518648 五、發明説明（1 ) 【發明之詳細的說明】 【發明所屬之技術領域】 該發明係有關於藉轉台一邊轉動基板，一邊作處理之 旋轉處理裝置。 【習知技術】 譬如’在液晶顯示裝置或半導體裝置之製造步驟過程 中，有用以在玻璃基板或半導體晶片等基板形成電路圖形 之成膜處理或光學處理。該等之處理藉處理液對上述基板 施行處理及洗淨以後，實施乾燥處理。 面對基板實施如此的-系列處理時，將上述基板保持 於轉台’與該轉台-起回轉，利用因它產生之離心力，可 使用旋轉處理裝置。 在-般，旋轉處理裝置具有處理槽，在該處理槽内配 置杯體。該杯體係上面開口 ’在内部設置有轉台。在該轉 台可裝拆地保持上述基板。在上述杯體之底部周方向地以 既定間隔連接複數個排出管。各排出管分別連接氣液分離 器’在該氣液分離器連接排出泵。 藉上述旋轉處理裝置處理基板時，首先，將保持基板 之轉台以數H)〜數刚轉/分之低速度—邊回轉一邊供應作 為處理液之氟氫酸等藥液至基板。 設藉藥液施行既定時間之處理時’同樣地供應作為處 理液之純水，自基板洗淨除去藥液。接著，由於將轉台以 1_〜2_轉/分程度之高速度回轉，藉離心力除去附:於 基板之處理液，以乾燥處理該基板。 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐）518648 V. Description of the invention (1) [Detailed description of the invention] [Technical field to which the invention belongs] The invention relates to a rotary processing device for processing a substrate while rotating a substrate by a turntable. [Conventional Technology] For example, in the process of manufacturing a liquid crystal display device or a semiconductor device, it is useful to form a circuit pattern on a glass substrate, a semiconductor wafer, or the like by a film forming process or an optical process. After the above-mentioned substrates are processed and cleaned by a processing liquid, a drying process is performed. When such a series of processing is performed on a substrate, the substrate is held on a turntable 'and the turntable is rotated up and down, and a centrifugal force generated by the substrate is used to rotate the processing device. In general, the rotary processing apparatus has a processing tank, and a cup is arranged in the processing tank. The cup system is open at the top ′ and a turntable is provided inside. The substrate is detachably held on the turntable. A plurality of discharge pipes are connected to the bottom of the cup in a circumferential direction at predetermined intervals. Each discharge pipe is connected to a gas-liquid separator ', and the gas-liquid separator is connected to a discharge pump. When the substrate is processed by the above-mentioned rotary processing apparatus, first, the turntable holding the substrate is supplied with a chemical solution such as hydrofluoric acid as a processing liquid to the substrate at a low speed of several digits to a few revolutions per minute. When a chemical solution is used for a predetermined period of time, it is assumed that pure water is supplied as a processing solution, and the chemical solution is washed and removed from the substrate. Next, since the turntable is rotated at a high speed of about 1 to 2 revolutions per minute, the processing liquid attached to the substrate is removed by centrifugal force, and the substrate is dried and processed. This paper size applies to China National Standard (CNS) A4 (210X297 mm)
.----- (請先閱讀背面之注意事項再填寫本頁) -丨 518648 A7 B7 五、發明説明 (請先閲讀背面之注意事項再填寫本頁) 如同上述當處理基板時，作動連接排出管之排出泵。 藉此’由於排出泵之吸引力透過棑出管作用於杯體内，藉 該排出管變成可排出含自基板飛散之處理液之杯體内氣 體。 【發明欲解決之課題】 可是’在杯體之底部，通常沿著杯體之周方向以既定 間隔連接2〜4只排出管。因此，作用於杯體内之排出泵吸 引力係連接排出管之部份與其他部份相較變高。亦即，在 杯體内’因排出泵引起之吸引力透過排出管難以均一地作 用遍及周方向全體。 -、旬· 因此’杯體内排出泵之吸引力難以作用之部份係由基 板飛散，在杯體之内周面反射之處理液排出變難，變成霧 狀〉于游杯體内而再附著於基板，有所謂變成污染原因之情 事。 .線— 本發明係提供一種自基板飛散之處理液不會自杯體排 不出而再附著於基板之旋轉處理裝置。 【為解決課題之手段】 根據本發明，提供一種一邊轉動基板，一邊作處理之 旋轉處理裝置，其包含： 杯體； 轉台，係設置於該杯體内以保持上述基板，同時藉驅 動源可旋轉驅動； 排出部，係連通設置於上述杯體内並用以自該杯體内 排出氣體及液體； 本紙張尺度翻巾國國家標準（哪）A4規格（2獻297公爱） 518648 A7 _________B7__ 五、發明説明（3 ) 排氣裝置’係連接該排出部並用以使吸引力作用於上 述杯體内；及 複數個整流環，係沿上下方向以既定間隔分離設置於 上述杯體内之内周面與上述轉台回轉領域外側之間，並藉 上述排氣裝置之吸引力整流自上述杯體内朝上述排出部所 I 排出之氣體。 根據本發明，藉設置於杯體内整流環之整流作用，變 成可將排出裝置之吸引力均一地作用於杯體内。 【發明之實施形態】 以下，參閱圖式說明本發明之實施形態。 第1圖乃至第5圖表示本發明之第丨實施形態。第丨圖與 第2圖所示旋轉處理裝置具有杯體卜該杯體丨設置於箱型狀 之處理槽2内。杯體丨具有面向中心部更高傾斜之底板3，在 該底板3之周邊部設置有周壁4。在該周壁塌口形成如在第 2圖所示周方向地以等間隔偶數，#如四個導人口部卜 在上述底板2之中心部份形成通孔6，在該通孔6插通中 空狀之驅動軸7。此外，藉遮蔽板仏閉塞通孔6。 在上述底板2下面之中心部份安裝驅動馬達8，在該驅 動馬達8未圖示之轉子連結上述驅動軸7。在突出該驅動轴7 之杯體！内之上端’安裝如在第2圖所示平面形狀為大致十 字狀之轉台9。 上述轉台9由連結固定於上述驅動轴7上端之基和愈 | 財向地以既定間隔連結_端部於該基部以四根臂㈣ 構成。如在第2圖所示’在各臂12之頂端部分別立設一對扣 本紙張尺度顧中酬家鮮（⑽）靖格（2歌297公幻 -----—— * 6 -.----- (Please read the precautions on the back before filling in this page)-丨 518648 A7 B7 V. Description of the invention (Please read the precautions on the back before filling in this page) As mentioned above, when processing the substrate, make the connection The discharge pump of the discharge pipe. By this, the suction force of the discharge pump acts on the cup body through the discharge tube, and the gas in the cup containing the processing liquid scattered from the substrate can be discharged by the discharge tube. [Problems to be Solved by the Invention] However, 'the bottom of the cup is usually connected with 2 to 4 discharge pipes at predetermined intervals along the circumferential direction of the cup. Therefore, the suction force of the discharge pump acting on the inside of the cup becomes higher than that of the other parts. That is, it is difficult for the suction force caused by the discharge pump in the cup's body to work uniformly throughout the entire circumference through the discharge pipe. -, Xun · Therefore, the part of the pump that is difficult to attract the pump body is scattered by the substrate, and the treatment liquid reflected on the inner peripheral surface of the cup becomes difficult to discharge, and becomes misty. Adhesion to a substrate may cause contamination. Line-The present invention provides a rotary processing device that does not allow the processing liquid scattered from the substrate to be discharged from the cup body and then adheres to the substrate. [Means for solving problems] According to the present invention, there is provided a rotary processing device for processing while rotating a substrate, which includes: a cup body; and a turntable, which is installed in the cup body to hold the substrate, and can be driven by a driving source. Rotary drive; The discharge part is connected to the cup body and is used to discharge gas and liquid from the cup body. The national standard (where) of this paper size is A4 (2 offers 297 public love) 518648 A7 _________B7__ 5 2. Description of the invention (3) The exhaust device is connected to the discharge part and used to make the attraction force act on the cup body; and a plurality of rectifying rings are arranged on the inner periphery of the cup body at predetermined intervals in the vertical direction. The gas discharged from the cup body toward the discharge part is rectified between the surface and the outside of the turntable rotation area by the exhaust device. According to the present invention, the rectifying effect of the rectifying ring provided in the cup body can be used to uniformly apply the attraction force of the discharge device to the cup body. [Embodiment of the invention] Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1 to 5 show the first embodiment of the present invention. The rotary processing device shown in FIGS. 丨 and 2 has a cup body, and the cup body is arranged in a box-shaped processing tank 2. The cup body 丨 has a bottom plate 3 inclined further toward the center portion, and a peripheral wall 4 is provided on the peripheral portion of the bottom plate 3. Collapses in the peripheral wall are formed at even intervals at equal intervals in the circumferential direction as shown in FIG. 2. For example, the four guide members form through-holes 6 in the center portion of the base plate 2, and hollows are inserted in the through-holes 6.状 的 驱动轴 7。 The driving shaft 7. In addition, the through hole 6 is closed by the shield plate 仏. A drive motor 8 is mounted on the central portion below the bottom plate 2 and a drive shaft 7 is connected to a rotor (not shown) of the drive motor 8. The cup body protruding the drive shaft 7! The inner upper end 'is mounted with a turntable 9 having a substantially cross-shaped plane as shown in Fig. 2. The above-mentioned turntable 9 is composed of a base and a base fixed to the upper end of the drive shaft 7, and the ends are connected at predetermined intervals to the base with four arms. As shown in Fig. 2 'a pair of buckles are set up on the top end of each arm 12. Paper size Gu Zhongjiao Jia Xian (鲜) Jing Ge (2 songs 297 public fantasy -----—— * 6-
(請先έ讀背面之注意事項再填寫本頁) •訂— 518648 A7 .__^B7_ 五、發明説明（4 ) 合銷13。在各臂12之頂端部與上述基部丨丨，分別立設支撐 銷14 〇 在上述轉台9,譬如利用於液晶顯示裝置之玻璃製矩形 狀基板15扣合在角部設置於各臂12頂端部之一對扣合銷 13，將該角部之下面與中心部之下面分別可裝拆地保持支 撐於上述支撐銷14。 因而，設上述驅動馬達8作動時，上述轉台9變成以保 持基板15之狀態向第2圖箭頭a所示反時鐘方向回轉驅 動。此外，上述遮蔽板6a係安裝於上述基部丨丨之下面。 如在第1圖所示，在上述杯體丨之周壁4上端，周方向遍 及全長設置有環狀之反射防止構件16。該反射防止構件16 具有傾斜部16a與垂設於該傾斜部16a内周緣之垂直部 16b’上述傾斜部16a係連結於上述周壁4之外周緣構成比内 周緣還低那樣傾斜。 藉此，由於回轉轉台9,即使附著於基板15之處理液一 部份向著上方飛散，因其處理液在傾斜部16a之下面面向下 方反射，也可防止再附著於基板丨5。 如在第2圖所示，在上述杯體丨之周壁外側，在與各導 入口部5對應之部份設置有蓋體22。各蓋體22沿著上述杯體 1之周方向形成自位於上述導人口部5側之—端隨著往沿著 上述轉台9之回轉方向之另一端部，與杯體丨外周面之間隔 逐：變大之導入路23。亦即，導入路23係自一端隨著往另 一端而截面積逐漸變大那樣的形成。 i述導人路23之末端係、閉塞，在該閉塞部形成作為排 本紙張尺度_中_家標準（CNS) M規格（2歌297公爱〉 (請先閲讀背面之注意事項再填寫本頁) 訂丨 •線 N發明說明（ 出之排出口 24。該排出口 24連接如在第1圖所示排出管25 之—端（上端）。 (請先閱讀背面之注意事項再填寫本頁) 由於上述導入路23之戴面積形成自一端隨著往另一端 逐漸增大，即使閉塞導入路23之末端，在導入路23内如同 後述可抑制自杯體1内流入之氣體之壓力急劇地上升。藉 匕透過上述排出口 24變成可將流入上述導入路23之氣體 順暢地排出上述排出管25。 •訂· 四根排出管25之中，位於杯體丨之直徑方向一端側之兩 根排出管25,亦即在周方向緊鄰一對排出管25連接第1氣液 刀離26A，位於直徑方向另一端側之兩根排出管h則連 接第2氣液分離器26B。各排出管25透過作為流量調整閥之 蝶形閥30連接上述各氣液分離器26A、26B。 如在第3圖所示，各氣液分離器26八、26B具有比設置 於直杈方向一端側與另一端側之各一對排出管25之間隔還 長的形成正方體狀之本體26。在該本體26上面之縱向一端 邛與另一端部分別氣密地連接一對上述排出管25。 各排出管25之下端部係突出上述本體26内。上述本體 26之内底面，亦即底壁形成自縱向兩端面向中央部還低地 傾斜之逆〜字狀之第1傾斜面27。 在上述本體26—側面之縱向中央部，連通上述本體26 内部之平面形狀連接L字狀之排氣口體29。在連接一對氣 液分離器26A、26B之排氣口體29係如在第！圖與第2圖所示 分別連接排氣管31之一端。一對排氣管31面對杯體丨之直徑 方向中心成對稱形狀，各自之另一端透過丁字管32連接作(Please read the precautions on the back first and then fill out this page) • Order — 518648 A7 .__ ^ B7_ 5. Description of the invention (4) Joint sales 13. Support pins 14 are erected at the top end of each arm 12 and the above base 丨. On the turntable 9, for example, a glass-shaped rectangular substrate 15 used for a liquid crystal display device is fastened to a corner and is provided at the top end of each arm 12. A pair of engaging pins 13 are detachably held and supported on the support pins 14 respectively at the lower surface of the corner portion and the lower surface of the center portion. Therefore, when the drive motor 8 is operated, the turntable 9 is driven to rotate in a counterclockwise direction as indicated by arrow a in FIG. 2 while holding the substrate 15. In addition, the shielding plate 6a is installed below the base portion 丨 丨. As shown in Fig. 1, an annular reflection preventing member 16 is provided on the upper end of the peripheral wall 4 of the cup body 丨 in the circumferential direction over the entire length. The anti-reflection member 16 has a slanted portion 16a and a vertical portion 16b 'which is perpendicular to the inner peripheral edge of the slanted portion 16a. The slanted portion 16a is connected to the outer peripheral edge of the peripheral wall 4 so as to be inclined lower than the inner peripheral edge. Thus, even if the part of the processing liquid attached to the substrate 15 is scattered upward due to the turntable 9, the processing liquid can be prevented from being re-adhered to the substrate 5 because the processing liquid is reflected downward under the inclined portion 16a. As shown in FIG. 2, a cover 22 is provided on the outer side of the peripheral wall of the cup body 丨 at a portion corresponding to each of the guide openings 5. Each cover 22 is formed along the circumferential direction of the cup 1 from the end located on the side of the guide portion 5 to the other end along the rotation direction of the turntable 9 and spaced from the outer surface of the cup 丨： Enlarge road 23. That is, the introduction path 23 is formed such that the cross-sectional area gradually increases from one end to the other end. The terminal system of the guideway 23 is described, and the occlusion is formed in the occlusion section as a paper size. _Medium_Home Standard (CNS) M Specification (2 Songs 297 Public Love) (Please read the precautions on the back before filling in this Page) Order 丨 • N Description of the Invention (Outlet outlet 24. This outlet outlet 24 is connected to the end (upper end) of the discharge pipe 25 as shown in Figure 1.) (Please read the precautions on the back before filling out this page ) Because the wearing area of the introduction channel 23 is gradually increased from one end to the other end, even if the end of the introduction channel 23 is closed, the pressure in the introduction channel 23 as described later can suppress the pressure of the gas flowing from the cup body 1 sharply. Ascend through the discharge port 24 to allow the gas flowing into the introduction channel 23 to be smoothly discharged from the discharge pipe 25. • Of the four discharge pipes 25, two at one end side in the diameter direction of the cup body 丨The discharge pipe 25, that is, a pair of discharge pipes 25 in the circumferential direction is connected to the first gas-liquid cutter 26A, and the two discharge pipes h on the other end side in the diameter direction are connected to the second gas-liquid separator 26B. Each discharge pipe 25 Through the butterfly valve 30 as a flow adjustment valve Each of the gas-liquid separators 26A and 26B is described above. As shown in FIG. 3, each of the gas-liquid separators 26 and 26B has an interval longer than a pair of discharge pipes 25 provided on one end side and the other end side of the straight branch direction. A long cube-shaped body 26. A pair of the above-mentioned discharge pipes 25 are air-tightly connected to one end 纵向 and the other end of the upper portion of the body 26 in a longitudinal direction. The lower end of each discharge pipe 25 projects out of the body 26. The body The inner bottom surface of 26, that is, the bottom wall is formed as a first inclined surface 27 in the shape of an inverse to a low angle from the longitudinal ends facing the central portion. The body 26—the longitudinal center portion of the side surface, communicates with the interior of the body 26. The L-shaped exhaust port body 29 is connected to the exhaust port body 29. The exhaust port body 29 connected to the pair of gas-liquid separators 26A and 26B is connected to one end of the exhaust pipe 31 as shown in Figs. 2 and 2 respectively. A pair of exhaust pipes 31 faces the center of the diameter of the cup 丨 in a symmetrical shape, and the other ends are connected through a T-shaped pipe 32
518648 A7 B7 五、發明説明（6 為排氣裝置之排氣泵33之吸引側。 在上述本體26—側面之高度方向下端部，比縱向中央 部，亦即上述排氣口體29還下方，在第丨傾斜面27最低之位 置連接排液管34。 從該排液管34，可排出滴下至氣液分離器26A、26B内 之液體’洗淨處理基.板15之處理液。 在上述本體26内，在上述排氣口體29與排液管34之間 高度，設置與本體26之内底面之第1傾斜面27大致同樣逆〜 字狀地彎曲之透孔構件35。該透孔構件35譬如沖孔金屬藉 具有多數個透孔35a之板材所形成。 連接上述本體26之一端與另一端之一對排出管之下 端部貫穿上述透孔構件35面側。也就是說，排出管25之下 端面位於透孔構件35下面側。而且，該排出管25之下端面 係與上述第1傾斜面27同方向地傾斜，形成於面對該第“頃 斜面27在些微間隔平行地離間對向之第2傾斜面28。 也就是說，將連接杯體1之四根排出管25作為兩根一組 分別連接氣液分離器26A、26B之兩端部，在該氣液分離器 26A、26B之縱向中央部連接排氣口體29，在該排氣口體” 透過排氣管3 1連接排氣泵3 3。因此，可將排氣泵3 3之吸引 力均等地作用在四根排出管25。 此外，作用於各排氣管31之吸引力，變成藉設置於上 述排出管25之蝶形閥30可調整。 如在第1圖與第2圖所示，上述杯體1内，在周壁4之内 周面與轉台9之旋轉領域外側之間部份設置有整流裝置 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） .................……裝：… (請先閲讀背面之注意事項再填寫本頁) 、一'^丨 :線· 518648 A7 _B7_ 五、發明説明（7 ) 41。該整流裝置41係由如在第5圖所示上下方向地以既定間 隔離間所保持之複數個整流環42所構成。 (請先W讀背面之注意事項再填寫本頁) 各整流環42係内周緣比外周緣高，板面為傾斜，在位 於上下之各一對整流環42間周方向之複數處，譬如3〜6處 設置有保持構件43。藉該保持構件43，上下一對整流環42 之中，面對位於下側之整流環42，以既定間隔保持位於上 側之整流環42。 上述保持構件43形成如第5圖所示在帶狀構件之一端 可裝拆地扣合於下側整流環42上端（内周緣）截面π字狀之 第1扣合部44,在另一端形成可裝拆地扣合於上側整流環42 下端（外周緣）之第2扣合部45。而且，在保持構件43之中途 部形成將形成第1扣合部44之端部朝上方彎曲之屈曲部46。 而且，由於保持構件43係將其第1扣合部44扣合下側整 流環42之内周緣，將第2扣合部45扣合上側整流環42之外周 緣，在下側整流環42之上方以既定間隔離間保持上側之整 流環43。 此外，即使在保持構件43之中途部未形成屈曲部46， 由於可調整形成於保持構件43之縱向一端與另一端之第1 扣合部44與第2扣合部45之角度，在下流側整流環42之上方 也可以既定間隔保持上側之整流環42。 在位於最下端之整流環42外周緣，向周方向既定間隔 以既定角度彎曲形成複數只腳47。而且，最下端之整流環 42藉其腳47設置於杯體1之底板3上，在該最下端之整流環 42上方藉保持構件43以既定間隔依次層疊保持複數個整流 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 10 518648 A7 B7 五、發明説明（8 環42。 被層疊之複數個整流環42係平行該等板面且面對保持 於上述轉台9之基板15之板面，以既定角度0(在第5圖所 示），譬如20〜50度之範圍，該實施形態係以45度之角度傾 斜。 藉此，當乾燥處理基板15時，由於自該基板15之周緣 朝外飛散之處理液如在第5圖箭頭Z所示自位於上下之一 對整流環42之内周緣間之間隙流入碰撞上側整流環42之下 面，變成自其下面向下方反射碰撞下側之整流環42上面， 流入該上面朝下方滴下。 此外，位於上側之整流環42下端比位於下側之整流環 42上端還位於下方。藉此，自基板15飛散流入一對整流環 42間之處理液不會碰撞上側整流環42之下面。以阻止通過 上下一對整流環42間。 而且，位於上側之整流環42下端與位於下側之整流環 42上端大致同樣高度也可。 上述排氣泵33之吸引力透過排出管25、導入路23、導 入口部5及所層疊之整流環42之間隙作用於杯體1内。上述 整流環42以既定間隔設置於上下方向，且設置遍及杯體1 之内周面全長。 因此，透過複數只排出管25作用於杯體1内之吸引力， 藉上述整流環42可在周方向分散。亦即，變成排氣泵33之 吸引力大致均一地在周方向作用於杯體1内。 如在第2圖所示，在上述整流環42之外周緣設置用以將 11 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 518648 A7 -------B7 _ 五、發明説明（9 ) 通過整流壞42之氣流自上述導入口部5朝上述導入路23強 制流入之導向構件48。 上述導向構件48在順著上述導入口部5之基板15之箭 頭A所示旋轉方向下流端，順著基板15之旋轉方向傾斜， 且ό又置遍及以既定間隔層疊之複數個整流環42高度方向全 長。上述整流環42之外徑尺寸設定比杯體丨之内徑尺寸小。 藉此’在杯體1之内周面與整流環42之外周緣之間形成在第 2圖所示間隙49。 上述杯體1内之氣體，以藉排氣泵33之吸引力及基板15 之回轉產生之離心力，通過既定間隔設置於上下方向之複 數個整流環42之間而導入上述導入口部5。那時，氣體之一 部伤不會朝導入路23流入，而進入杯體丨之内周面與整流環 42外周緣之間之間隙49(第2圖所示）。而且，上升其間隙 49 ’通過最上段整流環42之上面側回到基板15側，有附著 於基板15變成污染原因之情事。 然而，由於上述導向構件48設置於上述導入口部5之下 流端’通過整流環42之氣流不會從上述導入口部5之下流端 流入上述間隙49，構成強制的流入上述導入口部23。 根據如此構成之旋轉處理裝置，當乾燥處理洗淨處理 過之基板15時，設將保持基板15之轉台9以高速度回轉，藉 該回轉附著於基板15之處理液沿著以第2圖箭頭B所示基 板15之旋轉方向之轉動之接線方向飛散。 向箭頭B方向飛散之處理液，如在第5圖箭頭z所示流 入整流裝置41既定間隔層疊之上下一對整流環42之間，碰 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公董〉 1? (請先ΚΓ讀背面之注意事項再填寫本頁)518648 A7 B7 V. Description of the invention (6 is the suction side of the exhaust pump 33 of the exhaust device. The lower end of the body 26-side height direction is lower than the longitudinal central portion, that is, the exhaust port body 29, The drain pipe 34 is connected to the lowest position of the first inclined surface 27. From the drain pipe 34, the liquid dripping into the gas-liquid separators 26A and 26B can be discharged, and the processing liquid of the washing treatment base plate 15 can be discharged. In the main body 26, a through-hole member 35 which is curved in a reverse shape from the first inclined surface 27 of the inner bottom surface of the main body 26 is provided at a height between the exhaust port body 29 and the drain pipe 34. This through-hole The member 35 is formed of, for example, a punched metal by a plate having a plurality of through holes 35a. A lower end portion of a pair of discharge pipes connecting one end of the body 26 and the other end penetrates the through hole member 35 surface side. That is, the discharge pipe The lower end face of 25 is located on the lower side of the through-hole member 35. The lower end face of the discharge pipe 25 is inclined in the same direction as the first inclined surface 27, and is formed to face the first inclined surface 27 in parallel and spaced slightly apart. Opposite the second inclined surface 28. That is, The four discharge pipes 25 connected to the cup body 1 are connected to the two ends of the gas-liquid separators 26A and 26B as two sets, respectively. The gas-liquid separators 26A and 26B are connected to the exhaust port body 29 in the longitudinal center portion. This exhaust port body "is connected to the exhaust pump 33 through the exhaust pipe 31. Therefore, the attractive force of the exhaust pump 33 can be applied to the four exhaust pipes 25 evenly. In addition, the exhaust pipes 31 are applied to the exhaust pipes 31. The attraction force can be adjusted by the butterfly valve 30 provided on the discharge pipe 25. As shown in Figs. 1 and 2, the inner surface of the cup body 1 and the rotation of the turntable 9 are rotated in the cup 1. A rectifying device is provided between the outer sides of the field. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ....................: Please read the precautions on the back before filling this page), a '^ 丨: line · 518648 A7 _B7_ V. Description of the invention (7) 41. The rectifier 41 is set up and down as shown in Figure 5 It is composed of a plurality of rectifying rings 42 held in the isolation room. (Please read the precautions on the back before filling out this page.) Each rectifying ring 42 has an inner periphery rather than an outer periphery. The plate surface is inclined, and a plurality of retaining members 43 are provided at a plurality of positions in the circumferential direction between each pair of upper and lower rectifying rings 42. For example, holding members 43 are provided in the upper and lower pair of rectifying rings 42. Facing the rectifying ring 42 on the lower side, the rectifying ring 42 on the upper side is held at a predetermined interval. The holding member 43 is formed to be detachably fastened to the lower rectifying ring 42 at one end of the band-shaped member as shown in FIG. 5. An upper end (inner peripheral edge) cross section π-shaped first engaging portion 44 is formed at the other end with a second engaging portion 45 removably fastened to the lower end (outer peripheral edge) of the upper rectifying ring 42. A bent portion 46 is formed in the middle of the holding member 43 so that the end portion forming the first engaging portion 44 is bent upward. In addition, the holding member 43 engages the first engaging portion 44 with the inner peripheral edge of the lower rectifying ring 42, the second engaging portion 45 with the outer peripheral edge of the upper rectifying ring 42, and The rectifying ring 43 on the upper side is maintained at the upper side by a predetermined interval. In addition, even if the buckling portion 46 is not formed in the middle portion of the holding member 43, the angle between the first engaging portion 44 and the second engaging portion 45 formed at one end in the longitudinal direction and the other end of the holding member 43 can be adjusted on the downstream side. The rectifying ring 42 may be kept above the rectifying ring 42 at a predetermined interval. A plurality of legs 47 are formed by bending at a predetermined interval in the circumferential direction on the outer periphery of the rectifying ring 42 located at the lowermost end in the circumferential direction. Moreover, the lowermost rectifying ring 42 is arranged on the bottom plate 3 of the cup body 1 by its feet 47, and a plurality of rectifyings are sequentially stacked and held at predetermined intervals above the lowermost rectifying ring 42 by a holding member 43. The paper size is applicable to the country of China Standard (CNS) A4 specification (210X297 mm) 10 518648 A7 B7 V. Description of the invention (8 rings 42. A plurality of rectifying rings 42 laminated are parallel to the surface of the plates and face the substrate 15 held on the turntable 9 above. The plate surface is inclined at a predetermined angle of 0 (shown in FIG. 5), for example, in a range of 20 to 50 degrees. This embodiment is inclined at an angle of 45 degrees. Therefore, when the substrate 15 is dried, the substrate 15 As shown by the arrow Z in FIG. 5, the treatment liquid scattered outward from the peripheral edge flows from the gap between the inner peripheral edges of the upper and lower pairs of the rectifying rings 42 into the lower side of the collision upper rectifying ring 42 and becomes reflected downward from the collision. The upper side of the rectifying ring 42 flows down and flows downward from the upper side of the rectifying ring 42. In addition, the lower end of the rectifying ring 42 located on the upper side is lower than the upper end of the rectifying ring 42 on the lower side. As a result, it is scattered from the substrate 15 and flows into the pair of rectifying rings 42 Place The lysate does not collide with the lower side of the upper rectifying ring 42 to prevent passing between the upper and lower pair of rectifying rings 42. Moreover, the lower end of the upper rectifying ring 42 and the upper end of the lower rectifying ring 42 may be approximately the same height. The attractive force of the pump 33 acts on the cup body 1 through the gap between the discharge pipe 25, the introduction path 23, the introduction port 5 and the laminated rectifying ring 42. The rectifying ring 42 is arranged at a predetermined interval in the up-down direction and is arranged throughout the cup. The entire length of the inner peripheral surface of the body 1. Therefore, the attraction force acting on the cup body 1 through the plurality of discharge pipes 25 can be dispersed in the circumferential direction by the above-mentioned rectifying ring 42. That is, the attraction force of the exhaust pump 33 becomes substantially uniform. The ground acts on the cup body 1 in the circumferential direction. As shown in Figure 2, the outer periphery of the rectifying ring 42 is provided for the 11 (please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) 518648 A7 ------- B7 _ V. Description of the invention (9) Forced inflow from the inlet 5 through the inlet port 5 to the inlet 23 through the rectifier 42 Guide member 48. The above guide structure The piece 48 is at the downstream end following the rotation direction shown by the arrow A of the substrate 15 of the introduction port 5 described above, is inclined along the rotation direction of the substrate 15 and is placed over the full length of the plurality of rectifying rings 42 stacked at a predetermined interval in the height direction. The outer diameter of the rectifying ring 42 is set to be smaller than the inner diameter of the cup body. Thereby, a gap 49 shown in FIG. 2 is formed between the inner peripheral surface of the cup body 1 and the outer peripheral edge of the rectifying ring 42. The gas in the cup 1 is introduced into the introduction port 5 at a predetermined interval between a plurality of rectifying rings 42 arranged in the vertical direction by the suction force of the exhaust pump 33 and the centrifugal force generated by the rotation of the substrate 15. At that time, a gas wound does not flow into the introduction path 23, but enters a gap 49 (shown in Fig. 2) between the inner peripheral surface of the cup body and the outer peripheral edge of the rectifying ring 42. Then, the gap 49 'rises and passes through the upper surface side of the uppermost rectifying ring 42 to return to the substrate 15 side, and the adhesion to the substrate 15 may cause contamination. However, since the guide member 48 is provided at the downstream end of the inlet port portion 5 ', the airflow passing through the rectifying ring 42 does not flow from the downstream end of the inlet port portion 5 into the gap 49, thereby forcibly flowing into the inlet port portion 23. According to the rotary processing device configured as described above, when the processed substrate 15 is dried and cleaned, the turntable 9 holding the substrate 15 is rotated at a high speed, and the processing liquid attached to the substrate 15 by the rotation is moved along the arrow shown in FIG. 2. The wiring direction of the rotation direction of the substrate 15 shown in B is scattered. The processing liquid scattered in the direction of arrow B flows into the rectifier device 41 at a predetermined interval and is stacked between the next pair of rectifier rings 42 as shown by the arrow z in FIG. 5. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297). Director> 1? (Please read the precautions on the back before filling this page)
518648 A7 B7 五、發明説明（10 ) 撞上側整流環42之下面。由於該整流環42係内周緣構成比 外周緣高。將板面傾斜，碰撞下面之處理液面向下方反射 碰撞位於其下方之整流環42上面，沿著該上面流從外周緣 滴下。 從上述整流環42之外周緣滴下之處理液，藉在導入口 部5發生之吸引力變成與杯體1内之氣體一起從導入路23朝 排出管25被吸引排出。其結果，從基板15飛散之處理液在 杯體1之内周面反射回到基板15側，可防再附著於其基板 15 〇 在上述杯體1内，由於轉台9高速回轉，發生與箭頭B 所示處理液之飛散方向之氣流，在其氣流排氣泵33之吸引 力透過排出管25、導入路23、導入口部5及構成整流裝置41 之整流環42作用。 上述排氣泵33之吸引力由於透過以既定間隔設置於上 下方向之整流環42作用於杯體1内，藉該整流環42之整流作 用變成遍及杯體1周方向全長大致均等。 因此，含杯體1内處理液之氣體變成分別透過導入口部 5及導入路23從四只排出管25大致均等地可排出。其結果， 由於可防止含處理液之氣體在杯體1内滯留。變成可防止含 於滯留氣體之處理液再附著於基板15成為污染之原因。 在上述導入口部5之下流端，由於設置堵塞杯體1之内 周面與整流環42外周緣之間隙49之導向構件48，通過層疊 之整流環42之氣流從上述導入口部5強制的流入導入路23。 因此，通過整流環42之氣流未被吸引至導入口部5而進 13 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 518648 A7 _ B7_ 五、發明説明（η ) 入杯體1之内周面與整流環42外周緣之間隙49,上升其間隙 49通過最上段整流環42之上面朝基板15側流入，可防止含 於其氣流之處理液再附著於基板15。 上述整流裝置41之保持構件43係將形成於一端之第1 扣合部44扣合上下一對整流環42之中，位於下方之整流環 42之内周緣，而形成於另一端之第2扣合部45則扣合位於上 方之整流環42之外周緣。 也就是說，保持構件43係除了其第1扣合部44部份以外 比整流環42之内周緣還位於下方。因此，從旋轉之基板15 飛散流入上下一對整流環42之間之處理液不會碰撞保持整 流裝置41之整流環42之保持構件43，而碰撞上側整流環42 之下面向下方反射。因此，可防止從基板15飛散之處理液 在保持構件43反射而再附著於基板15。 在位於上述整流裝置41最下端之整流環42，在周方向 以既定間隔設置有複數只腳47。因此，由於最下端之整流 環42之内周側與外周側透過在周方向以既定間隔設置之腳 47間之空間部份連通，最下端整流環42之内周側朝外周側 之處理液或氣體可確實地流出。 再者，整流環42係將内周緣與外周緣可裝拆地扣合層 疊於保持構件43之第1、第2扣合部44、45。因此，整流裝 置41在基本檢查時可容易地分解或組裝整流環42。 連接各排出口 24之四只排出管25之中，分別位於直徑 方向一端側與另一端側之兩只排出管25在第1、第2氣液分 離器26A、26B之本體26上面，將連接該本體26側面之排氣 14 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 518648 A7 _____—___B7_ 五、發明説明（12 ) 官31作為中心對稱地連線。而且，分別連接第丨 '第2氣液 分離器26A、26B之一對排氣管31面對杯體丨之直徑方向中 心構成對稱形狀。 因此，通過四只排出管25，排氣泵33之吸引力大致均 專地作用在四只排出口 24。因而，來自各排出口 24氣流之 排出大致可均等地施行。由於在杯體丨内難以產生亂流，可 抑制霧氣浮游。 杯體1内之氣流從各排出管25流入氣液分離器26A、 26B之主體26内時，含於其氣流之液體沿著排出管25之内 面而從下端面滴下，氣體通透孔構件35之透孔35&被吸引到 排氣管3 1。 氣液分離器26A、26B其中，從排出管25之下端面滴下 之液體有乘勢附著被吸引到排氣管31之氣流，朝排氣管31 流入之虞。然而，排出管25之下端面形成在氣液分離器 26A、26B之本體26内底面所形成之第1傾斜面27與成平行 的第2傾斜面28。 也就是說，第2傾斜面28係排氣管3 1面向連接之排氣口 體29還低的傾斜。因此，.由於作用於排氣管31之排氣栗33 之吸引力難以作用於排出管25之第2傾斜面28,從該排出管 • 25滴下之液體難以吸引至排氣管31。 從排出管25滴下之液體，假設即使乘勢附著從排出管 25吸引到排氣管3 1之氣流，由於排出管25之下端貫穿透孔 構件35，從排出管25朝向排氣管31之液體不通過透孔構件 35之透孔35a而碰撞透孔構件35,滴下至本體26底部之機率 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 15 -----------------------裝..................訂..................線 (請先閲讀背面之注意事項再填寫本頁) 518648 A7 B7 五、發明説明（13 ) 高。因而，即使藉此，也可阻止在氣液分離器26A、26B 所分離之液體流入排氣管31。 在各排出管25設置有蝶形閥30。蝶形閥3〇通常以全開 使用。然而，來自杯體1内之氣流吸引失去平衡時，按照它 可凋整四只蝶形閥30之開度。因而，由於調整蝶形闊3〇之 開度’變成可均衡地施行來自杯體1内之排氣。 第6圖是表示該發明整流裝置41變形例之第2實施形 態。該實施形態，為在上下方向以既定間隔保持複數個整 流環42，代替上述第！實施形態之保持構件43，使用複數， 譬如3〜6只程度之支柱構件51。 各支柱構件5 1係在周方向以既定間隔立設於杯體1之 底板3上，在各整流環42穿設嵌合支柱構件51之安裝孔52。 而且，整流環42將安裝孔52嵌合支柱構件51，在既定之高 度位置，表面成既定之傾斜角度那樣的安裝固定。 即使是這樣的構成，也可與上述第1實施形態同樣，在 上下方向以既定間隔，而且内周緣比外周緣高，以既定角 度傾斜設置有複數個整流環42。 第7圖乃至第10圖是表示該發明之第3實施形態。在該 實施形態中，與上述第丨實施形態同一部份附上同一記號並 省略說明。亦即，在設置於處理槽2内之杯體1之周壁4,於 周方向以既定間隔形成四只導入口部5。也就是說，由於在 杯體1内部份地設置上述周壁，形成上述四只導入口部5。 如在第8圖所示，在上述導入口部連通一端之各導入路 23之另一端係藉遮蔽板61閉塞。也就是說，藉上述處理槽2518648 A7 B7 5. Description of the invention (10) Hit the underside of the side rectifying ring 42. The rectifying ring 42 has a higher inner periphery than an outer periphery. The surface of the plate is tilted, and the processing liquid under the collision is reflected downward. It collides with the upper side of the rectifying ring 42 located below it, and flows along the upper surface and drips from the outer periphery. The treatment liquid dripped from the outer periphery of the rectifying ring 42 is attracted and discharged from the introduction path 23 toward the discharge pipe 25 together with the gas in the cup body 1 due to the attractive force generated at the introduction port 5. As a result, the processing liquid scattered from the substrate 15 is reflected on the inner peripheral surface of the cup body 1 back to the substrate 15 side, and can be prevented from re-adhering to the substrate 15. In the above-mentioned cup body 1, the turntable 9 rotates at a high speed, and an arrow occurs. The airflow in the scattering direction of the processing liquid shown in B acts on the attraction force of the airflow exhaust pump 33 through the discharge pipe 25, the introduction path 23, the introduction port 5 and the rectification ring 42 constituting the rectification device 41. The attractive force of the exhaust pump 33 described above acts on the cup body 1 through the rectifying rings 42 arranged at predetermined intervals in the up-down direction, and the rectifying function of the rectifying rings 42 becomes approximately uniform throughout the entire length of the cup body in one circumferential direction. Therefore, the gas containing the processing liquid in the cup body 1 can be discharged substantially uniformly from the four discharge pipes 25 through the introduction port 5 and the introduction path 23, respectively. As a result, it is possible to prevent the gas containing the treatment liquid from remaining in the cup body 1. This can prevent the processing liquid contained in the retained gas from re-adhering to the substrate 15 to cause contamination. At the downstream end of the inlet port 5, a guide member 48 is provided to block the gap 49 between the inner peripheral surface of the cup body 1 and the outer peripheral edge of the rectifying ring 42. The airflow through the laminated rectifying ring 42 is forced from the inlet port 5. Inflow introduction path 23. Therefore, the airflow passing through the rectifying ring 42 is not attracted to the inlet 5 and enters 13 (please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 518648 A7 _ B7_ V. Description of the invention (η) The gap 49 between the inner peripheral surface of the cup body 1 and the outer peripheral edge of the rectifying ring 42 rises, and the gap 49 passes through the upper surface of the uppermost rectifying ring 42 and flows into the substrate 15 side, which can be prevented from being contained in The processing liquid of the airflow is attached to the substrate 15 again. The holding member 43 of the rectifying device 41 is formed by engaging a first fastening portion 44 formed at one end with a pair of upper and lower rectifying rings 42. The inner peripheral edge of the lower rectifying ring 42 is formed at the other end by a second buckle. The engaging portion 45 is fastened to the outer periphery of the upper rectifying ring 42. That is, the holding member 43 is located below the inner peripheral edge of the rectifying ring 42 except for the first engaging portion 44 thereof. Therefore, the processing liquid scattered from the rotating substrate 15 and flowing between the upper and lower pair of rectifying rings 42 does not collide with the holding member 43 that holds the rectifying ring 42 of the rectifying device 41, but hits the lower side of the upper rectifying ring 42 and reflects downward. Therefore, it is possible to prevent the processing liquid scattered from the substrate 15 from being reflected on the holding member 43 and being reattached to the substrate 15. The rectifying ring 42 located at the lowermost end of the rectifying device 41 is provided with a plurality of legs 47 at predetermined intervals in the circumferential direction. Therefore, since the inner peripheral side and the outer peripheral side of the lowermost rectifying ring 42 communicate with each other through a space portion between the feet 47 provided at a predetermined interval in the circumferential direction, the inner peripheral side of the lowermost rectifying ring 42 faces the treatment liquid or the outer peripheral side. The gas can definitely flow out. In addition, the rectifying ring 42 is a first and second engaging portions 44 and 45 that are detachably engaged with the inner peripheral edge and the outer peripheral edge of the holding member 43 in layers. Therefore, the rectifying device 41 can be easily disassembled or assembled during the basic inspection. Among the four discharge pipes 25 connected to each discharge port 24, the two discharge pipes 25 located at one end side and the other end side in the diameter direction are connected to the bodies 26 of the first and second gas-liquid separators 26A and 26B, respectively. Exhaust 14 on the side of the body 26 (please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) 518648 A7 _____—___ B7_ V. Description of the invention (12) The officer 31 is symmetrically connected as a center. Further, the radial centers of the pair of exhaust pipes 31 facing the cup body, which are respectively connected to one of the second gas-liquid separators 26A, 26B, form a symmetrical shape. Therefore, through the four discharge pipes 25, the attraction of the exhaust pump 33 is almost exclusively applied to the four discharge ports 24. Therefore, the discharge of the airflow from each of the discharge ports 24 can be performed substantially uniformly. Since turbulence is difficult to occur in the cup body, the mist can be suppressed from floating. When the airflow in the cup body 1 flows into the main body 26 of the gas-liquid separators 26A and 26B from the exhaust pipes 25, the liquid contained in the airflow drops from the lower end surface along the inner surface of the exhaust pipe 25, and the gas passes through the hole member 35 The through hole 35 & is attracted to the exhaust pipe 31. Among the gas-liquid separators 26A and 26B, the liquid dripping from the lower end surface of the discharge pipe 25 may adhere to the airflow attracted to the exhaust pipe 31 and flow into the exhaust pipe 31. However, a first inclined surface 27 formed on the lower end surface of the discharge pipe 25 on the inner bottom surface of the main body 26 of the gas-liquid separators 26A and 26B and a second inclined surface 28 formed in parallel. That is, the second inclined surface 28 is a low inclination of the exhaust pipe 31 facing the connected exhaust port body 29. Therefore, it is difficult for the suction force of the exhaust pump 33 acting on the exhaust pipe 31 to act on the second inclined surface 28 of the exhaust pipe 25, and it is difficult for the liquid dripping from the exhaust pipe 25 to attract the exhaust pipe 31. The liquid dripping from the discharge pipe 25 assumes that even if the airflow attracted from the discharge pipe 25 to the exhaust pipe 31 is attached, the lower end of the discharge pipe 25 penetrates the through-hole member 35, and the liquid from the discharge pipe 25 toward the exhaust pipe 31 The probability of dripping to the bottom of the body 26 without colliding with the through-hole 35a of the through-hole member 35 and dropping to the bottom of the body 26 This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 15 -------- --------------- Equipment ............ Order ............ ... line (please read the notes on the back before filling this page) 518648 A7 B7 V. Description of the invention (13) High. Therefore, even by this, the liquid separated by the gas-liquid separators 26A and 26B can be prevented from flowing into the exhaust pipe 31. Each discharge pipe 25 is provided with a butterfly valve 30. The butterfly valve 30 is usually used in a fully open state. However, when the airflow suction from the cup body 1 is out of balance, the opening degree of the four butterfly valves 30 can be adjusted according to it. Therefore, by adjusting the opening degree 'of the butterfly shape 30, the exhaust from the cup body 1 can be performed in a balanced manner. Fig. 6 shows a second embodiment of a modification of the rectifying device 41 of the present invention. In this embodiment, a plurality of rectification rings 42 are maintained at a predetermined interval in the vertical direction, instead of the first! In the embodiment, plural holding members 43 are used, for example, three to six pillar members 51 are used. Each pillar member 51 is erected on the bottom plate 3 of the cup body 1 at a predetermined interval in the circumferential direction, and each of the rectifying rings 42 is provided with a mounting hole 52 for fitting the pillar member 51. Further, the rectifying ring 42 fits the mounting hole 52 into the pillar member 51, and is fixed at a predetermined height position with a predetermined inclined surface on the surface. Even with such a configuration, similar to the first embodiment, a plurality of rectifying rings 42 may be provided at a predetermined interval in the up-down direction, and the inner peripheral edge is higher than the outer peripheral edge, and may be inclined at a predetermined angle. 7 to 10 show the third embodiment of the invention. In this embodiment, the same reference numerals are attached to the same portions as those in the above-mentioned first embodiment, and the description is omitted. That is, in the peripheral wall 4 of the cup body 1 provided in the processing tank 2, four introduction ports 5 are formed at predetermined intervals in the circumferential direction. That is, the peripheral wall is provided inside the cup body 1 to form the four inlet openings 5 described above. As shown in Fig. 8, the other end of each of the introduction paths 23 connected to one end of the introduction port is closed by a shielding plate 61. That is, borrowing the above processing tank 2
