing
A thin film 3 of a BN film containing a mixture of C-BN and a-BN is deposited by the method. In the case of CVD method,
Higher processing temperatures than in the case of the PVD method (approximately 500 to 700
℃), but since it is made of cemented carbide, there is no problem.
上記BN膜の薄膜層３を1.5μmの膜厚にて被覆
した成形用型１の硬度をマイクロビツカース硬度
計で測定したところ、2000Kg／mm2以上の値が得ら
れた。又、BN膜被覆後の表面粗さも0.03μm
（Rmax）以下と極めて小さく、又、成形により
高温を必要とするLak硝材の成形10000シヨツト
においても、BN膜を被覆した成形面の変形、ク
ラツクの発生は一切認められなかつた。従つて、
本実施例においても、第１実施例と同様の効果を
奏しうるものである。 When the hardness of the mold 1 coated with the thin film layer 3 of the BN film with a thickness of 1.5 μm was measured using a micro-Vickers hardness meter, a value of 2000 Kg/mm 2 or more was obtained. Also, the surface roughness after coating with BN film is 0.03μm.
Even in 10,000 molding shots of Lak glass material, which is extremely small (less than Rmax) and requires high temperatures during molding, no deformation or cracks were observed on the molded surface coated with the BN film. Therefore,
This embodiment can also achieve the same effects as the first embodiment.
（第３実施例）
成形用型１の金型基台２は、セラミツクスを用
いて構成することも可能である。但し、完全に緻
密でポアズのない研磨面は現在のところ得られて
ないので、Al2O3等よりなる酸化物系セラミツク
スで金型基台２を構成し、その成形面上にCVD
法によりSiCの厚膜（100μm以上）を被覆した
後、その表面を研磨加工し、光学的に充分な平滑
面に仕上げる。そして、この研磨仕上げされた成
形面にCVD法又はレーザ蒸着法により、Ｃ−BN
及びａ−BNの混在したBN膜を被着する。レー
ザ蒸着法の場合には、第１実施例と同様にＮイオ
ン照射を併用するのが有効である。(Third Embodiment) The mold base 2 of the mold 1 can also be constructed using ceramics. However, since it is currently not possible to obtain a completely fine, porous-free polished surface, the mold base 2 is made of oxide ceramics such as Al 2 O 3 , and CVD is applied to the molding surface.
After coating with a thick SiC film (100 μm or more) using the method, the surface is polished to create an optically sufficiently smooth surface. Then, C-BN
A BN film containing a-BN and a-BN is deposited. In the case of the laser vapor deposition method, it is effective to use N ion irradiation in combination, as in the first embodiment.
本実施例の場合には、金型製作に関して第１、
第２実施例よりも多くの工数を必要とするが、高
温を必要とする硝材の成形に対し第１、第２実施
例よりもより大きな金型１の延命化が図れる利点
がある。具体的には、LaSK硝材による光学素子
の成形に対し、従来技術に比して３〜５倍の寿命
を得ることができた。その他の効果は、第１実施
例と同様であるので、その説明は省略する。上記
第１、第２、第３実施例の構成例の他、金型基台
２をステンレス鋼、Mo、Ｗ、Ta等にて構成して
もよく、この場合にも第１実施例と同様のBN膜
を被着させることにより第１実施例と同様の作
用、効果を奏しうるものである。又、第２図は、
SF１１硝材に対する接着力を示すグラフ図であ
るが、SF８硝材の場合には400℃に加熱する。 In the case of this embodiment, the first,
Although this embodiment requires more man-hours than the second embodiment, it has the advantage of extending the life of the mold 1 more than the first and second embodiments when molding glass materials that require high temperatures. Specifically, when molding an optical element using LaSK glass material, we were able to obtain a lifespan 3 to 5 times longer than with conventional technology. Other effects are the same as those in the first embodiment, so their explanation will be omitted. In addition to the configuration examples of the first, second, and third embodiments described above, the mold base 2 may be made of stainless steel, Mo, W, Ta, etc., and in this case, the same as in the first embodiment. By depositing the BN film, the same functions and effects as in the first embodiment can be achieved. Also, Figure 2 shows
It is a graph showing the adhesive force for SF11 glass material, but in the case of SF8 glass material, it is heated to 400°C.
［発明の効果］
以上のように本発明によれば、従来の金型に比
して極めて良好な離型性と、成形面に被着される
被覆面の密着性を得ることができ、ひいては金型
寿命の大幅な延命化を図りうるものである。[Effects of the Invention] As described above, according to the present invention, it is possible to obtain extremely good mold releasability and adhesion of the coating surface applied to the molding surface compared to conventional molds, and as a result, This can significantly extend the life of the mold.
第１図は本発明に係る金型の実施例の構成を示
す断面説明図、第２図は第１図にて示した金型と
従来の金型との接着力の比較を示すグラフ図であ
る。
１……成形用型、２……金型基台、２ａ……成
形面、３……薄膜層。
FIG. 1 is a cross-sectional explanatory diagram showing the configuration of an embodiment of the mold according to the present invention, and FIG. 2 is a graph diagram showing a comparison of the adhesive force between the mold shown in FIG. 1 and a conventional mold. be. DESCRIPTION OF SYMBOLS 1... Molding mold, 2... Mold base, 2a... Molding surface, 3... Thin film layer.
Claims (1)
なくとも成形面にＣ−BN及びアモルフアスBN
の混在した薄膜を被着して構成したことを特徴と
する光学素子成形用型。 ２ 前記Ｃ−BN及びアモルフアスBNの混在し
た薄膜には、ｈ−BNも混在していることを特徴
とする特許請求の範囲第１項記載の光学素子成形
用型。[Claims] 1. C-BN and amorphous BN on at least the molding surface of a mold base made of metal or ceramics.
A mold for molding an optical element, characterized in that it is constructed by depositing a thin film containing a mixture of. 2. The mold for molding an optical element according to claim 1, wherein the thin film in which C-BN and amorphous BN are mixed also contains h-BN.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP962286A JPS62167229A (en) | 1986-01-20 | 1986-01-20 | Mold for forming optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP962286A JPS62167229A (en) | 1986-01-20 | 1986-01-20 | Mold for forming optical element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62167229A JPS62167229A (en) | 1987-07-23 |
| JPH0361615B2 true JPH0361615B2 (en) | 1991-09-20 |
Family
ID=11725366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP962286A Granted JPS62167229A (en) | 1986-01-20 | 1986-01-20 | Mold for forming optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62167229A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0581013B1 (en) * | 1992-06-25 | 1998-11-25 | Canon Kabushiki Kaisha | Mold for forming optical element and method for producing the same |
-
1986
- 1986-01-20 JP JP962286A patent/JPS62167229A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62167229A (en) | 1987-07-23 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |