JPH0361616B2 - - Google Patents
Info
- Publication number
- JPH0361616B2 JPH0361616B2 JP22641385A JP22641385A JPH0361616B2 JP H0361616 B2 JPH0361616 B2 JP H0361616B2 JP 22641385 A JP22641385 A JP 22641385A JP 22641385 A JP22641385 A JP 22641385A JP H0361616 B2 JPH0361616 B2 JP H0361616B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- molding
- crn
- mol
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000465 moulding Methods 0.000 claims description 26
- 239000011651 chromium Substances 0.000 claims description 20
- 230000003287 optical effect Effects 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 13
- 229910052804 chromium Inorganic materials 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000010935 stainless steel Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 238000009736 wetting Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/26—Mixtures of materials covered by more than one of the groups C03B2215/16 - C03B2215/24, e.g. C-SiC, Cr-Cr2O3, SIALON
Description
【発明の詳細な説明】 ［産業上の利用分野］ この発明は、光学素子成形用型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding an optical element.
［従来の技術］
一般に、光学ガラスを加熱プレスにより所望に
成形して光学素子を得ることは、例えば特公昭55
−11624号公報により知られている。ところで、
この加熱プレス手段による場合は、成形用型の離
型性の良いことが必要であり、特に像形成用光学
レンズに要求される厳密な表面形状および表面特
性を満足するには、離型性が重要な問題である。
通常、離型性は、成形用型の材料に起因するガラ
ス濡れ性に大きく依存している。[Prior Art] In general, obtaining an optical element by molding optical glass into a desired shape by hot pressing is known as, for example,
It is known from the publication No.-11624. by the way,
When using this hot press method, it is necessary that the mold has good mold releasability, and in particular, in order to satisfy the strict surface shape and surface characteristics required for image forming optical lenses, the mold must have good mold releasability. This is an important issue.
Usually, mold releasability largely depends on the glass wettability caused by the material of the mold.
従来、光学素子成形用型としては、米国特許第
316861号明細書に開示されるようにSUS400系ス
テンレス鋼を用いたものや、特開59−123629号公
報に開示されるように金属材料からなる型の表面
に窒化チタン（TiN）層を形成したものがある。 Conventionally, as a mold for molding optical elements, U.S. Patent No.
A titanium nitride (TiN) layer is formed on the surface of a mold made of SUS400 stainless steel as disclosed in the specification of No. 316861, or a mold made of a metal material as disclosed in JP-A No. 59-123629. There is something.
［発明が解決しようとする問題点］
しかし、上記ステンレス鋼等の金属からなる光
学素子成形用型は、ガラスの成形および熱間加圧
の各工程における温度サイクルにより結晶粒の成
長を生じて結晶構造が変化し、型の表面が肌荒れ
して離型性が著しく劣化し、成形品の所望の表面
形状を得られず、成形早期に製品の平滑度や光沢
を損なうとともに、型自体の寿命が非常に短いと
いう問題があつた。また、金型の表面にTiN層
を形成したものは、金型温度が500℃以上になる
と酸化してしまい、濡れ性が良くなつて離型性が
劣化し、高温の成形加工には不適当であつた。こ
の発明は、このような問題点に着目してなされた
もので、長寿命にして離型性が良好であり、高温
での成形加工にも適した光学素子成形用型を提供
することを目的とする。[Problems to be Solved by the Invention] However, the mold for molding optical elements made of metal such as stainless steel causes crystal grain growth due to temperature cycles in each process of glass molding and hot pressing. The structure changes, the surface of the mold becomes rough and the mold releasability deteriorates significantly, making it impossible to obtain the desired surface shape of the molded product, damaging the smoothness and gloss of the product in the early stage of molding, and shortening the life of the mold itself. The problem was that it was very short. In addition, molds with a TiN layer formed on the surface of the mold will oxidize when the mold temperature exceeds 500℃, improving wettability and deteriorating mold release properties, making it unsuitable for high-temperature molding processing. It was hot. This invention was made in view of these problems, and aims to provide a mold for molding optical elements that has a long life, good mold releasability, and is suitable for molding processing at high temperatures. shall be.
［問題点を解決するための手段］
かかる従来の問題点を解決するために、本発明
は、光学素子成形用型の少なくとも成形面をクロ
ムCrおよび窒素Ｎを主成分とする化合物で形成
した。例えばモリブデンMo、チタンTi、タング
ステンＷまたはステンレス鋼からなる金型の成形
面にCrおよびＮを主成分とする化合物の被膜を
形成したものである。[Means for Solving the Problems] In order to solve the conventional problems, in the present invention, at least the molding surface of the mold for molding an optical element is formed of a compound containing chromium Cr and nitrogen N as main components. For example, a film of a compound containing Cr and N as main components is formed on the molding surface of a mold made of molybdenum Mo, titanium Ti, tungsten W, or stainless steel.
上記CrおよびＮを主成分とする化合物は、
Cr40〜90モル％、N10〜50モル％であつてCrと
Ｎとの合計が90モル％以上含有することが好まし
い。これは、Crが40モル％未満であると、被膜
がもろく、膨張係数も小さくなるため、剥離や脱
落が生じ易くなり、またCrが90モル％を越える
と、耐蝕性が低下し、硬度も不十分となるからで
ある。一方、Ｎが10モル％未満であると、耐蝕性
が低下してしまい、Ｎが50モル％を越えると、被
膜がもろく、膨張係数も小さくなつて剥離や脱落
が生じ易くなるからである。また、CrとＮとの
合計が90モル％未満であると、十分な離型性が得
られない。 The above compound containing Cr and N as main components is
Preferably, the content is 40 to 90 mol% of Cr, 10 to 50 mol% of N, and the total content of Cr and N is 90 mol% or more. This is because if the Cr content is less than 40 mol%, the coating will be brittle and have a small expansion coefficient, making it easy to peel or fall off.If the Cr content exceeds 90 mol%, the corrosion resistance will decrease and the hardness will decrease. This is because it will be insufficient. On the other hand, if the N content is less than 10 mol%, the corrosion resistance will decrease, and if the N content exceeds 50 mol%, the coating will be brittle and have a small coefficient of expansion, making it easy to peel or fall off. Further, if the total amount of Cr and N is less than 90 mol%, sufficient mold releasability cannot be obtained.
本発明において、CrおよびＮを主成分とする
化合物としては、一窒化クロムCrN、Cr−CrN
または二窒化クロムCr2N−CrN系化合物等が適
している。 In the present invention, compounds containing Cr and N as main components include chromium mononitride CrN, Cr-CrN
Alternatively, chromium dinitride Cr 2 N-CrN-based compounds are suitable.
なお、金型に被膜を形成するには、金型の成形
面を研磨して十分に平滑かつ形状精度を良好に仕
上げた後、イオンプレーテイングまたはその他の
PVD法等を用いて行い、被膜は１〜3μmの厚さ
で均一に形成し、通常このままで光学素子成形用
型として用いる。また、必要に応じて研磨を行
い、更に粗さ、形状等の表面品質を向上させても
よい。 In order to form a film on the mold, the molding surface of the mold is polished to be sufficiently smooth and have good shape accuracy, and then ion plating or other methods are applied.
A PVD method or the like is used to form a uniform film with a thickness of 1 to 3 μm, and the film is usually used as it is as a mold for molding an optical element. Further, if necessary, polishing may be performed to further improve surface quality such as roughness and shape.
上記構成の光学素子成形用型は、十分な硬度を
有して長寿命であり、濡れ角が大きくて離型性が
良く、高温での成形加工においても優れた離型性
を示す。 The mold for molding an optical element having the above structure has sufficient hardness, has a long life, has a large wetting angle, has good mold releasability, and exhibits excellent mold releasability even in molding processing at high temperatures.
［実施例］
第１図に示すように、ステンレス鋼からなる金
属基材１を所望の最終製品に対応した形状に加工
し、さらに光学的要求の生じる成形面に鏡面研磨
を施し、その成形面に対し、イオンプレーテイン
グにより厚さ1.5μmのCrN被膜２を形成した。こ
こに、CrN被膜２は、CrN95モル％以上で炭素
Ｃ、ケイ素Si、ナトリウムNa等の不純物を含有
している。[Example] As shown in Fig. 1, a metal base material 1 made of stainless steel is processed into a shape corresponding to a desired final product, and the molded surface where optical requirements arise is mirror-polished. On the other hand, a 1.5 μm thick CrN film 2 was formed by ion plating. Here, the CrN coating 2 contains impurities such as carbon C, silicon Si, and sodium Na at 95 mol % or more of CrN.
次に、上記実施例で得た光学素子成形用型とフ
リント系ガラスとの濡れ性を試験した。その試験
結果を第２図に示す。なお、比較のため、第２図
中にステンレス鋼にTiN層を形成した型、石英
ガラスからなる型およびSUS420J2鋼からなる型
の試験結果も示した。試験は、窒素ガス雰囲気に
保持した加熱炉を2deg／minで昇温し、炉内にお
ける光学素子成形用型とペレツト状に加工したフ
リント系ガラスとの濡れ角を測定したものであ
る。 Next, the wettability of the optical element mold obtained in the above example with the flint-based glass was tested. The test results are shown in Figure 2. For comparison, FIG. 2 also shows the test results of a mold made of stainless steel with a TiN layer formed thereon, a mold made of quartz glass, and a mold made of SUS420J 2 steel. In the test, a heating furnace maintained in a nitrogen gas atmosphere was heated at a rate of 2 deg/min, and the wetting angle between the mold for molding an optical element and the flint-based glass processed into a pellet in the furnace was measured.
第２図は、横軸に炉内の温度（℃）、縦軸に濡
れ角（度）をとつたもので、実線３は実施例のも
の、実線４はステンレス鋼にTiN層を形成した
もの、破線５は石英ガラスからなるもの、破線６
はSUS420J2鋼からなるものの特性を示す。第２
図から明らかなように、実施例の型は、広い温度
範囲で濡れ角が大きく、ガラスとは濡れにくく、
離型性が良好であることが判る。これに対し、石
英ガラスまたはSUS420J2鋼からなる型は、濡れ
角が小さく、離型性が悪い。これは、石英ガラス
はフリント系ガラスと同様の酸化物であるためで
あり、金属は化学的にラジカルであるためである
と考えられる。また、TiN層を形成したものは、
500℃付近までは満足できる値を示すが、500℃を
越えると酸化により濡れ角が小さくなり、離型性
が悪くなつてしまう。 In Figure 2, the horizontal axis shows the temperature inside the furnace (°C) and the vertical axis shows the wetting angle (degrees), where solid line 3 shows the example, and solid line 4 shows the case where a TiN layer is formed on stainless steel. , broken line 5 is made of quartz glass, broken line 6 is made of quartz glass.
shows the characteristics of SUS420J 2 steel. Second
As is clear from the figure, the mold of the example has a large wetting angle over a wide temperature range, and is difficult to wet with glass.
It can be seen that the mold releasability is good. On the other hand, molds made of quartz glass or SUS420J 2 steel have a small wetting angle and poor mold release properties. This is thought to be because silica glass is an oxide similar to flint-based glass, and metals are chemically radicals. In addition, those with a TiN layer are
It shows a satisfactory value up to around 500°C, but when it exceeds 500°C, the wetting angle becomes small due to oxidation, and the mold releasability deteriorates.
一方、マイクロビツカース硬度計を用いてCrN
被膜２の表面における硬度を測定した。その結
果、10g荷重下で、金属基材１に超硬合金を用い
た場合には、1500±100Kgｆ／mm2、SUS304鋼を
用いた場合には、約1000Kgｆ／mm2、SUS420J2焼
入れ鋼を用いた場合には、1200±100Kgｆ／mm2を
示した。これらの値は、従来の焼入れ済合金工具
鋼が600〜800Kgｆ／mm2であるのに比し、十分優れ
た特性である。 On the other hand, CrN was measured using a micro-Vickers hardness tester.
The hardness on the surface of coating 2 was measured. As a result, under a load of 10g, when cemented carbide was used as the metal base material 1, it was 1500±100Kgf/mm 2 , when SUS304 steel was used, it was about 1000Kgf/mm 2 , and when SUS420J 2 quenched steel When used, it showed 1200±100Kgf/mm 2 . These values are sufficiently superior properties compared to the 600 to 800 Kgf/mm 2 of conventional hardened alloy tool steel.
また、表面粗さについては、例えば前記実施例
において、金属基材１の成形面をRmax＝0.1μm
の面に研磨してCrN被膜２を形成した場合、CrN
被膜２の表面粗さは変化しなかつた。さらに、金
属基材１の成形面をRmax＝0.03μm程度の面に
研磨してCrN被膜２を形成した場合、CrN被膜２
の表面粗さはRmax≦0.02μmとなり、更に良好
な面となつた。 Regarding the surface roughness, for example, in the above example, the molded surface of the metal base material 1 was set to Rmax = 0.1 μm.
When CrN coating 2 is formed on the surface of
The surface roughness of Coating 2 did not change. Furthermore, if the CrN coating 2 is formed by polishing the molded surface of the metal base material 1 to a surface of approximately Rmax = 0.03 μm, the CrN coating 2
The surface roughness was Rmax≦0.02μm, which was an even better surface.
また、実施例の型に対し5000シヨツトのガラス
光学部品成形を行つたところ、その成形面には全
く変化がなく、初期性能を維持していた。 Furthermore, when 5000 shots of glass optical components were molded using the mold of the example, there was no change in the molding surface at all, and the initial performance was maintained.
なお、上記実施例においては、金属基材１に直
接CrN被膜２を形成したが、本発明はかかる実施
例に限定されるものではなく、金属基材１にCr
を被着させた後にCrN被膜を形成してもよい。
Crは、膨張係数がステンレス鋼とCrNとの間で
あり、金属基材１との密着性を向上することがで
きる。ただし、Crは、耐蝕性を考慮すると、被
膜表面には存在しない方が好ましい。 In the above example, the CrN film 2 was formed directly on the metal base material 1, but the present invention is not limited to such an example, and the CrN film 2 was formed directly on the metal base material 1.
A CrN film may be formed after the CrN film is deposited.
Cr has an expansion coefficient between that of stainless steel and CrN, and can improve adhesion to the metal base material 1. However, in consideration of corrosion resistance, it is preferable that Cr not exist on the coating surface.
一方、成形面以外の部分にCrN被膜を形成して
もよく、被膜はCr−CrNの非晶質状組織または
CrN−Cr−Cr2Nの共晶状態のもの等でも前記実
施例とほぼ同様の効果を得ることができる。ま
た、本発明において、総和で10モル％未満であれ
ば、ホウ素Ｂ、リンＰ、バナジウムＶ、ケイ素
Si、ハフニウムHf等を化合物中に添加しても前
記効果を高めることができる。 On the other hand, a CrN film may be formed on parts other than the molding surface, and the film may be formed of an amorphous structure of Cr-CrN or
Almost the same effect as in the above embodiment can be obtained even with a eutectic state of CrN-Cr- Cr2N . In addition, in the present invention, if the total is less than 10 mol%, boron B, phosphorus P, vanadium V, silicon
The above effect can also be enhanced by adding Si, hafnium Hf, etc. to the compound.
［発明の効果］
以上のように、本発明の光学素子成形用型によ
れば、少なくとも成形面をCrおよびＮを主成分
とする化合物により形成しているので、長寿命に
して離型性が良好であり、高温での成形加工も良
好に行い得、型自体のコストも安価である。[Effects of the Invention] As described above, according to the mold for molding an optical element of the present invention, at least the molding surface is formed of a compound containing Cr and N as main components, so it has a long life and good mold releasability. It has good properties, can be molded well at high temperatures, and the cost of the mold itself is low.
第１図は本発明の光学素子成形用型の一実施例
を示す縦断正面図、第２図はフリント系ガラスと
の濡れ性の試験結果を示すグラスである。
１……金属基材、２……CrN被膜。
FIG. 1 is a longitudinal sectional front view showing an embodiment of an optical element molding mold of the present invention, and FIG. 2 is a glass showing the results of a wettability test with flint-based glass. 1...Metal base material, 2...CrN coating.
Claims (1)
り少なくとも成形面を形成したことを特徴とする
光学素子成形用型。 ２ 前記クロムおよび窒素を主成分とする化合物
が、クロム40〜90モル％、窒素10〜50モル％であ
つてクロムと窒素との合計が90モル％以上の化合
物からなることを特徴とする特許請求の範囲第１
項記載の光学素子成形用型。 ３ 前記クロムおよび窒素を主成分とする化合物
が、CrN，Ｃ−CrNまたはCr2N−CrN系化合物
からなることを特徴とする特許請求の範囲第１項
又は第２項記載の光学素子成形用型。[Scope of Claims] 1. A mold for molding an optical element, characterized in that at least a molding surface is formed of a compound containing chromium and nitrogen as main components. 2. A patent characterized in that the compound containing chromium and nitrogen as main components is a compound containing 40 to 90 mol% of chromium, 10 to 50 mol% of nitrogen, and the total of chromium and nitrogen is 90 mol% or more. Claim 1
A mold for molding an optical element as described in . 3. Optical element molding according to claim 1 or 2, wherein the compound containing chromium and nitrogen as main components is CrN, C-CrN or Cr2N -CrN based compound. Type.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22641385A JPS6287423A (en) | 1985-10-11 | 1985-10-11 | Mold for forming optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22641385A JPS6287423A (en) | 1985-10-11 | 1985-10-11 | Mold for forming optical element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6287423A JPS6287423A (en) | 1987-04-21 |
| JPH0361616B2 true JPH0361616B2 (en) | 1991-09-20 |
Family
ID=16844729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22641385A Granted JPS6287423A (en) | 1985-10-11 | 1985-10-11 | Mold for forming optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6287423A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0662307B2 (en) * | 1989-04-06 | 1994-08-17 | オリンパス光学工業株式会社 | Optical element molding die and method of manufacturing the same |
| FR2653452B1 (en) * | 1989-10-20 | 1992-01-24 | Stephanois Rech Mec | SUBSTRATE COATING FOR PROVIDING GOOD TRIBOLOGICAL PROPERTIES THEREOF, OF CHROME-NITROGEN ALLOY, AND PROCESS FOR OBTAINING SAME. |
| JP2771947B2 (en) * | 1994-04-21 | 1998-07-02 | 株式会社リケン | Sliding member |
-
1985
- 1985-10-11 JP JP22641385A patent/JPS6287423A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6287423A (en) | 1987-04-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0461816B2 (en) | ||
| JPH0361616B2 (en) | ||
| JPH0379299B2 (en) | ||
| JP2973533B2 (en) | Optical element molding method and molding die | |
| JPH0361617B2 (en) | ||
| JP2785888B2 (en) | Mold for optical element molding | |
| JPH0361615B2 (en) | ||
| JP2583581B2 (en) | Mold for optical element molding | |
| JPS63123822A (en) | Mold for molding optical glass element | |
| JP3011574B2 (en) | Mold for molding optical elements | |
| JPH02129035A (en) | Mold for molding optical element | |
| JPS63297231A (en) | Molding mold for glass product | |
| JPH0329012B2 (en) | ||
| JP2571290B2 (en) | Mold for optical element molding | |
| JP3605774B2 (en) | Glass press mold | |
| JP2732863B2 (en) | Mold for optical element molding | |
| JP2662285B2 (en) | Mold for optical element molding | |
| JPH04338121A (en) | Metallic mold for forming optical element | |
| JP6406938B2 (en) | Amorphous alloy, mold for molding, and method of manufacturing optical element | |
| JPH03164437A (en) | Optical element forming die | |
| JPH08217466A (en) | Method for forming glass optical element | |
| JPS60180926A (en) | Mold for press-molding highly accurate glass molded article | |
| AU2020283650A1 (en) | Method for manufacturing plate glass | |
| JPH02137741A (en) | Mold for making optical glass element | |
| JPS62207837A (en) | Metal mold for forming optical glass device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |