JPH0323632B2 - - Google Patents

Info

Publication number
JPH0323632B2
JPH0323632B2 JP15831585A JP15831585A JPH0323632B2 JP H0323632 B2 JPH0323632 B2 JP H0323632B2 JP 15831585 A JP15831585 A JP 15831585A JP 15831585 A JP15831585 A JP 15831585A JP H0323632 B2 JPH0323632 B2 JP H0323632B2
Authority
JP
Japan
Prior art keywords
film
thin film
substrate
sputtering
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15831585A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6220869A (ja
Inventor
Masato Sugyama
Toshihiko Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP15831585A priority Critical patent/JPS6220869A/ja
Publication of JPS6220869A publication Critical patent/JPS6220869A/ja
Publication of JPH0323632B2 publication Critical patent/JPH0323632B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP15831585A 1985-07-19 1985-07-19 薄膜形成方法 Granted JPS6220869A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15831585A JPS6220869A (ja) 1985-07-19 1985-07-19 薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15831585A JPS6220869A (ja) 1985-07-19 1985-07-19 薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS6220869A JPS6220869A (ja) 1987-01-29
JPH0323632B2 true JPH0323632B2 (enrdf_load_stackoverflow) 1991-03-29

Family

ID=15668946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15831585A Granted JPS6220869A (ja) 1985-07-19 1985-07-19 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS6220869A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6220869A (ja) 1987-01-29

Similar Documents

Publication Publication Date Title
US4767516A (en) Method for making magnetic recording media
EP0035870B1 (en) Method of producing a magnetic recording medium
JP3555797B2 (ja) 成膜装置および成膜方法
JPH0935233A (ja) 磁気記録媒体及びその製造方法
JPH0323632B2 (enrdf_load_stackoverflow)
JPH0450384B2 (enrdf_load_stackoverflow)
JPS60182711A (ja) 磁性薄膜の形成方法およびその装置
JPH0257144B2 (enrdf_load_stackoverflow)
JPH0334616B2 (enrdf_load_stackoverflow)
JPS62102421A (ja) 基板用フイルム及び薄膜形成方法
JPH0232353B2 (ja) Taikotaagetsutoshikisupatsutasochi
JPH0411624B2 (enrdf_load_stackoverflow)
JPS63277750A (ja) 薄膜形成方法
JPS641855B2 (enrdf_load_stackoverflow)
JPS6151336B2 (enrdf_load_stackoverflow)
JPS59193542A (ja) 磁気記録媒体の製造方法
JPS62151563A (ja) 薄膜形成装置
JPH0470392B2 (enrdf_load_stackoverflow)
JPS61279673A (ja) 対向タ−ゲツト式スパツタ装置
JP2000293847A (ja) 磁気記録媒体の製造装置
JPH0221052B2 (enrdf_load_stackoverflow)
JP2004362699A (ja) 磁気記録媒体の製造方法および製造装置
JPH0369010A (ja) 磁気記録媒体及びその製造方法
JPS6093640A (ja) 磁気記録媒体の製造用装置
JPH0121540B2 (enrdf_load_stackoverflow)