JP3461068B2 - Rotating cup type liquid supply device - Google Patents

Rotating cup type liquid supply device

Info

Publication number
JP3461068B2
JP3461068B2 JP28115995A JP28115995A JP3461068B2 JP 3461068 B2 JP3461068 B2 JP 3461068B2 JP 28115995 A JP28115995 A JP 28115995A JP 28115995 A JP28115995 A JP 28115995A JP 3461068 B2 JP3461068 B2 JP 3461068B2
Authority
JP
Japan
Prior art keywords
tray
liquid supply
plate
type liquid
supply device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP28115995A
Other languages
Japanese (ja)
Other versions
JPH09122561A (en
Inventor
宏仁 佐合
重美 藤山
太 島井
耕一 永澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP28115995A priority Critical patent/JP3461068B2/en
Priority to TW087207420U priority patent/TW350368U/en
Priority to KR1019960046144A priority patent/KR100254291B1/en
Priority to US08/742,581 priority patent/US5785759A/en
Publication of JPH09122561A publication Critical patent/JPH09122561A/en
Application granted granted Critical
Publication of JP3461068B2 publication Critical patent/JP3461068B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/162Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Formation Of Insulating Films (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はSOG(Spin-On-Gl
ass:珪素化合物を有機溶媒に溶解した溶液、及びこの
溶液を塗布・焼成することで形成される酸化珪素膜)等
の塗膜をガラス基板等の板状被処理物の表面に形成する
回転カップ式液体供給装置に関する。
TECHNICAL FIELD The present invention relates to SOG (Spin-On-Gl).
ass: A solution in which a silicon compound is dissolved in an organic solvent, and a rotary cup for forming a coating film such as a silicon oxide film formed by coating and baking this solution on the surface of a plate-shaped object to be processed such as a glass substrate. Type liquid supply device.

【0002】[0002]

【従来の技術】アウターカップ内にスピンナーによって
回転せしめられるインナーカップを配置し、このインナ
ーカップの上面開口を閉塞する蓋体下面にインナーカッ
プ内にセットされた板状被処理物表面に対向する整流板
を取り付けるようにした回転カップ式の液体供給装置の
改良として、本出願人は、インナーカップの内周面に飛
散防止リングを取り付けた構造のものを提案している
(特開平4−341367号公報)。
2. Description of the Related Art An inner cup, which is rotated by a spinner, is arranged in an outer cup, and a rectifier facing the surface of a plate-shaped object set in the inner cup is placed on a lower surface of a lid that closes an upper opening of the inner cup. As an improvement of the rotary cup type liquid supply device in which a plate is attached, the present applicant has proposed a structure in which a scattering prevention ring is attached to the inner peripheral surface of the inner cup (Japanese Patent Laid-Open No. 341367/1992). Gazette).

【0003】また、インナーカップ内底面に環状スペー
サを設け、この環状スペーサと整流板との間で板状被処
理物を囲む小空間を形成し、環状スペーサにはエア抜き
とドレイン抜きを兼ねた孔を形成した構造のものを提案
している(特開平6−170315号公報)。
Further, an annular spacer is provided on the inner bottom surface of the inner cup, and a small space surrounding the plate-shaped object is formed between the annular spacer and the rectifying plate. The annular spacer also serves as an air vent and a drain vent. A structure having holes is proposed (JP-A-6-170315).

【0004】[0004]

【発明が解決しようとする課題】特開平4−34136
7号公報の場合には、飛散防止リングによって洗浄液の
飛散を防ぐことができるが、板状被処理物とインナーカ
ップ内周面との間の隙間が大きく、乱流が発生しやすく
圧力変動が発生し充分に飛散を防止できない。
[Patent Document 1] Japanese Patent Application Laid-Open No. 4-34136
In the case of Japanese Unexamined Patent Publication No. 7, although the cleaning solution can be prevented from scattering by the scattering prevention ring, the gap between the plate-shaped object to be processed and the inner peripheral surface of the inner cup is large, and turbulent flow easily occurs to cause pressure fluctuation. It occurs and cannot sufficiently prevent scattering.

【0005】また、特開平6−170315号公報の場
合には、小空間に板状被処理物を収納した状態でインナ
ーカップを回転せしめるので、小空間内は乱流の発生と
圧力の変動が抑えられ、板状被処理物上に塗布された塗
布液を均一に拡げることができる。しかしながら、エア
抜きとドレイン抜きを兼ねた孔が環状スペーサに穿設さ
れているので、洗浄等のメンテナンスが面倒である。
Further, in the case of Japanese Patent Laid-Open No. 6-170315, since the inner cup is rotated in a state where the plate-like object to be processed is housed in the small space, turbulent flow and pressure fluctuations occur in the small space. It is possible to suppress and suppress the spread of the coating liquid applied on the plate-shaped object. However, since a hole that serves both as an air vent and a drain vent is formed in the annular spacer, maintenance such as cleaning is troublesome.

【0006】また、いずれの先行技術も板状被処理物の
寸法が変化した場合に、有効に対処することができず、
特にガラス基板等の矩形状をなす被処理物の寸法の変化
に対しては、装置の部品取替操作が不可欠であるなど充
分に追従することができない。
Further, none of the prior arts can effectively deal with the case where the dimension of the plate-like object is changed,
In particular, it is not possible to sufficiently follow the change in the dimensions of a rectangular object to be processed such as a glass substrate because it is indispensable to replace parts of the device.

【0007】[0007]

【課題を解決するための手段】上記課題を解決すべく本
発明に係る回転カップ式液体供給装置は、アウターカッ
プ内にスピンナーによって回転せしめられるインナーカ
ップを設け、このインナーカップの中央に板状被処理物
を保持する保持手段が設けられ、この保持手段は、前記
インナーカップの内側に露出するとともに前記板状被処
理物の撓みを防止する基板サポートピンを備え、且つ前
インナーカップの内上面に板状被処理物を囲むトレー
が固設した。
In order to solve the above problems, a rotary cup type liquid supply apparatus according to the present invention is provided with an inner cup which is rotated by a spinner in an outer cup, and a plate-shaped cover is provided at the center of the inner cup. A holding means for holding the processed material is provided, and the holding means is
It is exposed inside the inner cup and the plate-shaped treatment
Equipped with board support pins to prevent bending of physical objects
A tray surrounding the plate-shaped object was fixedly mounted on the inner upper surface of the inner cup.

【0008】ここで、前記トレー上面に、板状被処理物
よりも若干大きめの開口が形成されたカバーを着脱自在
に設ける構成とすること、或いはトレーの形状を平面視
で略四角形状とし、各隅部からトレーの回転方向を基準
として先行する辺と平行にドレイン誘導管を導出する構
成とすることが可能である。
Here, a cover having an opening slightly larger than the plate-like object to be processed is detachably provided on the upper surface of the tray, or the tray has a substantially quadrangular shape in plan view, It is possible to adopt a configuration in which the drain guide tube is led out from each corner in parallel to the preceding side with reference to the rotation direction of the tray.

【0009】[0009]

【発明の実施の形態】以下に本発明の実施の形態を添付
図面に基づいて説明する。ここで、図1は本発明に係る
回転カップ式液体供給装置の縦断面図、図2は同回転カ
ップ式液体供給装置の平面図、図3は同回転カップ式液
体供給装置の要部の分解斜視図である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, FIG. 1 is a longitudinal sectional view of a rotary cup type liquid supply device according to the present invention, FIG. 2 is a plan view of the rotary cup type liquid supply device, and FIG. 3 is an exploded view of a main part of the rotary cup type liquid supply device. It is a perspective view.

【0010】回転カップ式液体供給装置1はベース等に
固定されたアウターカップ2内にインナーカップ3を配
置し、このインナーカップ3をアウターカップ2を貫通
するスピンナー4にて回転せしめるようにしている。
In the rotary cup type liquid supply apparatus 1, an inner cup 3 is arranged in an outer cup 2 fixed to a base or the like, and the inner cup 3 is rotated by a spinner 4 penetrating the outer cup 2. .

【0011】インナーカップ3はその内側の最外部にド
レイン回収通路3aが形成され、中央部にはガラス基板
や半導体ウェーハ等の板状被処理物Wを保持する保持手
段として、板状被処理物Wの撓みを防止する基板サポー
トピン6を設けた真空チャック5を配置している。尚、
チャック5の形状は図示例にあっては円形にしているが
矩形状にしてもよい。また、板状被処理物Wの保持手段
として図示例においては、真空チャックを用いている
が、保持手段はこれに限定されるものではなく、メカチ
ャック等板状被処理物Wを固定できる保持手段であれば
どのようなものでも用いることができる。
The inner cup 3 has a drain recovery passage 3a formed at the innermost outermost portion thereof, and has a plate-shaped object to be processed as a holding means for holding a plate-shaped object W such as a glass substrate or a semiconductor wafer in the central portion. The vacuum chuck 5 provided with the substrate support pins 6 for preventing the deflection of W is arranged. still,
Although the chuck 5 has a circular shape in the illustrated example, it may have a rectangular shape. Further, in the illustrated example, a vacuum chuck is used as a holding means for holding the plate-shaped object W, but the holding means is not limited to this, and a holding device such as a mechanical chuck that can fix the plate-shaped object W. Any means can be used.

【0012】また、インナーカップ3上にはトレー7を
固定している。このトレー7は外形が略四角形状をな
し、中央には開口8が形成され、周縁部には内方に折れ
曲がった庇状壁部9が設けられ、更にトレー7の各隅部
からはドレイン誘導管10が導出されている。このドレ
イン誘導管10の導出方向はトレーの回転方向を基準と
して先行する辺と平行となっている。一例を示すと、ド
レイン誘導管10aの導出方向と、トレー7の辺7aと
が平行となっている。
A tray 7 is fixed on the inner cup 3. The tray 7 has a substantially quadrangular outer shape, an opening 8 is formed in the center, an eave-shaped wall portion 9 that is bent inward is provided in the peripheral portion, and the drain guide is provided from each corner of the tray 7. The tube 10 has been led out. The direction in which the drain guide tube 10 is led out is parallel to the leading side with respect to the rotation direction of the tray. As an example, the lead-out direction of the drain guide tube 10a and the side 7a of the tray 7 are parallel to each other.

【0013】また、前記トレー7の上面にはカバー11
が着脱自在とされている。このカバー11はネジや他の
係止具にてトレー7に止着され、中央部には板状被処理
物Wよりも若干大きめの開口11aが形成されている。
尚、処理する板状被処理物Wの寸法が異なる場合には、
それに適合した寸法の開口が形成されたカバーを選択し
交換する。開口11aの形状は矩形状に限定されず円形
でもよい。尚、カバー11の外径形状はインナーカップ
3の内径に合わせた円形に限定されず、例えば図4に示
すような、トレー7の外径形状に合わせた矩形状でもよ
い。
A cover 11 is provided on the upper surface of the tray 7.
Is said to be removable. The cover 11 is fixed to the tray 7 with a screw or other locking tool, and an opening 11a slightly larger than the plate-shaped object W is formed in the central portion.
If the dimensions of the plate-shaped object W to be processed are different,
Select and replace the cover that has an aperture of the appropriate size. The shape of the opening 11a is not limited to a rectangular shape and may be a circular shape. The outer diameter shape of the cover 11 is not limited to the circular shape that matches the inner diameter of the inner cup 3, and may be a rectangular shape that matches the outer diameter shape of the tray 7 as shown in FIG. 4, for example.

【0014】一方、インナーカップ3及びアウターカッ
プ2の上方には直線動、回転動、上下動或いはこれらを
合成した動きが可能なアーム12が臨み、このアーム1
2の先端には下方に伸びる軸13を取り付け、この軸1
3にはノズル孔14を穿設し、このノズル孔14をジョ
イント及びアーム12内を通るホースを介してチッ素ガ
ス供給源及び洗浄液供給源につなげている。
On the other hand, the inner cup 3 and the outer cup
Linear movement above the flop 2, rotational movement, vertical movement or arm 12 that can these synthesized motion faces, the arm 1
A shaft 13 extending downward is attached to the tip of the shaft 2.
3, a nozzle hole 14 is bored, and the nozzle hole 14 is connected to a nitrogen gas supply source and a cleaning liquid supply source via a joint and a hose passing through the inside of the arm 12.

【0015】また、前記軸13にはベアリング及び磁気
シールを介してボス部15を回転自在に嵌合し、このボ
ス部15にインナーカップ3の上面開口を閉塞するため
の円板状蓋体16を取り付け、この蓋体16の下面にイ
ンナーカップ3内の乱流を防止する整流板17を取り付
けている。この整流板17はガラス基板Wより若干大き
な寸法で相似形或いは円形をしている。また、蓋体16
上方のアーム12の先端下面にはアウターカップ2の上
面開口を閉塞する蓋体19を固着している。
Further, a boss portion 15 is rotatably fitted to the shaft 13 via a bearing and a magnetic seal, and the disc-like lid body 16 for closing the upper surface opening of the inner cup 3 in the boss portion 15. A rectifying plate 17 for preventing turbulent flow in the inner cup 3 is attached to the lower surface of the lid 16. The rectifying plate 17 is slightly larger than the glass substrate W and has a similar shape or a circular shape. Also, the lid 16
A lid 19 that closes the upper opening of the outer cup 2 is fixed to the lower surface of the tip of the upper arm 12.

【0016】以上において、ガラス基板等の板状被処理
物W表面にレジスト液等を均一に塗布するには、予めト
レー7上面に処理する板状被処理物Wに合わせた大きさ
開口11aを有するカバー11を固着しておく。
In the above, in order to uniformly apply the resist solution or the like to the surface of the plate-shaped object to be processed W such as a glass substrate, an opening 11a having a size corresponding to the plate-shaped object to be processed W is previously formed on the upper surface of the tray 7. The cover 11 which it has is fixed.

【0017】この状態で、アウターカップ2及びインナ
ーカップ3の上面を開放して真空チャック5上に板状被
処理物Wを受け渡し、吸引固着し、次いで板状被処理物
Wの表面にノズルからレジスト液等を滴下し、この後、
アウターカップ2及びインナーカップ3上にアーム12
を回動させて蓋体16,19を臨ませる。
In this state, the upper surfaces of the outer cup 2 and the inner cup 3 are opened, the plate-shaped object W is transferred onto the vacuum chuck 5 and suction-fixed, and then the surface of the plate-shaped object W is ejected from the nozzle. After dropping the resist solution etc.,
Arm 12 on outer cup 2 and inner cup 3
Is rotated to expose the lids 16 and 19.

【0018】そして、アーム12を下降することで蓋体
16によりインナーカップ3の上面を閉塞し、蓋体19
によりアウターカップ2の上面開口を閉塞したならば、
スピンナーによってチャック5とインナーカップ3を一
体的に回転せしめ、遠心力によりレジスト液等を板状被
処理物Wの表面に均一に拡散塗布する。
Then, by lowering the arm 12, the upper surface of the inner cup 3 is closed by the lid body 16, and the lid body 19 is closed.
If the upper opening of the outer cup 2 is closed by
The chuck 5 and the inner cup 3 are integrally rotated by a spinner, and the resist solution or the like is uniformly diffused and coated on the surface of the plate-shaped object W by a centrifugal force.

【0019】尚、板状被処理物Wの表面から飛散したレ
ジスト液等は、遠心力でトレー7の壁部内側に集り、壁
部内側を回転方向に沿って伝い、ドレイン誘導管10か
ら、インナーカップのドレイン回収通路3aに排出され
る。そして、この排出されたドレインは蓋を開けた後
に、吸引パイプ20等によって回収される。
The resist solution or the like scattered from the surface of the plate-shaped object W collects on the inside of the wall of the tray 7 by centrifugal force, propagates along the inside of the wall in the rotation direction, and from the drain guide tube 10. It is discharged to the drain recovery passage 3a of the inner cup. Then, the discharged drain is collected by the suction pipe 20 or the like after opening the lid.

【0020】以上の処理において、インナーカップ3内
は減圧状態になっているので、このまま蓋をあけて板状
被処理物Wを取り出すと、インナーカップ内の空気が乱
れてレジスト液がスポット的にガラス基板W表面に付着
するおそれがある。そこでレジスト液等が均一に塗布さ
れた板状被処理物Wを取り出すには、先ずノズルを介し
て蓋体16と整流板17の間の空間に窒素ガス等を導入
し減圧状態を解除して行う。
In the above process, since the inner cup 3 is in a depressurized state, if the plate-shaped object W is taken out with the lid open as it is, the air in the inner cup is disturbed and the resist solution is spotted. There is a possibility that it will adhere to the surface of the glass substrate W. Therefore, in order to take out the plate-shaped object W to which the resist solution or the like is uniformly applied, first, nitrogen gas or the like is introduced into the space between the lid body 16 and the current plate 17 through the nozzle to release the depressurized state. To do.

【0021】[0021]

【発明の効果】以上に説明したように本発明によれば、
回転カップ式液体供給装置のインナーカップ中央に板状
被処理物を保持する保持手段が設けられ、この保持手段
は、前記インナーカップの内側に露出するとともに前記
板状被処理物の撓みを防止する基板サポートピンを備
え、且つ前記インナーカップの内上面に板状被処理物を
囲むトレーを固設することで、より近い位置で板状被処
理物からの塗布液等を受けることができ、効果的に飛散
を防止することができる。
As described above, according to the present invention,
A holding means for holding a plate-shaped object to be processed is provided at the center of the inner cup of the rotary cup type liquid supply device.
, The while exposed to the inside of the inner cup
Equipped with board support pins to prevent bending of plate-shaped objects
Moreover, by fixing the tray surrounding the plate-shaped object on the inner upper surface of the inner cup, the coating liquid or the like from the plate-shaped object can be received at a closer position, and the scattering is effectively performed. Can be prevented.

【0022】また、トレー上面に板状被処理物よりも若
干大きめの開口を形成したカバーを着脱自在に設けるこ
とで、塗布液の飛散を更に有効に防止できるとともに、
板状被処理物の寸法に合せた開口寸法のカバーに交換で
きる。
Further, by providing a detachable cover having an opening slightly larger than the plate-like object to be treated on the upper surface of the tray, the scattering of the coating liquid can be prevented more effectively, and
It is possible to replace the cover with an opening size that matches the size of the plate-shaped object.

【0023】更に、トレーの形状を角形被処理物に合せ
た四角形とした場合には、トレーの回転方向を基準とし
て先行する辺と平行に各隅部からドレイン誘導管を導出
することで、効果的に被処理物表面から飛散した塗布液
等をドレイン溝等に排出することができる。
Further, in the case where the shape of the tray is a quadrangle adapted to the rectangular object, the effect can be obtained by deriving the drain guide tube from each corner in parallel with the preceding side on the basis of the rotation direction of the tray. The coating liquid or the like scattered from the surface of the object to be treated can be discharged to the drain groove or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る回転カップ式液体供給装置の縦断
面図
FIG. 1 is a vertical sectional view of a rotary cup type liquid supply device according to the present invention.

【図2】同回転カップ式液体供給装置の平面図FIG. 2 is a plan view of the rotary cup type liquid supply device.

【図3】同回転カップ式液体供給装置の要部の分解斜視
FIG. 3 is an exploded perspective view of a main part of the rotary cup type liquid supply device.

【図4】別実施例を示す図3と同様の図FIG. 4 is a view similar to FIG. 3 showing another embodiment.

【符号の説明】[Explanation of symbols]

1…回転カップ式液体供給装置、2…アウターカップ、
3…インナーカップ、4…スピンナー、5…真空チャッ
ク、6…基板サポートピン、7…トレー、8…トレーの
開口、9…トレーの壁部、10…ドレイン誘導管、11
…カバー、11a…カバーの開口、W…板状被処理物。
1 ... Rotating cup type liquid supply device, 2 ... Outer cup,
3 ... inner cup, 4 ... spinner, 5 ... vacuum chuck, 6 ... substrate support pin, 7 ... tray, 8 ... tray opening, 9 ... tray wall, 10 ... drain guide tube, 11
... cover, 11a ... opening of cover, W ... plate-shaped object to be processed.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 永澤 耕一 神奈川県川崎市中原区中丸子150番地 東京応化工業株式会社内 (56)参考文献 特開 平5−169003(JP,A) 特開 平6−170315(JP,A) 特開 平4−74564(JP,A) 特開 平4−66159(JP,A) 実開 平6−39165(JP,U) (58)調査した分野(Int.Cl.7,DB名) B05C 11/08 G03F 7/16 H01L 21/027 H01L 21/31 H01L 21/316 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Koichi Nagasawa, 150 Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa Tokyo Ohka Kogyo Co., Ltd. (56) References JP-A-5-169003 (JP, A) JP-A-6- 170315 (JP, A) JP-A-4-74564 (JP, A) JP-A-4-66159 (JP, A) Actually open flat 6-39165 (JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) B05C 11/08 G03F 7/16 H01L 21/027 H01L 21/31 H01L 21/316

