JPH0328048B2 - - Google Patents

Info

Publication number
JPH0328048B2
JPH0328048B2 JP56007244A JP724481A JPH0328048B2 JP H0328048 B2 JPH0328048 B2 JP H0328048B2 JP 56007244 A JP56007244 A JP 56007244A JP 724481 A JP724481 A JP 724481A JP H0328048 B2 JPH0328048 B2 JP H0328048B2
Authority
JP
Japan
Prior art keywords
mark
deflection
electron beam
position data
edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56007244A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57122517A (en
Inventor
Korehito Matsuda
Nobuo Shimazu
Kiichi Takamoto
Susumu Ozasa
Hisatake Yokochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP56007244A priority Critical patent/JPS57122517A/ja
Publication of JPS57122517A publication Critical patent/JPS57122517A/ja
Publication of JPH0328048B2 publication Critical patent/JPH0328048B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56007244A 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure Granted JPS57122517A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56007244A JPS57122517A (en) 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56007244A JPS57122517A (en) 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS57122517A JPS57122517A (en) 1982-07-30
JPH0328048B2 true JPH0328048B2 (https=) 1991-04-17

Family

ID=11660590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56007244A Granted JPS57122517A (en) 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS57122517A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229939A (ja) * 1986-03-31 1987-10-08 Advantest Corp 荷電粒子ビ−ム露光装置におけるマ−ク位置検出回路

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3924113A (en) * 1973-06-08 1975-12-02 Ibm Electron beam registration system

Also Published As

Publication number Publication date
JPS57122517A (en) 1982-07-30

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