五、發明説明（14 ) 之側壁與上述杯體丨之周壁4及上述遮蔽板61區劃形成導入 路23。 此外，在上述導入路23之另一端（末端）處理槽2之底 部，如在第7圖所示形成連接排出管25之排出口以。此點與 上述第1實施形態同樣。 在上述杯體1之内周面與設置於該杯體丨内之轉台9回 轉領域外側之間，於上下方向以既定間隔離間，構成整流 裝置41之複數個整流環42#保持裝㈣可料。在該實施 形態係在上述杯體i之内周面及處理槽2之内周面藉於周方 向以45度間隔設置之只上述保持裝㈣保持四只整流環 42 〇 如在第9圖與第10圖所示，上述保持裝置。具有支柱 64。該支柱64形纽定厚度之板狀，在下端面旋人— 度調整腳65。 在上述支柱64之上部，於上下方向以既定間隔形成四 只螺絲孔66。在各螺絲孔66螺合安裝螺絲67，在該安裝螺 絲67，L字狀之托架68安裝固定扣合形成於一邊之卩字溝 69。在該托架68之另一邊形成第丨扣止孔7〇。 / 上述整流環42具有連續至水平部⑴及該水平部仏外 周緣所形成之傾斜部71b，在該傾斜部71b之外周緣突設在 周方向以45度間隔之八個舌片72。在各舌片72形成第2扣止 孔73 〇 各整流環42載置上述舌片72於形成上述托架的之第^ 扣止孔70之另-邊。在形成於舌片72之第2扣止孔73與形成 518648 A7 _B7_ 五、發明説明（l5 ) 於托架69之第1扣止孔70嵌合扣止軸74之小直徑部74a。因 而，整流環42定位於托架69。 在各扣止軸74順著軸方向穿設插通孔75。在各扣止軸 74之上端面與下端面之間分別設置有套環76。自最上段扣 止軸74之插通孔75到最下段扣止軸74之長度之扣止銷76插 通上述插通孔及套環76。因而，藉上述扣止銷76透過舌片 72及扣止軸74可連結保持四只整流環42於上述托架69。 此外，拔出扣止銷76，就可分解四只整流環42。 如在第7圖所示，在上述杯體1之周壁4上端，可裝拆地 設置有環狀構件81。另外，在第7圖未圖示上述周壁4。該 環狀構件81係將板面以與上述整流環2之傾斜部71 b大致同 樣角度傾斜地設置。 在上述環狀構件81之内周緣設置具有垂直壁82截面鉤 形狀之反射防止環83。該反射防止環83能阻止在基板15之 乾燥處理時自轉台9飛散而在上述環狀構件81之内面反射 之處理液回到基板15側。 在上述轉台9，不只臂12之頂端部與基部11、連臂12 縱向之中途部也設置有複數個支撐銷14。因而，上述基板 15由於增加支撐銷14之支撐處，變成可抑制朝下方撓曲。 如在第8圖所示，在上述導入路23之導入口部5之一 端，與上述第1實施形態同樣設置為將通過整流環42之氣流 強制地流入上述導入路23之導向構件48。 因而，由於可防止通過整流環42之氣流流入整流環42 之外周面與杯體1之周壁4之内周面之間隙49，可防止氣流 18 (請先W讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 518648V. Description of the invention (14) The side wall is partitioned with the peripheral wall 4 of the above-mentioned cup body 丨 and the above-mentioned shielding plate 61 to form an introduction path 23. In addition, at the bottom portion of the processing tank 2 at the other end (end) of the introduction path 23, a discharge port connected to the discharge pipe 25 is formed as shown in FIG. This point is the same as the first embodiment. Between the inner peripheral surface of the above-mentioned cup body 1 and the outside of the turning area of the turntable 9 provided in the cup body 丨 a predetermined space is isolated in the up-down direction to form a plurality of rectifying rings 42 # of the rectifying device 41. . In this embodiment, the four holding rings 42 are held on the inner peripheral surface of the cup body i and the inner peripheral surface of the processing tank 2 at 45-degree intervals in the circumferential direction. As shown in FIG. 9 and Fig. 10 shows the holding device. With pillar 64. The pillar 64 is shaped like a plate with a constant thickness, and a rotation-degree adjusting leg 65 is rotated on the lower end surface. Four screw holes 66 are formed on the upper portion of the pillar 64 at predetermined intervals in the vertical direction. Mounting screws 67 are screwed into each of the screw holes 66, and L-shaped brackets 68 are fixedly fastened to the mounting screws 67 and formed into a side groove 69 formed on one side. A first stopper hole 70 is formed on the other side of the bracket 68. / The rectifying ring 42 has inclined portions 71b formed continuously to the horizontal portion ⑴ and the outer peripheral edge of the horizontal portion ，. Eight outer tongues 72 protruding at intervals of 45 degrees in the circumferential direction are protruded from the outer peripheral edge of the inclined portion 71b. A second buckle hole 73 is formed in each tongue piece 72. Each rectifying ring 42 places the tongue piece 72 on the other side of the first buckle hole 70 forming the bracket. The second locking hole 73 formed in the tongue piece 72 and the formed 518648 A7 _B7_ V. Description of the invention (15) The small diameter portion 74a of the locking shaft 74 is fitted into the first locking hole 70 in the bracket 69. Therefore, the rectifying ring 42 is positioned on the bracket 69. An insertion hole 75 is formed in each locking shaft 74 in the axial direction. A collar 76 is provided between the upper end surface and the lower end surface of each of the locking shafts 74. The above-mentioned insertion hole and collar 76 are inserted from the insertion hole 75 of the uppermost buckle shaft 74 to the length of the lowermost buckle shaft 74. Therefore, the four locking rings 42 can be connected and held to the bracket 69 through the tongue 72 and the locking shaft 74 through the locking pin 76. In addition, by pulling out the stopper pin 76, the four rectifying rings 42 can be disassembled. As shown in Fig. 7, an annular member 81 is detachably provided on the upper end of the peripheral wall 4 of the cup 1 described above. The peripheral wall 4 is not shown in FIG. 7. The ring-shaped member 81 is provided with the plate surface inclined at substantially the same angle as the inclined portion 71b of the rectifying ring 2 described above. An anti-reflection ring 83 having a hook shape in the cross section of the vertical wall 82 is provided on the inner peripheral edge of the ring-shaped member 81. This reflection preventing ring 83 can prevent the processing liquid that is scattered from the turntable 9 and reflected on the inner surface of the ring-shaped member 81 from returning to the substrate 15 side when the substrate 15 is dried. In the turntable 9 described above, a plurality of support pins 14 are provided not only at the top end portion of the arm 12, the base portion 11, or the longitudinal midway portion of the link arm 12. Therefore, the substrate 15 can be restrained from flexing downward by increasing the support portion of the support pin 14. As shown in Fig. 8, at one end of the introduction port portion 5 of the introduction path 23, a guide member 48 for forcibly flowing the airflow passing through the rectifying ring 42 into the introduction path 23 is provided as in the first embodiment. Therefore, since the airflow passing through the rectifying ring 42 can be prevented from flowing into the gap 49 between the outer peripheral surface of the rectifying ring 42 and the inner peripheral surface of the peripheral wall 4 of the cup 1, the airflow 18 can be prevented (please read the precautions on the back before filling this page ) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 518648