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アウターカップ内にスピンナーによって
回転せしめられインナーカップが設けられ、このインナ
ーカップの内側の最外部にはドレイン回収通路が形成さ
れ、また、インナーカップの内上面に板状被処理物を囲
むトレーが固設され、このトレーに形成した開口を介し
て真空チャックなどの保持手段がトレー内に臨み、この
保持手段に板状被処理物の撓みを防止する基板サポート
ピンを設けたことを特徴とする回転カップ式液体供給装
置。
1. An inner cup, which is rotated by a spinner, is provided in the outer cup, and a drain recovery passage is formed in an outermost portion inside the inner cup.
In addition, the plate-shaped workpiece is enclosed on the inner top surface of the inner cup.
The tray is fixed, and the tray is
Holding means such as a vacuum chuck faces the tray.
A rotary cup type liquid supply device, characterized in that the holding means is provided with a substrate support pin for preventing the plate-shaped workpiece from bending.
【請求項2】 請求項1に記載の回転カップ式液体供給
装置において、前記トレー上面にはカバーが着脱自在に
設けられ、このカバーには板状被処理物よりも若干大き
めの開口が形成されていることを特徴とする回転カップ
式液体供給装置。
2. The rotary cup type liquid supply device according to claim 1, wherein a cover is detachably provided on the upper surface of the tray, and the cover is formed with an opening slightly larger than a plate-shaped object to be processed. A rotating cup type liquid supply device.
【請求項3】 請求項1に記載の回転カップ式液体供給
装置において、前記トレーの形状は平面視で略四角形状
をなし、各隅部からはドレイン誘導管が導出され、この
ドレイン誘導管の導出方向はトレーの回転方向を基準と
して先行する辺と平行であることを特徴とする回転カッ
プ式液体供給装置。
3. The rotary cup type liquid supply device according to claim 1, wherein the shape of the tray is substantially quadrangular in a plan view, and the drain guide tube is led out from each corner, and the drain guide tube A rotating cup type liquid supply device characterized in that the pulling-out direction is parallel to the preceding side with respect to the rotating direction of the tray.
JP28115995A 1995-10-30 1995-10-30 Rotating cup type liquid supply device Expired - Fee Related JP3461068B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP28115995A JP3461068B2 (en) 1995-10-30 1995-10-30 Rotating cup type liquid supply device
TW087207420U TW350368U (en) 1995-10-30 1996-10-01 Rotating cup type liquid supply device
KR1019960046144A KR100254291B1 (en) 1995-10-30 1996-10-16 Rotary cup type liquid supply device
US08/742,581 US5785759A (en) 1995-10-30 1996-10-28 Rotating cup type liquid supply device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28115995A JP3461068B2 (en) 1995-10-30 1995-10-30 Rotating cup type liquid supply device

Publications (2)

Publication Number Publication Date
JPH09122561A JPH09122561A (en) 1997-05-13
JP3461068B2 true JP3461068B2 (en) 2003-10-27

Family

ID=17635185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28115995A Expired - Fee Related JP3461068B2 (en) 1995-10-30 1995-10-30 Rotating cup type liquid supply device

Country Status (4)

Country Link
US (1) US5785759A (en)
JP (1) JP3461068B2 (en)
KR (1) KR100254291B1 (en)
TW (1) TW350368U (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1199219C (en) * 1999-12-10 2005-04-27 皇家菲利浦电子有限公司 Method and device for providing layer of coating material on inner side of display window for color display tube
EP1124252A2 (en) * 2000-02-10 2001-08-16 Applied Materials, Inc. Apparatus and process for processing substrates
JP4426403B2 (en) * 2004-08-31 2010-03-03 東京エレクトロン株式会社 Laser processing equipment
CN101452209B (en) * 2007-11-30 2011-06-01 沈阳芯源微电子设备有限公司 Automatic cap-covering mechanism in photoresist coating unit of square substrate
DE102010014482A1 (en) * 2010-04-10 2011-10-13 Aktiebolaget Skf Antifriction bearing, particularly groove ball bearing, for use in bearing position, has a bearing inner ring and bearing outer ring, where recess is equipped in cage surface
KR102550973B1 (en) 2022-01-18 2023-07-05 (주)에스프레소미디어 Personalized metaverse character creation system using Artificial Intelligence deep learning

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2937549B2 (en) * 1991-05-16 1999-08-23 東京応化工業株式会社 Coating device
JP2591555B2 (en) * 1991-12-20 1997-03-19 東京応化工業株式会社 Coating device
US5439519A (en) * 1992-04-28 1995-08-08 Tokyo Ohka Kogyo Co., Ltd. Solution applying apparatus

Also Published As

Publication number Publication date
US5785759A (en) 1998-07-28
JPH09122561A (en) 1997-05-13
TW350368U (en) 1999-01-11
KR970020214A (en) 1997-05-28
KR100254291B1 (en) 2000-05-01

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