JPH0325400Y2 - - Google Patents
Info
- Publication number
- JPH0325400Y2 JPH0325400Y2 JP1986100176U JP10017686U JPH0325400Y2 JP H0325400 Y2 JPH0325400 Y2 JP H0325400Y2 JP 1986100176 U JP1986100176 U JP 1986100176U JP 10017686 U JP10017686 U JP 10017686U JP H0325400 Y2 JPH0325400 Y2 JP H0325400Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holder
- support
- cap
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 66
- 239000007788 liquid Substances 0.000 claims description 20
- 239000007921 spray Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 description 8
- 238000003780 insertion Methods 0.000 description 7
- 230000037431 insertion Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986100176U JPH0325400Y2 (de) | 1986-06-30 | 1986-06-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986100176U JPH0325400Y2 (de) | 1986-06-30 | 1986-06-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS636728U JPS636728U (de) | 1988-01-18 |
JPH0325400Y2 true JPH0325400Y2 (de) | 1991-06-03 |
Family
ID=30969748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986100176U Expired JPH0325400Y2 (de) | 1986-06-30 | 1986-06-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0325400Y2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007052300A (ja) * | 2005-08-19 | 2007-03-01 | Pre-Tech Co Ltd | マスク基板用の洗浄装置及びそれを用いたマスク基板の洗浄方法 |
JP4885755B2 (ja) * | 2007-02-07 | 2012-02-29 | ラピスセミコンダクタ株式会社 | ガイド部材の位置決め方法、及び基板の位置決め方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5498574A (en) * | 1978-01-20 | 1979-08-03 | Matsushita Electric Ind Co Ltd | Rotary coating unit of viscous material |
JPS614772B2 (de) * | 1982-03-19 | 1986-02-13 | Onoda Chem Ind Co Ltd |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51137177U (de) * | 1975-04-26 | 1976-11-05 | ||
JPS5649703Y2 (de) * | 1977-09-21 | 1981-11-19 | ||
JPS5571547U (de) * | 1978-11-08 | 1980-05-16 | ||
JPS614772U (ja) * | 1984-06-12 | 1986-01-13 | ホ−ヤ株式会社 | スプレ−装置 |
-
1986
- 1986-06-30 JP JP1986100176U patent/JPH0325400Y2/ja not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5498574A (en) * | 1978-01-20 | 1979-08-03 | Matsushita Electric Ind Co Ltd | Rotary coating unit of viscous material |
JPS614772B2 (de) * | 1982-03-19 | 1986-02-13 | Onoda Chem Ind Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS636728U (de) | 1988-01-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4189141B2 (ja) | 基板処理装置及びこれを用いた基板処理方法 | |
US5322079A (en) | Substrate holding apparatus of a simple structure for holding a rotating substrate, and a substrate processing apparatus including the substrate holding apparatus | |
JP7248465B2 (ja) | 基板処理装置のスピンチャック | |
JP3658355B2 (ja) | 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置 | |
JP2007058200A (ja) | マスクブランクの製造方法及び露光用マスクの製造方法 | |
JP2022046444A (ja) | 洗浄ジグ、これを含む基板処理装置、そして基板処理装置の洗浄方法 | |
JPH0325400Y2 (de) | ||
JPH02249225A (ja) | レジスト塗布装置 | |
US6569241B2 (en) | Substrate spinning apparatus | |
TWI771501B (zh) | 基板清洗裝置 | |
TW518648B (en) | Rotary processing device | |
JPS6079724A (ja) | 回転処理装置 | |
JP7376420B2 (ja) | 基板保持装置およびそれを備える基板搬送装置 | |
JPH0135470Y2 (de) | ||
JP3461068B2 (ja) | 回転カップ式液体供給装置 | |
JPS5963726A (ja) | ホトレジスト現像装置 | |
US10691020B2 (en) | Apparatus for dispensing liquid material and method for fabricating semiconductor device | |
US6403500B1 (en) | Cross-shaped resist dispensing system and method | |
JPH0220823Y2 (de) | ||
JPH049031Y2 (de) | ||
TW584909B (en) | Microelectronic substrate edge bead processing apparatus and method | |
KR20020097332A (ko) | 반도체 웨이퍼 고정용 진공 척 | |
JPH02309628A (ja) | スピンチヤツク | |
JPH11186133A (ja) | 基板処理装置 | |
JPH0446860Y2 (de) |