發明説明 上升到上述間隙49回到基板15側。 根據如此構成之旋轉處理裝置，可達成與上述第丨實施 形態同樣的作用效果。 譬如，當乾燥處理基板15時，在杯體丨之内周面與轉台 9回轉領域之間設置有整流環42。 因此，藉上述整流環42乾燥處理基板15時，可防止自 基板15飛散之處理液在杯體丨之内周面反射而回到基板15。 再者，排氣泵33之吸引力透過整流環42從四只排出口 24大致均一地作用於杯體1内。因此，自各排出口 4之氣體 之排出大致均等地施行，由於在杯體丨内氣流難以產生散 亂，可防止霧氣浮游於杯體丨内等，可達成與上述第丨實施 形態同樣的作用效果。 【發明之效果】 根據本發明，由於在杯體内之内周面與轉台之間設 有整流環’藉該整流環之整流作用可將排氣泵之吸引力 及周方向大致均一地作用於杯體内。 因此’含杯體内處理液之氣流不會有部份地滯留在杯 體内’由於遍及周方向全體大致可均一地排出，可防止 基板飛散之處理液再附著於基板之情事。 【圖式之簡單的說明】 【第1圖】 表示本發明之第1實施形態旋轉處理裝置概略構成 縱戴面圖。 【第2圖】 置 遍 白 之 (請先閲讀背面之注意事項再填寫本頁) -裝丨 訂— :線· 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 19 518648 A7 _B7_ 五、發明説明（17 ) 第1圖沿著X_X線橫截面圖。 【第3圖】 氣液分離器之截面圖。 【第4圖】 氣液分離器之側面圖。 【第5圖】 整流裝置之截面圖。 【第6圖】 表示本發明之第2實施形態整流裝置之截面圖。 【第7圖】 表示本發明之第3實施形態旋轉處理裝置概略構成之 縱截面圖。 【第8圖】 沿著在第7圖Y-Y線橫截面圖。 【第9圖】 表示整流環之安裝構造截面圖。 【第10圖】 表示整流環之安裝構造分解斜視圖。 20 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 518648 A7 B7 五、發明説明（is) 元件標號對照 1…杯體 2…處理槽 3…底板 4…周壁 5···導入口路 6 · · ·通孔 6a…遮蔽板 7…驅動軸 8…驅動馬達 9…轉台 11…基部 12…臂 13…扣合銷 14…支撐銷 15…基板 16…反射防止構件 16 a…傾斜部 16b···垂直部 22…蓋體 23…導入路 24…排出口 26…本體 26A…第1氣液分離器 26B…第2氣液分離器 27…第1傾斜面 28···第2傾斜面 29…排氣口體 30…蝶形閥 31…排氣管 32…T字管 33…排氣泵 34…排液管 35…透孔構件 35a…透孔 41…整流裝置 42…整流環 43…保持構件 44…第1扣合部 45···第2扣合部 4 6…屈曲部 47…腳 48…導向構件 (請先閲讀背面之注意事項再填窝本頁) 25…排出管 49…間隙 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 21 518648 A7 B7 五、發明説明（19 ) 51…支柱構件 71 b…傾斜部 52…安裝孔 72…舌片 61…遮蔽板 73…第2扣止孔 63…保持裝置 7 4…扣止轴 64…支柱 74a…小直徑部 66…螺絲孔 75…插通孔 67…安裝螺絲 76…套環 68…托架（L字狀） 81…環狀構件 69…托架 82…垂直壁 70…第1扣止孔 83…反射防止環 71a···水平部 (請先骑讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 22Description of the invention The gap 49 is raised to return to the substrate 15 side. According to the rotation processing device configured as described above, the same effect as that of the aforementioned first embodiment can be achieved. For example, when the substrate 15 is dried, a rectifying ring 42 is provided between the inner peripheral surface of the cup body 丨 and the turning area of the turntable 9. Therefore, when the substrate 15 is dried and processed by the rectifying ring 42, the processing liquid scattered from the substrate 15 can be prevented from being reflected on the inner peripheral surface of the cup body and returned to the substrate 15. In addition, the attraction force of the exhaust pump 33 acts on the cup body 1 through the rectifying ring 42 from the four discharge ports 24 substantially uniformly. Therefore, the gas discharge from each of the discharge ports 4 is performed approximately evenly. Since the airflow in the cup body 丨 is difficult to be scattered, the mist can be prevented from floating in the cup body 丨 and the like, and the same effect as the first embodiment can be achieved. . [Effect of the invention] According to the present invention, since a rectifying ring is provided between the inner peripheral surface of the cup body and the turntable, the attraction of the exhaust pump and the circumferential direction can be substantially uniformly applied by the rectifying effect of the rectifying ring. Cup inside. Therefore, 'the airflow containing the processing liquid in the cup body does not stay in the cup body in part' because the entirety can be discharged uniformly throughout the entire circumference, which prevents the processing liquid from scattering from being attached to the substrate. [Brief Description of the Drawings] [Figure 1] A schematic longitudinal view showing a schematic configuration of a rotation processing apparatus according to a first embodiment of the present invention. [Figure 2] Put it all over (please read the precautions on the back before filling out this page)-Binding 丨 Binding:: The paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 19 518648 A7 _B7_ V. Description of the invention (17) Figure 1 is a cross-sectional view taken along line X_X. [Figure 3] Sectional view of the gas-liquid separator. [Figure 4] A side view of the gas-liquid separator. [Figure 5] A cross-sectional view of a rectifier. Fig. 6 is a cross-sectional view showing a rectifying device according to a second embodiment of the present invention. [Fig. 7] A longitudinal sectional view showing a schematic configuration of a rotation processing apparatus according to a third embodiment of the present invention. [Figure 8] A cross-sectional view taken along line Y-Y in Figure 7. [Fig. 9] A sectional view showing a mounting structure of a rectifying ring. [Fig. 10] An exploded perspective view showing a mounting structure of a rectifying ring. 20 (Please read the precautions on the back before filling this page) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 518648 A7 B7 V. Description of the invention (is) Component label comparison 1 ... Cup body 2 ... Processing tank 3 ... bottom 4 ... peripheral wall 5 ... introduction port 6 ... through hole 6a ... shielding plate 7 ... drive shaft 8 ... drive motor 9 ... turntable 11 ... base 12 ... arm 13 ... fastening pin 14 ... support Pin 15 ... Substrate 16 ... Anti-reflection member 16a ... Inclined portion 16b ... Vertical portion 22 ... Lid 23 ... Leading path 24 ... Discharge port 26 ... Main body 26A ... First gas-liquid separator 26B ... Second gas-liquid separation Device 27 ... 1st inclined surface 28 ... 2nd inclined surface 29 ... exhaust port body 30 ... butterfly valve 31 ... exhaust pipe 32 ... T-shaped pipe 33 ... exhaust pump 34 ... drain pipe 35 ... through hole Member 35a ... through hole 41 ... rectifying device 42 ... rectifying ring 43 ... retaining member 44 ... first engaging portion 45 ... second engaging portion 4 6 ... bending portion 47 ... foot 48 ... guide member (please read the back first Note for refilling this page) 25 ... Exhaust pipe 49 ... Gap This paper size applies to China National Standard (CNS) A4 (210X297) 21) 518648 A7 B7 V. Description of the invention (19) 51 ... pillar member 71 b ... inclined portion 52 ... mounting hole 72 ... tongue 61 ... shield plate 73 ... second locking hole 63 ... retaining device 7 4 ... buckling Shaft 64 ... Post 74a ... Small diameter portion 66 ... Screw hole 75 ... Insertion hole 67 ... Mounting screw 76 ... Collar 68 ... Bracket (L-shaped) 81 ... Ring member 69 ... Bracket 82 ... Vertical wall 70 ... The first stopper hole 83 ... Anti-reflection ring 71a ... Horizontal section (please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 22